BE497135A - - Google Patents

Info

Publication number
BE497135A
BE497135A BE497135DA BE497135A BE 497135 A BE497135 A BE 497135A BE 497135D A BE497135D A BE 497135DA BE 497135 A BE497135 A BE 497135A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Family has litigation
Publication of BE497135A publication Critical patent/BE497135A/xx
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=32398483&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BE497135(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S8/00—Lighting devices intended for fixed installation
    • F21S8/08—Lighting devices intended for fixed installation with a standard
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V17/00—Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages
    • F21V17/02—Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages with provision for adjustment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2103/00—Elongate light sources, e.g. fluorescent tubes

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Luminescent Compositions (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
BE497135D 1949-07-23 BE497135A (sv)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
DEP0049803 1949-07-23
DEO205A DE865109C (de) 1949-07-23 1949-12-28 Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen
DEO0000268 1950-02-01
DEO0000940 1950-08-01
DEK8877A DE894959C (de) 1949-07-23 1951-02-02 Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares Material
DEK9441A DE922506C (de) 1949-07-23 1951-03-24 Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von wasserunloeslichen Diazoverbindungen
DEK16195A DE928621C (de) 1949-07-23 1951-03-24 Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von wasserunloeslichen Diazoverbindungen
DEK0012457 1951-12-14
US51708655A 1955-06-21 1955-06-21
US718477A US3046123A (en) 1949-07-23 1958-03-03 Process for making printing plates and light sensitive material for use therein

Publications (1)

Publication Number Publication Date
BE497135A true BE497135A (sv)

Family

ID=32398483

Family Applications (7)

Application Number Title Priority Date Filing Date
BE500222D BE500222A (sv) 1949-07-23
BE508815D BE508815A (sv) 1949-07-23
BE510563D BE510563A (sv) 1949-07-23
BE516129D BE516129A (sv) 1949-07-23
BE510151D BE510151A (sv) 1949-07-23
BE510152D BE510152A (sv) 1949-07-23
BE497135D BE497135A (sv) 1949-07-23

Family Applications Before (6)

Application Number Title Priority Date Filing Date
BE500222D BE500222A (sv) 1949-07-23
BE508815D BE508815A (sv) 1949-07-23
BE510563D BE510563A (sv) 1949-07-23
BE516129D BE516129A (sv) 1949-07-23
BE510151D BE510151A (sv) 1949-07-23
BE510152D BE510152A (sv) 1949-07-23

Country Status (8)

Country Link
US (8) US3046116A (sv)
AT (8) AT171431B (sv)
BE (7) BE497135A (sv)
CH (9) CH295106A (sv)
DE (8) DE854890C (sv)
FR (9) FR1031581A (sv)
GB (7) GB699412A (sv)
NL (5) NL80628C (sv)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2766118A (en) * 1952-10-01 1956-10-09 Azoplate Corp Light-sensitive material for the photomechanical reproduction and process for the production of images
US2767092A (en) * 1951-12-06 1956-10-16 Azoplate Corp Light sensitive material for lithographic printing
US2907655A (en) * 1953-09-30 1959-10-06 Schmidt Maximilian Paul Light-sensitive material for the photo-mechanical reproduction and process for the production of images
US3046119A (en) * 1950-08-01 1962-07-24 Azoplate Corp Light sensitive material for printing and process for making printing plates
US3046131A (en) * 1952-01-05 1962-07-24 Azoplate Corp Photographic material containing light sensitive quinone diazides
US3046113A (en) * 1951-06-30 1962-07-24 Azoplate Corp Light sensitive material
US3046122A (en) * 1949-07-23 1962-07-24 Azoplate Corp Process of making printing plates and light sensitive material suitable for use therein
US3046114A (en) * 1955-03-01 1962-07-24 Azoplate Corp Diazo compounds and printing plates manufactured therefrom
US3050389A (en) * 1957-08-03 1962-08-21 Azoplate Corp Light-sensitive material for the photomechanical preparation of printing plates

Families Citing this family (202)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046124A (en) * 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suitablefor use therein
NL89894C (sv) * 1952-08-16
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
NL96545C (sv) * 1954-03-12 1900-01-01
NL195961A (sv) * 1954-04-03
NL96874C (sv) * 1954-04-03
BE540225A (sv) * 1954-08-20
BE539175A (sv) * 1954-08-20
DE949383C (de) * 1954-08-26 1956-09-20 Kalle & Co Ag Lichtempfindliche Metallfolie fuer die Druckplattenherstellung, welche mit Diazosulfonaten lichtempfindlich gemacht ist
US3029146A (en) * 1955-02-25 1962-04-10 Azoplate Corp Reproduction material
NL94867C (sv) * 1955-02-25
BE560264A (sv) * 1956-09-25
US3019105A (en) * 1957-02-28 1962-01-30 Harris Intertype Corp Treatment of diazo-sensitized lithographic plates
US2975053A (en) * 1958-10-06 1961-03-14 Azoplate Corp Reproduction material
NL129161C (sv) * 1959-01-14
NL247405A (sv) * 1959-01-15
NL247406A (sv) * 1959-01-17
NL247588A (sv) * 1959-01-21
NL247939A (sv) * 1959-02-04
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
NL254616A (sv) * 1959-08-05
NL131386C (sv) * 1959-08-29
NL255517A (sv) * 1959-09-04
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
BE606642A (sv) * 1960-07-29
NL132291C (sv) * 1961-01-25
NL283850A (sv) * 1961-10-13
US3260599A (en) * 1962-11-19 1966-07-12 Minnesota Mining & Mfg Vesicular diazo copy-sheet containing photoreducible dye
US3210531A (en) * 1963-03-18 1965-10-05 Samuel M Neely Outdoor floodlighting assembly
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3331944A (en) * 1965-03-02 1967-07-18 Electro Therm Plug-in heating element assembly
US3387975A (en) * 1965-03-10 1968-06-11 Sony Corp Method of making color screen of a cathode ray tube
GB1116737A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Bis-(o-quinone diazide) modified bisphenols
NL136645C (sv) * 1966-12-12
US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
US3984250A (en) * 1970-02-12 1976-10-05 Eastman Kodak Company Light-sensitive diazoketone and azide compositions and photographic elements
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
JPS5539825B2 (sv) * 1972-05-12 1980-10-14
JPS5024641B2 (sv) * 1972-10-17 1975-08-18
US4024122A (en) * 1973-02-12 1977-05-17 Rca Corporation Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone)
US3852771A (en) * 1973-02-12 1974-12-03 Rca Corp Electron beam recording process
US3950173A (en) * 1973-02-12 1976-04-13 Rca Corporation Electron beam recording article with o-quinone diazide compound
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4327022A (en) * 1973-08-16 1982-04-27 Sterling Drug Inc. Heterocyclic alkyl naphthols
US4169108A (en) * 1973-08-16 1979-09-25 Sterling Drug Inc. 5(OR 6)-[(Substituted-amino)alkyl]-2,3-naphthalenediols
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS5645127B2 (sv) * 1974-02-25 1981-10-24
US4007047A (en) * 1974-06-06 1977-02-08 International Business Machines Corporation Modified processing of positive photoresists
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
DE2530502C2 (de) * 1974-07-22 1985-07-18 American Hoechst Corp., Bridgewater, N.J. Verfahren zum gleichzeitigen Entwickeln und Konservieren von Druckplatten sowie dafür geeignete Behandlungslösung
DE2447225C2 (de) * 1974-10-03 1983-12-22 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zum Ablösen von positiven Photolack
US4005437A (en) * 1975-04-18 1977-01-25 Rca Corporation Method of recording information in which the electron beam sensitive material contains 4,4'-bis(3-diazo-3-4-oxo-1-naphthalene sulfonyloxy)benzil
CA1085212A (en) * 1975-05-27 1980-09-09 Ronald H. Engebrecht Use of volatile carboxylic acids in improved photoresists containing quinone diazides
DE2529054C2 (de) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Herstellung eines zur Vorlage negativen Resistbildes
US4148654A (en) * 1976-07-22 1979-04-10 Oddi Michael J Positive acting photoresist comprising diazide ester, novolak resin and rosin
DE2641099A1 (de) * 1976-09-13 1978-03-16 Hoechst Ag Lichtempfindliche kopierschicht
DE2641100A1 (de) * 1976-09-13 1978-03-16 Hoechst Ag Lichtempfindliche kopierschicht
US4059449A (en) * 1976-09-30 1977-11-22 Rca Corporation Photoresist containing a thiodipropionate compound
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
US4263387A (en) * 1978-03-16 1981-04-21 Coulter Systems Corporation Lithographic printing plate and process for making same
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
US4207107A (en) * 1978-08-23 1980-06-10 Rca Corporation Novel ortho-quinone diazide photoresist sensitizers
DE2948324C2 (de) * 1978-12-01 1993-01-14 Hitachi, Ltd., Tokio/Tokyo Lichtempfindliches Gemisch, enthaltend eine Bisazidverbindung, und Verfahren zur Bildung von Mustern
JPS561933A (en) * 1979-06-18 1981-01-10 Ibm Resist composition
US4284706A (en) * 1979-12-03 1981-08-18 International Business Machines Corporation Lithographic resist composition for a lift-off process
DE3040157A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
US4431724A (en) * 1981-01-07 1984-02-14 Ovchinnikov Jury M Offset printing plate and process for making same
DE3100856A1 (de) * 1981-01-14 1982-08-12 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition
DE3124936A1 (de) * 1981-06-25 1983-01-20 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3127754A1 (de) * 1981-07-14 1983-02-03 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
JPS59165053A (ja) * 1983-03-11 1984-09-18 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
US4499171A (en) * 1982-04-20 1985-02-12 Japan Synthetic Rubber Co., Ltd. Positive type photosensitive resin composition with at least two o-quinone diazides
DE3220816A1 (de) * 1982-06-03 1983-12-08 Merck Patent Gmbh, 6100 Darmstadt Lichtempfindliche komponenten fuer positiv arbeitende fotoresistmaterialien
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US3046116A (en) * 1949-07-23 1962-07-24 Azoplate Corp Light sensitive material for printing and process for making printing plates
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US3046113A (en) * 1951-06-30 1962-07-24 Azoplate Corp Light sensitive material
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US2766118A (en) * 1952-10-01 1956-10-09 Azoplate Corp Light-sensitive material for the photomechanical reproduction and process for the production of images
US2907655A (en) * 1953-09-30 1959-10-06 Schmidt Maximilian Paul Light-sensitive material for the photo-mechanical reproduction and process for the production of images
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AT177053B (de) 1953-12-28
NL80628C (sv)
CH318851A (de) 1957-01-31
DE888204C (de) 1953-08-31
NL78797C (sv)
US3046110A (en) 1962-07-24
AT184821B (de) 1956-02-25
FR64119E (fr) 1955-10-21
AT198127B (de) 1958-06-10
BE510563A (sv)
CH306897A (de) 1955-04-30
DE879203C (de) 1953-04-23
CH295106A (de) 1953-12-15
FR62126E (fr) 1955-06-10
AT201430B (de) 1959-01-10
DE894959C (de) 1953-10-29
CH316606A (de) 1956-10-15
GB723242A (en) 1955-02-02
AT179194B (de) 1954-07-26
CH302817A (de) 1954-10-31
US3046123A (en) 1962-07-24
AT181493B (de) 1955-03-25
CH292832A (de) 1953-08-31
FR64216E (fr) 1955-11-09
DE922506C (de) 1955-01-17
DE854890C (de) 1952-12-18
BE508815A (sv)
GB699412A (en) 1953-11-04
FR65465E (fr) 1956-02-21
US3046122A (en) 1962-07-24
CH308002A (de) 1955-06-30
GB706028A (en) 1954-03-24
AT171431B (de) 1952-05-26
US3064124A (en) 1962-11-13
FR1031581A (fr) 1953-06-24
CH315139A (de) 1956-07-31
FR63708E (fr) 1955-10-03
AT189925B (de) 1957-05-25
DE928621C (de) 1955-06-06
NL80569C (sv)
BE510151A (sv)
BE510152A (sv)
BE500222A (sv)
GB708834A (en) 1954-05-12
US3046116A (en) 1962-07-24
FR64118E (fr) 1955-10-21
DE907739C (de) 1954-02-18
GB729746A (en) 1955-05-11
BE516129A (sv)
NL76414C (sv)
US3046117A (en) 1962-07-24
NL78723C (sv)
FR63606E (fr) 1955-09-30
GB732544A (en) 1955-06-29
DE865109C (de) 1953-01-29
FR60499E (fr) 1954-11-03
GB774272A (en) 1957-05-08
US3046111A (en) 1962-07-24
CH317504A (de) 1956-11-30
US3046118A (en) 1962-07-24

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