BRPI0811241A2 - Instalação de tratamento a vácuo e método de tratamento a vácuo - Google Patents
Instalação de tratamento a vácuo e método de tratamento a vácuoInfo
- Publication number
- BRPI0811241A2 BRPI0811241A2 BRPI0811241-0A2A BRPI0811241A BRPI0811241A2 BR PI0811241 A2 BRPI0811241 A2 BR PI0811241A2 BR PI0811241 A BRPI0811241 A BR PI0811241A BR PI0811241 A2 BRPI0811241 A2 BR PI0811241A2
- Authority
- BR
- Brazil
- Prior art keywords
- vacuum treatment
- installation
- treatment method
- treatment installation
- vacuum
- Prior art date
Links
- 238000009489 vacuum treatment Methods 0.000 title 2
- 238000009434 installation Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/3255—Material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32055—Arc discharge
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH00843/07 | 2007-05-25 | ||
CH8432007 | 2007-05-25 | ||
PCT/EP2008/054851 WO2008145459A1 (de) | 2007-05-25 | 2008-04-22 | Vakuumbehandlungsanlage und vakuumbehandlungsverfahren |
Publications (2)
Publication Number | Publication Date |
---|---|
BRPI0811241A2 true BRPI0811241A2 (pt) | 2014-11-04 |
BRPI0811241B1 BRPI0811241B1 (pt) | 2019-06-25 |
Family
ID=38222614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0811241-0A BRPI0811241B1 (pt) | 2007-05-25 | 2008-04-22 | Instalação e método de tratamento a vácuo |
Country Status (10)
Country | Link |
---|---|
US (1) | US8496793B2 (pt) |
EP (1) | EP2148939B1 (pt) |
JP (1) | JP5618824B2 (pt) |
KR (1) | KR101499272B1 (pt) |
CN (1) | CN101743338B (pt) |
BR (1) | BRPI0811241B1 (pt) |
CA (1) | CA2686445C (pt) |
MX (1) | MX2009012750A (pt) |
RU (1) | RU2472869C2 (pt) |
WO (1) | WO2008145459A1 (pt) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114875376A (zh) * | 2022-04-16 | 2022-08-09 | 黄石全洋光电科技有限公司 | 一种连续性真空镀膜生产线及镀膜工艺 |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI399451B (zh) * | 2008-09-05 | 2013-06-21 | Yu Hsueh Lin | 傳動機構之表面鍍膜方法 |
DE102009000821B4 (de) * | 2009-02-12 | 2013-05-02 | Surcoatec Ag | Verfahren zum Aufbringen einer Beschichtung auf Werkstücke und/oder Werkstoffe aufweisend mindestens ein leicht oxidierbares Nichteisenmetall sowie Werkstück und/oder Werkstoff hergestellt nach dem Verfahren |
DE102009003232A1 (de) * | 2009-05-19 | 2010-12-02 | Federal-Mogul Burscheid Gmbh | Gleitelement eines Verbrennungsmotors, insbesondere Kolbenring |
JP6040028B2 (ja) | 2009-08-07 | 2016-12-07 | エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト,トリュープバッハ | 耐食性と組合わされたトライボロジー、新種のpvdおよびpacvdコーティング |
ES2749354T3 (es) * | 2009-09-25 | 2020-03-19 | Oerlikon Surface Solutions Ag Pfaeffikon | Procedimiento para la preparación de capas de óxido de zirconio cúbicas |
CN102102181B (zh) * | 2009-12-22 | 2013-10-09 | 鸿富锦精密工业(深圳)有限公司 | 镀膜装置 |
CN102244971A (zh) * | 2010-05-13 | 2011-11-16 | 贵州翔明科技有限责任公司 | 一种大气压直流弧放电等离子体发生装置及阴极制作方法 |
NL2005847C2 (nl) * | 2010-12-09 | 2012-06-12 | Ten Cate Nederland B V | Kunstgrasveld. |
DE102011003254A1 (de) * | 2011-01-27 | 2012-08-02 | Federal-Mogul Burscheid Gmbh | Gleitelement, insbesondere Kolbenring, mit einer Beschichtung sowie Verfahren zur Herstellung eines Gleitelements |
DE102011016681A1 (de) * | 2011-04-11 | 2012-10-11 | Oerlikon Trading Ag, Trübbach | Kohlenstofffunkenverdampfung |
SG194537A1 (en) * | 2011-04-20 | 2013-12-30 | Oerlikon Trading Ag | High power impulse magnetron sputtering method providing enhanced ionization of the sputtered particles and apparatus for its implementation |
JP2013028851A (ja) * | 2011-07-29 | 2013-02-07 | Kobe Steel Ltd | プラズマcvd装置 |
DE102011083714A1 (de) * | 2011-09-29 | 2013-04-04 | Federal-Mogul Burscheid Gmbh | Gleitelement mit DLC-Beschichtung |
DE102011116576A1 (de) * | 2011-10-21 | 2013-04-25 | Oerlikon Trading Ag, Trübbach | Bohrer mit Beschichtung |
EP2587518B1 (en) * | 2011-10-31 | 2018-12-19 | IHI Hauzer Techno Coating B.V. | Apparatus and Method for depositing Hydrogen-free ta C Layers on Workpieces and Workpiece |
US9793098B2 (en) | 2012-09-14 | 2017-10-17 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
US9412569B2 (en) | 2012-09-14 | 2016-08-09 | Vapor Technologies, Inc. | Remote arc discharge plasma assisted processes |
US10056237B2 (en) | 2012-09-14 | 2018-08-21 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
JP6063816B2 (ja) * | 2013-05-27 | 2017-01-18 | 株式会社デンソー | 表面処理装置及び表面処理方法 |
RU2567770C2 (ru) * | 2013-08-06 | 2015-11-10 | Федеральное государственное бюджетное учреждение науки Институт физического материаловедения Сибирского отделения Российской академии наук | Способ получения покрытий алмазоподобного углерода и устройство для его осуществления |
CA2867451C (en) * | 2013-10-28 | 2021-06-29 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
JP2017504955A (ja) | 2013-11-06 | 2017-02-09 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | Dcバイアス変調による、粒子発生抑制装置 |
JP6533374B2 (ja) | 2013-11-06 | 2019-06-19 | Dowaサーモテック株式会社 | Dlc皮膜の成膜方法 |
TWM475016U (zh) * | 2013-11-13 | 2014-03-21 | Mingdao University | 複合式沉積系統 |
WO2015117991A1 (de) * | 2014-02-06 | 2015-08-13 | Kgt Graphit Technologie Gmbh | Schutzschicht für pecvd-boote aus graphit |
JP2016021344A (ja) * | 2014-07-15 | 2016-02-04 | 中外炉工業株式会社 | プラズマ処理装置、及びそのプラズマ処理装置を用いたプラズマ処理方法 |
JP6650442B2 (ja) * | 2014-09-18 | 2020-02-19 | ティッセンクルップ スチール ヨーロッパ アーゲーThyssenkrupp Steel Europe Ag | 構成部品、バンド状の材料又はツールの表面にコーティングを形成する装置 |
JP6396749B2 (ja) * | 2014-10-03 | 2018-09-26 | 神港精機株式会社 | 硬質被膜およびその形成方法ならびに形成装置 |
JP6757793B2 (ja) * | 2015-10-16 | 2020-09-23 | エリコン サーフェス ソリューションズ アーゲー、 プフェフィコン | Hf−b−cの三元相を含んでなる新規コーティング材料 |
US20180334739A1 (en) * | 2015-11-10 | 2018-11-22 | Sandvik Intellectual Property Ab | Method for pre-treating a surface for coating |
CN107022741A (zh) * | 2016-02-01 | 2017-08-08 | 沈阳科友真空技术有限公司 | 一种pems等离子体增强磁控溅射镀膜设备 |
MY189225A (en) * | 2016-04-22 | 2022-01-31 | Oerlikon Surface Solutions Ag Pfaffikon | Ticn having reduced growth defects by means of hipims |
KR101888557B1 (ko) * | 2016-11-16 | 2018-08-14 | 한국생산기술연구원 | ta-C 복합 코팅층, ta-C 복합 코팅층 제조 장치 및 이를 이용한 제조방법 |
CN106856165B (zh) * | 2016-12-29 | 2019-12-13 | 浙江合特光电有限公司 | 一种硅锗低温外延方法 |
CN107130213B (zh) * | 2017-05-03 | 2019-04-09 | 成都真锐科技涂层技术有限公司 | 多元合金复合薄膜制备设备和制备方法 |
DE102017213404A1 (de) * | 2017-08-02 | 2019-02-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Anordnung zur Beschichtung von Substratoberflächen mittels elektrischer Lichtbogenentladung |
RU2671522C1 (ru) * | 2017-08-14 | 2018-11-01 | Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" | Способ плазменного упрочнения внутренней цилиндрической поверхности |
CN108559956B (zh) * | 2018-04-11 | 2024-02-09 | 深圳市正和忠信股份有限公司 | 一种强辉光放电沉积类金刚石碳膜设备及加工方法 |
CN108588659A (zh) * | 2018-05-04 | 2018-09-28 | 京磁材料科技股份有限公司 | 高效低耗的镀膜设备 |
CN108682637B (zh) * | 2018-05-21 | 2020-10-13 | 深圳市希迈科科技有限公司 | 一种半导体芯片等离子刻蚀机 |
CN108774728B (zh) * | 2018-08-06 | 2023-04-11 | 法德(浙江)机械科技有限公司 | 一种离子源多弧柱弧复合pvd镀膜系统及镀膜方法 |
JP7159694B2 (ja) * | 2018-08-28 | 2022-10-25 | 日本電産株式会社 | プラズマ処理装置 |
DE102019110642A1 (de) | 2019-04-25 | 2020-10-29 | Vtd Vakuumtechnik Dresden Gmbh | Anode für PVD-Prozesse |
CN110205589B (zh) * | 2019-07-12 | 2023-12-08 | 江苏徐工工程机械研究院有限公司 | 一种脉冲碳离子激发源装置 |
RU195652U1 (ru) * | 2019-08-05 | 2020-02-03 | Ооо «Инноватехпром» | Устройство для распыления металла в вакууме |
CN112323034B (zh) * | 2019-08-05 | 2023-10-17 | 武汉光谷创元电子有限公司 | 真空处理装置 |
CN111074222B (zh) * | 2019-12-12 | 2022-11-18 | 广东汇成真空科技股份有限公司 | 一种应用于pvd镀膜的弧光电子源增强辉光放电加热工艺 |
CN111394689A (zh) * | 2020-04-15 | 2020-07-10 | 辽宁北宇真空科技有限公司 | 一种镀膜基片的等离子清洗装置及其使用方法 |
US11821075B2 (en) * | 2020-06-15 | 2023-11-21 | Vapor Technologies, Inc. | Anti-microbial coating physical vapor deposition such as cathodic arc evaporation |
CN111748789B (zh) * | 2020-07-10 | 2022-06-24 | 哈尔滨工业大学 | 一种石墨阴极弧增强辉光放电沉积纯dlc的装置及其方法 |
CN112030127B (zh) * | 2020-07-28 | 2022-08-16 | 温州职业技术学院 | 一种采用增强辉光放电复合调制强流脉冲电弧制备的ta-C涂层及制备方法 |
CN112063975B (zh) * | 2020-07-28 | 2022-08-12 | 温州职业技术学院 | 一种通过调制强流脉冲电弧制备ta-C涂层的方法 |
CN111893455B (zh) * | 2020-09-08 | 2023-10-03 | 河北美普兰地环保科技有限公司 | 金属基材碳纳米膜材料制造设备及其制备方法 |
RU2754338C1 (ru) * | 2020-12-29 | 2021-09-01 | федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технический университет имени Н.Э. Баумана (национальный исследовательский университет)" (МГТУ им. Н.Э. Баумана) | Способ модификации поверхностей пластин паяного пластинчатого теплообменника |
CN113564540B (zh) * | 2021-07-30 | 2023-10-03 | 江苏徐工工程机械研究院有限公司 | 电弧离子镀膜装置及镀膜方法 |
CN114411099B (zh) * | 2021-12-30 | 2023-12-08 | 广东鼎泰高科技术股份有限公司 | 一种真空镀膜系统及镀膜方法 |
CN115198240B (zh) * | 2022-06-07 | 2024-02-20 | 深圳元点真空装备有限公司 | 一种大尺寸真空镀膜设备及其使用方法 |
CN115637418A (zh) * | 2022-10-12 | 2023-01-24 | 中微半导体设备(上海)股份有限公司 | 形成涂层的方法、涂覆装置、零部件及等离子体反应装置 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB896122A (en) * | 1959-09-08 | 1962-05-09 | Gen Electric Co Ltd | Improvements in or relating to the coating of surfaces with thin films of aluminium oxide |
CH631743A5 (de) * | 1977-06-01 | 1982-08-31 | Balzers Hochvakuum | Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage. |
SU695074A1 (ru) * | 1978-05-11 | 1981-12-07 | Предприятие П/Я А-3959 | Способ изготовлени неплав щегос электрода |
US4673477A (en) * | 1984-03-02 | 1987-06-16 | Regents Of The University Of Minnesota | Controlled vacuum arc material deposition, method and apparatus |
CH664768A5 (de) * | 1985-06-20 | 1988-03-31 | Balzers Hochvakuum | Verfahren zur beschichtung von substraten in einer vakuumkammer. |
US4620913A (en) * | 1985-11-15 | 1986-11-04 | Multi-Arc Vacuum Systems, Inc. | Electric arc vapor deposition method and apparatus |
DE3941202A1 (de) * | 1989-12-14 | 1990-06-07 | Krupp Gmbh | Verfahren zur erzeugung von schichten aus harten kohlenstoffmodifikationen und vorrichtung zur durchfuehrung des verfahrens |
DE4440521C1 (de) * | 1994-11-12 | 1995-11-02 | Rowo Coating Ges Fuer Beschich | Vorrichtung zum Beschichten von Substraten mit einem Materialdampf im Unterdruck oder Vakuum |
DE19626094C2 (de) * | 1996-05-02 | 2000-10-19 | Siemens Ag | Anodenkörper für eine Röntgenröhre |
DE19826259A1 (de) * | 1997-06-16 | 1998-12-17 | Bosch Gmbh Robert | Verfahren und Einrichtung zum Vakuumbeschichten eines Substrates |
DE19841012C1 (de) * | 1998-09-08 | 2000-01-13 | Fraunhofer Ges Forschung | Einrichtung zum plasmaaktivierten Bedampfen im Vakuum |
DE10018143C5 (de) * | 2000-04-12 | 2012-09-06 | Oerlikon Trading Ag, Trübbach | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
US6391164B1 (en) * | 2000-06-23 | 2002-05-21 | Isak I. Beilis | Deposition of coatings and thin films using a vacuum arc with a non-consumable hot anode |
US20030234176A1 (en) * | 2000-07-17 | 2003-12-25 | Jawad Haidar | Production of carbon and carbon-based materials |
RU2219033C1 (ru) * | 2002-11-04 | 2003-12-20 | Федеральное Государственное Унитарное Предприятие "Центральный Научно-Исследовательский Институт Конструкционных Материалов "Прометей" | Экономнолегированный электрод для износостойкой наплавки |
US9997338B2 (en) * | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
-
2008
- 2008-04-22 KR KR1020097026978A patent/KR101499272B1/ko active IP Right Grant
- 2008-04-22 CN CN2008800174824A patent/CN101743338B/zh active Active
- 2008-04-22 MX MX2009012750A patent/MX2009012750A/es active IP Right Grant
- 2008-04-22 RU RU2009148283/02A patent/RU2472869C2/ru active
- 2008-04-22 WO PCT/EP2008/054851 patent/WO2008145459A1/de active Application Filing
- 2008-04-22 BR BRPI0811241-0A patent/BRPI0811241B1/pt not_active IP Right Cessation
- 2008-04-22 EP EP08736455.0A patent/EP2148939B1/de active Active
- 2008-04-22 JP JP2010508766A patent/JP5618824B2/ja active Active
- 2008-04-22 CA CA2686445A patent/CA2686445C/en active Active
- 2008-04-28 US US12/110,463 patent/US8496793B2/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114875376A (zh) * | 2022-04-16 | 2022-08-09 | 黄石全洋光电科技有限公司 | 一种连续性真空镀膜生产线及镀膜工艺 |
Also Published As
Publication number | Publication date |
---|---|
RU2472869C2 (ru) | 2013-01-20 |
WO2008145459A1 (de) | 2008-12-04 |
KR20100018585A (ko) | 2010-02-17 |
JP2010528179A (ja) | 2010-08-19 |
CA2686445C (en) | 2015-01-27 |
EP2148939A1 (de) | 2010-02-03 |
US20080292812A1 (en) | 2008-11-27 |
EP2148939B1 (de) | 2017-06-14 |
CN101743338A (zh) | 2010-06-16 |
US8496793B2 (en) | 2013-07-30 |
JP5618824B2 (ja) | 2014-11-05 |
CN101743338B (zh) | 2013-10-16 |
KR101499272B1 (ko) | 2015-03-05 |
CA2686445A1 (en) | 2008-12-04 |
RU2009148283A (ru) | 2011-06-27 |
MX2009012750A (es) | 2009-12-11 |
BRPI0811241B1 (pt) | 2019-06-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BRPI0811241A2 (pt) | Instalação de tratamento a vácuo e método de tratamento a vácuo | |
BRPI0811561A2 (pt) | Dispositivo de iluminação e método de iluminação | |
BRPI0818048A2 (pt) | Dispositivo de iluminação e método de fabricação | |
BRPI0716500A2 (pt) | Projétil e método de direcionamento de projétil | |
BRPI0814359A2 (pt) | Método | |
BRPI0817226A2 (pt) | Método | |
BRPI0817726A2 (pt) | Método | |
BRPI0810206A2 (pt) | Método de tratar câncer | |
BRPI0807225A2 (pt) | Dispositivo e método endocirúrgico | |
FI20075978A0 (fi) | Järjestely ja menetelmä | |
BRPI0920799A2 (pt) | dispositivos de avanço mandibular, e, método de avanço mandibular | |
DE502007005077D1 (de) | Einklemmschutzvorrichtung | |
EP2265853A4 (en) | FLEXIBLE EXHAUST FITTING | |
BRPI0815365A2 (pt) | Dispositivo de radiocomunicação e método de radiocomunicação | |
BRPI0906432A2 (pt) | Laminado elástico e método de fabricação | |
BRPI0816907A2 (pt) | Método e dispositivo | |
FI20065842A0 (fi) | Alipaineviemärijärjestelmä | |
BRPI0910854A2 (pt) | métodos de tratamento | |
EP2121511A4 (en) | DEVICES AND METHOD FOR MICROPACKING | |
FI20061090A (fi) | Kunnonvalvontamenetelmä | |
HK1118084A1 (en) | Drainage trap | |
DE602008000291D1 (de) | Steckverbinder und Montageverfahren dafür | |
BRPI0812275A2 (pt) | Aparelho e método de produção de painéis de gesso | |
BRPI0915849A2 (pt) | disposição de vedação e método de vedação | |
BRPI0718145A2 (pt) | Método de micronização |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
B25G | Requested change of headquarter approved |
Owner name: OERLIKON TRADING AG, TRUEBBACH (CH) |
|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06T | Formal requirements before examination [chapter 6.20 patent gazette] |
Free format text: O DEPOSITANTE DEVE RESPONDER A EXIGENCIA FORMULADA NESTE PARECER EM ATE 60 (SESSENTA) DIAS, A PARTIR DA DATA DE PUBLICACAO NA RPI, SOB PENA DO ARQUIVAMENTO DO PEDIDO, DE ACORDO COM O ARTIGO 34, INCISO II, DA LPI, POR MEIO DO SERVICO DE CODIGO 206. PUBLIQUE-SE A EXIGENCIA (6.20). |
|
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 25/06/2019, OBSERVADAS AS CONDICOES LEGAIS. (CO) 10 (DEZ) ANOS CONTADOS A PARTIR DE 25/06/2019, OBSERVADAS AS CONDICOES LEGAIS |
|
B25D | Requested change of name of applicant approved |
Owner name: OERLIKON SURFACE SOLUTIONS AG., TRUEBBACH (CH) |
|
B25D | Requested change of name of applicant approved |
Owner name: OERLIKON SURFACE SOLUTIONS AG., PFAEFFIKON (CH) |
|
B25G | Requested change of headquarter approved |
Owner name: OERLIKON SURFACE SOLUTIONS AG., PFAEFFIKON (CH) |
|
B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time |
Free format text: REFERENTE A 16A ANUIDADE. |