NL8300421A - Roentgen onderzoek apparaat met dubbel focusserend kristal. - Google Patents
Roentgen onderzoek apparaat met dubbel focusserend kristal. Download PDFInfo
- Publication number
- NL8300421A NL8300421A NL8300421A NL8300421A NL8300421A NL 8300421 A NL8300421 A NL 8300421A NL 8300421 A NL8300421 A NL 8300421A NL 8300421 A NL8300421 A NL 8300421A NL 8300421 A NL8300421 A NL 8300421A
- Authority
- NL
- Netherlands
- Prior art keywords
- crystal
- focusing
- double
- mold
- ray
- Prior art date
Links
- 239000013078 crystal Substances 0.000 title claims description 113
- 238000002441 X-ray diffraction Methods 0.000 claims description 11
- 238000004458 analytical method Methods 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 238000003780 insertion Methods 0.000 claims description 3
- 230000037431 insertion Effects 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- 239000003292 glue Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 description 16
- 238000005259 measurement Methods 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 238000009662 stress testing Methods 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910017488 Cu K Inorganic materials 0.000 description 1
- 229910017541 Cu-K Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8300421A NL8300421A (nl) | 1983-02-04 | 1983-02-04 | Roentgen onderzoek apparaat met dubbel focusserend kristal. |
| DE8484200132T DE3465519D1 (en) | 1983-02-04 | 1984-02-01 | X-ray examination apparatus having a double focusing crystal |
| EP19840200132 EP0115892B1 (en) | 1983-02-04 | 1984-02-01 | X-ray examination apparatus having a double focusing crystal |
| CA000446511A CA1222075A (en) | 1983-02-04 | 1984-02-01 | X-ray examination apparatus having a double focusing crystal |
| JP59017218A JPS59153152A (ja) | 1983-02-04 | 1984-02-03 | 二重収束ｘ線分光結晶及び該結晶を具えるｘ線検査装置 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8300421A NL8300421A (nl) | 1983-02-04 | 1983-02-04 | Roentgen onderzoek apparaat met dubbel focusserend kristal. |
| NL8300421 | 1983-02-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8300421A true NL8300421A (nl) | 1984-09-03 |
Family
ID=19841350
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8300421A NL8300421A (nl) | 1983-02-04 | 1983-02-04 | Roentgen onderzoek apparaat met dubbel focusserend kristal. |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0115892B1 (enExample) |
| JP (1) | JPS59153152A (enExample) |
| CA (1) | CA1222075A (enExample) |
| DE (1) | DE3465519D1 (enExample) |
| NL (1) | NL8300421A (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8501181A (nl) * | 1985-04-24 | 1986-11-17 | Philips Nv | Kristal voor een roentgenanalyse apparaat. |
| JPS62141730U (enExample) * | 1986-02-28 | 1987-09-07 | ||
| WO1996034274A2 (en) * | 1995-04-26 | 1996-10-31 | Philips Electronics N.V. | Method of manufacturing an x-ray optical element for an x-ray analysis apparatus |
| US7430277B2 (en) | 2002-06-19 | 2008-09-30 | Xeoncs | Optical device for X-ray applications |
| FR2841371B1 (fr) * | 2002-06-19 | 2004-10-22 | Xenocs | Ensemble optique et procede associe |
| CN107024493A (zh) * | 2017-03-20 | 2017-08-08 | 中国工程物理研究院电子工程研究所 | 一种碳化硅单晶晶片基平面弯曲的测试方法 |
| CN114649106B (zh) * | 2022-03-17 | 2024-08-27 | 重庆大学 | 一种球面高能透射晶体成像器及制造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6410514A (enExample) * | 1964-09-10 | 1966-03-11 | ||
| JPS454549Y1 (enExample) * | 1968-10-11 | 1970-03-02 | ||
| JPS5023994A (enExample) * | 1973-07-02 | 1975-03-14 | ||
| US3927319A (en) * | 1974-06-28 | 1975-12-16 | Univ Southern California | Crystal for X-ray crystal spectrometer |
| US4078175A (en) * | 1976-09-20 | 1978-03-07 | Nasa | Apparatus for use in examining the lattice of a semiconductor wafer by X-ray diffraction |
| DD149420A1 (de) * | 1980-03-03 | 1981-07-08 | Reinhard Arnhold | Roentgendiffraktometer |
-
1983
- 1983-02-04 NL NL8300421A patent/NL8300421A/nl not_active Application Discontinuation
-
1984
- 1984-02-01 EP EP19840200132 patent/EP0115892B1/en not_active Expired
- 1984-02-01 DE DE8484200132T patent/DE3465519D1/de not_active Expired
- 1984-02-01 CA CA000446511A patent/CA1222075A/en not_active Expired
- 1984-02-03 JP JP59017218A patent/JPS59153152A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| EP0115892B1 (en) | 1987-08-19 |
| JPH0557536B2 (enExample) | 1993-08-24 |
| EP0115892A1 (en) | 1984-08-15 |
| CA1222075A (en) | 1987-05-19 |
| JPS59153152A (ja) | 1984-09-01 |
| DE3465519D1 (en) | 1987-09-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1B | A search report has been drawn up | ||
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |