KR102237339B1 - 스퍼터링 타깃 및 그 제조 방법 - Google Patents

스퍼터링 타깃 및 그 제조 방법 Download PDF

Info

Publication number
KR102237339B1
KR102237339B1 KR1020167002105A KR20167002105A KR102237339B1 KR 102237339 B1 KR102237339 B1 KR 102237339B1 KR 1020167002105 A KR1020167002105 A KR 1020167002105A KR 20167002105 A KR20167002105 A KR 20167002105A KR 102237339 B1 KR102237339 B1 KR 102237339B1
Authority
KR
South Korea
Prior art keywords
sputtering
target
sputtering target
sintered body
oxygen
Prior art date
Application number
KR1020167002105A
Other languages
English (en)
Korean (ko)
Other versions
KR20160040533A (ko
Inventor
아츠시 사이토
사토시 노무라
쇼우빈 장
유토 도시모리
Original Assignee
미쓰비시 마테리알 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쓰비시 마테리알 가부시키가이샤 filed Critical 미쓰비시 마테리알 가부시키가이샤
Publication of KR20160040533A publication Critical patent/KR20160040533A/ko
Application granted granted Critical
Publication of KR102237339B1 publication Critical patent/KR102237339B1/ko

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C18/00—Alloys based on zinc
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3284—Zinc oxides, zincates, cadmium oxides, cadmiates, mercury oxides, mercurates or oxide forming salts thereof
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/652—Reduction treatment
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
KR1020167002105A 2013-08-06 2014-08-05 스퍼터링 타깃 및 그 제조 방법 KR102237339B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2013-163051 2013-08-06
JP2013163051 2013-08-06
JPJP-P-2014-157914 2014-08-01
JP2014157914A JP6233233B2 (ja) 2013-08-06 2014-08-01 スパッタリングターゲット及びその製造方法
PCT/JP2014/070572 WO2015020029A1 (fr) 2013-08-06 2014-08-05 Cible de pulvérisation et son procédé de production

Publications (2)

Publication Number Publication Date
KR20160040533A KR20160040533A (ko) 2016-04-14
KR102237339B1 true KR102237339B1 (ko) 2021-04-06

Family

ID=52461360

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167002105A KR102237339B1 (ko) 2013-08-06 2014-08-05 스퍼터링 타깃 및 그 제조 방법

Country Status (5)

Country Link
JP (1) JP6233233B2 (fr)
KR (1) KR102237339B1 (fr)
CA (1) CA2918933A1 (fr)
TW (1) TW201525169A (fr)
WO (1) WO2015020029A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7024636B2 (ja) * 2018-07-12 2022-02-24 三菱マテリアル株式会社 スパッタリングターゲットの製造方法
JP2022105853A (ja) * 2021-01-05 2022-07-15 三菱マテリアル株式会社 酸化物スパッタリングターゲット、および、酸化物スパッタリングターゲットの製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000064035A (ja) * 1998-08-21 2000-02-29 Tdk Corp 光記録媒体の干渉膜用スパッタリングターゲットおよびその製造方法
JP2009123957A (ja) 2007-11-15 2009-06-04 Sumitomo Chemical Co Ltd 酸化物半導体材料及びその製造方法、電子デバイス及び電界効果トランジスタ
JP2010070410A (ja) * 2008-09-17 2010-04-02 Idemitsu Kosan Co Ltd 酸化物焼結体の製造方法
JP2012144793A (ja) 2011-01-13 2012-08-02 Sumitomo Heavy Ind Ltd ターゲット、およびこれを備えた成膜装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4797712B2 (ja) * 2006-03-08 2011-10-19 東ソー株式会社 ＺｎＯ−Ａｌ２Ｏ３系焼結体、スパッタリングターゲット及び透明導電膜の製造方法
JP4552950B2 (ja) * 2006-03-15 2010-09-29 住友金属鉱山株式会社 ターゲット用酸化物焼結体、その製造方法、それを用いた透明導電膜の製造方法、及び得られる透明導電膜
JP4730204B2 (ja) 2006-05-24 2011-07-20 住友金属鉱山株式会社 酸化物焼結体ターゲット、及びそれを用いた酸化物透明導電膜の製造方法
JP4994068B2 (ja) * 2006-08-09 2012-08-08 出光興産株式会社 酸化物導電性材料及びその製造方法
JP2009009816A (ja) * 2007-06-28 2009-01-15 Idemitsu Kosan Co Ltd 酸化物導電性材料及びその製造方法
JP5024226B2 (ja) 2008-08-06 2012-09-12 日立金属株式会社 酸化物焼結体およびその製造方法、スパッタリングターゲット、半導体薄膜
JP2012066968A (ja) * 2010-09-24 2012-04-05 Kobelco Kaken:Kk 酸化物焼結体およびスパッタリングターゲット
JP5651095B2 (ja) 2010-11-16 2015-01-07 株式会社コベルコ科研 酸化物焼結体およびスパッタリングターゲット
JP2012148937A (ja) * 2011-01-20 2012-08-09 Sumitomo Chemical Co Ltd 導電性複合酸化物、酸化亜鉛系焼結体、その製造方法およびターゲット

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000064035A (ja) * 1998-08-21 2000-02-29 Tdk Corp 光記録媒体の干渉膜用スパッタリングターゲットおよびその製造方法
JP2009123957A (ja) 2007-11-15 2009-06-04 Sumitomo Chemical Co Ltd 酸化物半導体材料及びその製造方法、電子デバイス及び電界効果トランジスタ
JP2010070410A (ja) * 2008-09-17 2010-04-02 Idemitsu Kosan Co Ltd 酸化物焼結体の製造方法
JP2012144793A (ja) 2011-01-13 2012-08-02 Sumitomo Heavy Ind Ltd ターゲット、およびこれを備えた成膜装置

Also Published As

Publication number Publication date
KR20160040533A (ko) 2016-04-14
JP2015052165A (ja) 2015-03-19
WO2015020029A1 (fr) 2015-02-12
TW201525169A (zh) 2015-07-01
CA2918933A1 (fr) 2015-02-12
JP6233233B2 (ja) 2017-11-22

Similar Documents

Publication Publication Date Title
TWI488826B (zh) An indium oxide sintered body, an indium oxide transparent conductive film, and a method for producing the transparent conductive film
TWI541362B (zh) In 2 O 3 -SnO 2 -ZnO sputtering target
JP5330469B2 (ja) スパッタリングターゲット、透明導電膜及び透明電極
TWI476287B (zh) Oxide sintered body and sputtering target
KR101695578B1 (ko) 산화물 소결체 및 스퍼터링 타깃, 및 그 제조 방법
JP5339100B2 (ja) Ｚｎ−Ｓｉ−Ｏ系酸化物焼結体とその製造方法およびスパッタリングターゲットと蒸着用タブレット
TWI480255B (zh) Oxide sintered body and sputtering target
TWI568869B (zh) Oxide sintered body and sputtering target
JP6278229B2 (ja) 透明酸化物膜形成用スパッタリングターゲット及びその製造方法
JP6426309B2 (ja) 新規ガーネット化合物、それを含有する焼結体及びスパッタリングターゲット
KR20130105735A (ko) 산화물 소결체 및 스퍼터링 타깃
JP2021038143A (ja) 酸化物焼結体、スパッタリングターゲット、酸化物半導体膜及び薄膜トランジスタ
KR102237339B1 (ko) 스퍼터링 타깃 및 그 제조 방법
KR20180116293A (ko) Sn-Zn-O 계 산화물 소결체와 그 제조 방법
JP5081960B2 (ja) 酸化物焼結体及び酸化物半導体薄膜
TW201910539A (zh) 氧化物燒結體及濺鍍靶
CN110546300A (zh) 透明导电膜用溅射靶
JP5689378B2 (ja) 透明導電膜
JP2013193945A (ja) Ｉｎ−Ｇａ−Ｚｎ−Ｏ系酸化物焼結体とその製造方法およびスパッタリングターゲットと酸化物半導体膜
JP2017014534A (ja) スパッタリングターゲット及びその製造方法
JP2020164957A (ja) スパッタリングターゲットおよび、スパッタリングターゲットの製造方法

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
AMND Amendment
X701 Decision to grant (after re-examination)
GRNT Written decision to grant