AU2001262793A1 - Photoresist remover composition - Google Patents

Photoresist remover composition

Info

Publication number
AU2001262793A1
AU2001262793A1 AU2001262793A AU6279301A AU2001262793A1 AU 2001262793 A1 AU2001262793 A1 AU 2001262793A1 AU 2001262793 A AU2001262793 A AU 2001262793A AU 6279301 A AU6279301 A AU 6279301A AU 2001262793 A1 AU2001262793 A1 AU 2001262793A1
Authority
AU
Australia
Prior art keywords
remover composition
photoresist remover
photoresist
composition
remover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001262793A
Inventor
Sang-Dai Lee
Chang-Il Oh
Young-Woong Park
Chong-Soon Yoo
Suk-Il Yoon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongjin Semichem Co Ltd
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of AU2001262793A1 publication Critical patent/AU2001262793A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
AU2001262793A 2000-06-12 2001-06-07 Photoresist remover composition Abandoned AU2001262793A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020000032225A KR100363271B1 (en) 2000-06-12 2000-06-12 Photoresist remover composition
KR0032225 2000-06-12
PCT/KR2001/000966 WO2001096964A1 (en) 2000-06-12 2001-06-07 Photoresist remover composition

Publications (1)

Publication Number Publication Date
AU2001262793A1 true AU2001262793A1 (en) 2001-12-24

Family

ID=19671757

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001262793A Abandoned AU2001262793A1 (en) 2000-06-12 2001-06-07 Photoresist remover composition

Country Status (7)

Country Link
US (1) US6908892B2 (en)
JP (1) JP3833176B2 (en)
KR (1) KR100363271B1 (en)
CN (1) CN1203378C (en)
AU (1) AU2001262793A1 (en)
TW (1) TWI283338B (en)
WO (1) WO2001096964A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4867092B2 (en) * 2001-07-04 2012-02-01 三菱瓦斯化学株式会社 Resist stripper composition
KR100434491B1 (en) 2001-08-17 2004-06-05 삼성전자주식회사 Resist or etching by-products removing composition and resist removing method using the same
KR100862988B1 (en) * 2002-09-30 2008-10-13 주식회사 동진쎄미켐 Photoresist remover composition
KR100751919B1 (en) * 2005-11-18 2007-08-31 램테크놀러지 주식회사 Photoresist stripping composition and method of forming a pattern using the same
KR101082515B1 (en) * 2008-04-07 2011-11-10 주식회사 엘지화학 Stripper composition for photoresist and method for stripping photoresist
CN102301283B (en) * 2009-02-03 2014-10-08 出光兴产株式会社 Resist remover composition and resist removing method using the same
US8889609B2 (en) 2011-03-16 2014-11-18 Air Products And Chemicals, Inc. Cleaning formulations and method of using the cleaning formulations
US8999184B2 (en) * 2012-08-03 2015-04-07 Lam Research Corporation Method for providing vias
CA3068808A1 (en) * 2017-07-06 2019-01-10 Dow Global Technologies Llc Amide combinations for cleaning and stripping of electronic parts
WO2020046515A1 (en) * 2018-08-30 2020-03-05 Huntsman Petrochemical Llc Quaternary ammonium hydroxides of polyamines
CN113003535A (en) * 2021-02-20 2021-06-22 中国科学院物理研究所 Glue removing method of superconducting quantum bit air bridge and chip thereof

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4617251A (en) 1985-04-11 1986-10-14 Olin Hunt Specialty Products, Inc. Stripping composition and method of using the same
US4770713A (en) 1986-12-10 1988-09-13 Advanced Chemical Technologies, Inc. Stripping compositions containing an alkylamide and an alkanolamine and use thereof
JP2591626B2 (en) * 1987-09-16 1997-03-19 東京応化工業株式会社 Stripper for resist
US5279771A (en) * 1990-11-05 1994-01-18 Ekc Technology, Inc. Stripping compositions comprising hydroxylamine and alkanolamine
US5753601A (en) * 1991-01-25 1998-05-19 Ashland Inc Organic stripping composition
US5988186A (en) * 1991-01-25 1999-11-23 Ashland, Inc. Aqueous stripping and cleaning compositions
JPH05509234A (en) * 1991-02-08 1993-12-22 ルセル　ユクラフ Nucleotide sequence encoding the variable region of human T lymphocyte receptor alpha chain and corresponding peptide segment and use in diagnosis and therapy
US5308745A (en) * 1992-11-06 1994-05-03 J. T. Baker Inc. Alkaline-containing photoresist stripping compositions producing reduced metal corrosion with cross-linked or hardened resist resins
US6326130B1 (en) 1993-10-07 2001-12-04 Mallinckrodt Baker, Inc. Photoresist strippers containing reducing agents to reduce metal corrosion
US5885362A (en) * 1995-07-27 1999-03-23 Mitsubishi Chemical Corporation Method for treating surface of substrate
JP2911792B2 (en) 1995-09-29 1999-06-23 東京応化工業株式会社 Stripper composition for resist
JP3236220B2 (en) * 1995-11-13 2001-12-10 東京応化工業株式会社 Stripper composition for resist
JP3929518B2 (en) 1995-11-30 2007-06-13 東京応化工業株式会社 Stripping composition for resist
US5798323A (en) * 1997-05-05 1998-08-25 Olin Microelectronic Chemicals, Inc. Non-corrosive stripping and cleaning composition
JPH1152590A (en) * 1997-08-06 1999-02-26 Nagase Denshi Kagaku Kk Resist remover composition and method for using the same
JP3932150B2 (en) * 1997-10-03 2007-06-20 ナガセケムテックス株式会社 Resist stripper composition and method of using the same
EP1044251A4 (en) * 1997-10-14 2002-03-20 Advanced Tech Materials Ammonium borate containing compositions for stripping residues from semiconductor substrates
US6432209B2 (en) * 1998-03-03 2002-08-13 Silicon Valley Chemlabs Composition and method for removing resist and etching residues using hydroxylazmmonium carboxylates
AU4189599A (en) * 1998-05-18 1999-12-06 Mallinckrodt, Inc. Silicate-containing alkaline compositions for cleaning microelectronic substrates
KR100288769B1 (en) * 1998-07-10 2001-09-17 윤종용 Stripper composition for photoresist
GB2342727A (en) 1998-10-12 2000-04-19 Ekc Technology Ltd Composition to remove resists and tp inhibit titanium corrosion

Also Published As

Publication number Publication date
US6908892B2 (en) 2005-06-21
KR20010111605A (en) 2001-12-19
CN1203378C (en) 2005-05-25
JP2004526981A (en) 2004-09-02
TWI283338B (en) 2007-07-01
US20030158058A1 (en) 2003-08-21
CN1434931A (en) 2003-08-06
WO2001096964A8 (en) 2002-03-21
WO2001096964A1 (en) 2001-12-20
KR100363271B1 (en) 2002-12-05
JP3833176B2 (en) 2006-10-11

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