CA2496467C - Stabilized, aqueous silicon dioxide dispersion - Google Patents

Stabilized, aqueous silicon dioxide dispersion Download PDF

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Publication number
CA2496467C
CA2496467C CA002496467A CA2496467A CA2496467C CA 2496467 C CA2496467 C CA 2496467C CA 002496467 A CA002496467 A CA 002496467A CA 2496467 A CA2496467 A CA 2496467A CA 2496467 C CA2496467 C CA 2496467C
Authority
CA
Canada
Prior art keywords
silicon dioxide
cation
providing compound
aqueous dispersion
dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA002496467A
Other languages
English (en)
French (fr)
Other versions
CA2496467A1 (en
Inventor
Wolfgang Lortz
Christoph Batz-Sohn
Gabriele Perlet
Werner Will
Gerrit Schneider
Peter Neugebauer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa GmbH filed Critical Degussa GmbH
Publication of CA2496467A1 publication Critical patent/CA2496467A1/en
Application granted granted Critical
Publication of CA2496467C publication Critical patent/CA2496467C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/149—Coating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3045—Treatment with inorganic compounds
    • C09C1/3054—Coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Compounds (AREA)
  • Colloid Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CA002496467A 2002-08-22 2003-07-29 Stabilized, aqueous silicon dioxide dispersion Expired - Fee Related CA2496467C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10238463.0 2002-08-22
DE10238463A DE10238463A1 (de) 2002-08-22 2002-08-22 Stabilisierte, wässerige Siliciumdioxid-Dispersion
PCT/EP2003/008333 WO2004018359A1 (en) 2002-08-22 2003-07-29 Stabilized, aqueous silicon dioxide dispersion

Publications (2)

Publication Number Publication Date
CA2496467A1 CA2496467A1 (en) 2004-03-04
CA2496467C true CA2496467C (en) 2008-12-09

Family

ID=31197230

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002496467A Expired - Fee Related CA2496467C (en) 2002-08-22 2003-07-29 Stabilized, aqueous silicon dioxide dispersion

Country Status (10)

Country Link
EP (1) EP1529014A1 (ja)
JP (1) JP4448030B2 (ja)
KR (1) KR100772258B1 (ja)
CN (1) CN100447082C (ja)
AU (1) AU2003250188A1 (ja)
CA (1) CA2496467C (ja)
DE (1) DE10238463A1 (ja)
NO (1) NO20051492L (ja)
PL (1) PL203972B1 (ja)
WO (1) WO2004018359A1 (ja)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200613485A (en) * 2004-03-22 2006-05-01 Kao Corp Polishing composition
DE102004021092A1 (de) 2004-04-29 2005-11-24 Degussa Ag Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel
AT500776B1 (de) * 2004-08-18 2008-12-15 Wagner Friedrich Verwendung einer zusammensetzung zum aufbringen einer rutschhemmenden, höhenaufbauenden strukturbeschichtung
AT502282B1 (de) * 2005-07-26 2008-12-15 Friedrich Wagner Rutschhemmender sprühauftrag für bewegliche bodenbeläge
WO2006046463A1 (ja) * 2004-10-28 2006-05-04 Konica Minolta Photo Imaging, Inc. カチオン性微粒子分散体及びインクジェット記録用紙
DE102005012409A1 (de) 2005-03-17 2006-09-21 Wacker Chemie Ag Wäßrige Dispersionen teilhydrophober Kieselsäuren
DE102005062606A1 (de) * 2005-12-23 2007-07-05 Deutsche Institute Für Textil- Und Faserforschung Denkendorf Nanoskalige Teilchen auf der Basis von SiO2 und Mischoxiden hiervon, deren Herstellung und Verwendung zur Behandlung textiler Materialien
JP2007258606A (ja) * 2006-03-24 2007-10-04 Fujifilm Corp 化学的機械的研磨用研磨液
US9074118B2 (en) * 2006-07-12 2015-07-07 Cabot Microelectronics Corporation CMP method for metal-containing substrates
DE102006049526A1 (de) 2006-10-20 2008-04-24 Evonik Degussa Gmbh Stabile wässrige Dispersionen von Siliciumdioxid
RU2010125233A (ru) * 2007-11-19 2011-12-27 Грейс Гмбх Унд Ко. Кг (De) Антикоррозионные частицы
DE102007059861A1 (de) * 2007-12-12 2009-06-18 Evonik Degussa Gmbh Verfahren zur Herstellung von Siliciumdioxid-Dispersionen
DE102008041466A1 (de) 2008-08-22 2010-02-25 Wacker Chemie Ag Wäßrige Dispersionen hydrophober Kieselsäuren
CN101838479B (zh) * 2010-03-19 2013-11-20 福建师范大学 一种可分散超细二氧化硅的制备方法
KR102205327B1 (ko) * 2013-06-10 2021-01-19 닛산 가가쿠 가부시키가이샤 실리카 졸 및 실리카 졸의 제조 방법
CN105778775B (zh) * 2014-12-23 2021-03-02 安集微电子（上海）有限公司 一种中性胶体二氧化硅的制备方法
CN104830300A (zh) * 2015-04-30 2015-08-12 河南大学 一种小粒径纳米聚硅乳液及其制备方法
CN108751204A (zh) * 2018-05-14 2018-11-06 江苏联瑞新材料股份有限公司 一种亚微米二氧化硅分散液的制备方法
CN111777949A (zh) * 2020-07-13 2020-10-16 长沙金硅地环保科技有限公司 一种高分子纳米硅与水溶胶聚合物及其应用
JP2022067800A (ja) * 2020-10-21 2022-05-09 山口精研工業株式会社 シリカ分散液、及び研磨剤組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892797A (en) * 1956-02-17 1959-06-30 Du Pont Process for modifying the properties of a silica sol and product thereof
US3007878A (en) * 1956-11-01 1961-11-07 Du Pont Aquasols of positively-charged coated silica particles and their production
SE501214C2 (sv) * 1992-08-31 1994-12-12 Eka Nobel Ab Silikasol samt förfarande för framställning av papper under användande av solen
JP4704564B2 (ja) * 1998-10-02 2011-06-15 キャボット コーポレイション シリカ分散体、コーティング組成物、及び記録媒体

Also Published As

Publication number Publication date
KR20050050646A (ko) 2005-05-31
JP4448030B2 (ja) 2010-04-07
PL203972B1 (pl) 2009-11-30
CN1675128A (zh) 2005-09-28
PL373839A1 (en) 2005-09-19
AU2003250188A1 (en) 2004-03-11
CN100447082C (zh) 2008-12-31
WO2004018359A1 (en) 2004-03-04
NO20051492L (no) 2005-05-13
JP2005536426A (ja) 2005-12-02
EP1529014A1 (en) 2005-05-11
DE10238463A1 (de) 2004-03-04
KR100772258B1 (ko) 2007-11-01
CA2496467A1 (en) 2004-03-04

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