BR0311284A - agentes geradores de ácido selecionado e seu uso em processos para elementos sensìveis à radiação por formação de imagem - Google Patents

agentes geradores de ácido selecionado e seu uso em processos para elementos sensìveis à radiação por formação de imagem

Info

Publication number
BR0311284A
BR0311284A BRPI0311284-5A BR0311284A BR0311284A BR 0311284 A BR0311284 A BR 0311284A BR 0311284 A BR0311284 A BR 0311284A BR 0311284 A BR0311284 A BR 0311284A
Authority
BR
Brazil
Prior art keywords
unsubstituted
processes
imaging
generating agents
sensitive elements
Prior art date
Application number
BRPI0311284-5A
Other languages
English (en)
Inventor
Ting Tao
Jianbing Huang
Original Assignee
Kodak Polychrome Graphics Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Llc filed Critical Kodak Polychrome Graphics Llc
Publication of BR0311284A publication Critical patent/BR0311284A/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C245/00—Compounds containing chains of at least two nitrogen atoms with at least one nitrogen-to-nitrogen multiple bond
    • C07C245/20—Diazonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C305/00—Esters of sulfuric acids
    • C07C305/02—Esters of sulfuric acids having oxygen atoms of sulfate groups bound to acyclic carbon atoms of a carbon skeleton
    • C07C305/04—Esters of sulfuric acids having oxygen atoms of sulfate groups bound to acyclic carbon atoms of a carbon skeleton being acyclic and saturated
    • C07C305/06—Hydrogenosulfates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/266—Polyurethanes; Polyureas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

"AGENTES GERADORES DE áCIDO SELECIONADO E SEU USO EM PROCESSOS PARA ELEMENTOS SENSìVEIS à RADIAçãO POR FORMAçãO DE IMAGEM". A presente invenção refere-se a um agente gerador de ácido util para formação de imagem de elementos fotossensíveis, o agente gerador de ácido tem a fórmula(I), (II) ou (III) em que: R¬ 1¬ é um grupo hidrocarboneto ou arila não-substituído ou substituído, X é oxigênio, enxofre ou selênio, Y e enxofre, selênio ou telúrio, Ar¬ 1¬ é um grupo arila não-substituído ou substituído, R¬ 2¬, R¬ 3¬ e R¬ 4¬ são cada qual independentemente, um grupo hidrocarboneto ou arila não-substituído ou substituído ou quaisquer dois de R¬ 2¬, R¬ 3¬ e R¬ 4¬ são ligados juntos para formar uma estrutura em anel, e R¬ 5¬ e R¬ 6¬ são cada qual, independentemente selecionados de um grupo hidrocarboneto ou arila não-substituído ou substituído, ou R¬ 5¬ e R¬ 6¬ são ligados entre si para formar uma estrutura de anel.
BRPI0311284-5A 2002-05-24 2003-05-22 agentes geradores de ácido selecionado e seu uso em processos para elementos sensìveis à radiação por formação de imagem BR0311284A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/155,696 US6787281B2 (en) 2002-05-24 2002-05-24 Selected acid generating agents and their use in processes for imaging radiation-sensitive elements
PCT/US2003/016118 WO2004036314A2 (en) 2002-05-24 2003-05-22 Acid generating agents and their use in processes for imaging radiation-sensitive elements

Publications (1)

Publication Number Publication Date
BR0311284A true BR0311284A (pt) 2007-04-27

Family

ID=29549144

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0311284-5A BR0311284A (pt) 2002-05-24 2003-05-22 agentes geradores de ácido selecionado e seu uso em processos para elementos sensìveis à radiação por formação de imagem

Country Status (6)

Country Link
US (1) US6787281B2 (pt)
EP (1) EP1508072A2 (pt)
JP (1) JP2005536781A (pt)
CN (1) CN100474110C (pt)
BR (1) BR0311284A (pt)
WO (1) WO2004036314A2 (pt)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
KR100804873B1 (ko) 1999-06-10 2008-02-20 얼라이드시그날 인코퍼레이티드 포토리소그래피용 ｓｏｇ 반사방지 코팅
CN1606713B (zh) 2001-11-15 2011-07-06 霍尼韦尔国际公司 用于照相平版印刷术的旋涂抗反射涂料
US20040137370A1 (en) * 2003-01-09 2004-07-15 Collins Jeffrey J. Method and apparatus for processing of radiation-sensitive patterning compositions
US7045269B2 (en) 2003-03-10 2006-05-16 Eastman Kodak Company Method for forming images using negative working imageable elements
US6908726B2 (en) * 2003-04-07 2005-06-21 Kodak Polychrome Graphics Llc Thermally imageable elements imageable at several wavelengths
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US7306897B2 (en) * 2004-02-12 2007-12-11 Konica Minolta Medical & Graphic, Inc. Preparation method of printing plate material and printing plate material
US7685738B2 (en) * 2005-02-04 2010-03-30 Printing Research, Inc. Computer to plate color sensor and drying/curing system and method
US7225560B2 (en) * 2005-02-04 2007-06-05 Printing Research, Inc. Computer to plate curing system
US7541131B2 (en) * 2005-02-18 2009-06-02 Fujifilm Corporation Resist composition, compound for use in the resist composition and pattern forming method using the resist composition
US7790814B2 (en) * 2005-04-05 2010-09-07 Delphi Technologies, Inc. Radiopaque polymers for circuit board assembly
US7279255B2 (en) * 2006-02-07 2007-10-09 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
US7226709B1 (en) 2006-06-20 2007-06-05 Eastman Kodak Company Digital mask-forming film and method of use
US7704670B2 (en) 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US7300726B1 (en) 2006-10-20 2007-11-27 Eastman Kodak Company Multi-layer imageable element with improved properties
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
KR101523393B1 (ko) 2007-02-27 2015-05-27 이엠디 퍼포먼스 머티리얼스 코프. 규소를 주성분으로 하는 반사 방지 코팅 조성물
US7862984B2 (en) 2007-03-28 2011-01-04 Eastman Kodak Company Polyonium borates and radiation-sensitive composition and imageable elements containing same
US7781143B2 (en) 2007-05-31 2010-08-24 Eastman Kodak Company Negative-working imageable elements and methods of use
US7799504B2 (en) 2007-06-05 2010-09-21 Eastman Kodak Company Mask film to form relief images and method of use
US20080311520A1 (en) * 2007-06-13 2008-12-18 Jianfei Yu On-press developable negative-working imageable elements and methods of use
EP2098367A1 (en) 2008-03-05 2009-09-09 Eastman Kodak Company Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates
US8084182B2 (en) 2008-04-29 2011-12-27 Eastman Kodak Company On-press developable elements and methods of use
US20100151385A1 (en) 2008-12-17 2010-06-17 Ray Kevin B Stack of negative-working imageable elements
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8293451B2 (en) * 2009-08-18 2012-10-23 International Business Machines Corporation Near-infrared absorbing film compositions
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
US8426104B2 (en) 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
US20110097666A1 (en) 2009-10-27 2011-04-28 Celin Savariar-Hauck Lithographic printing plate precursors
US8936899B2 (en) 2012-09-04 2015-01-20 Eastman Kodak Company Positive-working lithographic printing plate precursors and use
CN102482310B (zh) 2009-10-29 2015-08-19 米兰集团 用于平版印刷版涂料组合物的棓单宁类化合物
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
US20110236832A1 (en) 2010-03-26 2011-09-29 Celin Savariar-Hauck Lithographic processing solutions and methods of use
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US8900798B2 (en) 2010-10-18 2014-12-02 Eastman Kodak Company On-press developable lithographic printing plate precursors
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120141942A1 (en) 2010-12-03 2012-06-07 Domenico Balbinot Method of preparing lithographic printing plates
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
EP2678311A1 (en) * 2011-02-23 2014-01-01 Basf Se Sulfonium sulfates, their preparation and use
US8530142B2 (en) 2011-03-15 2013-09-10 Eastman Kodak Company Flexographic printing plate precursor, imaging assembly, and use
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US8703381B2 (en) 2011-08-31 2014-04-22 Eastman Kodak Company Lithographic printing plate precursors for on-press development
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
CN104379628B (zh) * 2012-04-19 2016-11-16 巴斯夫欧洲公司 锍化合物、其制备及其用途
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
US8945813B2 (en) 2013-04-18 2015-02-03 Eastman Kodak Company Mask forming imageable material and use
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
US20170021656A1 (en) 2015-07-24 2017-01-26 Kevin Ray Lithographic imaging and printing with negative-working photoresponsive printing members
US20170217149A1 (en) 2016-01-28 2017-08-03 Eastman Kodak Company Negatively-working lithographic printing plate precursor and method
CN106313870B (zh) 2016-08-19 2018-06-15 浙江康尔达新材料股份有限公司 一种可成像涂层、热敏阴图平版印刷版及其制版方法
CN115079517A (zh) 2017-11-30 2022-09-20 罗门哈斯电子材料有限责任公司 盐和包含其的光致抗蚀剂
CN109856911B (zh) * 2017-11-30 2023-10-27 罗门哈斯电子材料有限责任公司 盐和包含其的光致抗蚀剂
TWI733069B (zh) 2017-12-31 2021-07-11 美商羅門哈斯電子材料有限公司 單體、聚合物及包含其的微影組合物
EP3752885A1 (en) 2018-02-16 2020-12-23 Miraclon Corporation Mask element precursor and relief image - forming system
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates
EP4101830A1 (en) 2021-06-10 2022-12-14 FEW Chemicals GmbH Novel diaryliodonium salt mixtures as low molecular weight photoinitiators with minimized crystallization behavior and elevated solubility

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4708925A (en) 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
US5085972A (en) 1990-11-26 1992-02-04 Minnesota Mining And Manufacturing Company Alkoxyalkyl ester solubility inhibitors for phenolic resins
US5550004A (en) * 1992-05-06 1996-08-27 Ocg Microelectronic Materials, Inc. Chemically amplified radiation-sensitive composition
JPH0641215A (ja) * 1992-07-23 1994-02-15 Nippon Kayaku Co Ltd カチオン発生剤溶液
JPH06199770A (ja) * 1992-12-28 1994-07-19 Japan Synthetic Rubber Co Ltd 新規オニウム塩およびそれを含有する感放射線性樹脂 組成物
US5314747A (en) * 1993-03-19 1994-05-24 Xerox Corporation Recording sheets containing cationic sulfur compounds
US5372915A (en) 1993-05-19 1994-12-13 Eastman Kodak Company Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
US5814431A (en) 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
JP3613491B2 (ja) 1996-06-04 2005-01-26 富士写真フイルム株式会社 感光性組成物
JP3645362B2 (ja) 1996-07-22 2005-05-11 富士写真フイルム株式会社 ネガ型画像記録材料
JPH10171108A (ja) 1996-10-07 1998-06-26 Konica Corp 画像形成材料及び画像形成方法
US6042987A (en) 1996-10-16 2000-03-28 Fuji Photo Film Co., Ltd Negative type image recording material
US5919601A (en) 1996-11-12 1999-07-06 Kodak Polychrome Graphics, Llc Radiation-sensitive compositions and printing plates
US6077641A (en) 1997-01-17 2000-06-20 Kodak Polychrome Graphics Llc Lithographic plates
JP3798504B2 (ja) 1997-04-21 2006-07-19 富士写真フイルム株式会社 ネガ型画像記録材料
JP3805519B2 (ja) 1997-08-29 2006-08-02 富士写真フイルム株式会社 画像記録材料
US6291129B1 (en) * 1997-08-29 2001-09-18 Kabushiki Kaisha Toshiba Monomer, high molecular compound and photosensitive composition
BR9901906B1 (pt) 1998-09-21 2008-11-18 composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares.
US6096124A (en) * 1999-04-27 2000-08-01 Xerox Corporation Ink compositions
WO2001040167A1 (fr) * 1999-12-03 2001-06-07 Toyo Gosei Kogyo Co., Ltd. Procede de production de derive de sel d'onium et nouveau derive de sel d'onium
DE60133929D1 (de) 2000-12-04 2008-06-19 Ciba Holding Inc Oniumsalze und ihre verwendung als latente säuren

Also Published As

Publication number Publication date
WO2004036314A3 (en) 2004-10-07
US20030219673A1 (en) 2003-11-27
CN100474110C (zh) 2009-04-01
CN1656426A (zh) 2005-08-17
JP2005536781A (ja) 2005-12-02
WO2004036314A2 (en) 2004-04-29
EP1508072A2 (en) 2005-02-23
US6787281B2 (en) 2004-09-07

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B06A Notification to applicant to reply to the report for non-patentability or inadequacy of the application [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B11D Dismissal acc. art. 38, par 2 of ipl - failure to pay fee after grant in time