BR9907023A - "dispositivo de célula solar e método de fabricação do mesmo" - Google Patents
"dispositivo de célula solar e método de fabricação do mesmo"Info
- Publication number
- BR9907023A BR9907023A BR9907023-5A BR9907023A BR9907023A BR 9907023 A BR9907023 A BR 9907023A BR 9907023 A BR9907023 A BR 9907023A BR 9907023 A BR9907023 A BR 9907023A
- Authority
- BR
- Brazil
- Prior art keywords
- solar cell
- electrode
- semiconductor layer
- transparent oxide
- cell device
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000010410 layer Substances 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 3
- 239000002335 surface treatment layer Substances 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
"DISPOSITIVO DE CéLULA SOLAR E MéTODO DE FABRICAçãO DO MESMO". Uma célula solar (2) tem uma estrutura de camada múltipla constituída de um substrato de vidro transparente de isolamento (10), um eletrodo de óxido transparente (12), uma camada de tratamento de superfície (14) formada por meio da submissão do eletrodo de óxido transparente (12) ao processamento de plasma oxidante, um filme de azoteto de silício (16), uma camada semicondutora do tipo p (18), uma camada amortecedora (20), uma camada semicondutora intrínseca (22), uma camada semicondutora do tipo N (24), e um eletrodo de metal (26) empilhados nesta ordem. A superfície do eletrodo de óxido transparente (12) é estabilizada quimicamente pela camada de tratamento de superfície (14), aumentando, desta maneira, a voltagem de extremidade aberta.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1007198 | 1998-01-22 | ||
PCT/JP1999/000256 WO1999038216A1 (fr) | 1998-01-22 | 1999-01-22 | Dispositif de cellule solaire et son procede de production |
Publications (1)
Publication Number | Publication Date |
---|---|
BR9907023A true BR9907023A (pt) | 2000-10-17 |
Family
ID=11740150
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR9907023-5A BR9907023A (pt) | 1998-01-22 | 1999-01-22 | "dispositivo de célula solar e método de fabricação do mesmo" |
Country Status (7)
Country | Link |
---|---|
US (1) | US6333456B1 (pt) |
EP (1) | EP1050909A4 (pt) |
KR (1) | KR20010033375A (pt) |
CN (1) | CN1287690A (pt) |
AU (1) | AU1983499A (pt) |
BR (1) | BR9907023A (pt) |
WO (1) | WO1999038216A1 (pt) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1050909A4 (en) * | 1998-01-22 | 2002-01-30 | Citizen Watch Co Ltd | SOLAR CELL DEVICE AND ITS PRODUCTION METHOD |
KR100374020B1 (ko) * | 2000-09-25 | 2003-02-26 | 학교법인고려중앙학원 | ITO/n형 반도체층 계면에서 터널링 접합을 이용한박막 광전지 및 그 제조방법 |
JP3906182B2 (ja) * | 2002-06-21 | 2007-04-18 | アスラブ・エス アー | 特に液晶ディスプレイセル又は電気化学光電池である多層セル |
US7022247B2 (en) * | 2003-03-26 | 2006-04-04 | Union Semiconductor Technology Corporation | Process to form fine features using photolithography and plasma etching |
US7960646B2 (en) * | 2005-08-30 | 2011-06-14 | Kaneka Corporation | Silicon-based thin-film photoelectric converter and method of manufacturing the same |
JP5470633B2 (ja) * | 2008-12-11 | 2014-04-16 | 国立大学法人東北大学 | 光電変換素子及び太陽電池 |
WO2011006307A1 (zh) * | 2009-07-14 | 2011-01-20 | Guo Jianguo | 外加电场型光伏电池 |
CN101699632A (zh) * | 2009-10-14 | 2010-04-28 | 郭建国 | 外加电源提供电场效应的薄膜光伏电池 |
KR101283140B1 (ko) * | 2011-01-26 | 2013-07-05 | 엘지이노텍 주식회사 | 태양전지 및 이의 제조방법 |
CN102332504B (zh) * | 2011-04-13 | 2013-04-10 | 东旭集团有限公司 | 提高非晶硅太阳能电池中p型层和i型层界面性能的方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4162505A (en) * | 1978-04-24 | 1979-07-24 | Rca Corporation | Inverted amorphous silicon solar cell utilizing cermet layers |
JPS5846074B2 (ja) * | 1979-03-12 | 1983-10-14 | 三洋電機株式会社 | 光起電力装置の製造方法 |
US4732621A (en) * | 1985-06-17 | 1988-03-22 | Sanyo Electric Co., Ltd. | Method for producing a transparent conductive oxide layer and a photovoltaic device including such a layer |
JPH031577A (ja) * | 1990-04-06 | 1991-01-08 | Semiconductor Energy Lab Co Ltd | 光電変換装置 |
JPH06122982A (ja) | 1992-10-13 | 1994-05-06 | Matsushita Electric Ind Co Ltd | アルミニウムを主成分とする金属薄膜のエッチング液組成物 |
JPH0851225A (ja) * | 1994-08-05 | 1996-02-20 | Mitsui Toatsu Chem Inc | 非晶質光電変換装置 |
JP3164756B2 (ja) | 1995-08-30 | 2001-05-08 | 京セラ株式会社 | 多層薄膜回路の形成方法 |
US5667631A (en) * | 1996-06-28 | 1997-09-16 | Lam Research Corporation | Dry etching of transparent electrodes in a low pressure plasma reactor |
EP1050909A4 (en) * | 1998-01-22 | 2002-01-30 | Citizen Watch Co Ltd | SOLAR CELL DEVICE AND ITS PRODUCTION METHOD |
JP3290186B2 (ja) * | 1998-01-28 | 2002-06-10 | シチズン時計株式会社 | 太陽電池装置の製造方法 |
-
1999
- 1999-01-22 EP EP99900665A patent/EP1050909A4/en not_active Withdrawn
- 1999-01-22 CN CN99801904A patent/CN1287690A/zh active Pending
- 1999-01-22 BR BR9907023-5A patent/BR9907023A/pt not_active IP Right Cessation
- 1999-01-22 AU AU19834/99A patent/AU1983499A/en not_active Abandoned
- 1999-01-22 US US09/600,758 patent/US6333456B1/en not_active Expired - Fee Related
- 1999-01-22 KR KR1020007006842A patent/KR20010033375A/ko active IP Right Grant
- 1999-01-22 WO PCT/JP1999/000256 patent/WO1999038216A1/ja not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US6333456B1 (en) | 2001-12-25 |
CN1287690A (zh) | 2001-03-14 |
EP1050909A4 (en) | 2002-01-30 |
KR20010033375A (ko) | 2001-04-25 |
EP1050909A1 (en) | 2000-11-08 |
WO1999038216A1 (fr) | 1999-07-29 |
AU1983499A (en) | 1999-08-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100490159C (zh) | 一种薄膜晶体管器件 | |
KR940006217A (ko) | 반도체장치 및 그 제조방법 | |
EP2261990A3 (en) | High withstand voltage semiconductor device and manufacturing method thereof | |
EP0641027A4 (en) | SEMICONDUCTOR ARRANGEMENT. | |
BR9907023A (pt) | "dispositivo de célula solar e método de fabricação do mesmo" | |
IT1256415B (it) | Struttura di contatto tra due strati conduttori in un dispositivo a semiconduttore e procedimento per la fabbricazione di essa | |
EP0677877A3 (en) | Insulating gate type semiconductor device and power inverter using such a device | |
JPS5499576A (en) | Thin-film transistor and its manufacture | |
KR0159464B1 (ko) | 반도체장치의 제조방법 | |
EP1059672A3 (en) | High withstand voltage semiconductor device and method of manufacturing the same | |
BR9904782A (pt) | Método para fabricar dispositivo de célula solar | |
JPS6437535A (en) | Thin film semiconductor element | |
JPS5522879A (en) | Insulation gate type field effect semiconductor device | |
JPH039656A (ja) | イメージセンサ | |
KR970054087A (ko) | 반도체 소자의 웰 형성방법 | |
JPH02163972A (ja) | 薄膜トランジスタの製造方法 | |
JPS55107229A (en) | Method of manufacturing semiconductor device | |
KR930003430A (ko) | 반도체 장치 및 그 제조방법 | |
JPS57107074A (en) | Semiconductor device | |
TW344108B (en) | A bipolar transistor and method of manufacturing thereof | |
RU2099817C1 (ru) | Способ изготовления мдп ис | |
KR960015492B1 (ko) | 반도체 소자의 텅스텐 폴리사이드 제조방법 | |
KR910017646A (ko) | 플라즈마 산화를 이용한 박막 fet트랜지스터의 제조방법 | |
JPS57122534A (en) | Manufacture of semiconductor device | |
KR970072498A (ko) | 수직형 인버터 및 그 제조 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TE | Change of address | ||
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 5A,6A,7A E 8A ANUIDADES |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 1910 DE 14/08/2007. |