BR0109167A - Processo e dispositivo para regulagem da concentração de ìons metálicos em um lìquido eletrolìtico, bem como aplicação do processo e uso do dispositivo - Google Patents
Processo e dispositivo para regulagem da concentração de ìons metálicos em um lìquido eletrolìtico, bem como aplicação do processo e uso do dispositivoInfo
- Publication number
- BR0109167A BR0109167A BR0109167-0A BR0109167A BR0109167A BR 0109167 A BR0109167 A BR 0109167A BR 0109167 A BR0109167 A BR 0109167A BR 0109167 A BR0109167 A BR 0109167A
- Authority
- BR
- Brazil
- Prior art keywords
- metal
- auxiliary
- regulating
- concentration
- well
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrolytic Production Of Metals (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
"PROCESSO E DISPOSITIVO PARA REGULAGEM DA CONCENTRAçãO DE ìONS METáLICOS EM UM LìQUIDO ELETROLìTICO, BEM COMO APLICAçãO DO PROCESSO E USO DO DISPOSITIVO". Para regulagem da concentração de íons metálicos em um líquido eletrolítico, que serve para a precipitação eletrolítica de metal e que contém, adicionalmente, materiais de um sistema de redox eletroquimicamente reversível, é conhecido guiar pelo menos uma parte do líquido eletrolítico por uma célula auxiliar 2, que apresenta um ânodo auxiliar 20 não solúvel e pelo menos um cátodo auxiliar 30, entre os quais é produzido um fluxo de corrente por aplicação de uma tensão. Desse modo, são reduzidas quantidades excessivas dos materiais oxidados do sistema de redox no cátodo auxiliar 30 e, desse modo, reduzida a formação de íons do metal a ser precipitado. Partindo disso, a presente invenção consiste no fato de usar como cátodo auxiliar fragmentos do metal 30 a ser precipitado.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10013339A DE10013339C1 (de) | 2000-03-17 | 2000-03-17 | Verfahren und Vorrichtung zum Regulieren der Konzentration von Metallionen in einer Elektrolytflüssigkeit sowie Anwendung des Verfahrens und Verwendung der Vorrichtung |
| PCT/DE2001/000748 WO2001068953A1 (de) | 2000-03-17 | 2001-02-23 | Verfahren und vorrichtung zum regulieren der konzentration von metallionen in einer elektrolytflüssigkeit sowie anwendung des verfahrens und verwendung der vorrichtung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR0109167A true BR0109167A (pt) | 2002-11-26 |
| BR0109167B1 BR0109167B1 (pt) | 2011-06-14 |
Family
ID=7635321
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0109167-0A BR0109167B1 (pt) | 2000-03-17 | 2001-02-23 | processo e dispositivo para regulagem da concentraÇço de Íons metÁlicos em um lÍquido eletrolÍtico. |
Country Status (17)
| Country | Link |
|---|---|
| US (1) | US6899803B2 (pt) |
| EP (1) | EP1264010B1 (pt) |
| JP (1) | JP4484414B2 (pt) |
| KR (1) | KR100740817B1 (pt) |
| CN (1) | CN1263900C (pt) |
| AT (1) | ATE296910T1 (pt) |
| AU (1) | AU4227801A (pt) |
| BR (1) | BR0109167B1 (pt) |
| CA (1) | CA2391038A1 (pt) |
| DE (2) | DE10013339C1 (pt) |
| DK (1) | DK1264010T3 (pt) |
| ES (1) | ES2242737T3 (pt) |
| HK (1) | HK1048145B (pt) |
| MX (1) | MXPA02008974A (pt) |
| MY (1) | MY127759A (pt) |
| TW (1) | TW557332B (pt) |
| WO (1) | WO2001068953A1 (pt) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003038158A2 (de) * | 2001-10-25 | 2003-05-08 | Infineon Technologies Ag | Galvanisiereinrichtung und galvanisiersystem zum beschichten von bereits leitfähig ausgebildeten strukturen |
| KR100861698B1 (ko) * | 2006-03-30 | 2008-11-11 | 삼두주식회사 | 금속 분말 제조장치 및 금속 분말 제조방법 |
| US7759124B2 (en) * | 2007-06-16 | 2010-07-20 | Crown Packaging Technology, Inc. | Blancher with automated process control |
| JP4957906B2 (ja) * | 2007-07-27 | 2012-06-20 | 上村工業株式会社 | 連続電気銅めっき方法 |
| EP2194165A1 (en) * | 2008-10-21 | 2010-06-09 | Rohm and Haas Electronic Materials LLC | Method for replenishing tin and its alloying metals in electrolyte solutions |
| US9404194B2 (en) | 2010-12-01 | 2016-08-02 | Novellus Systems, Inc. | Electroplating apparatus and process for wafer level packaging |
| KR101067694B1 (ko) * | 2011-05-20 | 2011-09-27 | 주식회사 삼원알텍 | 금속의 아노다이징 처리과정에서 발생되는 용존 구리의 처리 시스템 |
| KR101311274B1 (ko) | 2011-08-05 | 2013-09-25 | 주식회사 삼원알텍 | 금속의 아노다이징 처리과정에서 발생되는 용존 구리의 처리 시스템 |
| US9534308B2 (en) | 2012-06-05 | 2017-01-03 | Novellus Systems, Inc. | Protecting anodes from passivation in alloy plating systems |
| KR20140034529A (ko) * | 2012-09-12 | 2014-03-20 | 삼성전기주식회사 | 전기 동도금 장치 |
| US11180387B2 (en) | 2013-06-24 | 2021-11-23 | Thought Preserve, Llc | Voltage-controlled, hydrodynamically isolated, ion-generation apparatus and method |
| US10011505B2 (en) * | 2013-06-24 | 2018-07-03 | Thought Preserve, Llc | Hydrodynamically isolated, ion-generator apparatus and method |
| EP3168332B2 (en) | 2015-03-13 | 2023-07-26 | Okuno Chemical Industries Co., Ltd. | Use of a jig electrolytic stripper for removing palladium from an object and a method for removing palladium |
| US10227707B2 (en) * | 2015-07-17 | 2019-03-12 | Applied Materials, Inc. | Inert anode electroplating processor and replenisher |
| TWI615363B (zh) * | 2016-04-08 | 2018-02-21 | 科閎電子股份有限公司 | 降低電解液中至少一污染性陽離子濃度的方法 |
| EP3875642A1 (de) * | 2020-03-04 | 2021-09-08 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Verfahren zum aufbereiten eines spülwassers aus der leiterplatten- und/oder substrat-herstellung |
| KR102330351B1 (ko) * | 2021-07-23 | 2021-11-23 | 정채호 | 도금용 볼 공급장치 |
| EP4339165A1 (en) * | 2022-09-16 | 2024-03-20 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Separating a foreign metal from a process fluid, method and apparatus |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1062651A (en) * | 1976-05-11 | 1979-09-18 | Anthony P. Holko | Process and apparatus for electrowinning metal from metal bearing solutions |
| DD215589B5 (de) * | 1983-05-11 | 1994-06-01 | Heinz Dr Rer Nat Liebscher | Verfahren zur elektrolytischen Metallabscheidung bei erzwungener Konvektion |
| DD261613A1 (de) * | 1987-06-05 | 1988-11-02 | Leipzig Galvanotechnik | Verfahren zur elektrolytischen kupferabscheidung aus sauren elektrolyten mit dimensionsstabiler anode |
| GB8921439D0 (en) | 1989-09-22 | 1989-11-08 | Electricity Council | Improvements in or relating to the electrodeposition of zinc or zinc alloy coatings |
| JPH04191394A (ja) | 1990-11-26 | 1992-07-09 | Furukawa Electric Co Ltd:The | 銅被覆鋼線の製造方法 |
| DE4344387C2 (de) * | 1993-12-24 | 1996-09-05 | Atotech Deutschland Gmbh | Verfahren zur elektrolytischen Abscheidung von Kupfer und Anordnung zur Durchführung des Verfahrens |
| DE19736350C1 (de) * | 1997-08-21 | 1999-08-05 | Atotech Deutschland Gmbh | Verfahren zur Konzentrationsregulierung von Stoffen in Elektrolyten und Vorrichtung zur Durchführung des Verfahrens |
-
2000
- 2000-03-17 DE DE10013339A patent/DE10013339C1/de not_active Expired - Lifetime
-
2001
- 2001-02-23 US US10/169,797 patent/US6899803B2/en not_active Expired - Lifetime
- 2001-02-23 EP EP01915052A patent/EP1264010B1/de not_active Expired - Lifetime
- 2001-02-23 CN CNB01806700XA patent/CN1263900C/zh not_active Expired - Lifetime
- 2001-02-23 MX MXPA02008974A patent/MXPA02008974A/es active IP Right Grant
- 2001-02-23 DE DE50106389T patent/DE50106389D1/de not_active Expired - Lifetime
- 2001-02-23 DK DK01915052T patent/DK1264010T3/da active
- 2001-02-23 BR BRPI0109167-0A patent/BR0109167B1/pt not_active IP Right Cessation
- 2001-02-23 KR KR1020027008693A patent/KR100740817B1/ko active IP Right Grant
- 2001-02-23 AU AU42278/01A patent/AU4227801A/en not_active Abandoned
- 2001-02-23 AT AT01915052T patent/ATE296910T1/de active
- 2001-02-23 JP JP2001567828A patent/JP4484414B2/ja not_active Expired - Lifetime
- 2001-02-23 WO PCT/DE2001/000748 patent/WO2001068953A1/de active IP Right Grant
- 2001-02-23 ES ES01915052T patent/ES2242737T3/es not_active Expired - Lifetime
- 2001-02-23 CA CA002391038A patent/CA2391038A1/en not_active Abandoned
- 2001-02-26 TW TW090104321A patent/TW557332B/zh not_active IP Right Cessation
- 2001-03-13 MY MYPI20011136A patent/MY127759A/en unknown
-
2003
- 2003-01-07 HK HK03100184.3A patent/HK1048145B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| HK1048145B (zh) | 2005-07-29 |
| US20030000842A1 (en) | 2003-01-02 |
| US6899803B2 (en) | 2005-05-31 |
| TW557332B (en) | 2003-10-11 |
| DK1264010T3 (da) | 2005-08-29 |
| DE50106389D1 (de) | 2005-07-07 |
| KR100740817B1 (ko) | 2007-07-19 |
| CN1418265A (zh) | 2003-05-14 |
| BR0109167B1 (pt) | 2011-06-14 |
| DE10013339C1 (de) | 2001-06-13 |
| AU4227801A (en) | 2001-09-24 |
| JP4484414B2 (ja) | 2010-06-16 |
| JP2003527490A (ja) | 2003-09-16 |
| CN1263900C (zh) | 2006-07-12 |
| ATE296910T1 (de) | 2005-06-15 |
| MY127759A (en) | 2006-12-29 |
| ES2242737T3 (es) | 2005-11-16 |
| WO2001068953A1 (de) | 2001-09-20 |
| EP1264010B1 (de) | 2005-06-01 |
| CA2391038A1 (en) | 2001-09-20 |
| MXPA02008974A (es) | 2003-04-25 |
| EP1264010A1 (de) | 2002-12-11 |
| KR20020084086A (ko) | 2002-11-04 |
| HK1048145A1 (en) | 2003-03-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
| B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
| B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 14/06/2011, OBSERVADAS AS CONDICOES LEGAIS. |
|
| B21A | Patent or certificate of addition expired [chapter 21.1 patent gazette] |
Free format text: PATENTE EXTINTA EM 14.06.2021 |