DE3465519D1 - X-ray examination apparatus having a double focusing crystal - Google Patents

X-ray examination apparatus having a double focusing crystal

Info

Publication number
DE3465519D1
DE3465519D1 DE8484200132T DE3465519T DE3465519D1 DE 3465519 D1 DE3465519 D1 DE 3465519D1 DE 8484200132 T DE8484200132 T DE 8484200132T DE 3465519 T DE3465519 T DE 3465519T DE 3465519 D1 DE3465519 D1 DE 3465519D1
Authority
DE
Germany
Prior art keywords
examination apparatus
ray examination
double focusing
focusing crystal
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484200132T
Other languages
German (de)
English (en)
Inventor
Geert Brouwer
Albert Huizing
Antonius Adrianus Ondersteijn
Josef Franz Karol Thijssen
Mathias Petrus Antoniu Viegers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3465519D1 publication Critical patent/DE3465519D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE8484200132T 1983-02-04 1984-02-01 X-ray examination apparatus having a double focusing crystal Expired DE3465519D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8300421A NL8300421A (nl) 1983-02-04 1983-02-04 Roentgen onderzoek apparaat met dubbel focusserend kristal.

Publications (1)

Publication Number Publication Date
DE3465519D1 true DE3465519D1 (en) 1987-09-24

Family

ID=19841350

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484200132T Expired DE3465519D1 (en) 1983-02-04 1984-02-01 X-ray examination apparatus having a double focusing crystal

Country Status (5)

Country Link
EP (1) EP0115892B1 (enExample)
JP (1) JPS59153152A (enExample)
CA (1) CA1222075A (enExample)
DE (1) DE3465519D1 (enExample)
NL (1) NL8300421A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8501181A (nl) * 1985-04-24 1986-11-17 Philips Nv Kristal voor een roentgenanalyse apparaat.
JPS62141730U (enExample) * 1986-02-28 1987-09-07
WO1996034274A2 (en) * 1995-04-26 1996-10-31 Philips Electronics N.V. Method of manufacturing an x-ray optical element for an x-ray analysis apparatus
US7430277B2 (en) 2002-06-19 2008-09-30 Xeoncs Optical device for X-ray applications
FR2841371B1 (fr) * 2002-06-19 2004-10-22 Xenocs Ensemble optique et procede associe
CN107024493A (zh) * 2017-03-20 2017-08-08 中国工程物理研究院电子工程研究所 一种碳化硅单晶晶片基平面弯曲的测试方法
CN114649106B (zh) * 2022-03-17 2024-08-27 重庆大学 一种球面高能透射晶体成像器及制造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6410514A (enExample) * 1964-09-10 1966-03-11
JPS454549Y1 (enExample) * 1968-10-11 1970-03-02
JPS5023994A (enExample) * 1973-07-02 1975-03-14
US3927319A (en) * 1974-06-28 1975-12-16 Univ Southern California Crystal for X-ray crystal spectrometer
US4078175A (en) * 1976-09-20 1978-03-07 Nasa Apparatus for use in examining the lattice of a semiconductor wafer by X-ray diffraction
DD149420A1 (de) * 1980-03-03 1981-07-08 Reinhard Arnhold Roentgendiffraktometer

Also Published As

Publication number Publication date
EP0115892B1 (en) 1987-08-19
JPH0557536B2 (enExample) 1993-08-24
EP0115892A1 (en) 1984-08-15
NL8300421A (nl) 1984-09-03
CA1222075A (en) 1987-05-19
JPS59153152A (ja) 1984-09-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee