AU2002232383A1 - Compositions for microlithography - Google Patents

Compositions for microlithography

Info

Publication number
AU2002232383A1
AU2002232383A1 AU2002232383A AU3238302A AU2002232383A1 AU 2002232383 A1 AU2002232383 A1 AU 2002232383A1 AU 2002232383 A AU2002232383 A AU 2002232383A AU 3238302 A AU3238302 A AU 3238302A AU 2002232383 A1 AU2002232383 A1 AU 2002232383A1
Authority
AU
Australia
Prior art keywords
microlithography
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002232383A
Other languages
English (en)
Inventor
Larry L. Berger
Michael Karl Crawford
Jerald Feldman
Lynda Kaye Johnson
Iii Frank L. Schadt
Jr. Fredrick Claus Zumsteg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of AU2002232383A1 publication Critical patent/AU2002232383A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
AU2002232383A 2000-10-18 2001-10-16 Compositions for microlithography Abandoned AU2002232383A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US69128000A 2000-10-18 2000-10-18
US09/691,280 2000-10-18
PCT/US2001/042743 WO2002033489A2 (en) 2000-10-18 2001-10-16 Compositions for microlithography

Publications (1)

Publication Number Publication Date
AU2002232383A1 true AU2002232383A1 (en) 2002-04-29

Family

ID=24775897

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002232383A Abandoned AU2002232383A1 (en) 2000-10-18 2001-10-16 Compositions for microlithography

Country Status (7)

Country Link
EP (1) EP1326903A2 (de)
JP (1) JP2004512396A (de)
KR (1) KR20040004403A (de)
CN (1) CN1214054C (de)
AU (1) AU2002232383A1 (de)
TW (1) TW569079B (de)
WO (1) WO2002033489A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030130452A1 (en) * 2001-10-12 2003-07-10 Johnson Lynda Kaye Copolymers of ethylene with various norbornene derivatives
CN1639640A (zh) * 2002-03-01 2005-07-13 E·I·内穆尔杜邦公司 用于显微平版印刷的氟化共聚物
TWI307819B (en) 2002-05-28 2009-03-21 Arch Spec Chem Inc Acetal protected polymers and photoresist compositions thereof
US7264914B2 (en) * 2002-08-09 2007-09-04 E. I. Du Pont De Nemours And Company Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography
JP2007525543A (ja) 2003-02-20 2007-09-06 プロメラス， エルエルシー フォトレジスト組成物のための溶解速度調整剤
JP4377174B2 (ja) 2003-07-25 2009-12-02 富士フイルム株式会社 ポジ型レジスト組成物
JP6419212B2 (ja) 2013-12-20 2018-11-07 ビーエイエスエフ・コーティングス・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢＡＳＦ Ｃｏａｔｉｎｇｓ ＧｍｂＨ 水性一次分散体、その製造方法およびその使用
CN106444281A (zh) * 2016-09-22 2017-02-22 京东方科技集团股份有限公司 一种光刻胶及刻蚀方法
JP6986986B2 (ja) * 2018-01-30 2021-12-22 三井化学株式会社 フッ素含有環状オレフィン系共重合体および成形体

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4327360B2 (ja) * 1998-09-23 2009-09-09 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー ホトレジスト、ポリマーおよびマイクロリソグラフィの方法

Also Published As

Publication number Publication date
TW569079B (en) 2004-01-01
JP2004512396A (ja) 2004-04-22
WO2002033489A3 (en) 2002-11-21
CN1214054C (zh) 2005-08-10
KR20040004403A (ko) 2004-01-13
CN1484659A (zh) 2004-03-24
EP1326903A2 (de) 2003-07-16
WO2002033489A2 (en) 2002-04-25

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