BR112013021546A2 - fonte de evaporação do arco - Google Patents

fonte de evaporação do arco

Info

Publication number
BR112013021546A2
BR112013021546A2 BR112013021546A BR112013021546A BR112013021546A2 BR 112013021546 A2 BR112013021546 A2 BR 112013021546A2 BR 112013021546 A BR112013021546 A BR 112013021546A BR 112013021546 A BR112013021546 A BR 112013021546A BR 112013021546 A2 BR112013021546 A2 BR 112013021546A2
Authority
BR
Brazil
Prior art keywords
target
evaporation source
arc evaporation
magnet
magnetic pole
Prior art date
Application number
BR112013021546A
Other languages
English (en)
Other versions
BR112013021546B1 (pt
Inventor
Kenji Yamamoto
Shinichi Tanifuji
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2011118267A external-priority patent/JP5081315B2/ja
Priority claimed from JP2011180544A external-priority patent/JP5081320B2/ja
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Publication of BR112013021546A2 publication Critical patent/BR112013021546A2/pt
Publication of BR112013021546B1 publication Critical patent/BR112013021546B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3452—Magnet distribution

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Spectroscopy & Molecular Physics (AREA)

Abstract

resumo patente de invenção: "fonte de evaporação do arco". a presente invenção refere-se a uma fonte de evaporação do arco (101) de acordo com uma modalidade da presente invenção que compreende: um magneto circunferencial conformado em aro (103) que é então disposto para circundar a circunferência externa de um alvo (102) ao longo de uma direção em que a direção de magnetização se torna paralela à superfície frontal do alvo; e um magneto da superfície traseira (104) que está disposto na lateral da superfície traseira do alvo (102) ao longo de uma direção em que a direção de magnetização se torna perpendicular à superfície frontal do alvo. o polo magnético do magneto circunferencial (103) na lateral interna na direção radial e o polo magnético do magneto da superfície traseira (104) na lateral do alvo (102) têm a mesma polaridade um ao outro.
BR112013021546-1A 2011-02-23 2012-02-23 fonte de evaporação do arco BR112013021546B1 (pt)

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP2011037094 2011-02-23
JP2011037095 2011-02-23
JP2011-037094 2011-02-23
JP2011-037095 2011-02-23
JP2011097162 2011-04-25
JP2011-097162 2011-04-25
JP2011118267A JP5081315B2 (ja) 2011-02-23 2011-05-26 アーク式蒸発源
JP2011-118267 2011-05-26
JP2011-180544 2011-08-22
JP2011180544A JP5081320B2 (ja) 2011-02-23 2011-08-22 アーク式蒸発源
PCT/JP2012/054451 WO2012115203A1 (ja) 2011-02-23 2012-02-23 アーク式蒸発源

Publications (2)

Publication Number Publication Date
BR112013021546A2 true BR112013021546A2 (pt) 2016-11-01
BR112013021546B1 BR112013021546B1 (pt) 2020-10-27

Family

ID=49111783

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112013021546-1A BR112013021546B1 (pt) 2011-02-23 2012-02-23 fonte de evaporação do arco

Country Status (10)

Country Link
US (2) US20130327642A1 (pt)
EP (1) EP2679702B1 (pt)
KR (4) KR20150103383A (pt)
CN (1) CN103392026B (pt)
BR (1) BR112013021546B1 (pt)
CA (1) CA2824749C (pt)
IL (2) IL227683B (pt)
MX (1) MX363412B (pt)
PT (1) PT2679702T (pt)
WO (1) WO2012115203A1 (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5946337B2 (ja) * 2012-06-20 2016-07-06 株式会社神戸製鋼所 アーク式蒸発源
JP6403269B2 (ja) * 2014-07-30 2018-10-10 株式会社神戸製鋼所 アーク蒸発源
CN111032907A (zh) * 2017-08-21 2020-04-17 堺显示器制品株式会社 蒸镀装置、蒸镀方法以及有机el显示装置的制造方法
JP7461367B2 (ja) * 2019-02-28 2024-04-03 エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト，プフェフィコーン パルス型カソードアーク堆積

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2537210B2 (ja) * 1986-09-18 1996-09-25 株式会社東芝 高密度プラズマの発生装置
JPH02232364A (ja) * 1989-03-02 1990-09-14 Kobe Steel Ltd 真空アーク蒸着装置
JPH04236770A (ja) * 1991-01-17 1992-08-25 Kobe Steel Ltd 真空アーク蒸着のアークスポットの制御方法及び蒸発源
CN1103677A (zh) * 1994-09-05 1995-06-14 北京电炉厂 大面积可控电弧蒸发源
JP3287163B2 (ja) 1995-01-23 2002-05-27 日新電機株式会社 アーク式蒸発源
KR970002891A (ko) * 1995-06-28 1997-01-28 배순훈 브이씨알 헤드의 박막 증착용 스퍼터링 장치
JPH11269634A (ja) 1998-03-20 1999-10-05 Kobe Steel Ltd 真空アーク蒸発源
TWI242049B (en) * 1999-01-14 2005-10-21 Kobe Steel Ltd Vacuum arc evaporation source and vacuum arc vapor deposition apparatus
JP2004523658A (ja) 2001-03-27 2004-08-05 フンダシオン テクニケル 大きい表面領域を有するターゲットのための強力な磁気ガイドを伴うアーク蒸着装置
JP2003342717A (ja) * 2002-05-27 2003-12-03 Mitsubishi Materials Kobe Tools Corp 真空アーク方式蒸着装置及びこれを用いた成膜方法
JP4548666B2 (ja) * 2005-08-26 2010-09-22 株式会社不二越 アーク式イオンプレーティング装置用蒸発源
RU2448388C2 (ru) * 2006-05-16 2012-04-20 Эрликон Трейдинг Аг, Трюббах Электродуговой источник и магнитное приспособление
JP2009024230A (ja) * 2007-07-20 2009-02-05 Kobe Steel Ltd スパッタリング装置
WO2009066633A1 (ja) * 2007-11-21 2009-05-28 Kabushiki Kaisha Kobe Seiko Sho アークイオンプレーティング装置用の蒸発源及びアークイオンプレーティング装置
JP2009144236A (ja) 2007-11-21 2009-07-02 Kobe Steel Ltd アークイオンプレーティング装置用の蒸発源及びアークイオンプレーティング装置
US8016982B2 (en) 2007-11-30 2011-09-13 Panasonic Corporation Sputtering apparatus and sputtering method
JP4526582B2 (ja) * 2007-11-30 2010-08-18 パナソニック株式会社 スパッタリング装置およびスパッタリング方法
JP5649308B2 (ja) 2009-04-28 2015-01-07 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法

Also Published As

Publication number Publication date
US10982318B2 (en) 2021-04-20
KR20130121955A (ko) 2013-11-06
CA2824749C (en) 2016-04-26
MX363412B (es) 2019-03-22
BR112013021546B1 (pt) 2020-10-27
EP2679702A1 (en) 2014-01-01
CA2824749A1 (en) 2012-08-30
MX2013009737A (es) 2014-01-31
IL249382A0 (en) 2017-02-28
IL227683B (en) 2018-03-29
IL227683A0 (en) 2013-09-30
EP2679702B1 (en) 2020-01-22
PT2679702T (pt) 2020-02-14
US20180371605A1 (en) 2018-12-27
KR20150103384A (ko) 2015-09-10
WO2012115203A1 (ja) 2012-08-30
CN103392026A (zh) 2013-11-13
CN103392026B (zh) 2016-04-06
IL249382B (en) 2018-01-31
KR20150103382A (ko) 2015-09-10
EP2679702A4 (en) 2016-03-02
US20130327642A1 (en) 2013-12-12
KR20150103383A (ko) 2015-09-10

Similar Documents

Publication Publication Date Title
BR112014032995A2 (pt) canaleta de arco de corrente contínua e aparelho disjuntor de corrente contínua bi-direcional
ES2543155T3 (es) Bucle de sujeción magnética con imanes permanentes y con bloqueo mecánico
BR112014026878A2 (pt) mecanismo de operação e comutador de energia provido com o mecanismo de operação
BR112013021546A2 (pt) fonte de evaporação do arco
ES2652141T3 (es) Configuración magnética modificable para fuentes de evaporación por arco
BR112013005959A2 (pt) "rotor para máquina de polo modulado"
CO2019002017A2 (es) Agentes de iarn para infección causada por el virus de la hepatitis b
BR112012024767A2 (pt) rotor de uma máquina elétrica com magnetos permanentes embutidos e máquina elétrica
BR112013026357A2 (pt) arranjo de focalização de fluxo para imãs permanentes, métodos para fabricar estes arranjos, e máquinas que incluem estes arranjos
BR112012028103A2 (pt) dispositivo de comutação eletromagneticamente operados e métodos de atuação dos mesmos.
BR112012017740A2 (pt) rotor para máquina de polo modulado.
BR112014020246A8 (pt) Dispositivo eletro medicinal
IN2014CN03489A (pt)
MY162696A (en) Magnetic field downhole tool attachment
BR112015018598A2 (pt) fonte de plasma
BR112013032940A2 (pt) aspergidor com imãs repelentes
JP2011202217A5 (pt)
BR112014013071A2 (pt) máquinas elétricas e rotores de máquinas elétricas
BR112012033702A2 (pt) módulo de placa de cobertura de imãs para geradores, disposição, procedimento de montagem e desmontagem do mesmo.
BR112014017667A8 (pt) Gerador de campo magnético para aparelho térmico magnetocalórico
BR112012033035A2 (pt) fonte de arco de evaporação com velocidade rápida de formação de película, dispositivo de formação de película e método da fabricação de película de revestimento usando a fonte de arco de evaporação
BRPI1014811A8 (pt) Disposição para fixar um imã permanente em um rotor de uma máquina elétrica e rotor de uma máquina elétrica
BR112015024814A2 (pt) máquina de pólo modulada de comutação de fluxo
MX337713B (es) Modulo de imanes para un aparato medidor de caudal magnetico nuclear.
GB2527439A (en) System for reducing thermal shield vibrations

Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 23/02/2012, OBSERVADAS AS CONDICOES LEGAIS.