JP5459977B2 - プラズマ化学蒸着法を実行するための装置および光学的予備成形品を製造する方法 - Google Patents
プラズマ化学蒸着法を実行するための装置および光学的予備成形品を製造する方法 Download PDFInfo
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- JP5459977B2 JP5459977B2 JP2008118127A JP2008118127A JP5459977B2 JP 5459977 B2 JP5459977 B2 JP 5459977B2 JP 2008118127 A JP2008118127 A JP 2008118127A JP 2008118127 A JP2008118127 A JP 2008118127A JP 5459977 B2 JP5459977 B2 JP 5459977B2
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 230000003287 optical effect Effects 0.000 title claims abstract description 7
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims description 7
- 239000000758 substrate Substances 0.000 claims abstract description 69
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 43
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 18
- 239000011521 glass Substances 0.000 claims abstract description 15
- 238000000151 deposition Methods 0.000 claims abstract description 9
- 230000008021 deposition Effects 0.000 claims abstract description 6
- 238000007496 glass forming Methods 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 13
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 4
- 230000008018 melting Effects 0.000 claims description 4
- 238000012216 screening Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 abstract 2
- 210000002381 plasma Anatomy 0.000 description 14
- 239000013307 optical fiber Substances 0.000 description 12
- 239000002245 particle Substances 0.000 description 11
- 239000007787 solid Substances 0.000 description 11
- 239000000835 fiber Substances 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 230000001681 protective effect Effects 0.000 description 5
- 238000005253 cladding Methods 0.000 description 4
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- 239000002923 metal particle Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 238000005019 vapor deposition process Methods 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
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- 239000000203 mixture Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
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- 239000002019 doping agent Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- -1 Polytetrafluoroethylene Polymers 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
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- 239000002826 coolant Substances 0.000 description 1
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- 238000011010 flushing procedure Methods 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
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- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
- C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Melting And Manufacturing (AREA)
- Chemical Vapour Deposition (AREA)
Description
2 内側チューブ
3 マイクロ波導波路
4 円筒空間
5 共振空洞
6 内側リング
7 円筒軸
8 共振器
9 円筒型内壁
11 円筒型外壁
13 スリット
15 縦方向軸
17 胴体
18 開口部
Claims (15)
- ドープされたシリカまたはドープされていないシリカの1層または複数層が細長の中空ガラス基材チューブの内側に蒸着されるプラズマ化学蒸着法を実行するための装置にして、円筒軸の周りに本質的に円筒対称に形成された共振空洞を有する共振器を含み、この軸に沿って基材チューブが位置決めされ、前記共振空洞が円筒型内壁と円筒型外壁を備えて実質的に環状の形状であり、前記円筒型内壁が前記円筒軸の周りの円の少なくとも一部に沿って延びるスリットを含み、この共振空洞の中にマイクロ波導波路が延び、それにより、マイクロ波が前述のスリットを経由して円筒型内壁によって取り囲まれた空洞へと抜け出ることが可能になり、共振器が基材チューブの少なくとも一部を取り囲み、かつ基材チューブの長手方向軸に沿って前後に移動させられることが可能である、前記装置であって、中空の内側チューブが共振空洞の円筒型内壁に対して密着して位置決めされ、該内側チューブは、共振器に相対して静止型であり、共振空洞の長さのうちの少なくとも一部に沿って円筒軸に沿って延び、かつマイクロ波に対して透過性であり、基材チューブが内側チューブの内側に位置決めされることができるような直径をこの内側チューブが有することを特徴とする、装置。
- 内側チューブが円筒軸に沿って共振器の外側へと延びることを特徴とする、請求項1に記載の装置。
- 内側チューブが、基材チューブの長手方向軸に沿って内側チューブが共振器と同期して動かされることが可能になるような方式で共振器に接続されることを特徴とする、請求項1から2のいずれか一項に記載の装置。
- 内側チューブの長さが基材チューブの長さよりも小さいことを特徴とする、請求項1から3のいずれか一項に記載の装置。
- 内側チューブの長さが最大で共振器の長さの2倍であることを特徴とする、請求項1から4のいずれか一項に記載の装置。
- 内側チューブが一方の端部に内側リングを設けられることを特徴とする、請求項1から5のいずれか一項に記載の装置。
- 内側チューブが両方の端部にそのような内側リングを設けられることを特徴とする、請求項6に記載の装置。
- 基材チューブの外径と内側リングの内径との間の差が最大で3mmであることを特徴とする、請求項6から7のいずれか一項に記載の装置。
- 内側チューブが、内側チューブの壁の周りの円の一部に沿って延びる1つまたは複数の開口を設けられることを特徴とする、請求項1から8のいずれか一項に記載の装置。
- 前記1つまたは複数の開口が共振空洞の円筒型内壁内のスリットの近傍に配置されることを特徴とする、請求項9に記載の装置。
- マイクロ波導波路が、共振空洞の円筒型内壁と内側チューブによって取り囲まれる空間にガスを供給するための手段を設けられることを特徴とする、請求項1から10のいずれか一項に記載の装置。
- 共振空洞の円筒型壁のスリットが円筒軸の周りの円全体に延び、円の一部がスクリーニング素子を使用して遮断されることを特徴とする、請求項1から11のいずれか一項に記載の装置。
- 内側チューブが1000℃よりも高い融点を有する石英ガラスで作られることを特徴とする、請求項1から12のいずれか一項に記載の装置。
- 内側チューブの内径がその長さに沿って変わることを特徴とする、請求項1から13のいずれか一項に記載の装置。
- プラズマ化学蒸着法によって光学的予備成形品を製造する方法であって、請求項1から14のいずれか一項に記載の装置を使用してガラス層を形成するための蒸着条件が基材チューブの内側に作り出されている間に、ドープされた、またはドープされていないガラス形成ガスが細長のガラス基材チューブの内側を通過させられる、方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1033783A NL1033783C2 (nl) | 2007-05-01 | 2007-05-01 | Inrichting voor het uitvoeren van een plasma chemische dampdepositie alsmede werkwijze ter vervaardiging van een optische voorvorm. |
NL1033783 | 2007-05-01 |
Publications (2)
Publication Number | Publication Date |
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JP2008280238A JP2008280238A (ja) | 2008-11-20 |
JP5459977B2 true JP5459977B2 (ja) | 2014-04-02 |
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JP2008118127A Active JP5459977B2 (ja) | 2007-05-01 | 2008-04-30 | プラズマ化学蒸着法を実行するための装置および光学的予備成形品を製造する方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8662011B2 (ja) |
EP (1) | EP1988065B1 (ja) |
JP (1) | JP5459977B2 (ja) |
CN (1) | CN101298664B (ja) |
AT (1) | ATE531674T1 (ja) |
BR (1) | BRPI0801878B1 (ja) |
ES (1) | ES2376133T3 (ja) |
NL (1) | NL1033783C2 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102263000B (zh) * | 2011-06-24 | 2013-05-15 | 长飞光纤光缆有限公司 | 一种等离子体微波谐振腔 |
NL2007809C2 (en) * | 2011-11-17 | 2013-05-21 | Draka Comteq Bv | An apparatus for performing a plasma chemical vapour deposition process. |
NL2007917C2 (en) * | 2011-12-01 | 2013-06-06 | Draka Comteq Bv | A device for applying electromagnetic microwave radiation in a plasma inside a hollow glass substrate tube, and method for manufacturing an optical preform. |
NL2007968C2 (en) * | 2011-12-14 | 2013-06-17 | Draka Comteq Bv | An apparatus for performing a plasma chemical vapour deposition process. |
CN105244251B (zh) * | 2015-11-03 | 2017-11-17 | 长飞光纤光缆股份有限公司 | 一种大功率等离子体微波谐振腔 |
NL2017575B1 (en) | 2016-10-04 | 2018-04-13 | Draka Comteq Bv | A method and an apparatus for performing a plasma chemical vapour deposition process and a method |
NL2028245B1 (en) | 2021-05-19 | 2022-12-05 | Draka Comteq Bv | A plasma chemical vapor deposition apparatus |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2444100C3 (de) * | 1974-09-14 | 1979-04-12 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zur Herstellung von innenbeschichteten Glasrohren zum Ziehen von Lichtleitfasern |
US4292063A (en) * | 1980-05-05 | 1981-09-29 | Northern Telecom Limited | Manufacture of an optical fiber preform with micro-wave plasma activated deposition in a tube |
JPS5869732A (ja) * | 1981-10-21 | 1983-04-26 | Furukawa Electric Co Ltd:The | プラズマcvd法におけるガラスパイプの加熱方法 |
DE3528275A1 (de) * | 1985-08-07 | 1987-02-19 | Philips Patentverwaltung | Verfahren und vorrichtung zum innenbeschichten von rohren |
DE3632684A1 (de) * | 1986-09-26 | 1988-03-31 | Philips Patentverwaltung | Verfahren und vorrichtung zum innenbeschichten von rohren |
NL8602910A (nl) * | 1986-11-17 | 1988-06-16 | Philips Nv | Inrichting voor het aanbrengen van glaslagen op de binnenzijde van een buis. |
JPH03193880A (ja) * | 1989-08-03 | 1991-08-23 | Mikakutou Seimitsu Kogaku Kenkyusho:Kk | 高圧力下でのマイクロ波プラズマcvdによる高速成膜方法及びその装置 |
DE4203369C2 (de) * | 1992-02-06 | 1994-08-11 | Ceramoptec Gmbh | Verfahren und Vorrichtung zur Herstellung von Vorformen für Lichtwellenleiter |
US6138478A (en) * | 1992-09-21 | 2000-10-31 | Ceramoptec Industries, Inc. | Method of forming an optical fiber preform using an E020 plasma field configuration |
US5698036A (en) * | 1995-05-26 | 1997-12-16 | Tokyo Electron Limited | Plasma processing apparatus |
US5895548A (en) * | 1996-03-29 | 1999-04-20 | Applied Komatsu Technology, Inc. | High power microwave plasma applicator |
US5902404A (en) * | 1997-03-04 | 1999-05-11 | Applied Materials, Inc. | Resonant chamber applicator for remote plasma source |
ATE234947T1 (de) * | 1997-12-31 | 2003-04-15 | Draka Fibre Technology Bv | Pcvd-vorrichtung und verfahren zur herstellung einer optischen faser, eines vorform-stabes und eines mantelrohres und die damit hergestellte optische faser |
JP4008728B2 (ja) * | 2002-03-20 | 2007-11-14 | 株式会社 液晶先端技術開発センター | プラズマ処理装置 |
NL1020358C2 (nl) * | 2002-04-10 | 2003-10-13 | Draka Fibre Technology Bv | Werkwijze en inrichting ter vervaardiging van optische voorvormen, alsmede de daarmee verkregen optische vezels. |
-
2007
- 2007-05-01 NL NL1033783A patent/NL1033783C2/nl not_active IP Right Cessation
-
2008
- 2008-04-25 EP EP08007993A patent/EP1988065B1/en active Active
- 2008-04-25 AT AT08007993T patent/ATE531674T1/de active
- 2008-04-25 ES ES08007993T patent/ES2376133T3/es active Active
- 2008-04-30 CN CN2008101258138A patent/CN101298664B/zh active Active
- 2008-04-30 JP JP2008118127A patent/JP5459977B2/ja active Active
- 2008-05-01 US US12/113,512 patent/US8662011B2/en active Active
- 2008-05-02 BR BRPI0801878A patent/BRPI0801878B1/pt active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US8662011B2 (en) | 2014-03-04 |
JP2008280238A (ja) | 2008-11-20 |
CN101298664B (zh) | 2011-11-09 |
ES2376133T3 (es) | 2012-03-09 |
BRPI0801878B1 (pt) | 2018-10-16 |
BRPI0801878A2 (pt) | 2009-01-06 |
NL1033783C2 (nl) | 2008-11-06 |
CN101298664A (zh) | 2008-11-05 |
US20080274300A1 (en) | 2008-11-06 |
EP1988065A1 (en) | 2008-11-05 |
ATE531674T1 (de) | 2011-11-15 |
EP1988065B1 (en) | 2011-11-02 |
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