ATE555859T1 - Niederdielektrischer konstanter plasmapolymerisierter dünnfilm und herstellungsverfahren dafür - Google Patents

Niederdielektrischer konstanter plasmapolymerisierter dünnfilm und herstellungsverfahren dafür

Info

Publication number
ATE555859T1
ATE555859T1 AT08170636T AT08170636T ATE555859T1 AT E555859 T1 ATE555859 T1 AT E555859T1 AT 08170636 T AT08170636 T AT 08170636T AT 08170636 T AT08170636 T AT 08170636T AT E555859 T1 ATE555859 T1 AT E555859T1
Authority
AT
Austria
Prior art keywords
thin film
dielectric constant
plasma polymerized
constant plasma
low dielectric
Prior art date
Application number
AT08170636T
Other languages
English (en)
Inventor
Donggeun Jung
Sungwoo Lee
Jihyung Woo
Original Assignee
Univ Sungkyunkwan Found
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Sungkyunkwan Found filed Critical Univ Sungkyunkwan Found
Application granted granted Critical
Publication of ATE555859T1 publication Critical patent/ATE555859T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/20—Manufacture of shaped structures of ion-exchange resins
    • C08J5/22—Films, membranes or diaphragms
    • C08J5/2206—Films, membranes or diaphragms based on organic and/or inorganic macromolecular compounds
    • C08J5/2218—Synthetic macromolecular compounds
    • C08J5/2256—Synthetic macromolecular compounds based on macromolecular compounds obtained by reactions other than those involving carbon-to-carbon bonds, e.g. obtained by polycondensation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/20—Manufacture of shaped structures of ion-exchange resins
    • C08J5/22—Films, membranes or diaphragms
    • C08J5/2287—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/01—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
AT08170636T 2007-12-06 2008-12-04 Niederdielektrischer konstanter plasmapolymerisierter dünnfilm und herstellungsverfahren dafür ATE555859T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070126331A KR100962044B1 (ko) 2007-12-06 2007-12-06 저유전 플라즈마 중합체 박막 및 그 제조 방법

Publications (1)

Publication Number Publication Date
ATE555859T1 true ATE555859T1 (de) 2012-05-15

Family

ID=40382806

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08170636T ATE555859T1 (de) 2007-12-06 2008-12-04 Niederdielektrischer konstanter plasmapolymerisierter dünnfilm und herstellungsverfahren dafür

Country Status (5)

Country Link
US (1) US7897521B2 (de)
EP (1) EP2070601B1 (de)
KR (1) KR100962044B1 (de)
CN (1) CN101450995B (de)
AT (1) ATE555859T1 (de)

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* Cited by examiner, † Cited by third party
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EP2744364B1 (de) 2011-08-15 2016-10-26 The Procter and Gamble Company Kosmetikapplikatoren
US9371430B2 (en) 2013-08-19 2016-06-21 Research & Business Foundation Sungkyunkwan University Porous film with high hardness and a low dielectric constant and preparation method thereof
CN110540648A (zh) * 2014-11-07 2019-12-06 中国科学院上海有机化学研究所 含苯并环丁烯基团的有机硅氧烷及其制备和应用
US10351729B2 (en) 2016-03-03 2019-07-16 Motorola Mobility Llc Polysiloxane films and methods of making polysiloxane films
CN108933088B (zh) * 2017-05-25 2020-05-29 上海稷以科技有限公司 一种封装的方法及封装结构
KR102578827B1 (ko) 2018-04-24 2023-09-15 삼성전자주식회사 유연한 유무기 보호막 및 그 제조방법
KR102138102B1 (ko) * 2018-09-05 2020-07-27 성균관대학교산학협력단 저유전 플라즈마 중합체 박막 및 이의 제조 방법

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Also Published As

Publication number Publication date
KR100962044B1 (ko) 2010-06-08
CN101450995B (zh) 2012-05-09
EP2070601B1 (de) 2012-05-02
KR20090059462A (ko) 2009-06-11
EP2070601A2 (de) 2009-06-17
EP2070601A3 (de) 2010-02-24
US20090054612A1 (en) 2009-02-26
US7897521B2 (en) 2011-03-01
CN101450995A (zh) 2009-06-10

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