BRPI0801878A2 - aparelho para execuÇço de deposiÇço de vapor quÍmico de plasma e mÉtodo de fabricaÇço de uma prÉ-forma àtica - Google Patents

aparelho para execuÇço de deposiÇço de vapor quÍmico de plasma e mÉtodo de fabricaÇço de uma prÉ-forma àtica

Info

Publication number
BRPI0801878A2
BRPI0801878A2 BRPI0801878-2A BRPI0801878A BRPI0801878A2 BR PI0801878 A2 BRPI0801878 A2 BR PI0801878A2 BR PI0801878 A BRPI0801878 A BR PI0801878A BR PI0801878 A2 BRPI0801878 A2 BR PI0801878A2
Authority
BR
Brazil
Prior art keywords
plasma chemical
preform
attic
manufacture
interior
Prior art date
Application number
BRPI0801878-2A
Other languages
English (en)
Inventor
Stralen Mattheus Jacobus Nicolaas Van
Igor Milicevic
Johannes Antoon Hartsuiker
Original Assignee
Draka Comteq Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Draka Comteq Bv filed Critical Draka Comteq Bv
Publication of BRPI0801878A2 publication Critical patent/BRPI0801878A2/pt
Publication of BRPI0801878B1 publication Critical patent/BRPI0801878B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

APARELHO PARA EXECUÇçO DE DEPOSIÇçO DE VAPOR QUÍMICO DE PLASMA E MÉTODO DE FABRICAÇçO DE UMA PRÉ-FORMA àTICA. A presente invenção refere-se a um aparelho para execução da deposição de vapor químico de plasma, pelo qual uma ou mais camadas de sílica dopada ou não dopada são depositadas sobre o interior de um tubo de substrato de vidro oco alongado. A presente invenção também se refere a um método de fabricação de uma pré-forma ótica por meio da deposição de vapor químico de plasma, onde os gases de formação do vidro dopados ou não dopados são passados através do interior de um tubo de substrato de vidro alongado, enquanto as condições, tal que a deposição das camadas de vidro aconteça, são criadas no interior do tubo de substrato.
BRPI0801878A 2007-05-01 2008-05-02 aparelho para execução de deposição de vapor químico de plasma e método de fabricação de uma pré-forma ótica BRPI0801878B1 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL1033783A NL1033783C2 (nl) 2007-05-01 2007-05-01 Inrichting voor het uitvoeren van een plasma chemische dampdepositie alsmede werkwijze ter vervaardiging van een optische voorvorm.

Publications (2)

Publication Number Publication Date
BRPI0801878A2 true BRPI0801878A2 (pt) 2009-01-06
BRPI0801878B1 BRPI0801878B1 (pt) 2018-10-16

Family

ID=38996701

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0801878A BRPI0801878B1 (pt) 2007-05-01 2008-05-02 aparelho para execução de deposição de vapor químico de plasma e método de fabricação de uma pré-forma ótica

Country Status (8)

Country Link
US (1) US8662011B2 (pt)
EP (1) EP1988065B1 (pt)
JP (1) JP5459977B2 (pt)
CN (1) CN101298664B (pt)
AT (1) ATE531674T1 (pt)
BR (1) BRPI0801878B1 (pt)
ES (1) ES2376133T3 (pt)
NL (1) NL1033783C2 (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102263000B (zh) * 2011-06-24 2013-05-15 长飞光纤光缆有限公司 一种等离子体微波谐振腔
NL2007809C2 (en) * 2011-11-17 2013-05-21 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
NL2007917C2 (en) * 2011-12-01 2013-06-06 Draka Comteq Bv A device for applying electromagnetic microwave radiation in a plasma inside a hollow glass substrate tube, and method for manufacturing an optical preform.
NL2007968C2 (en) * 2011-12-14 2013-06-17 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
CN105244251B (zh) * 2015-11-03 2017-11-17 长飞光纤光缆股份有限公司 一种大功率等离子体微波谐振腔
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
NL2028245B1 (en) 2021-05-19 2022-12-05 Draka Comteq Bv A plasma chemical vapor deposition apparatus

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2444100C3 (de) * 1974-09-14 1979-04-12 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zur Herstellung von innenbeschichteten Glasrohren zum Ziehen von Lichtleitfasern
US4292063A (en) * 1980-05-05 1981-09-29 Northern Telecom Limited Manufacture of an optical fiber preform with micro-wave plasma activated deposition in a tube
JPS5869732A (ja) * 1981-10-21 1983-04-26 Furukawa Electric Co Ltd:The プラズマｃｖｄ法におけるガラスパイプの加熱方法
DE3528275A1 (de) * 1985-08-07 1987-02-19 Philips Patentverwaltung Verfahren und vorrichtung zum innenbeschichten von rohren
DE3632684A1 (de) * 1986-09-26 1988-03-31 Philips Patentverwaltung Verfahren und vorrichtung zum innenbeschichten von rohren
NL8602910A (nl) * 1986-11-17 1988-06-16 Philips Nv Inrichting voor het aanbrengen van glaslagen op de binnenzijde van een buis.
US5037666A (en) * 1989-08-03 1991-08-06 Uha Mikakuto Precision Engineering Research Institute Co., Ltd. High-speed film forming method by microwave plasma chemical vapor deposition (CVD) under high pressure
DE4203369C2 (de) * 1992-02-06 1994-08-11 Ceramoptec Gmbh Verfahren und Vorrichtung zur Herstellung von Vorformen für Lichtwellenleiter
US6138478A (en) * 1992-09-21 2000-10-31 Ceramoptec Industries, Inc. Method of forming an optical fiber preform using an E020 plasma field configuration
US5698036A (en) * 1995-05-26 1997-12-16 Tokyo Electron Limited Plasma processing apparatus
US5895548A (en) * 1996-03-29 1999-04-20 Applied Komatsu Technology, Inc. High power microwave plasma applicator
US5902404A (en) * 1997-03-04 1999-05-11 Applied Materials, Inc. Resonant chamber applicator for remote plasma source
JP4326146B2 (ja) * 1997-12-31 2009-09-02 プラズマ オプティカル ファイバー ベスローテン フェンノートシャップ Ｐｃｖｄ装置及び光ファイバ、プレフォームロッド及びジャケットチューブを製造する方法並びにこれにより製造される光ファイバ
JP4008728B2 (ja) * 2002-03-20 2007-11-14 株式会社 液晶先端技術開発センター プラズマ処理装置
NL1020358C2 (nl) * 2002-04-10 2003-10-13 Draka Fibre Technology Bv Werkwijze en inrichting ter vervaardiging van optische voorvormen, alsmede de daarmee verkregen optische vezels.

Also Published As

Publication number Publication date
EP1988065B1 (en) 2011-11-02
ES2376133T3 (es) 2012-03-09
US20080274300A1 (en) 2008-11-06
EP1988065A1 (en) 2008-11-05
NL1033783C2 (nl) 2008-11-06
CN101298664B (zh) 2011-11-09
ATE531674T1 (de) 2011-11-15
JP2008280238A (ja) 2008-11-20
BRPI0801878B1 (pt) 2018-10-16
US8662011B2 (en) 2014-03-04
JP5459977B2 (ja) 2014-04-02
CN101298664A (zh) 2008-11-05

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Legal Events

Date Code Title Description
B03A Publication of a patent application or of a certificate of addition of invention [chapter 3.1 patent gazette]
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06I Publication of requirement cancelled [chapter 6.9 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

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