CA2918933A1 - Cible de pulverisation et son procede de production - Google Patents

Cible de pulverisation et son procede de production Download PDF

Info

Publication number
CA2918933A1
CA2918933A1 CA2918933A CA2918933A CA2918933A1 CA 2918933 A1 CA2918933 A1 CA 2918933A1 CA 2918933 A CA2918933 A CA 2918933A CA 2918933 A CA2918933 A CA 2918933A CA 2918933 A1 CA2918933 A1 CA 2918933A1
Authority
CA
Canada
Prior art keywords
target
sputtering
sputtering target
oxygen
specific resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA2918933A
Other languages
English (en)
Inventor
Atsushi Saito
Satoshi Nomura
Shoubin Zhang
Yuto Toshimori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of CA2918933A1 publication Critical patent/CA2918933A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C18/00—Alloys based on zinc
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3284—Zinc oxides, zincates, cadmium oxides, cadmiates, mercury oxides, mercurates or oxide forming salts thereof
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/652—Reduction treatment
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
CA2918933A 2013-08-06 2014-08-05 Cible de pulverisation et son procede de production Abandoned CA2918933A1 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2013163051 2013-08-06
JP2013-163051 2013-08-06
JP2014-157914 2014-08-01
JP2014157914A JP6233233B2 (ja) 2013-08-06 2014-08-01 スパッタリングターゲット及びその製造方法
PCT/JP2014/070572 WO2015020029A1 (fr) 2013-08-06 2014-08-05 Cible de pulvérisation et son procédé de production

Publications (1)

Publication Number Publication Date
CA2918933A1 true CA2918933A1 (fr) 2015-02-12

Family

ID=52461360

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2918933A Abandoned CA2918933A1 (fr) 2013-08-06 2014-08-05 Cible de pulverisation et son procede de production

Country Status (5)

Country Link
JP (1) JP6233233B2 (fr)
KR (1) KR102237339B1 (fr)
CA (1) CA2918933A1 (fr)
TW (1) TW201525169A (fr)
WO (1) WO2015020029A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7024636B2 (ja) * 2018-07-12 2022-02-24 三菱マテリアル株式会社 スパッタリングターゲットの製造方法
JP2022105853A (ja) * 2021-01-05 2022-07-15 三菱マテリアル株式会社 酸化物スパッタリングターゲット、および、酸化物スパッタリングターゲットの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3533333B2 (ja) * 1998-08-21 2004-05-31 Ｔｄｋ株式会社 光記録媒体の干渉膜用スパッタリングターゲットおよびその製造方法
JP4797712B2 (ja) * 2006-03-08 2011-10-19 東ソー株式会社 ＺｎＯ−Ａｌ２Ｏ３系焼結体、スパッタリングターゲット及び透明導電膜の製造方法
JP4552950B2 (ja) * 2006-03-15 2010-09-29 住友金属鉱山株式会社 ターゲット用酸化物焼結体、その製造方法、それを用いた透明導電膜の製造方法、及び得られる透明導電膜
JP4730204B2 (ja) 2006-05-24 2011-07-20 住友金属鉱山株式会社 酸化物焼結体ターゲット、及びそれを用いた酸化物透明導電膜の製造方法
JP4994068B2 (ja) * 2006-08-09 2012-08-08 出光興産株式会社 酸化物導電性材料及びその製造方法
JP2009009816A (ja) * 2007-06-28 2009-01-15 Idemitsu Kosan Co Ltd 酸化物導電性材料及びその製造方法
JP2009123957A (ja) * 2007-11-15 2009-06-04 Sumitomo Chemical Co Ltd 酸化物半導体材料及びその製造方法、電子デバイス及び電界効果トランジスタ
JP5024226B2 (ja) 2008-08-06 2012-09-12 日立金属株式会社 酸化物焼結体およびその製造方法、スパッタリングターゲット、半導体薄膜
JP2010070410A (ja) * 2008-09-17 2010-04-02 Idemitsu Kosan Co Ltd 酸化物焼結体の製造方法
JP2012066968A (ja) * 2010-09-24 2012-04-05 Kobelco Kaken:Kk 酸化物焼結体およびスパッタリングターゲット
JP5651095B2 (ja) 2010-11-16 2015-01-07 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット
JP5460619B2 (ja) * 2011-01-13 2014-04-02 住友重機械工業株式会社 ターゲット、およびこれを備えた成膜装置
JP2012148937A (ja) * 2011-01-20 2012-08-09 Sumitomo Chemical Co Ltd 導電性複合酸化物、酸化亜鉛系焼結体、その製造方法およびターゲット

Also Published As

Publication number Publication date
TW201525169A (zh) 2015-07-01
KR20160040533A (ko) 2016-04-14
WO2015020029A1 (fr) 2015-02-12
KR102237339B1 (ko) 2021-04-06
JP2015052165A (ja) 2015-03-19
JP6233233B2 (ja) 2017-11-22

Similar Documents

Publication Publication Date Title
TWI645059B (zh) 氧化銦－氧化鋅系（ｉｚｏ）濺鍍鈀及其製造方法
TWI476287B (zh) Oxide sintered body and sputtering target
EP2428500B1 (fr) Corps fritté en oxyde d'indium, film conducteur transparent en oxyde d'indium et son procédé de fabrication
TWI525060B (zh) An oxide sintered body, a sputtering target, a thin film, and an oxide sintered body
JP2013067531A (ja) Ｚｎ−Ｓｉ−Ｏ系酸化物焼結体とその製造方法および透明導電膜
TW201538431A (zh) 氧化物燒結體及濺鍍靶、與該氧化物燒結體之製造方法
KR20100012040A (ko) 아모르퍼스 복합 산화막, 결정질 복합 산화막, 아모르퍼스 복합 산화막의 제조 방법, 결정질 복합 산화막의 제조 방법 및 복합 산화물 소결체
JP5081959B2 (ja) 酸化物焼結体及び酸化物半導体薄膜
JP2014055348A (ja) 透明酸化物膜形成用スパッタリングターゲット及びその製造方法
KR20140138614A (ko) 스퍼터링 타깃 및 고저항 투명막 그리고 그 제조 방법
CA2918933A1 (fr) Cible de pulverisation et son procede de production
TW201806909A (zh) 燒結體、濺鍍靶及其製造方法
JP5081960B2 (ja) 酸化物焼結体及び酸化物半導体薄膜
TW201910539A (zh) 氧化物燒結體及濺鍍靶
JP5367660B2 (ja) 酸化物焼結体及び酸化物半導体薄膜
JP5363742B2 (ja) 酸化亜鉛系透明導電膜
JP5761253B2 (ja) Ｚｎ−Ｓｉ−Ｏ系酸化物焼結体とその製造方法およびスパッタリングターゲットと蒸着用タブレット
JP5367659B2 (ja) 酸化物焼結体及び酸化物半導体薄膜
JP2010084177A (ja) 酸化亜鉛系焼結ターゲットおよびその製造方法
KR101283686B1 (ko) 열안정성 투명 도전막 및 투명 도전막의 제조방법
JP5689378B2 (ja) 透明導電膜
TW202314012A (zh) 濺鍍靶及其製造方法
JP2014037631A (ja) 酸化亜鉛系透明導電膜、マグネトロンスパッタリング用焼結体ターゲット、液晶ディスプレイ及びタッチパネル、ならびに酸化亜鉛系透明導電膜を含んでなる機器
JPWO2014171545A1 (ja) Ｉｎ−Ｇａ−Ｚｎ系複合酸化物焼結体およびその製造方法
JP2012102403A (ja) 酸化亜鉛系透明導電膜、マグネトロンスパッタリング用焼結体ターゲット、液晶ディスプレイ及びタッチパネル、ならびに酸化亜鉛系透明導電膜を含んでなる機器

Legal Events

Date Code Title Description
FZDE Dead

Effective date: 20200831