BR112018016802A2 - deposição eletroquímica de elementos em meio aquoso - Google Patents

deposição eletroquímica de elementos em meio aquoso

Info

Publication number
BR112018016802A2
BR112018016802A2 BR112018016802A BR112018016802A BR112018016802A2 BR 112018016802 A2 BR112018016802 A2 BR 112018016802A2 BR 112018016802 A BR112018016802 A BR 112018016802A BR 112018016802 A BR112018016802 A BR 112018016802A BR 112018016802 A2 BR112018016802 A2 BR 112018016802A2
Authority
BR
Brazil
Prior art keywords
aqueous medium
elements
electrochemical deposition
metal
atm
Prior art date
Application number
BR112018016802A
Other languages
English (en)
Inventor
Nulwala Hunaid
D Watkins John
Zhou Xu
Original Assignee
Lumishield Tech Incorporated
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lumishield Tech Incorporated filed Critical Lumishield Tech Incorporated
Publication of BR112018016802A2 publication Critical patent/BR112018016802A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/42—Electroplating: Baths therefor from solutions of light metals
    • C25D3/44—Aluminium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/16—Electroplating with layers of varying thickness
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

a presente invenção refere-se a um método para a eletrodeposição de ao menos um metal sobre uma superfície de um substrato condutor. em algumas modalidades, a eletrodeposição é conduzida em uma temperatura de aproximadamente 10º c a aproximadamente 70º c, aproximadamente 0,5 atm a aproximadamente 5 atm, em uma atmosfera compreendendo oxigênio. em algumas modalidades, o método compreende eletrodepositar ao menos um metal através de redução eletroquímica de um complexo metálico dissolvido em um meio substancialmente aquoso.
BR112018016802A 2016-02-16 2016-02-16 deposição eletroquímica de elementos em meio aquoso BR112018016802A2 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2016/018050 WO2017142513A1 (en) 2016-02-16 2016-02-16 Electrochemical deposition of elements in aqueous media

Publications (1)

Publication Number Publication Date
BR112018016802A2 true BR112018016802A2 (pt) 2018-12-26

Family

ID=55442889

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112018016802A BR112018016802A2 (pt) 2016-02-16 2016-02-16 deposição eletroquímica de elementos em meio aquoso

Country Status (13)

Country Link
US (1) US20190256994A1 (pt)
EP (1) EP3417097B1 (pt)
JP (1) JP6718509B2 (pt)
KR (1) KR102174846B1 (pt)
CN (1) CN108779566A (pt)
AU (1) AU2016393673B2 (pt)
BR (1) BR112018016802A2 (pt)
CA (1) CA3009779C (pt)
ES (1) ES2877331T3 (pt)
IL (1) IL260354A (pt)
MX (1) MX2018007193A (pt)
PL (1) PL3417097T3 (pt)
WO (1) WO2017142513A1 (pt)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MX2019014278A (es) 2017-06-01 2021-02-09 Lumishield Tech Incorporated Métodos y composiciones para deposición electroquímica de capas ricas en metal en soluciones acuosas.
US20220127744A1 (en) * 2019-02-01 2022-04-28 Lumishield Technologies Incorporated Methods and Compositions for Improved Adherence of Organic Coatings to Materials
CN111636078B (zh) * 2020-07-24 2023-11-10 宁波革创新材料科技有限公司 一种水性电镀多孔铝的方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR529229A (fr) * 1920-07-27 1921-11-25 Noren Leonie Procédé permettant de recouvrir d'une couche d'aluminium, un fil ou autre objet en cuivre
DE2453829C2 (de) * 1974-11-13 1983-04-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Additiven und ihre Verwendung als Glanzbildner
US4601958A (en) 1984-09-26 1986-07-22 Allied Corporation Plated parts and their production
EP0786539A2 (en) * 1996-01-26 1997-07-30 Elf Atochem North America, Inc. High current density zinc organosulfonate electrogalvanizing process and composition
JP3039374B2 (ja) * 1996-05-30 2000-05-08 住友金属工業株式会社 耐燃料腐食性に優れためっき鋼板
EP1162289A1 (en) * 2000-06-08 2001-12-12 Lucent Technologies Inc. Palladium electroplating bath and process for electroplating
US6911068B2 (en) * 2001-10-02 2005-06-28 Shipley Company, L.L.C. Plating bath and method for depositing a metal layer on a substrate
US7371467B2 (en) * 2002-01-08 2008-05-13 Applied Materials, Inc. Process chamber component having electroplated yttrium containing coating
CN1788112B (zh) * 2003-05-12 2012-01-11 阿科玛股份有限公司 高纯度的电解磺酸溶液
CN100547694C (zh) * 2003-05-19 2009-10-07 阿科玛股份有限公司 锌镧系磺酸电解质
KR100855531B1 (ko) * 2004-04-13 2008-09-01 어플라이드 머티어리얼스, 인코포레이티드 전기 도금된 이트륨 함유 코팅을 갖는 프로세스 챔버 요소
US20080257744A1 (en) * 2007-04-19 2008-10-23 Infineon Technologies Ag Method of making an integrated circuit including electrodeposition of aluminium
US20120055612A1 (en) * 2010-09-02 2012-03-08 International Business Machines Corporation Electrodeposition methods of gallium and gallium alloy films and related photovoltaic structures
JP2014156614A (ja) * 2011-04-11 2014-08-28 Hitachi Ltd 電気アルミニウムめっき液
US20130310569A1 (en) 2012-05-21 2013-11-21 Hunaid Nulwala Triazolide based ionic liquids
US8753761B2 (en) * 2012-07-27 2014-06-17 Sun Catalytix Corporation Aqueous redox flow batteries comprising metal ligand coordination compounds
FR3008718B1 (fr) * 2013-07-16 2016-12-09 Snecma Procede de fabrication d'une sous-couche metallique a base de platine sur un substrat metallique
US20150122661A1 (en) * 2013-11-05 2015-05-07 Rohm And Haas Electronic Materials Llc Plating bath and method
US20170073831A1 (en) * 2014-02-21 2017-03-16 Nihon Parkerizing Co., Ltd. Composition for direct-current cathodic electrolysis, lubrication-film-equipped metal material, and production method therefor
WO2016004189A1 (en) * 2014-07-03 2016-01-07 Nulwala Hunaid B Selected compositions for aluminum processes and devices

Also Published As

Publication number Publication date
KR20180107101A (ko) 2018-10-01
PL3417097T3 (pl) 2021-11-02
AU2016393673A1 (en) 2018-06-28
EP3417097B1 (en) 2021-04-07
KR102174846B1 (ko) 2020-11-05
CA3009779A1 (en) 2017-08-24
JP2019505665A (ja) 2019-02-28
US20190256994A1 (en) 2019-08-22
WO2017142513A1 (en) 2017-08-24
EP3417097A1 (en) 2018-12-26
MX2018007193A (es) 2018-08-23
ES2877331T3 (es) 2021-11-16
CA3009779C (en) 2021-03-23
JP6718509B2 (ja) 2020-07-08
AU2016393673B2 (en) 2020-04-30
CN108779566A (zh) 2018-11-09
IL260354A (en) 2018-08-30

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Legal Events

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B350 Update of information on the portal [chapter 15.35 patent gazette]
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]

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