BE509317A - - Google Patents

Info

Publication number
BE509317A
BE509317A BE509317DA BE509317A BE 509317 A BE509317 A BE 509317A BE 509317D A BE509317D A BE 509317DA BE 509317 A BE509317 A BE 509317A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE509317A publication Critical patent/BE509317A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • H01M4/70Carriers or collectors characterised by shape or form
    • H01M4/76Containers for holding the active material, e.g. tubes, capsules
    • H01M4/762Porous or perforated metallic containers
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/08Germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02373Group 14 semiconducting materials
    • H01L21/02381Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02524Group 14 semiconducting materials
    • H01L21/02532Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/0262Reduction or decomposition of gaseous compounds, e.g. CVD
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S118/00Coating apparatus
    • Y10S118/90Semiconductor vapor doping

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Materials Engineering (AREA)
  • Power Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Thermistors And Varistors (AREA)
BE509317D 1951-03-07 BE509317A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US214364A US2692839A (en) 1951-03-07 1951-03-07 Method of fabricating germanium bodies

Publications (1)

Publication Number Publication Date
BE509317A true BE509317A (nl) 1900-01-01

Family

ID=22798790

Family Applications (1)

Application Number Title Priority Date Filing Date
BE509317D BE509317A (nl) 1951-03-07

Country Status (7)

Country Link
US (1) US2692839A (nl)
BE (1) BE509317A (nl)
CH (1) CH305860A (nl)
DE (1) DE865160C (nl)
FR (1) FR1044870A (nl)
GB (1) GB692250A (nl)
NL (1) NL99536C (nl)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1140549B (de) * 1954-05-18 1962-12-06 Siemens Ag Verfahren zum Herstellen von reinstem kristallinem Germanium, Verbindungen von Elementen der ó¾. und ó§.oder ó�. und ó÷. Gruppe des Periodischen Systems und von oxydischem Halbleitermaterial
DE977684C (de) * 1953-03-25 1968-05-02 Siemens Ag Halbleiteranordnung

Families Citing this family (126)

* Cited by examiner, † Cited by third party
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US3123788A (en) * 1964-03-03 Piezoresistive gage
US3162556A (en) * 1953-01-07 1964-12-22 Hupp Corp Introduction of disturbance points in a cadmium sulfide transistor
GB778383A (en) * 1953-10-02 1957-07-03 Standard Telephones Cables Ltd Improvements in or relating to the production of material for semi-conductors
NL193073A (nl) * 1954-03-05
DE1057845B (de) * 1954-03-10 1959-05-21 Licentia Gmbh Verfahren zur Herstellung von einkristallinen halbleitenden Verbindungen
NL111118C (nl) * 1954-04-01
NL258754A (nl) * 1954-05-18 1900-01-01
US2964396A (en) * 1954-05-24 1960-12-13 Siemens Ag Producing semiconductor substances of highest purity
BE538469A (nl) * 1954-05-27
US2928761A (en) * 1954-07-01 1960-03-15 Siemens Ag Methods of producing junction-type semi-conductor devices
DE1228342B (de) * 1954-07-14 1966-11-10 Siemens Ag Diffusionsverfahren zum Dotieren einer Oberflaechenschicht von festen Halbleiterkoerpern
DE1107343B (de) * 1954-10-14 1961-05-25 Licentia Gmbh Verfahren zum Herstellen von elektrischen Halbleiteranordnungen
DE1185894B (de) * 1955-03-04 1965-01-21 Siemens Ag Verfahren zur Herstellung von Staeben aus hochreinem Titan oder Zirkon durch Abscheidung aus der Gasphase
NL107344C (nl) * 1955-03-23
NL212349A (nl) * 1955-04-22 1900-01-01
US2871149A (en) * 1955-05-02 1959-01-27 Sprague Electric Co Semiconductor method
BE548791A (nl) * 1955-06-20
US2895858A (en) * 1955-06-21 1959-07-21 Hughes Aircraft Co Method of producing semiconductor crystal bodies
DE1227433B (de) * 1955-07-28 1966-10-27 Siemens Ag Verfahren zum Einbau definierter Stoerstellen in Metall- oder Halbleiterschichten
DE1259838B (de) * 1955-08-16 1968-02-01 Siemens Ag Verfahren zum Herstellen von Halbleiterkristallen
NL109064C (nl) * 1955-10-24
US2827403A (en) * 1956-08-06 1958-03-18 Pacific Semiconductors Inc Method for diffusing active impurities into semiconductor materials
US2921905A (en) * 1956-08-08 1960-01-19 Westinghouse Electric Corp Method of preparing material for semiconductor applications
US2964435A (en) * 1957-03-27 1960-12-13 Mc Graw Edison Co Semiconductor devices and their manufacture
DE1048638B (de) * 1957-07-02 1959-01-15 Siemens &. Halske Aktiengesellschaft, Berlin und München Verfahren zur Herstellung von Halbleitereinkristallen, insbesondere von Silizium durch thermische Zersetzung oder Reduktion
US3003900A (en) * 1957-11-12 1961-10-10 Pacific Semiconductors Inc Method for diffusing active impurities into semiconductor materials
DE1198321B (de) * 1958-01-06 1965-08-12 Int Standard Electric Corp Verfahren zur Herstellung von Halbleitermaterial grosser Reinheit
NL123477C (nl) * 1958-05-16
NL244520A (nl) * 1958-10-23
DE1167987B (de) * 1958-12-09 1964-04-16 Siemens Ag Verfahren zum Herstellen einer Halbleiteranordnung
US3154439A (en) * 1959-04-09 1964-10-27 Sprague Electric Co Method for forming a protective skin for transistor
DE1227874B (de) * 1959-04-10 1966-11-03 Itt Ind Ges Mit Beschraenkter Verfahren zum Herstellen von n-dotierten Siliciumeinkristallen
DE1197989B (de) * 1959-04-27 1965-08-05 Siemens Ag Verfahren zum Herstellen einer Halbleiteranordnung
US3089788A (en) * 1959-05-26 1963-05-14 Ibm Epitaxial deposition of semiconductor materials
NL256300A (nl) * 1959-05-28 1900-01-01
BE620887A (nl) * 1959-06-18
US3089794A (en) * 1959-06-30 1963-05-14 Ibm Fabrication of pn junctions by deposition followed by diffusion
NL252532A (nl) * 1959-06-30 1900-01-01
NL244298A (nl) * 1959-10-13
NL256734A (nl) * 1959-10-28
US3082283A (en) * 1959-11-25 1963-03-19 Ibm Radiant energy responsive semiconductor device
US3133336A (en) * 1959-12-30 1964-05-19 Ibm Semiconductor device fabrication
US3234440A (en) * 1959-12-30 1966-02-08 Ibm Semiconductor device fabrication
US3190773A (en) * 1959-12-30 1965-06-22 Ibm Vapor deposition process to form a retrograde impurity distribution p-n junction formation wherein the vapor contains both donor and acceptor impurities
NL259447A (nl) * 1959-12-31
NL260906A (nl) * 1960-02-12
US3151006A (en) * 1960-02-12 1964-09-29 Siemens Ag Use of a highly pure semiconductor carrier material in a vapor deposition process
NL260907A (nl) * 1960-02-12
DE1162661B (de) * 1960-03-31 1964-02-06 Wacker Chemie Gmbh Verfahren zur gleichzeitigen und gleichmaessigen Dotierung
US3098774A (en) * 1960-05-02 1963-07-23 Mark Albert Process for producing single crystal silicon surface layers
US3096219A (en) * 1960-05-02 1963-07-02 Rca Corp Semiconductor devices
US3206406A (en) * 1960-05-09 1965-09-14 Merck & Co Inc Critical cooling rate in vapor deposition process to form bladelike semiconductor compound crystals
NL264555A (nl) * 1960-05-09
US3096209A (en) * 1960-05-18 1963-07-02 Ibm Formation of semiconductor bodies
NL258408A (nl) * 1960-06-10
NL265823A (nl) * 1960-06-13
NL266513A (nl) * 1960-07-01
NL268294A (nl) * 1960-10-10
US3131098A (en) * 1960-10-26 1964-04-28 Merck & Co Inc Epitaxial deposition on a substrate placed in a socket of the carrier member
NL270518A (nl) * 1960-11-30
US3232745A (en) * 1960-12-05 1966-02-01 Siemens Ag Producing rod-shaped semiconductor crystals
DE1419717A1 (de) * 1960-12-06 1968-10-17 Siemens Ag Monokristalliner Halbleiterkoerper und Verfahren zur Herstellung desselben
DE1254607B (de) * 1960-12-08 1967-11-23 Siemens Ag Verfahren zum Herstellen von einkristallinen Halbleiterkoerpoern aus der Gasphase
NL273009A (nl) * 1960-12-29
US3184348A (en) * 1960-12-30 1965-05-18 Ibm Method for controlling doping in vaporgrown semiconductor bodies
DE1464669B1 (de) * 1961-03-06 1971-02-04 Itt Ind Gmbh Deutsche Halbleiterdiode mit stark spannungsabhaengiger Kapazitaet
US3207635A (en) * 1961-04-19 1965-09-21 Ibm Tunnel diode and process therefor
US3210624A (en) * 1961-04-24 1965-10-05 Monsanto Co Article having a silicon carbide substrate with an epitaxial layer of boron phosphide
DE1141386B (de) * 1961-04-26 1962-12-20 Siemens Ag Verfahren zur Herstellung einer Halbleiteranordnung
NL275313A (nl) * 1961-05-10
NL284599A (nl) * 1961-05-26 1900-01-01
NL278620A (nl) * 1961-06-02 1900-01-01
DE1156176B (de) * 1961-06-09 1963-10-24 Siemens Ag Verfahren und Vorrichtung zur Herstellung von Halbleiteranordnungen durch einkristalline Abscheidung von Halbleitermaterial aus der Gasphase auf einen Traegerkristall
NL279828A (nl) * 1961-07-05
US3172792A (en) * 1961-07-05 1965-03-09 Epitaxial deposition in a vacuum onto semiconductor wafers through an in- teracttgn between the wafer and the support material
US3145125A (en) * 1961-07-10 1964-08-18 Ibm Method of synthesizing iii-v compound semiconductor epitaxial layers having a specified conductivity type without impurity additions
US3220380A (en) * 1961-08-21 1965-11-30 Merck & Co Inc Deposition chamber including heater element enveloped by a quartz workholder
FR1335282A (fr) * 1961-08-30 1963-08-16 Gen Electric Composés semi-conducteurs, procédés de préparation et de dépôt de ceux-ci, et dispositifs semi-conducteurs ainsi obtenus
US3170825A (en) * 1961-10-02 1965-02-23 Merck & Co Inc Delaying the introduction of impurities when vapor depositing an epitaxial layer on a highly doped substrate
US3261726A (en) * 1961-10-09 1966-07-19 Monsanto Co Production of epitaxial films
US3218203A (en) * 1961-10-09 1965-11-16 Monsanto Co Altering proportions in vapor deposition process to form a mixed crystal graded energy gap
US3312571A (en) * 1961-10-09 1967-04-04 Monsanto Co Production of epitaxial films
DE1264419B (de) * 1961-10-27 1968-03-28 Siemens Ag Verfahren zum Abscheiden einer einkristallinen Silicium-Schicht aus der Gasphase aufeinem Silicium-Einkristall
NL285435A (nl) * 1961-11-24 1900-01-01
DE1258983B (de) * 1961-12-05 1968-01-18 Telefunken Patent Verfahren zum Herstellen einer Halbleiteranordnung mit epitaktischer Schicht und mindestens einem pn-UEbergang
DE1289831B (de) * 1961-12-22 1969-02-27 Siemens Ag Verfahren zur Herstellung duenner frei tragender Folien aus einkristallinem Halbleitermaterial
DE1241811B (de) * 1962-01-12 1967-06-08 Itt Ind Ges Mit Beschraenkter Verfahren zur Herstellung eindiffundierter Zonen von Verunreinigungen in einem Halbleiterkoerper
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US3152932A (en) * 1962-01-29 1964-10-13 Hughes Aircraft Co Reduction in situ of a dipolar molecular gas adhering to a substrate
NL288409A (nl) * 1962-02-02
BE627948A (nl) * 1962-02-02
US3223904A (en) * 1962-02-19 1965-12-14 Motorola Inc Field effect device and method of manufacturing the same
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DE1202616B (de) * 1962-02-23 1965-10-07 Siemens Ag Verfahren zum Entfernen der bei der Epitaxie auf dem Heizer abgeschiedenen Halbleiterschicht
US3178798A (en) * 1962-05-09 1965-04-20 Ibm Vapor deposition process wherein the vapor contains both donor and acceptor impurities
BE632892A (nl) * 1962-05-29
BE633263A (nl) * 1962-06-06
DE1255635B (de) * 1962-06-14 1967-12-07 Siemens Ag Verfahren zum Herstellen kristalliner, insbesondere einkristalliner Schichten aus halbleitenden Stoffen
US3224912A (en) * 1962-07-13 1965-12-21 Monsanto Co Use of hydrogen halide and hydrogen in separate streams as carrier gases in vapor deposition of ii-vi compounds
US3218205A (en) * 1962-07-13 1965-11-16 Monsanto Co Use of hydrogen halide and hydrogen in separate streams as carrier gases in vapor deposition of iii-v compounds
NL295293A (nl) * 1962-07-13
NL296876A (nl) * 1962-08-23
NL298449A (nl) * 1962-10-05
DE1245333B (de) * 1962-10-31 1967-07-27 Merck & Co Inc Verfahren zur Herstellung von blattfoermigen Einkristallen
GB1064290A (en) * 1963-01-14 1967-04-05 Motorola Inc Method of making semiconductor devices
NL302321A (nl) * 1963-02-08
US3268374A (en) * 1963-04-24 1966-08-23 Texas Instruments Inc Method of producing a field-effect transistor
DE1273484B (de) * 1963-08-01 1968-07-25 Siemens Ag Verfahren zum Herstellen von reinem, gegebenenfalls dotiertem Halbleitermaterial mittels Transportreaktionen
US3370980A (en) * 1963-08-19 1968-02-27 Litton Systems Inc Method for orienting single crystal films on polycrystalline substrates
US3206339A (en) * 1963-09-30 1965-09-14 Philco Corp Method of growing geometricallydefined epitaxial layer without formation of undesirable crystallites
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DE1244733B (de) * 1963-11-05 1967-07-20 Siemens Ag Vorrichtung zum Aufwachsen einkristalliner Halbleitermaterialschichten auf einkristallinen Grundkoerpern
DE1248014B (de) * 1963-12-05 1967-08-24 Siemens Ag Verfahren zum Abscheiden von Halbleitermaterial unter Anwendung einer elektrischen Glimmentladung
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US3297501A (en) * 1963-12-31 1967-01-10 Ibm Process for epitaxial growth of semiconductor single crystals
US3346414A (en) * 1964-01-28 1967-10-10 Bell Telephone Labor Inc Vapor-liquid-solid crystal growth technique
DE1262243B (de) * 1964-03-18 1968-03-07 Ibm Deutschland Verfahren zum epitaktischen Aufwachsen von Halbleitermaterial
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US4910163A (en) * 1988-06-09 1990-03-20 University Of Connecticut Method for low temperature growth of silicon epitaxial layers using chemical vapor deposition system

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US2556991A (en) * 1946-03-20 1951-06-12 Bell Telephone Labor Inc Light-sensitive electric device
US2462681A (en) * 1947-07-03 1949-02-22 Gen Electric Method of forming germanium films
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE977684C (de) * 1953-03-25 1968-05-02 Siemens Ag Halbleiteranordnung
DE1140549B (de) * 1954-05-18 1962-12-06 Siemens Ag Verfahren zum Herstellen von reinstem kristallinem Germanium, Verbindungen von Elementen der ó¾. und ó§.oder ó�. und ó÷. Gruppe des Periodischen Systems und von oxydischem Halbleitermaterial

Also Published As

Publication number Publication date
FR1044870A (fr) 1953-11-23
DE865160C (de) 1953-01-29
NL99536C (nl) 1900-01-01
GB692250A (en) 1953-06-03
US2692839A (en) 1954-10-26
CH305860A (de) 1955-03-15

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