BRPI0806628A2 - substrato de vidro transparente, processo de fabricação de um substrato, célula fotovoltaica, vidro temperado e/ou curvo, vidro aquecedor conformado, tela de plasma, e, eletrodo de lámpada plana - Google Patents
substrato de vidro transparente, processo de fabricação de um substrato, célula fotovoltaica, vidro temperado e/ou curvo, vidro aquecedor conformado, tela de plasma, e, eletrodo de lámpada plana Download PDFInfo
- Publication number
- BRPI0806628A2 BRPI0806628A2 BRPI0806628-0A BRPI0806628A BRPI0806628A2 BR PI0806628 A2 BRPI0806628 A2 BR PI0806628A2 BR PI0806628 A BRPI0806628 A BR PI0806628A BR PI0806628 A2 BRPI0806628 A2 BR PI0806628A2
- Authority
- BR
- Brazil
- Prior art keywords
- oxide
- substrate
- substrate according
- layer
- glass
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 98
- 239000011521 glass Substances 0.000 title claims abstract description 76
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 6
- 238000010792 warming Methods 0.000 title description 2
- 150000004767 nitrides Chemical class 0.000 claims abstract description 67
- 238000010438 heat treatment Methods 0.000 claims abstract description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 34
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 18
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 claims description 14
- 229910052681 coesite Inorganic materials 0.000 claims description 12
- 229910052906 cristobalite Inorganic materials 0.000 claims description 12
- 229910052682 stishovite Inorganic materials 0.000 claims description 12
- 229910052905 tridymite Inorganic materials 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 9
- 230000005684 electric field Effects 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 9
- 238000012360 testing method Methods 0.000 claims description 9
- 239000011787 zinc oxide Substances 0.000 claims description 9
- 229910001887 tin oxide Inorganic materials 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- 239000002243 precursor Substances 0.000 claims description 7
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 5
- BHNZEZWIUMJCGF-UHFFFAOYSA-N 1-chloro-1,1-difluoroethane Chemical compound CC(F)(F)Cl BHNZEZWIUMJCGF-UHFFFAOYSA-N 0.000 claims description 4
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 claims description 4
- RJCQBQGAPKAMLL-UHFFFAOYSA-N bromotrifluoromethane Chemical compound FC(F)(F)Br RJCQBQGAPKAMLL-UHFFFAOYSA-N 0.000 claims description 4
- AFYPFACVUDMOHA-UHFFFAOYSA-N chlorotrifluoromethane Chemical compound FC(F)(F)Cl AFYPFACVUDMOHA-UHFFFAOYSA-N 0.000 claims description 4
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 claims description 4
- 150000002222 fluorine compounds Chemical class 0.000 claims description 4
- 229910052738 indium Inorganic materials 0.000 claims description 4
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 4
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 3
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims description 3
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 239000004338 Dichlorodifluoromethane Substances 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 2
- 238000010521 absorption reaction Methods 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 230000003667 anti-reflective effect Effects 0.000 claims description 2
- 239000012752 auxiliary agent Substances 0.000 claims description 2
- FUHMZYWBSHTEDZ-UHFFFAOYSA-M bispyribac-sodium Chemical compound [Na+].COC1=CC(OC)=NC(OC=2C(=C(OC=3N=C(OC)C=C(OC)N=3)C=CC=2)C([O-])=O)=N1 FUHMZYWBSHTEDZ-UHFFFAOYSA-M 0.000 claims description 2
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 229940042935 dichlorodifluoromethane Drugs 0.000 claims description 2
- 235000019404 dichlorodifluoromethane Nutrition 0.000 claims description 2
- 238000001493 electron microscopy Methods 0.000 claims description 2
- 230000002209 hydrophobic effect Effects 0.000 claims description 2
- 230000001939 inductive effect Effects 0.000 claims description 2
- 229960004065 perflutren Drugs 0.000 claims description 2
- 230000001699 photocatalysis Effects 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 229910052593 corundum Inorganic materials 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 239000012808 vapor phase Substances 0.000 claims 1
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 9
- 230000032798 delamination Effects 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- 235000012239 silicon dioxide Nutrition 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910006404 SnO 2 Inorganic materials 0.000 description 3
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- RPPBZEBXAAZZJH-UHFFFAOYSA-N cadmium telluride Chemical compound [Te]=[Cd] RPPBZEBXAAZZJH-UHFFFAOYSA-N 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000009916 joint effect Effects 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- REOJLIXKJWXUGB-UHFFFAOYSA-N mofebutazone Chemical group O=C1C(CCCC)C(=O)NN1C1=CC=CC=C1 REOJLIXKJWXUGB-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/029—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Photovoltaic Devices (AREA)
- Laminated Bodies (AREA)
- Gas-Filled Discharge Tubes (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0752664A FR2911336B3 (fr) | 2007-01-15 | 2007-01-15 | Substrat verrier revetu de couches a tenue mecanique amelioree |
| FR0752664 | 2007-01-15 | ||
| FR0753943A FR2913973B1 (fr) | 2007-03-21 | 2007-03-21 | Substrat verrier revetu de couches a tenue mecanique amelioree |
| FR0753943 | 2007-03-21 | ||
| PCT/FR2008/050063 WO2008099115A2 (fr) | 2007-01-15 | 2008-01-14 | Substrat verrier revetu de couches a tenue mecanique amelioree |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BRPI0806628A2 true BRPI0806628A2 (pt) | 2011-09-13 |
Family
ID=39690583
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0806628-0A BRPI0806628A2 (pt) | 2007-01-15 | 2008-01-14 | substrato de vidro transparente, processo de fabricação de um substrato, célula fotovoltaica, vidro temperado e/ou curvo, vidro aquecedor conformado, tela de plasma, e, eletrodo de lámpada plana |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8470434B2 (enExample) |
| EP (1) | EP2114839A2 (enExample) |
| JP (1) | JP5475461B2 (enExample) |
| KR (1) | KR101456560B1 (enExample) |
| AU (1) | AU2008214505B2 (enExample) |
| BR (1) | BRPI0806628A2 (enExample) |
| MX (1) | MX2009007526A (enExample) |
| RU (1) | RU2462424C2 (enExample) |
| WO (1) | WO2008099115A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2950878B1 (fr) | 2009-10-01 | 2011-10-21 | Saint Gobain | Procede de depot de couche mince |
| EP2354107A1 (de) * | 2010-02-10 | 2011-08-10 | Saint-Gobain Glass France | Verfahren zur Herstellung einer strukturierten TCO-Schutzschicht |
| FR2956659B1 (fr) * | 2010-02-22 | 2014-10-10 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
| DE102010017246A1 (de) * | 2010-06-04 | 2011-12-08 | Solibro Gmbh | Solarzellenmodul und Herstellungsverfahren hierfür |
| EP2408022A1 (en) * | 2010-07-16 | 2012-01-18 | Applied Materials, Inc. | Thin Film Solar Cell Fabrication Process, Deposition method for TCO layer, and Solar cell precursor layer stack |
| FR2983350A1 (fr) * | 2011-11-30 | 2013-05-31 | Saint Gobain | Electrode transparente pour cellule photovoltaique cdte |
| CN103590001B (zh) * | 2013-11-20 | 2016-01-20 | 温州大学 | 一种高强度多层膜系光电玻璃及其制备方法 |
| CN106687423B (zh) * | 2014-09-11 | 2021-03-12 | 皮尔金顿集团有限公司 | 用于沉积钛氧化物涂层的化学气相沉积工艺 |
| WO2018232303A1 (en) * | 2017-06-16 | 2018-12-20 | Mcpeak Kevin Michael | Metal-semiconductor-metal plasmonic device and absorber and method for making the same |
| DE102017115397A1 (de) | 2017-07-10 | 2019-01-10 | Schott Schweiz Ag | Heißformgebungswerkzeug für die Herstellung von Glascontainern |
| CN109265014A (zh) * | 2018-11-05 | 2019-01-25 | 西北工业大学深圳研究院 | 一种新型类石墨烯二硫化钼基自清洁生态玻璃及制备方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4187336A (en) * | 1977-04-04 | 1980-02-05 | Gordon Roy G | Non-iridescent glass structures |
| ES2221257T3 (es) * | 1991-12-26 | 2004-12-16 | Atofina Chemicals, Inc. | Composicion de revestimiento para vidrio. |
| NO931606L (no) | 1992-05-26 | 1993-11-29 | Saint Gobain Vitrage | Vindusplate med en funksjonell film |
| JP2874556B2 (ja) * | 1994-05-31 | 1999-03-24 | 日本板硝子株式会社 | 透明導電膜付きガラス板およびそれを用いたタッチパネル |
| US5811191A (en) * | 1994-12-27 | 1998-09-22 | Ppg Industries, Inc. | Multilayer antireflective coating with a graded base layer |
| FR2736632B1 (fr) * | 1995-07-12 | 1997-10-24 | Saint Gobain Vitrage | Vitrage muni d'une couche conductrice et/ou bas-emissive |
| WO1997025201A1 (en) * | 1996-01-11 | 1997-07-17 | Libbey-Owens-Ford Co. | Coated glass article having a solar control coating |
| US6265076B1 (en) * | 1998-02-06 | 2001-07-24 | Libbey-Owens-Ford Co. | Anti-reflective films |
| FR2781789B1 (fr) * | 1998-08-03 | 2001-08-03 | Saint Gobain Vitrage | Substrat transparent comportant un reseau de fils metalliques et utilisation de ce substrat |
| WO2000015572A2 (en) * | 1998-09-17 | 2000-03-23 | Libbey-Owens-Ford Co. | Heat strengthened coated glass article and method for making same |
| KR100700800B1 (ko) * | 1998-11-09 | 2007-03-27 | 피피지 인더스트리즈 오하이오 인코포레이티드 | 일사 조정성 피복물 및 피복된 제품 |
| ATE403545T1 (de) * | 1999-08-26 | 2008-08-15 | Agc Flat Glass Europe Sa | Verbundglasscheibe |
| JP2001186967A (ja) * | 1999-12-28 | 2001-07-10 | Nippon Sheet Glass Co Ltd | 冷凍・冷蔵庫用ガラスと該ガラスを使用したガラス物品 |
| FR2843483B1 (fr) * | 2002-08-06 | 2005-07-08 | Saint Gobain | Lampe plane, procede de fabrication et application |
| FR2856057B1 (fr) * | 2003-06-13 | 2007-03-30 | Saint Gobain | Traitement par projection de panneaux poses sur un support barriere |
| JP4767167B2 (ja) * | 2003-06-24 | 2011-09-07 | カーディナル・シージー・カンパニー | 濃度変調コーティング |
| US7431992B2 (en) * | 2004-08-09 | 2008-10-07 | Ppg Industries Ohio, Inc. | Coated substrates that include an undercoating |
| JP2006332453A (ja) * | 2005-05-27 | 2006-12-07 | Sharp Corp | 薄膜太陽電池の製造方法および薄膜太陽電池 |
| US20080047603A1 (en) * | 2006-08-24 | 2008-02-28 | Guardian Industries Corp. | Front contact with intermediate layer(s) adjacent thereto for use in photovoltaic device and method of making same |
-
2008
- 2008-01-14 JP JP2009545213A patent/JP5475461B2/ja not_active Expired - Fee Related
- 2008-01-14 EP EP08761934A patent/EP2114839A2/fr not_active Withdrawn
- 2008-01-14 RU RU2009131040/03A patent/RU2462424C2/ru not_active IP Right Cessation
- 2008-01-14 KR KR1020097014702A patent/KR101456560B1/ko not_active Expired - Fee Related
- 2008-01-14 US US12/523,174 patent/US8470434B2/en not_active Expired - Fee Related
- 2008-01-14 BR BRPI0806628-0A patent/BRPI0806628A2/pt not_active IP Right Cessation
- 2008-01-14 AU AU2008214505A patent/AU2008214505B2/en not_active Ceased
- 2008-01-14 MX MX2009007526A patent/MX2009007526A/es active IP Right Grant
- 2008-01-14 WO PCT/FR2008/050063 patent/WO2008099115A2/fr not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| AU2008214505B2 (en) | 2013-02-07 |
| KR101456560B1 (ko) | 2014-10-31 |
| WO2008099115A2 (fr) | 2008-08-21 |
| AU2008214505A1 (en) | 2008-08-21 |
| JP2010515648A (ja) | 2010-05-13 |
| EP2114839A2 (fr) | 2009-11-11 |
| JP5475461B2 (ja) | 2014-04-16 |
| WO2008099115A3 (fr) | 2008-11-06 |
| RU2462424C2 (ru) | 2012-09-27 |
| RU2009131040A (ru) | 2011-02-27 |
| US8470434B2 (en) | 2013-06-25 |
| MX2009007526A (es) | 2009-07-22 |
| KR20090101236A (ko) | 2009-09-24 |
| US20100313936A1 (en) | 2010-12-16 |
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| B08F | Application fees: application dismissed [chapter 8.6 patent gazette] | ||
| B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |