CA1222075A - X-ray examination apparatus having a double focusing crystal - Google Patents
X-ray examination apparatus having a double focusing crystalInfo
- Publication number
- CA1222075A CA1222075A CA000446511A CA446511A CA1222075A CA 1222075 A CA1222075 A CA 1222075A CA 000446511 A CA000446511 A CA 000446511A CA 446511 A CA446511 A CA 446511A CA 1222075 A CA1222075 A CA 1222075A
- Authority
- CA
- Canada
- Prior art keywords
- crystal
- double focusing
- jig
- ray
- curvature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 114
- 238000002441 X-ray diffraction Methods 0.000 claims abstract description 12
- 239000003292 glue Substances 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- 239000010703 silicon Substances 0.000 claims abstract description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 3
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 3
- 230000005855 radiation Effects 0.000 claims description 24
- 238000004458 analytical method Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000005476 soldering Methods 0.000 abstract description 4
- 238000000034 method Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 101150072084 BCAM gene Proteins 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010023204 Joint dislocation Diseases 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229940000425 combination drug Drugs 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8300421 | 1983-02-04 | ||
| NL8300421A NL8300421A (nl) | 1983-02-04 | 1983-02-04 | Roentgen onderzoek apparaat met dubbel focusserend kristal. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1222075A true CA1222075A (en) | 1987-05-19 |
Family
ID=19841350
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000446511A Expired CA1222075A (en) | 1983-02-04 | 1984-02-01 | X-ray examination apparatus having a double focusing crystal |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0115892B1 (enExample) |
| JP (1) | JPS59153152A (enExample) |
| CA (1) | CA1222075A (enExample) |
| DE (1) | DE3465519D1 (enExample) |
| NL (1) | NL8300421A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8501181A (nl) * | 1985-04-24 | 1986-11-17 | Philips Nv | Kristal voor een roentgenanalyse apparaat. |
| JPS62141730U (enExample) * | 1986-02-28 | 1987-09-07 | ||
| WO1996034274A2 (en) * | 1995-04-26 | 1996-10-31 | Philips Electronics N.V. | Method of manufacturing an x-ray optical element for an x-ray analysis apparatus |
| FR2841371B1 (fr) * | 2002-06-19 | 2004-10-22 | Xenocs | Ensemble optique et procede associe |
| EP1732087A3 (fr) | 2002-06-19 | 2007-03-28 | Xenocs | Ensemble optique et dispositif associé |
| CN107024493A (zh) * | 2017-03-20 | 2017-08-08 | 中国工程物理研究院电子工程研究所 | 一种碳化硅单晶晶片基平面弯曲的测试方法 |
| CN114649106B (zh) * | 2022-03-17 | 2024-08-27 | 重庆大学 | 一种球面高能透射晶体成像器及制造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6410514A (enExample) * | 1964-09-10 | 1966-03-11 | ||
| JPS454549Y1 (enExample) * | 1968-10-11 | 1970-03-02 | ||
| JPS5023994A (enExample) * | 1973-07-02 | 1975-03-14 | ||
| US3927319A (en) * | 1974-06-28 | 1975-12-16 | Univ Southern California | Crystal for X-ray crystal spectrometer |
| US4078175A (en) * | 1976-09-20 | 1978-03-07 | Nasa | Apparatus for use in examining the lattice of a semiconductor wafer by X-ray diffraction |
| DD149420A1 (de) * | 1980-03-03 | 1981-07-08 | Reinhard Arnhold | Roentgendiffraktometer |
-
1983
- 1983-02-04 NL NL8300421A patent/NL8300421A/nl not_active Application Discontinuation
-
1984
- 1984-02-01 EP EP19840200132 patent/EP0115892B1/en not_active Expired
- 1984-02-01 CA CA000446511A patent/CA1222075A/en not_active Expired
- 1984-02-01 DE DE8484200132T patent/DE3465519D1/de not_active Expired
- 1984-02-03 JP JP59017218A patent/JPS59153152A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| EP0115892A1 (en) | 1984-08-15 |
| JPS59153152A (ja) | 1984-09-01 |
| JPH0557536B2 (enExample) | 1993-08-24 |
| NL8300421A (nl) | 1984-09-03 |
| EP0115892B1 (en) | 1987-08-19 |
| DE3465519D1 (en) | 1987-09-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7076024B2 (en) | X-ray apparatus with dual monochromators | |
| US4599741A (en) | System for local X-ray excitation by monochromatic X-rays | |
| US5406609A (en) | X-ray analysis apparatus | |
| US5414747A (en) | Method and apparatus for in-process analysis of polycrystalline films and coatings by x-ray diffraction | |
| US5509043A (en) | Asymmetrical 4-crystal monochromator | |
| US5132997A (en) | X-ray spectroscopic analyzing apparatus | |
| EP0117293A2 (en) | Stress measurement by X-ray diffractometry | |
| US4649557A (en) | X-ray analysis apparatus including a monochromator crystal having crystal lattice surfaces | |
| EP0110469B1 (en) | X-ray analysis apparatus comprising a four-crystal monochromator | |
| JPH11502025A (ja) | 同時ｘ線回折及びｘ線蛍光測定のための装置 | |
| CA1222075A (en) | X-ray examination apparatus having a double focusing crystal | |
| JP2001021507A (ja) | Ｘａｆｓ測定装置 | |
| JPH1114561A (ja) | Ｘ線測定装置およびその方法 | |
| JP4160124B2 (ja) | 部分的に変化し、部分的に一定の曲率半径を有するアナライザ結晶を有するｘ線スペクトロメータ | |
| US6516047B2 (en) | X-ray diffraction apparatus and method | |
| JP2940757B2 (ja) | Ｘ線回折分析装置 | |
| JP2000155102A (ja) | Ｘ線測定装置およびその方法 | |
| JP2912127B2 (ja) | 蛍光ｘ線分析方法 | |
| JP2952284B2 (ja) | Ｘ線光学系の評価方法 | |
| JPH04164239A (ja) | 粉末ｘ線回折計 | |
| JP2003014894A (ja) | Ｘ線分光方法及びｘ線分光装置 | |
| CN120559000A (zh) | 一种x射线聚焦探测系统及其衍射晶体的制作方法 | |
| JPH09113468A (ja) | 正極点図測定方法 | |
| Winegar | Measurement of crystallographic texture at chalk river nuclear laboratories | |
| Xiong et al. | The determination of complete pole figures using the reflection method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |