AU2001256797A1 - Resist stripper composition - Google Patents

Resist stripper composition

Info

Publication number
AU2001256797A1
AU2001256797A1 AU2001256797A AU5679701A AU2001256797A1 AU 2001256797 A1 AU2001256797 A1 AU 2001256797A1 AU 2001256797 A AU2001256797 A AU 2001256797A AU 5679701 A AU5679701 A AU 5679701A AU 2001256797 A1 AU2001256797 A1 AU 2001256797A1
Authority
AU
Australia
Prior art keywords
stripper composition
resist stripper
resist
composition
stripper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001256797A
Inventor
Sang-Dai Lee
Chang-Il Oh
Young-Woong Park
Chong-Soon Yoo
Suk-Il Yoon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongjin Semichem Co Ltd
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of AU2001256797A1 publication Critical patent/AU2001256797A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2001256797A 2000-04-26 2001-04-25 Resist stripper composition Abandoned AU2001256797A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020000022221A KR100360985B1 (en) 2000-04-26 2000-04-26 Resist stripper composition
KR0022221 2000-04-26
PCT/KR2001/000692 WO2001082002A1 (en) 2000-04-26 2001-04-25 Resist stripper composition

Publications (1)

Publication Number Publication Date
AU2001256797A1 true AU2001256797A1 (en) 2001-11-07

Family

ID=19667052

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001256797A Abandoned AU2001256797A1 (en) 2000-04-26 2001-04-25 Resist stripper composition

Country Status (7)

Country Link
US (1) US6774097B2 (en)
JP (1) JP3679753B2 (en)
KR (1) KR100360985B1 (en)
CN (1) CN1220115C (en)
AU (1) AU2001256797A1 (en)
TW (1) TW508478B (en)
WO (1) WO2001082002A1 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7964192B1 (en) 1997-12-02 2011-06-21 Janssen Alzheimer Immunotherapy Prevention and treatment of amyloidgenic disease
US6455479B1 (en) * 2000-08-03 2002-09-24 Shipley Company, L.L.C. Stripping composition
JP3738996B2 (en) * 2002-10-10 2006-01-25 東京応化工業株式会社 Cleaning liquid for photolithography and substrate processing method
JP4698123B2 (en) * 2001-05-21 2011-06-08 ドウジン セミケム カンパニー リミテッド Resist remover composition
KR20030076093A (en) * 2002-03-22 2003-09-26 크린크리에티브 주식회사 Composition for removal of photoresist
JP3516446B2 (en) 2002-04-26 2004-04-05 東京応化工業株式会社 Photoresist stripping method
KR100581279B1 (en) 2003-06-02 2006-05-17 삼성전자주식회사 Composition for removing photoresist and method for forming a bump of a semiconductor device using the same
US8178482B2 (en) * 2004-08-03 2012-05-15 Avantor Performance Materials, Inc. Cleaning compositions for microelectronic substrates
KR101136026B1 (en) * 2004-09-24 2012-04-18 주식회사 동진쎄미켐 Composition for stripping photoresist and method for manufacturing thin film transistor array panel using the same
KR20060064441A (en) * 2004-12-08 2006-06-13 말린크로트 베이커, 인코포레이티드 Non-aqueous, non-corrosive microelectronic cleaning compositions
DE602006017559D1 (en) * 2005-08-13 2010-11-25 Techno Semichem Co Ltd FOTORESIST DISTANCE COMPOSITION FOR SEMICONDUCTOR MANUFACTURING
WO2007046655A1 (en) * 2005-10-21 2007-04-26 Samsung Electronics Co., Ltd. Stripper composition for removing dry etching residue and stripping method
US8551682B2 (en) 2007-08-15 2013-10-08 Dynaloy, Llc Metal conservation with stripper solutions containing resorcinol
CN101685274B (en) * 2008-09-26 2012-08-22 安集微电子（上海）有限公司 Cleaning agent for thick-film photoresist
WO2010061701A1 (en) * 2008-11-28 2010-06-03 出光興産株式会社 Anti-corrosive photoresist-removing agent composition
WO2010090146A1 (en) * 2009-02-03 2010-08-12 出光興産株式会社 Resist remover composition and method for removing resist using same
KR101089211B1 (en) * 2010-12-02 2011-12-02 엘티씨 (주) Composition of stripping solution for liquid crystal display process photoresist comprising primary alkanolamine
US10073351B2 (en) * 2014-12-23 2018-09-11 Versum Materials Us, Llc Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation
JP6562789B2 (en) * 2015-09-10 2019-08-21 キヤノン株式会社 Removal method of object to be removed
CN105655352B (en) * 2016-01-14 2018-08-14 武汉华星光电技术有限公司 The production method of low temperature polycrystalline silicon tft array substrate
JP6681284B2 (en) * 2016-06-23 2020-04-15 信越化学工業株式会社 Method for reducing metal of sugar alcohol compound
KR102228536B1 (en) * 2017-03-10 2021-03-15 주식회사 엘지화학 Stripper composition for removing photoresist and stripping method of photoresist using the same
JP2020118969A (en) 2019-01-25 2020-08-06 東京応化工業株式会社 Process liquid and method of processing substrate

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6110881A (en) * 1990-11-05 2000-08-29 Ekc Technology, Inc. Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
US5556482A (en) * 1991-01-25 1996-09-17 Ashland, Inc. Method of stripping photoresist with composition containing inhibitor
US5988186A (en) * 1991-01-25 1999-11-23 Ashland, Inc. Aqueous stripping and cleaning compositions
JP3302120B2 (en) 1993-07-08 2002-07-15 関東化学株式会社 Stripper for resist
US5597420A (en) 1995-01-17 1997-01-28 Ashland Inc. Stripping composition having monoethanolamine
JP3614242B2 (en) 1996-04-12 2005-01-26 三菱瓦斯化学株式会社 Photoresist stripper and method for manufacturing semiconductor integrated circuit
KR0184307B1 (en) * 1996-06-24 1999-04-01 이부섭 Photoresist detaching agent
US5759973A (en) * 1996-09-06 1998-06-02 Olin Microelectronic Chemicals, Inc. Photoresist stripping and cleaning compositions
US5989353A (en) * 1996-10-11 1999-11-23 Mallinckrodt Baker, Inc. Cleaning wafer substrates of metal contamination while maintaining wafer smoothness
US5798323A (en) * 1997-05-05 1998-08-25 Olin Microelectronic Chemicals, Inc. Non-corrosive stripping and cleaning composition
US6432209B2 (en) * 1998-03-03 2002-08-13 Silicon Valley Chemlabs Composition and method for removing resist and etching residues using hydroxylazmmonium carboxylates
KR20000003435A (en) * 1998-06-29 2000-01-15 김영환 Photoresist eliminating method using mixed organic solvent
US6368421B1 (en) * 1998-07-10 2002-04-09 Clariant Finance (Bvi) Limited Composition for stripping photoresist and organic materials from substrate surfaces
GB2342727A (en) * 1998-10-12 2000-04-19 Ekc Technology Ltd Composition to remove resists and tp inhibit titanium corrosion

Also Published As

Publication number Publication date
JP3679753B2 (en) 2005-08-03
KR100360985B1 (en) 2002-11-18
CN1220115C (en) 2005-09-21
WO2001082002A1 (en) 2001-11-01
JP2003532143A (en) 2003-10-28
CN1426544A (en) 2003-06-25
KR20010106537A (en) 2001-12-07
US20030100459A1 (en) 2003-05-29
TW508478B (en) 2002-11-01
US6774097B2 (en) 2004-08-10

Similar Documents

Publication Publication Date Title
AU2001274579A1 (en) Resist composition
AU2001256797A1 (en) Resist stripper composition
SG97932A1 (en) Resist stripping composition
AU2002225730A1 (en) Compounds
EP1400858A4 (en) Photoresist stripper composition
AU2001292518A1 (en) Novel compounds
AU2001276676A1 (en) Resist ink composition
AU2001288946A1 (en) Photoresist composition
AU2002214324A1 (en) Medicinal compositions
AUPQ661800A0 (en) Insulin-potentiating compounds
AU2001239765A1 (en) Novel compounds
AU2001246998A1 (en) Novel compounds
AU2001241098A1 (en) Composition
AU2001265871A1 (en) Substituted sulfonylaminopyrimidines
AU2001253362A1 (en) Novel compounds
AU2001254731A1 (en) Substituted phenyluracils
AU2001258255A1 (en) Substituted benzoylcyclohexenones
AU2001256964A1 (en) Novel compounds
AU2002225724A1 (en) Motilide compounds
AU2001296527A1 (en) Resist stripping process
AU2001275201A1 (en) Acne-treating composition
AU2001259252A1 (en) Neuroprotective compositions
AU2002217285A1 (en) Compounds
AU2001230689A1 (en) Novel compounds
AU2001287852A1 (en) Composition