AU551827B2 - Photopolymerisable compositions - Google Patents

Photopolymerisable compositions

Info

Publication number
AU551827B2
AU551827B2 AU18536/83A AU1853683A AU551827B2 AU 551827 B2 AU551827 B2 AU 551827B2 AU 18536/83 A AU18536/83 A AU 18536/83A AU 1853683 A AU1853683 A AU 1853683A AU 551827 B2 AU551827 B2 AU 551827B2
Authority
AU
Australia
Prior art keywords
photopolymerisable compositions
photopolymerisable
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU18536/83A
Other languages
English (en)
Other versions
AU1853683A (en
Inventor
Hideki Nagasaka
Noriaki Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Publication of AU1853683A publication Critical patent/AU1853683A/en
Application granted granted Critical
Publication of AU551827B2 publication Critical patent/AU551827B2/en
Assigned to MITSUBISHI CHEMICAL CORPORATION reassignment MITSUBISHI CHEMICAL CORPORATION Request to Amend Deed and Register Assignors: MITSUBISHI KASEI CORPORATION
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/116Redox or dye sensitizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing
    • Y10S430/123Sulfur in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/127Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
AU18536/83A 1982-09-27 1983-08-30 Photopolymerisable compositions Ceased AU551827B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP57-168088 1982-09-27
JP57168088A JPS5956403A (ja) 1982-09-27 1982-09-27 光重合性組成物

Publications (2)

Publication Number Publication Date
AU1853683A AU1853683A (en) 1984-04-05
AU551827B2 true AU551827B2 (en) 1986-05-15

Family

ID=15861616

Family Applications (1)

Application Number Title Priority Date Filing Date
AU18536/83A Ceased AU551827B2 (en) 1982-09-27 1983-08-30 Photopolymerisable compositions

Country Status (6)

Country Link
US (1) US4985470A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0107792B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5956403A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU551827B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1222091A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3361644D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (115)

* Cited by examiner, † Cited by third party
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JPS59226002A (ja) * 1983-06-06 1984-12-19 Fuji Photo Film Co Ltd 光重合性組成物
JPH0629285B2 (ja) * 1983-10-14 1994-04-20 三菱化成株式会社 光重合性組成物
SE458860B (sv) * 1986-02-06 1989-05-16 Itronic Process Ab Anordning vid en foer vaermebehandling av banformiga alster anordnad behandlingsanlaeggning
JP2538992B2 (ja) * 1987-07-21 1996-10-02 三菱化学株式会社 光重合性組成物
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US5514521A (en) * 1990-08-22 1996-05-07 Brother Kogyo Kabushiki Kaisha Photocurable composition
JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
JP3070184B2 (ja) * 1991-10-18 2000-07-24 三菱化学株式会社 光重合性組成物及び感光材料
JP2693670B2 (ja) * 1991-11-06 1997-12-24 住友ベークライト株式会社 感光性樹脂組成物
JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
CN1060487C (zh) * 1993-08-23 2001-01-10 普罗克特和甘保尔公司 用硅氧烷接枝的热塑性弹性共聚物和含有这些共聚物的头发和皮肤护理组合物
US5738974A (en) 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
EP0780731B1 (en) 1995-12-22 2002-04-17 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter, color filter and liquid crystal display device
JPH09218514A (ja) * 1996-02-09 1997-08-19 Brother Ind Ltd 光硬化型組成物及び感光性カプセル
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
JPH11184084A (ja) 1997-12-22 1999-07-09 Brother Ind Ltd 速硬化性感光性組成物及び記録用シート
US6573380B2 (en) 1999-03-09 2003-06-03 Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo 4-cyanocoumarin derivatives and uses thereof
WO2003050106A1 (en) 2001-12-13 2003-06-19 Kabushiki Kaisha Hayashibara Seibutsu Kagaku Kenkyujo Coumarin compound
KR20060041223A (ko) 2003-07-11 2006-05-11 가부시끼가이샤 하야시바라 세이부쓰 가가꾸 겐꾸조 아민화합물과 그 용도
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US7830472B2 (en) 2004-04-26 2010-11-09 Mitsubishi Chemical Corporation Blue color composition for color filter, color filter, and color image display device
US7439537B2 (en) 2004-07-30 2008-10-21 Agfa Graphics, N.V. Divinylfluorenes
US7241557B2 (en) 2004-07-30 2007-07-10 Agfa Graphics Nv Photopolymerizable composition
WO2006048445A1 (en) * 2004-11-05 2006-05-11 Agfa Graphics Nv Photopolymerizable composition
JP4315892B2 (ja) * 2004-11-25 2009-08-19 東京応化工業株式会社 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
ATE445861T1 (de) 2005-08-26 2009-10-15 Agfa Graphics Nv Photopolymer druckplattenvorläufer
EP1788431B1 (en) 2005-11-18 2009-01-28 Agfa Graphics N.V. Method of making a lithographic printing plate
ATE475908T1 (de) 2005-11-18 2010-08-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
ES2479066T3 (es) 2005-11-18 2014-07-23 Agfa Graphics N.V. Método de fabricación de una plancha de impresión litográfica
ES2321205T3 (es) 2005-11-18 2009-06-03 Agfa Graphics N.V. Metodo para fabricar una plancha de impresion litografica.
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ATE426836T1 (de) 2005-11-18 2009-04-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
EP1788444B1 (en) 2005-11-18 2011-01-26 Agfa Graphics N.V. Method of making a lithographic printing plate
EP1788430B1 (en) 2005-11-18 2009-03-18 Agfa Graphics N.V. Method of making a lithographic printing plate
ES2411697T3 (es) 2005-11-21 2013-07-08 Agfa Graphics N.V. Método de fabricación de una plancha de impresión litográfica
ATE430330T1 (de) 2005-11-21 2009-05-15 Agfa Graphics Nv Verfahren zur herstellung einer lithografiedruckform
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JP4816239B2 (ja) * 2005-11-21 2011-11-16 日立化成工業株式会社 永久レジスト用感光性エレメント、レジストパターンの形成方法、プリント配線板及び半導体素子
JP2007171407A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版原版及びその製版方法
EP2009486A4 (en) 2006-04-19 2009-12-09 Mitsubishi Chem Corp Color image display device
EP1884372B1 (en) 2006-08-03 2009-10-21 Agfa Graphics N.V. A lithographic printing plate support
EP2153279B1 (en) 2007-05-25 2010-12-29 Agfa Graphics N.V. A lithographic printing plate precursor
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WO2009086492A1 (en) * 2007-12-28 2009-07-09 E. I. Du Pont De Nemours And Company Thermally and actinically curable adhesive composition
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JP5264427B2 (ja) 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
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CN102834779B (zh) 2010-03-31 2015-07-08 富士胶片株式会社 用于处理平版印刷版原版的显影液,通过使用显影液制备平版印刷版的方法和印刷方法
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JP5432960B2 (ja) 2011-08-24 2014-03-05 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5401522B2 (ja) 2011-09-15 2014-01-29 富士フイルム株式会社 コーティング組成物、ならびに該組成物を用いた、画像形成材料、平版印刷版原版及び酸素遮断性フィルム
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CN104115069B (zh) 2012-02-20 2018-11-02 富士胶片株式会社 制版处理废液的浓缩方法及再循环方法
JP5711168B2 (ja) 2012-02-27 2015-04-30 富士フイルム株式会社 平版印刷版原版および平版印刷版の作製方法
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CN105308504B (zh) 2013-06-14 2019-12-03 爱克发有限公司 平版印刷版前体
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EP3431290B1 (en) 2017-07-20 2021-09-08 Agfa Nv A lithographic printing plate precursor
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WO2019096893A1 (en) 2017-11-15 2019-05-23 Byk-Chemie Gmbh Block co-polymer
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EP4461539A1 (en) 2023-05-10 2024-11-13 Eco3 Bv A negative-working lithographic printing plate precursor

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US3652275A (en) * 1970-07-09 1972-03-28 Du Pont HEXAARYLBIIMIDAZOLE BIS (p-DIALKYL-AMINOPHENYL-{60 ,{62 -UNSATURATED) KETONE COMPOSITIONS
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DE3048490C2 (de) * 1980-12-22 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Lichtempfindliches Aufzeichnungsmaterial
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Also Published As

Publication number Publication date
JPS5956403A (ja) 1984-03-31
EP0107792A1 (en) 1984-05-09
US4985470A (en) 1991-01-15
EP0107792B1 (en) 1985-12-27
CA1222091A (en) 1987-05-19
JPH0363562B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-10-01
DE3361644D1 (en) 1986-02-06
AU1853683A (en) 1984-04-05

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