BR9901906B1 - composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares. - Google Patents

composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares.

Info

Publication number
BR9901906B1
BR9901906B1 BRPI9901906-0A BR9901906A BR9901906B1 BR 9901906 B1 BR9901906 B1 BR 9901906B1 BR 9901906 A BR9901906 A BR 9901906A BR 9901906 B1 BR9901906 B1 BR 9901906B1
Authority
BR
Brazil
Prior art keywords
coating composition
lithographic printing
printing plates
radiation sensitive
sensitive coating
Prior art date
Application number
BRPI9901906-0A
Other languages
English (en)
Other versions
BR9901906A (pt
Inventor
Andre Luiz Arias
Luiz Nei Arias
Marjorie Arias
Mario Italo Provenzano
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to BRPI9901906-0A priority Critical patent/BR9901906B1/pt
Priority to US09/787,667 priority patent/US6933093B1/en
Priority to JP2000571311A priority patent/JP2002525682A/ja
Priority to PCT/BR1999/000079 priority patent/WO2000017711A1/en
Priority to EP99947142A priority patent/EP1116073A1/en
Priority to AU60727/99A priority patent/AU6072799A/en
Publication of BR9901906A publication Critical patent/BR9901906A/pt
Publication of BR9901906B1 publication Critical patent/BR9901906B1/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D161/00Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
    • C09D161/04Condensation polymers of aldehydes or ketones with phenols only
    • C09D161/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M7/00After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock
    • B41M7/0027After-treatment of prints, e.g. heating, irradiating, setting of the ink, protection of the printed stock using protective coatings or layers by lamination or by fusion of the coatings or layers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
BRPI9901906-0A 1998-09-21 1999-04-19 composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares. BR9901906B1 (pt)

Priority Applications (6)

Application Number Priority Date Filing Date Title
BRPI9901906-0A BR9901906B1 (pt) 1998-09-21 1999-04-19 composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares.
US09/787,667 US6933093B1 (en) 1998-09-21 1999-09-21 Radiation sensitive coating composition useful for lithographic printing plates and the like
JP2000571311A JP2002525682A (ja) 1998-09-21 1999-09-21 リソグラフィー印刷プレート等に有用な放射線感受性コーティング組成物
PCT/BR1999/000079 WO2000017711A1 (en) 1998-09-21 1999-09-21 Radiation sensitive coating composition useful for lithographic printing plates and the like
EP99947142A EP1116073A1 (en) 1998-09-21 1999-09-21 Radiation sensitive coating composition useful for lithographic printing plates and the like
AU60727/99A AU6072799A (en) 1998-09-21 1999-09-21 Radiation sensitive coating composition useful for lithographic printing plates and the like

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
BR9803946 1998-09-21
BRPI9901906-0A BR9901906B1 (pt) 1998-09-21 1999-04-19 composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares.

Publications (2)

Publication Number Publication Date
BR9901906A BR9901906A (pt) 2002-06-04
BR9901906B1 true BR9901906B1 (pt) 2008-11-18

Family

ID=25665099

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI9901906-0A BR9901906B1 (pt) 1998-09-21 1999-04-19 composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares.

Country Status (6)

Country Link
US (1) US6933093B1 (pt)
EP (1) EP1116073A1 (pt)
JP (1) JP2002525682A (pt)
AU (1) AU6072799A (pt)
BR (1) BR9901906B1 (pt)
WO (1) WO2000017711A1 (pt)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7049046B2 (en) 2004-03-30 2006-05-23 Eastman Kodak Company Infrared absorbing compounds and their use in imageable elements
US6787281B2 (en) 2002-05-24 2004-09-07 Kodak Polychrome Graphics Llc Selected acid generating agents and their use in processes for imaging radiation-sensitive elements
US6977131B2 (en) 2002-05-30 2005-12-20 Kodak Polychrome Graphics Llc Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements
US6844139B2 (en) 2003-01-03 2005-01-18 Kodak Polychrome Graphics, Llc Method for forming a lithographic printing plate
US6790590B2 (en) 2003-01-27 2004-09-14 Kodak Polychrome Graphics, Llp Infrared absorbing compounds and their use in imageable elements
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
US7045269B2 (en) 2003-03-10 2006-05-16 Eastman Kodak Company Method for forming images using negative working imageable elements
US6902861B2 (en) 2003-03-10 2005-06-07 Kodak Polychrome Graphics, Llc Infrared absorbing compounds and their use in photoimageable elements
US6908726B2 (en) 2003-04-07 2005-06-21 Kodak Polychrome Graphics Llc Thermally imageable elements imageable at several wavelengths
US7371454B2 (en) 2003-12-15 2008-05-13 Eastman Kodak Company Imageable element comprising sulfated polymers
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
KR100995678B1 (ko) * 2008-09-01 2010-11-22 주식회사 코오롱 페놀 노볼락 수지, 페놀 노볼락 에폭시 수지 및 에폭시 수지 조성물
EP2194429A1 (en) 2008-12-02 2010-06-09 Eastman Kodak Company Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
EP2284005B1 (en) 2009-08-10 2012-05-02 Eastman Kodak Company Lithographic printing plate precursors with beta-hydroxy alkylamide crosslinkers
EP2293144B1 (en) 2009-09-04 2012-11-07 Eastman Kodak Company Method of drying lithographic printing plates after single-step-processing
KR101423171B1 (ko) * 2010-12-30 2014-07-25 제일모직 주식회사 하드마스크 조성물, 이를 사용한 패턴 형성 방법 및 상기 패턴을 포함하는 반도체 집적회로 디바이스

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5886101A (en) 1988-03-02 1999-03-23 E. I. Du Pont De Nemours And Company Solvent dispersible interpenetrating polymer networks
US4943511A (en) * 1988-08-05 1990-07-24 Morton Thiokol, Inc. High sensitivity mid and deep UV resist
EP0501433B1 (en) * 1991-02-28 1997-05-07 E.I. Du Pont De Nemours And Company Photosensitive compositions using solvent dispersible interpenetrating polymer networks
EP0611999B1 (en) 1993-02-08 1999-04-14 Hewlett-Packard Company Reusable positive-charging organic photoconductor containing phthalocyanine pigment and cross-linking binder
JP3434340B2 (ja) * 1994-03-29 2003-08-04 東京応化工業株式会社 高感度ポジ型ホトレジスト組成物
US5647036A (en) 1994-09-09 1997-07-08 Deacon Research Projection display with electrically-controlled waveguide routing
US5703710A (en) 1994-09-09 1997-12-30 Deacon Research Method for manipulating optical energy using poled structure
JPH09120157A (ja) * 1995-10-25 1997-05-06 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
US5804355A (en) 1996-03-14 1998-09-08 Agfa-Gevaert N.V. Producing a contone image by sequentially exposing a thermo-sensitive imaging material by means of a set of radiation beams
US5879861A (en) 1996-04-23 1999-03-09 Agfa-Gevaert, N.V. Method for making a lithographic printing plate wherein an imaging element is used that comprises a thermosensitive mask
KR100214271B1 (ko) 1996-06-29 1999-08-02 김영환 콘택홀용 위상 반전 마스크
US5814430A (en) 1996-09-23 1998-09-29 Agfa-Gevaert, N.V. Method for the formation of an improved heat mode image
US6042987A (en) * 1996-10-16 2000-03-28 Fuji Photo Film Co., Ltd Negative type image recording material
JPH10180976A (ja) 1996-11-05 1998-07-07 Mitsubishi Paper Mills Ltd 平版印刷版の製版方法
US5919601A (en) * 1996-11-12 1999-07-06 Kodak Polychrome Graphics, Llc Radiation-sensitive compositions and printing plates
US5948596A (en) 1997-05-27 1999-09-07 Kodak Polychrome Graphics Llc Digital printing plate comprising a thermal mask
US6022667A (en) 1997-05-27 2000-02-08 Agfa-Gevaert, N.V. Heat sensitive imaging element and a method for producing lithographic plates therewith
US6014929A (en) 1998-03-09 2000-01-18 Teng; Gary Ganghui Lithographic printing plates having a thin releasable interlayer overlying a rough substrate
US6562527B2 (en) * 2001-08-17 2003-05-13 Kodak Polychrome Graphics Llc Imaged members and method of preparation thereof

Also Published As

Publication number Publication date
BR9901906A (pt) 2002-06-04
JP2002525682A (ja) 2002-08-13
US6933093B1 (en) 2005-08-23
EP1116073A1 (en) 2001-07-18
WO2000017711A1 (en) 2000-03-30
AU6072799A (en) 2000-04-10

Similar Documents

Publication Publication Date Title
DE69804876D1 (de) Flachdruckplatte
DE69716721D1 (de) Lithographisches offsetdruckverfahren
BR9901906B1 (pt) composiÇço para revestimento sensÍvel a radiaÇço étil para chapas de impressço litogrÁfica e similares.
DE69410212D1 (de) Lithographische Druckplatten
DE69905098D1 (de) Fotoempfindliche Flachdruckplatte
DE69703378D1 (de) Photoempfindliche lithographische Druckplatte
DE59903941D1 (de) Offsetdruckwerk
BR9606209A (pt) Composição de revestimento e substrato termoplástico litográfico imprimível
DE69830382D1 (de) Sicheres Drucken
DE69805428D1 (de) Lithographiedruckplatten mit photothermischem umwandlungsmaterial
DK0679265T3 (da) Litografiske trykplader, der kan fremkaldes på trykkemaskinen
DE69719062D1 (de) Flachdruck
DE69703963D1 (de) Entwicklungsfreie Flachdruckplatte
DE69620614D1 (de) Trockenflachdruckplatten
DE69824942D1 (de) Blatttransportmechanismus
DE69712273D1 (de) Lichtempfindliche Zusammensetzung und lithographische Druckplatte unter Verwendung derselben
DE69400177D1 (de) Lithographische Druckplatte
FR2762545B1 (fr) Document fiduciaire revetu d'impressions de securite
DE69803084D1 (de) Vorsensibilisierte flachdruckplatten
DE69935097D1 (de) Schablonendrucker
DE69706870D1 (de) Flachdruckplatten
DE69511601D1 (de) Lichtempfindliche lithographische Druckplatte
DE69812817D1 (de) Positiv arbeitende lithographische Druckplatte
DE69518107D1 (de) Lichtempfindliche lithographische Druckplatte
DE69500801D1 (de) Lithographische Druckplatte

Legal Events

Date Code Title Description
B06A Notification to applicant to reply to the report for non-patentability or inadequacy of the application [chapter 6.1 patent gazette]
B06A Notification to applicant to reply to the report for non-patentability or inadequacy of the application [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted
B24C Patent annual fee: request for for restoration

Free format text: REFERENTE 11A. E 12A. ANUIDADE(S).

B24H Lapse because of non-payment of annual fees (definitively: art 78 iv lpi)
B24F Patent annual fee: publication cancelled

Free format text: ANULADA A PUBLICACAO CODIGO 24.8 NA RPI NO 2259 DE 22/04/2014 POR TER SIDO INDEVIDA.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE AS 11A E 12A ANUIDADES.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2607 DE 22-12-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.