ATE550456T1 - Vorrichtung und verfahren zur schnellen abscheidung von rutil-titandioxid - Google Patents

Vorrichtung und verfahren zur schnellen abscheidung von rutil-titandioxid

Info

Publication number
ATE550456T1
ATE550456T1 AT04794409T AT04794409T ATE550456T1 AT E550456 T1 ATE550456 T1 AT E550456T1 AT 04794409 T AT04794409 T AT 04794409T AT 04794409 T AT04794409 T AT 04794409T AT E550456 T1 ATE550456 T1 AT E550456T1
Authority
AT
Austria
Prior art keywords
titanium dioxide
plasma
rapid deposition
target
rutil
Prior art date
Application number
AT04794409T
Other languages
English (en)
Inventor
Norman Boling
Eric Krisl
Mark George
Miles Rains
Rober Gray
Original Assignee
Deposition Sciences Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deposition Sciences Inc filed Critical Deposition Sciences Inc
Application granted granted Critical
Publication of ATE550456T1 publication Critical patent/ATE550456T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
    • C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
AT04794409T 2003-10-07 2004-10-07 Vorrichtung und verfahren zur schnellen abscheidung von rutil-titandioxid ATE550456T1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US50887103P 2003-10-07 2003-10-07
US50887703P 2003-10-07 2003-10-07
US51200203P 2003-10-17 2003-10-17
PCT/US2004/033045 WO2005035822A1 (en) 2003-10-07 2004-10-07 Apparatus and process for high rate deposition of rutile titanium dioxide

Publications (1)

Publication Number Publication Date
ATE550456T1 true ATE550456T1 (de) 2012-04-15

Family

ID=34437665

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04794409T ATE550456T1 (de) 2003-10-07 2004-10-07 Vorrichtung und verfahren zur schnellen abscheidung von rutil-titandioxid

Country Status (5)

Country Link
US (1) US20050092599A1 (de)
EP (1) EP1680527B1 (de)
JP (1) JP2007507618A (de)
AT (1) ATE550456T1 (de)
WO (1) WO2005035822A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8133361B2 (en) * 2007-06-05 2012-03-13 Deposition Sciences, Inc. Thin film coating system and method
US20110233049A1 (en) * 2007-08-30 2011-09-29 Koninklijke Philips Electronics N.V. Sputtering system
JP2011500971A (ja) * 2007-10-26 2011-01-06 デポジッション サイエンス インク 薄膜コーティングシステムおよび方法
WO2010044922A1 (en) * 2008-06-12 2010-04-22 Anguel Nikolov Thin film and optical interference filter incorporating high-index titanium dioxide and method for making them
WO2011119727A1 (en) * 2010-03-23 2011-09-29 Deposition Sciences, Inc. Antireflection coating for multi-junction solar cells
JP6681683B2 (ja) * 2015-08-27 2020-04-15 日本電気硝子株式会社 光学膜及びその製造方法

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Publication number Priority date Publication date Assignee Title
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EP0641842B1 (de) * 1993-09-02 1998-05-06 MERCK PATENT GmbH Oberflächenmodifizierte Pigmente und deren Verwendung zur Vergilbungsinhibierung von pigmentierten Kunststoffen
EP0657562B1 (de) * 1993-11-12 2001-09-12 PPG Industries Ohio, Inc. Haltbare Sputterschicht aus Metalloxid
GB9405442D0 (en) * 1994-03-19 1994-05-04 Applied Vision Ltd Apparatus for coating substrates
JPH07333423A (ja) * 1994-06-08 1995-12-22 Hitachi Maxell Ltd 選択透過膜
WO1996006203A1 (en) * 1994-08-19 1996-02-29 Optical Coating Laboratory, Inc. Electrochromic materials and devices, and method
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KR100190558B1 (ko) * 1995-03-04 1999-10-15 구본준 강유전체 및 이를 채용한 반도체장치의 커패시터
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US6340544B1 (en) * 1996-09-19 2002-01-22 Fuji Xerox Co., Ltd. Process for recording image using photoelectrodeposition method and process for producing color filter using the same
DE19644752A1 (de) * 1996-10-28 1998-04-30 Leybold Systems Gmbh Interferenzschichtensystem
JP4005172B2 (ja) * 1997-05-16 2007-11-07 Ｈｏｙａ株式会社 両面同時成膜方法および装置
US6103320A (en) * 1998-03-05 2000-08-15 Shincron Co., Ltd. Method for forming a thin film of a metal compound by vacuum deposition
JP3735461B2 (ja) * 1998-03-27 2006-01-18 株式会社シンクロン 複合金属の化合物薄膜形成方法及びその薄膜形成装置
JP3776315B2 (ja) * 1998-07-24 2006-05-17 パクエス バイオ システムズ ベスローテン フェンノートシャップ アンモニアを含有する廃水の処理方法
JP2001240960A (ja) * 1999-12-21 2001-09-04 Nippon Sheet Glass Co Ltd 光触媒膜が被覆された物品、その物品の製造方法及びその膜を被覆するために用いるスパッタリングターゲット
JP3774353B2 (ja) * 2000-02-25 2006-05-10 株式会社シンクロン 金属化合物薄膜の形成方法およびその形成装置
JP3584854B2 (ja) * 2000-05-22 2004-11-04 日本板硝子株式会社 光沢性塗被紙およびその製造方法
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JP3997731B2 (ja) * 2001-03-19 2007-10-24 富士ゼロックス株式会社 基材上に結晶性半導体薄膜を形成する方法
JP4857496B2 (ja) * 2001-08-01 2012-01-18 大日本印刷株式会社 複合体、コーティング組成物、その塗膜、反射防止膜、反射防止フィルム、及び、画像表示装置

Also Published As

Publication number Publication date
JP2007507618A (ja) 2007-03-29
US20050092599A1 (en) 2005-05-05
EP1680527B1 (de) 2012-03-21
EP1680527A1 (de) 2006-07-19
EP1680527A4 (de) 2008-10-22
WO2005035822A1 (en) 2005-04-21

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