CA2486073C - Electrode for gas evolution and method for its production - Google Patents
Electrode for gas evolution and method for its production Download PDFInfo
- Publication number
- CA2486073C CA2486073C CA2486073A CA2486073A CA2486073C CA 2486073 C CA2486073 C CA 2486073C CA 2486073 A CA2486073 A CA 2486073A CA 2486073 A CA2486073 A CA 2486073A CA 2486073 C CA2486073 C CA 2486073C
- Authority
- CA
- Canada
- Prior art keywords
- solution
- tantalum
- iridium
- metal
- titanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims abstract description 53
- 239000002184 metal Substances 0.000 claims abstract description 53
- 229910000510 noble metal Inorganic materials 0.000 claims abstract description 31
- 239000002243 precursor Substances 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 20
- 150000003624 transition metals Chemical class 0.000 claims abstract description 20
- 229910052802 copper Inorganic materials 0.000 claims abstract description 16
- 239000010949 copper Substances 0.000 claims abstract description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 15
- 238000007747 plating Methods 0.000 claims abstract description 12
- 239000000243 solution Substances 0.000 claims description 65
- 239000010410 layer Substances 0.000 claims description 46
- 229910052715 tantalum Inorganic materials 0.000 claims description 38
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 35
- 239000010936 titanium Substances 0.000 claims description 32
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 30
- 229910052719 titanium Inorganic materials 0.000 claims description 25
- 229910052741 iridium Inorganic materials 0.000 claims description 22
- 239000003929 acidic solution Substances 0.000 claims description 18
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 18
- 230000004913 activation Effects 0.000 claims description 17
- 150000002739 metals Chemical class 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 17
- 239000011229 interlayer Substances 0.000 claims description 16
- 239000011241 protective layer Substances 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 15
- 230000001681 protective effect Effects 0.000 claims description 14
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 9
- 229910052718 tin Inorganic materials 0.000 claims description 9
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 claims description 8
- 229910052787 antimony Inorganic materials 0.000 claims description 7
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical class [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 7
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 7
- 150000001805 chlorine compounds Chemical class 0.000 claims description 6
- NGCDGPPKVSZGRR-UHFFFAOYSA-J 1,4,6,9-tetraoxa-5-stannaspiro[4.4]nonane-2,3,7,8-tetrone Chemical compound [Sn+4].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O NGCDGPPKVSZGRR-UHFFFAOYSA-J 0.000 claims description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 5
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 5
- 239000006259 organic additive Substances 0.000 claims description 4
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 claims description 3
- 150000002222 fluorine compounds Chemical class 0.000 claims description 3
- 238000004065 wastewater treatment Methods 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 claims 1
- 150000003891 oxalate salts Chemical class 0.000 claims 1
- 239000008399 tap water Substances 0.000 abstract description 6
- 235000020679 tap water Nutrition 0.000 abstract description 6
- 239000002351 wastewater Substances 0.000 abstract description 5
- 239000011253 protective coating Substances 0.000 abstract 1
- 238000007669 thermal treatment Methods 0.000 description 33
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 239000001301 oxygen Substances 0.000 description 10
- 229910052760 oxygen Inorganic materials 0.000 description 10
- 235000011149 sulphuric acid Nutrition 0.000 description 10
- 230000003197 catalytic effect Effects 0.000 description 9
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 9
- 239000000523 sample Substances 0.000 description 9
- 239000001117 sulphuric acid Substances 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 238000000137 annealing Methods 0.000 description 7
- 229910052593 corundum Inorganic materials 0.000 description 7
- 239000010431 corundum Substances 0.000 description 7
- 238000005238 degreasing Methods 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 150000004706 metal oxides Chemical class 0.000 description 7
- 238000005488 sandblasting Methods 0.000 description 7
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical class Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 4
- -1 fluoride ions Chemical class 0.000 description 4
- 229910000457 iridium oxide Inorganic materials 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical class [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910004537 TaCl5 Inorganic materials 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000009849 deactivation Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003487 electrochemical reaction Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000006833 reintegration Effects 0.000 description 2
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 2
- 229910000314 transition metal oxide Inorganic materials 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 241000195493 Cryptophyta Species 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910010061 TiC13 Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(I) oxide Inorganic materials [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- FTXJFNVGIDRLEM-UHFFFAOYSA-N copper;dinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O FTXJFNVGIDRLEM-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- KRFJLUBVMFXRPN-UHFFFAOYSA-N cuprous oxide Chemical compound [O-2].[Cu+].[Cu+] KRFJLUBVMFXRPN-UHFFFAOYSA-N 0.000 description 1
- 229940112669 cuprous oxide Drugs 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000005363 electrowinning Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000009418 renovation Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- CALMYRPSSNRCFD-UHFFFAOYSA-J tetrachloroiridium Chemical compound Cl[Ir](Cl)(Cl)Cl CALMYRPSSNRCFD-UHFFFAOYSA-J 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
- C25B11/053—Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
- C02F2001/46133—Electrodes characterised by the material
- C02F2001/46138—Electrodes comprising a substrate and a coating
- C02F2001/46142—Catalytic coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Inert Electrodes (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITMI2002A001128 | 2002-05-24 | ||
| IT2002MI001128A ITMI20021128A1 (it) | 2002-05-24 | 2002-05-24 | Elettrodo per sviluppo di gas e metodo per il suo ottenimento |
| PCT/EP2003/005424 WO2003100135A2 (en) | 2002-05-24 | 2003-05-23 | Electrode for gas evolution and method for its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2486073A1 CA2486073A1 (en) | 2003-12-04 |
| CA2486073C true CA2486073C (en) | 2012-10-23 |
Family
ID=11449969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2486073A Expired - Lifetime CA2486073C (en) | 2002-05-24 | 2003-05-23 | Electrode for gas evolution and method for its production |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US7815781B2 (https=) |
| EP (1) | EP1507899B1 (https=) |
| JP (1) | JP4398858B2 (https=) |
| KR (1) | KR101022978B1 (https=) |
| CN (1) | CN100480430C (https=) |
| AT (1) | ATE332988T1 (https=) |
| AU (1) | AU2003238386A1 (https=) |
| CA (1) | CA2486073C (https=) |
| DE (1) | DE60306772T2 (https=) |
| ES (1) | ES2268374T3 (https=) |
| IT (1) | ITMI20021128A1 (https=) |
| PT (1) | PT1507899E (https=) |
| RU (1) | RU2326991C2 (https=) |
| TW (1) | TWI251036B (https=) |
| WO (1) | WO2003100135A2 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITMI20041006A1 (it) * | 2004-05-20 | 2004-08-20 | De Nora Elettrodi Spa | Anodo per sviluppo ossigeno |
| CN100432297C (zh) * | 2004-12-15 | 2008-11-12 | 中国科学院生态环境研究中心 | 去除水中硝酸盐的电极及制备方法 |
| ITMI20050373A1 (it) * | 2005-03-09 | 2006-09-10 | Nora Elettrodi S P A | Elettrodo cilindrico |
| TWI490371B (zh) * | 2009-07-28 | 2015-07-01 | Industrie De Nora Spa | 電解應用上的電極及其製法以及在電極表面上陽極釋氧之電解法和電冶法 |
| JP5582762B2 (ja) * | 2009-11-09 | 2014-09-03 | デノラ・テック・インコーポレーテッド | ハロゲン含有溶液の電気分解において用いるための電極 |
| EP2390385B1 (en) * | 2010-05-25 | 2015-05-06 | Permelec Electrode Ltd. | Anode for electrolysis and manufacturing method thereof |
| TWI433964B (zh) * | 2010-10-08 | 2014-04-11 | Water Star Inc | 複數層之混合金屬氧化物電極及其製法 |
| ITMI20102354A1 (it) * | 2010-12-22 | 2012-06-23 | Industrie De Nora Spa | Elettrodo per cella elettrolitica |
| ITMI20110089A1 (it) * | 2011-01-26 | 2012-07-27 | Industrie De Nora Spa | Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali |
| RU2456379C1 (ru) * | 2011-06-07 | 2012-07-20 | Александр Алексеевич Делекторский | Способ изготовления многофункционального коррозионно-стойкого электрода |
| ITMI20111132A1 (it) * | 2011-06-22 | 2012-12-23 | Industrie De Nora Spa | Anodo per evoluzione di ossigeno |
| ITMI20122035A1 (it) * | 2012-11-29 | 2014-05-30 | Industrie De Nora Spa | Elettrodo per evoluzione di ossigeno in processi elettrochimici industriali |
| CN103774177B (zh) * | 2014-01-26 | 2015-12-02 | 福州大学 | 一种嵌入钌锆锡氧化物的活性涂层及其制备方法 |
| CN103774175B (zh) * | 2014-01-26 | 2015-12-02 | 福州大学 | 一种嵌入钌锆锡钛氧化物的活性涂层及其制备方法 |
| CN104150567B (zh) * | 2014-06-04 | 2017-03-29 | 盐城工学院 | 一种电化学预处理吡虫啉农药废水的方法 |
| US12084782B2 (en) * | 2016-08-26 | 2024-09-10 | California Institute Of Technology | Electrolysis electrode and methods of manufacture and using same in water purification system |
| CN106367779A (zh) * | 2016-11-07 | 2017-02-01 | 南昌专腾科技有限公司 | 一种多孔钛基电极材料及其制备方法 |
| US11668017B2 (en) | 2018-07-30 | 2023-06-06 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
| KR102355824B1 (ko) * | 2018-12-27 | 2022-01-26 | 코웨이 주식회사 | 팔라듐, 이리듐 및 탄탈럼으로 구성된 전극용 촉매층 및 상기 전극용 촉매가 코팅된 살균수 생성 모듈 |
| CN113795612A (zh) * | 2019-04-26 | 2021-12-14 | 松下知识产权经营株式会社 | 电解用电极和制造电解用电极的方法 |
| CN114450252A (zh) | 2019-06-25 | 2022-05-06 | 加州理工学院 | 用于废水处理的反应性电化学膜 |
| KR102305334B1 (ko) * | 2019-10-04 | 2021-09-28 | 주식회사 웨스코일렉트로드 | 아연도금장치의 양극판 |
| EP4245890A4 (en) * | 2020-11-12 | 2024-10-09 | Lg Chem, Ltd. | ELECTRODE FOR ELECTROLYSIS |
| US12545605B2 (en) | 2020-12-14 | 2026-02-10 | California Institute Of Technology | “Super-bubble” electro-photo hybrid catalytic system for advanced treatment of organic wastewater |
| IT202100027536A1 (it) * | 2021-10-27 | 2023-04-27 | Industrie De Nora Spa | Elettrodo per evoluzione di ipoclorito |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1294373A (en) * | 1970-03-18 | 1972-10-25 | Ici Ltd | Electrodes for electrochemical processes |
| US4005003A (en) | 1975-04-15 | 1977-01-25 | Olin Corporation | Multi-component metal electrode |
| JP2713788B2 (ja) * | 1989-12-22 | 1998-02-16 | ティーディーケイ株式会社 | 酸素発生用電極及びその製造方法 |
| JP2885913B2 (ja) * | 1990-09-04 | 1999-04-26 | ペルメレック電極株式会社 | クロムめっき用陽極およびその製造方法 |
| FR2666573B1 (fr) | 1990-09-11 | 1993-07-02 | Eca | Devidoir immerge pour un cable sous-marin. |
| JP3212327B2 (ja) * | 1991-08-30 | 2001-09-25 | ペルメレック電極株式会社 | 電解用電極 |
| EP0546714B1 (en) * | 1991-12-13 | 1999-08-04 | Imperial Chemical Industries Plc | Cathode for use in electrolytic cell |
| RU2104959C1 (ru) * | 1994-09-26 | 1998-02-20 | Коноплева Галина Васильевна | Способ и установка для подготовки питьевой воды |
| IT1293319B1 (it) * | 1997-07-10 | 1999-02-16 | De Nora Spa | Metodo per l'applicazione di un rivestmento catalitico ad un substrato metallico |
| JP3553775B2 (ja) * | 1997-10-16 | 2004-08-11 | ペルメレック電極株式会社 | ガス拡散電極を使用する電解槽 |
| US6110590A (en) * | 1998-04-15 | 2000-08-29 | The University Of Akron | Synthetically spun silk nanofibers and a process for making the same |
| US6368489B1 (en) * | 1998-05-06 | 2002-04-09 | Eltech Systems Corporation | Copper electrowinning |
| KR100406981B1 (ko) * | 2000-12-22 | 2003-11-28 | 한국과학기술연구원 | 전하 유도 방사에 의한 고분자웹 제조 장치 및 그 방법 |
| US20030211135A1 (en) * | 2002-04-11 | 2003-11-13 | Greenhalgh Skott E. | Stent having electrospun covering and method |
-
2002
- 2002-05-24 IT IT2002MI001128A patent/ITMI20021128A1/it unknown
-
2003
- 2003-05-23 KR KR1020047019017A patent/KR101022978B1/ko not_active Expired - Lifetime
- 2003-05-23 CA CA2486073A patent/CA2486073C/en not_active Expired - Lifetime
- 2003-05-23 AT AT03732450T patent/ATE332988T1/de not_active IP Right Cessation
- 2003-05-23 PT PT03732450T patent/PT1507899E/pt unknown
- 2003-05-23 ES ES03732450T patent/ES2268374T3/es not_active Expired - Lifetime
- 2003-05-23 DE DE60306772T patent/DE60306772T2/de not_active Expired - Lifetime
- 2003-05-23 JP JP2004507572A patent/JP4398858B2/ja not_active Expired - Lifetime
- 2003-05-23 WO PCT/EP2003/005424 patent/WO2003100135A2/en not_active Ceased
- 2003-05-23 EP EP03732450A patent/EP1507899B1/en not_active Expired - Lifetime
- 2003-05-23 AU AU2003238386A patent/AU2003238386A1/en not_active Abandoned
- 2003-05-23 TW TW092113920A patent/TWI251036B/zh not_active IP Right Cessation
- 2003-05-23 RU RU2004137802/04A patent/RU2326991C2/ru active
- 2003-05-23 CN CNB038118971A patent/CN100480430C/zh not_active Expired - Lifetime
- 2003-05-23 US US10/514,186 patent/US7815781B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| ITMI20021128A0 (it) | 2002-05-24 |
| ES2268374T3 (es) | 2007-03-16 |
| WO2003100135A2 (en) | 2003-12-04 |
| ATE332988T1 (de) | 2006-08-15 |
| DE60306772D1 (de) | 2006-08-24 |
| AU2003238386A1 (en) | 2003-12-12 |
| KR101022978B1 (ko) | 2011-03-18 |
| JP4398858B2 (ja) | 2010-01-13 |
| CN1656254A (zh) | 2005-08-17 |
| PT1507899E (pt) | 2006-12-29 |
| ITMI20021128A1 (it) | 2003-11-24 |
| JP2005530921A (ja) | 2005-10-13 |
| RU2004137802A (ru) | 2005-06-27 |
| WO2003100135A3 (en) | 2004-09-02 |
| AU2003238386A8 (en) | 2003-12-12 |
| KR20050004867A (ko) | 2005-01-12 |
| EP1507899A2 (en) | 2005-02-23 |
| CN100480430C (zh) | 2009-04-22 |
| CA2486073A1 (en) | 2003-12-04 |
| RU2326991C2 (ru) | 2008-06-20 |
| EP1507899B1 (en) | 2006-07-12 |
| TWI251036B (en) | 2006-03-11 |
| US20050211553A1 (en) | 2005-09-29 |
| TW200307061A (en) | 2003-12-01 |
| US7815781B2 (en) | 2010-10-19 |
| DE60306772T2 (de) | 2007-07-12 |
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