BRPI0916470A2 - composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores - Google Patents

composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores

Info

Publication number
BRPI0916470A2
BRPI0916470A2 BRPI0916470A BRPI0916470A BRPI0916470A2 BR PI0916470 A2 BRPI0916470 A2 BR PI0916470A2 BR PI0916470 A BRPI0916470 A BR PI0916470A BR PI0916470 A BRPI0916470 A BR PI0916470A BR PI0916470 A2 BRPI0916470 A2 BR PI0916470A2
Authority
BR
Brazil
Prior art keywords
remover
precursors
photoresist
cleaner
hardening
Prior art date
Application number
BRPI0916470A
Other languages
English (en)
Inventor
Richard P Beatty
Original Assignee
INVISTA Technologies S à r l
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INVISTA Technologies S à r l filed Critical INVISTA Technologies S à r l
Publication of BRPI0916470A2 publication Critical patent/BRPI0916470A2/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K8/00Compositions for drilling of boreholes or wells; Compositions for treating boreholes or wells, e.g. for completion or for remedial operations
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D9/00Chemical paint or ink removers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K17/00Soil-conditioning materials or soil-stabilising materials
    • C09K17/14Soil-conditioning materials or soil-stabilising materials containing organic compounds only
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K8/00Compositions for drilling of boreholes or wells; Compositions for treating boreholes or wells, e.g. for completion or for remedial operations
    • C09K8/02Well-drilling compositions
    • C09K8/03Specific additives for general use in well-drilling compositions
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/20Organic compounds containing oxygen
    • C11D3/2003Alcohols; Phenols
    • C11D3/2041Dihydric alcohols
    • C11D3/2051Dihydric alcohols cyclic; polycyclic
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/261Alcohols; Phenols
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/266Esters or carbonates
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
BRPI0916470A 2008-12-18 2009-12-11 composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores BRPI0916470A2 (pt)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US13869708P 2008-12-18 2008-12-18
US14843309P 2009-01-30 2009-01-30
US18313109P 2009-06-02 2009-06-02
PCT/US2009/067634 WO2010071759A1 (en) 2008-12-18 2009-12-11 Cyclohexane oxidation process byproduct derivatives and methods for using the same

Publications (1)

Publication Number Publication Date
BRPI0916470A2 true BRPI0916470A2 (pt) 2016-02-16

Family

ID=42269117

Family Applications (2)

Application Number Title Priority Date Filing Date
BRPI0916168A BRPI0916168A2 (pt) 2008-12-18 2009-12-11 "composição, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável, poliéster e solvente"
BRPI0916470A BRPI0916470A2 (pt) 2008-12-18 2009-12-11 composição, solvente, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente adequado para uso na fabricação de produtos eletrônicos, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável e poliéster preparado a partir de precursores

Family Applications Before (1)

Application Number Title Priority Date Filing Date
BRPI0916168A BRPI0916168A2 (pt) 2008-12-18 2009-12-11 "composição, agente de cura, lama de perfuração, removedor de tinta, extrator fotorresistente, removedor de grafite, limpador, método para dissolver uma resina, método para endurecer um substrato friável, poliéster e solvente"

Country Status (7)

Country Link
US (2) US8541057B2 (pt)
EP (2) EP2376421A4 (pt)
JP (2) JP5651126B2 (pt)
KR (2) KR20110100222A (pt)
CN (2) CN102256927A (pt)
BR (2) BRPI0916168A2 (pt)
WO (2) WO2010071761A1 (pt)

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EP2931907A2 (en) 2012-12-14 2015-10-21 Invista Technologies S.A R.L. METHODS OF PRODUCING 7-CARBON CHEMICALS VIA CoA-DEPENDENT CARBON CHAIN ELONGATION ASSOCIATED WITH CARBON STORAGE
CN105026569A (zh) 2012-12-31 2015-11-04 英威达技术有限责任公司 通过丙酮酸和琥珀酸半醛羟醛缩合生产7-碳化学物的方法
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CN105008543A (zh) 2012-12-31 2015-10-28 英威达技术有限责任公司 通过芳香族化合物生产7-碳化学物的方法
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US9920339B2 (en) 2014-06-16 2018-03-20 Invista North America S.A.R.L. Methods, reagents and cells for biosynthesizing compounds
US9957535B2 (en) 2014-06-16 2018-05-01 Invista North America S.A.R.L. Methods, reagents and cells for biosynthesizing compounds
EP3155105A1 (en) 2014-06-16 2017-04-19 Invista Technologies S.A R.L. Methods, reagents and cells for biosynthesizing compounds
BR112016029399A2 (pt) 2014-06-16 2017-10-17 Invista Tech Sarl métodos, reagentes e células para biossintetizar composto
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Also Published As

Publication number Publication date
JP2012512875A (ja) 2012-06-07
EP2376421A1 (en) 2011-10-19
JP2012512876A (ja) 2012-06-07
EP2376422A4 (en) 2012-12-12
US20120101009A1 (en) 2012-04-26
WO2010071759A1 (en) 2010-06-24
KR20110100222A (ko) 2011-09-09
CN102256928A (zh) 2011-11-23
BRPI0916168A2 (pt) 2015-11-03
EP2376422A1 (en) 2011-10-19
EP2376421A4 (en) 2012-12-12
US20120064252A1 (en) 2012-03-15
WO2010071761A1 (en) 2010-06-24
JP5651126B2 (ja) 2015-01-07
KR20110100224A (ko) 2011-09-09
CN102256927A (zh) 2011-11-23
US8541057B2 (en) 2013-09-24

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B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]