AU2001273598A1 - Carbonate-based photoresist stripping compositions - Google Patents

Carbonate-based photoresist stripping compositions

Info

Publication number
AU2001273598A1
AU2001273598A1 AU2001273598A AU7359801A AU2001273598A1 AU 2001273598 A1 AU2001273598 A1 AU 2001273598A1 AU 2001273598 A AU2001273598 A AU 2001273598A AU 7359801 A AU7359801 A AU 7359801A AU 2001273598 A1 AU2001273598 A1 AU 2001273598A1
Authority
AU
Australia
Prior art keywords
carbonate
photoresist stripping
based photoresist
stripping compositions
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001273598A
Inventor
James R. Machac Jr.
Edward T. Marquis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Petrochemical LLC
Original Assignee
Huntsman Specialty Chemicals Corp
Huntsman Petrochemical LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huntsman Specialty Chemicals Corp, Huntsman Petrochemical LLC filed Critical Huntsman Specialty Chemicals Corp
Publication of AU2001273598A1 publication Critical patent/AU2001273598A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
AU2001273598A 2000-06-29 2001-06-14 Carbonate-based photoresist stripping compositions Abandoned AU2001273598A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US60646500A 2000-06-29 2000-06-29
US09606465 2000-06-29
PCT/US2001/041033 WO2002003143A2 (en) 2000-06-29 2001-06-14 Alkylene carbonate-based photoresist stripping compositions

Publications (1)

Publication Number Publication Date
AU2001273598A1 true AU2001273598A1 (en) 2002-01-14

Family

ID=24428087

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001273598A Abandoned AU2001273598A1 (en) 2000-06-29 2001-06-14 Carbonate-based photoresist stripping compositions

Country Status (3)

Country Link
US (2) US6475708B2 (en)
AU (1) AU2001273598A1 (en)
WO (1) WO2002003143A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040050406A1 (en) * 2002-07-17 2004-03-18 Akshey Sehgal Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
US20040094507A1 (en) * 2002-11-14 2004-05-20 Goodner Michael D. Stripping cross-linked photoresists
CN100334508C (en) * 2003-01-10 2007-08-29 吉埈仍 Photoresist demoulding coposition and model forming method by using said composition
US20040255974A1 (en) * 2003-06-23 2004-12-23 Burress Jeffrey P. Equipment cleaner
US7413848B2 (en) * 2005-07-27 2008-08-19 United Microelectronics Corp. Method of removing photoresist and photoresist rework method
EP1752193A1 (en) * 2005-08-13 2007-02-14 Dr. Straetmans Chemische Produkte GmbH Use of one or more cyclic 1,2-alkylene carbonates as stabilizer and activity enhancer for preservatives, corresponding composition
US20070179072A1 (en) * 2006-01-30 2007-08-02 Rao Madhukar B Cleaning formulations
WO2011147822A2 (en) * 2010-05-27 2011-12-01 Akzo Nobel Chemicals International B.V. Agricultural formulations with acyl morpholines and polar aprotic co-solvents
JP5657318B2 (en) * 2010-09-27 2015-01-21 富士フイルム株式会社 Semiconductor substrate cleaning agent, cleaning method using the same, and semiconductor device manufacturing method
DE102012217306B4 (en) * 2012-09-25 2017-01-12 Vacuumschmelze Gmbh & Co. Kg Detergents, their use and methods of removing cured casting resins, adhesives, mounting foams, paint films and paint residues
CN103543620B (en) * 2013-11-11 2016-07-06 深圳市星扬化工有限公司 A kind of printed circuit board development film removes liquid
WO2019222127A1 (en) * 2018-05-16 2019-11-21 Huntsman Petrochemical Llc Quaternary ammonium hydroxides of polyamines

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2991254A (en) * 1958-02-11 1961-07-04 Sun Oil Co Composition for engine deposit removal
JPS5133229B2 (en) * 1973-09-13 1976-09-18
US4438192A (en) 1983-02-14 1984-03-20 The Dow Chemical Company Photoresist stripper composition and method of use
US4483917A (en) 1983-02-14 1984-11-20 The Dow Chemical Company Photoresist stripper composition and method of use
US4791043A (en) 1983-12-20 1988-12-13 Hmc Patents Holding Co., Inc. Positive photoresist stripping composition
US4806458A (en) 1985-10-28 1989-02-21 Hoechst Celanese Corporation Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate
US4948697A (en) 1985-10-28 1990-08-14 Hoechst Celanese Corporation Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
GB8712731D0 (en) * 1987-05-30 1987-07-01 Ciba Geigy Ag Metallic patterns
US4824763A (en) 1987-07-30 1989-04-25 Ekc Technology, Inc. Triamine positive photoresist stripping composition and prebaking process
US4822723A (en) * 1987-11-30 1989-04-18 Hoechst Celanese Corporation Developer compositions for heavy-duty lithographic printing plates
US5690747A (en) * 1988-05-20 1997-11-25 The Boeing Company Method for removing photoresist with solvent and ultrasonic agitation
US4940651A (en) 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist
US5102777A (en) 1990-02-01 1992-04-07 Ardrox Inc. Resist stripping
US5268260A (en) * 1991-10-22 1993-12-07 International Business Machines Corporation Photoresist develop and strip solvent compositions and method for their use
JPH0627684A (en) * 1992-07-10 1994-02-04 Tokyo Ohka Kogyo Co Ltd Rinse for lithography and production of semiconductor device using the same
US5354492A (en) * 1992-09-04 1994-10-11 Cook Composites And Polymers Company Aqueous cleaning solutions for removing uncured urethane resin systems from the surfaces of processing equipment
US5310428A (en) * 1992-12-22 1994-05-10 Inernational Business Machines Corporation Solvent stabilization process and method of recovering solvent
CN1065564C (en) * 1993-05-17 2001-05-09 东芝硅株式会社 cleaning agent, cleaning method and cleaning apparatus
JP2679618B2 (en) * 1994-04-26 1997-11-19 日本電気株式会社 Stripping liquid composition and stripping and cleaning method
US5721204A (en) * 1996-02-29 1998-02-24 Gage Products Company Paint stripping composition
US6169061B1 (en) * 1997-05-23 2001-01-02 Huntsman Petrochemical Corporation Paint and coating remover
ATE275174T1 (en) * 1997-05-23 2004-09-15 Huntsman Spec Chem Corp AGENT FOR REMOVAL OF COATINGS AND PAINTS
US6187108B1 (en) * 1999-02-25 2001-02-13 Huntsman Petrochemical Corporation Alkylene carbonate-based cleaners
US6207224B1 (en) * 1999-10-06 2001-03-27 E. I. Du Pont De Nemours And Company Process for coating thermoplastic substrates with a coating composition containing a non-aggressive solvent
US6420327B1 (en) * 2000-08-09 2002-07-16 Huntsman Petrochemical Corporation Carbonate-based coating removers

Also Published As

Publication number Publication date
US6475708B2 (en) 2002-11-05
US20020155393A1 (en) 2002-10-24
US20020068244A1 (en) 2002-06-06
WO2002003143A2 (en) 2002-01-10
WO2002003143A3 (en) 2002-04-25
US6586164B2 (en) 2003-07-01

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