AU2001284459A1 - Aligner and method of manufacturing a device - Google Patents
Aligner and method of manufacturing a deviceInfo
- Publication number
- AU2001284459A1 AU2001284459A1 AU2001284459A AU8445901A AU2001284459A1 AU 2001284459 A1 AU2001284459 A1 AU 2001284459A1 AU 2001284459 A AU2001284459 A AU 2001284459A AU 8445901 A AU8445901 A AU 8445901A AU 2001284459 A1 AU2001284459 A1 AU 2001284459A1
- Authority
- AU
- Australia
- Prior art keywords
- aligner
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-269521 | 2000-09-06 | ||
JP2000269521 | 2000-09-06 | ||
PCT/JP2001/007740 WO2002021583A1 (fr) | 2000-09-06 | 2001-09-06 | Aligneur et procede de fabrication de dispositif |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001284459A1 true AU2001284459A1 (en) | 2002-03-22 |
Family
ID=18756113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001284459A Abandoned AU2001284459A1 (en) | 2000-09-06 | 2001-09-06 | Aligner and method of manufacturing a device |
Country Status (6)
Country | Link |
---|---|
US (1) | US20040017556A1 (ja) |
JP (1) | JP4466811B2 (ja) |
KR (1) | KR20030029926A (ja) |
CN (1) | CN1592948A (ja) |
AU (1) | AU2001284459A1 (ja) |
WO (1) | WO2002021583A1 (ja) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3977214B2 (ja) * | 2002-09-17 | 2007-09-19 | キヤノン株式会社 | 露光装置 |
JP4326784B2 (ja) | 2002-11-11 | 2009-09-09 | 株式会社半導体エネルギー研究所 | 生産システム |
US6829035B2 (en) * | 2002-11-12 | 2004-12-07 | Applied Materials Israel, Ltd. | Advanced mask cleaning and handling |
US20130248734A1 (en) * | 2012-03-21 | 2013-09-26 | John Robert Berry | Air purification system |
KR20060007211A (ko) * | 2004-07-19 | 2006-01-24 | 삼성전자주식회사 | 노광 시스템 |
KR100656182B1 (ko) * | 2004-08-16 | 2006-12-12 | 두산디앤디 주식회사 | 유기박막 소자의 양산 제작용 선형의 증착 공정 장치와 기판 이송 장치 |
US7206652B2 (en) | 2004-08-20 | 2007-04-17 | International Business Machines Corporation | Method and system for intelligent automated reticle management |
KR100735027B1 (ko) * | 2006-01-03 | 2007-07-03 | 삼성전자주식회사 | 레티클 식별장치와 이를 구비한 노광설비 및 노광방법 |
US7591624B2 (en) * | 2006-01-09 | 2009-09-22 | International Business Machines Corporation | Reticle storage pod (RSP) transport system utilizing FOUP adapter plate |
JP5007053B2 (ja) * | 2006-02-23 | 2012-08-22 | 株式会社日立ハイテクノロジーズ | 試料搬送システム、試料搬送方法、プログラムおよび記録媒体 |
JP4966693B2 (ja) | 2007-02-28 | 2012-07-04 | 株式会社日立ハイテクノロジーズ | 試料搬送装置及び方法 |
US8556564B2 (en) * | 2007-06-26 | 2013-10-15 | Siemens Healthcare Diagnostics Inc. | Mobile sample storage and retrieval unit for a laboratory automated sample handling worksystem |
JP4992668B2 (ja) * | 2007-10-31 | 2012-08-08 | 旭硝子株式会社 | 容器交換装置および容器交換方法 |
JP5386137B2 (ja) * | 2008-10-06 | 2014-01-15 | 株式会社日立ハイテクノロジーズ | 試料測定装置 |
CN101825841B (zh) * | 2010-03-30 | 2012-07-04 | 东莞宏威数码机械有限公司 | 掩膜存储清洗系统 |
US9164399B2 (en) * | 2012-01-10 | 2015-10-20 | Hermes-Microvision, Inc. | Reticle operation system |
US9385019B2 (en) | 2012-06-21 | 2016-07-05 | Globalfoundries Inc. | Overhead substrate handling and storage system |
JP2014157190A (ja) | 2013-02-14 | 2014-08-28 | Toshiba Corp | 基板収納容器及び露光装置 |
CN103713472B (zh) * | 2013-12-18 | 2016-03-30 | 合肥京东方光电科技有限公司 | 一种自动安装掩模板系统 |
CN105093836B (zh) * | 2014-05-06 | 2017-08-29 | 上海微电子装备(集团)股份有限公司 | Euv光刻装置及其曝光方法 |
CN105807574B (zh) * | 2014-12-30 | 2018-03-02 | 上海微电子装备(集团)股份有限公司 | 掩模传输装置、曝光装置及掩模传输方法 |
JP6742189B2 (ja) * | 2016-08-04 | 2020-08-19 | キヤノン株式会社 | インプリント装置、及び物品製造方法 |
DE102017213861A1 (de) * | 2017-08-09 | 2019-02-14 | Krones Ag | Behälterbehandlungsanlage |
US10714364B2 (en) * | 2017-08-31 | 2020-07-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for inspecting wafer carriers |
KR20210081597A (ko) * | 2019-12-24 | 2021-07-02 | 캐논 톡키 가부시키가이샤 | 성막 시스템 및 전자 디바이스 제조방법 |
CN114280891B (zh) * | 2020-09-28 | 2023-02-03 | 长鑫存储技术有限公司 | 光刻设备 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4999671A (en) * | 1986-07-11 | 1991-03-12 | Canon Kabushiki Kaisha | Reticle conveying device |
US5498118A (en) * | 1992-02-07 | 1996-03-12 | Nikon Corporation | Apparatus for and method of carrying a substrate |
US6473157B2 (en) * | 1992-02-07 | 2002-10-29 | Nikon Corporation | Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate |
US6048655A (en) * | 1992-02-07 | 2000-04-11 | Nikon Corporation | Method of carrying and aligning a substrate |
JP3031790B2 (ja) * | 1992-12-10 | 2000-04-10 | キヤノン株式会社 | 半導体製造装置 |
US5559584A (en) * | 1993-03-08 | 1996-09-24 | Nikon Corporation | Exposure apparatus |
JPH07245332A (ja) * | 1994-03-04 | 1995-09-19 | Hitachi Ltd | 半導体製造装置および半導体装置の製造方法ならびに半導体装置 |
JPH10154646A (ja) * | 1996-11-22 | 1998-06-09 | Nikon Corp | 搬送装置 |
JPH11204396A (ja) * | 1998-01-08 | 1999-07-30 | Canon Inc | 半導体製造システムおよびデバイス製造方法 |
US6466838B1 (en) * | 1998-05-14 | 2002-10-15 | Canon Kabushiki Kaisha | Semiconductor exposure apparatus and device manufacturing method using the same |
JP2000188318A (ja) * | 1998-12-22 | 2000-07-04 | Canon Inc | デバイス製造装置 |
TW446858B (en) * | 1999-04-21 | 2001-07-21 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using such a lithographic projection apparatus, and device made by such a method of manufacturing |
JP4365934B2 (ja) * | 1999-05-10 | 2009-11-18 | キヤノン株式会社 | 露光装置、半導体製造装置およびデバイス製造方法 |
JP3513437B2 (ja) * | 1999-09-01 | 2004-03-31 | キヤノン株式会社 | 基板管理方法及び半導体露光装置 |
-
2001
- 2001-09-06 AU AU2001284459A patent/AU2001284459A1/en not_active Abandoned
- 2001-09-06 CN CNA018180043A patent/CN1592948A/zh active Pending
- 2001-09-06 WO PCT/JP2001/007740 patent/WO2002021583A1/ja active Application Filing
- 2001-09-06 JP JP2002525906A patent/JP4466811B2/ja not_active Expired - Fee Related
- 2001-09-06 KR KR10-2003-7003305A patent/KR20030029926A/ko not_active Application Discontinuation
-
2003
- 2003-03-06 US US10/379,718 patent/US20040017556A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20040017556A1 (en) | 2004-01-29 |
CN1592948A (zh) | 2005-03-09 |
KR20030029926A (ko) | 2003-04-16 |
WO2002021583A9 (fr) | 2003-01-23 |
WO2002021583A1 (fr) | 2002-03-14 |
JP4466811B2 (ja) | 2010-05-26 |
JPWO2002021583A1 (ja) | 2004-01-15 |
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