ATE545155T1 - Leistungshalbleiterbauelement - Google Patents
LeistungshalbleiterbauelementInfo
- Publication number
- ATE545155T1 ATE545155T1 AT10167819T AT10167819T ATE545155T1 AT E545155 T1 ATE545155 T1 AT E545155T1 AT 10167819 T AT10167819 T AT 10167819T AT 10167819 T AT10167819 T AT 10167819T AT E545155 T1 ATE545155 T1 AT E545155T1
- Authority
- AT
- Austria
- Prior art keywords
- doped
- layer
- additional
- collector
- power semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
- H10D18/60—Gate-turn-off devices
- H10D18/65—Gate-turn-off devices with turn-off by field effect
- H10D18/655—Gate-turn-off devices with turn-off by field effect produced by insulated gate structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D18/00—Thyristors
- H10D18/40—Thyristors with turn-on by field effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/028—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs
- H10D30/0291—Manufacture or treatment of FETs having insulated gates [IGFET] of double-diffused metal oxide semiconductor [DMOS] FETs of vertical DMOS [VDMOS] FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
Landscapes
- Thyristors (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10167819A EP2402997B1 (de) | 2010-06-30 | 2010-06-30 | Leistungshalbleiterbauelement |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE545155T1 true ATE545155T1 (de) | 2012-02-15 |
Family
ID=42985587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT10167819T ATE545155T1 (de) | 2010-06-30 | 2010-06-30 | Leistungshalbleiterbauelement |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8304814B2 (de) |
| EP (1) | EP2402997B1 (de) |
| JP (1) | JP5781383B2 (de) |
| KR (1) | KR101683751B1 (de) |
| CN (1) | CN102315257B (de) |
| AT (1) | ATE545155T1 (de) |
| ES (1) | ES2382185T3 (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5644793B2 (ja) * | 2012-03-02 | 2014-12-24 | 株式会社デンソー | 半導体装置 |
| US9666705B2 (en) * | 2012-05-14 | 2017-05-30 | Infineon Technologies Austria Ag | Contact structures for compound semiconductor devices |
| CN103579296B (zh) * | 2012-08-06 | 2016-09-07 | 三垦电气株式会社 | 半导体装置及其制造方法 |
| JP2015032744A (ja) * | 2013-08-05 | 2015-02-16 | 株式会社東芝 | 半導体装置および半導体装置の製造方法 |
| US9685506B2 (en) | 2015-03-05 | 2017-06-20 | Infineon Technologies Americas Corp. | IGBT having an inter-trench superjunction structure |
| US9831330B2 (en) | 2015-03-05 | 2017-11-28 | Infineon Technologies Americas Corp. | Bipolar semiconductor device having a deep charge-balanced structure |
| US9768284B2 (en) | 2015-03-05 | 2017-09-19 | Infineon Technologies Americas Corp. | Bipolar semiconductor device having a charge-balanced inter-trench structure |
| JP6406452B2 (ja) * | 2015-06-30 | 2018-10-17 | 富士電機株式会社 | 半導体装置及びその製造方法 |
| WO2018030440A1 (ja) | 2016-08-12 | 2018-02-15 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
| CN109449202B (zh) * | 2018-10-30 | 2021-10-22 | 广州工商学院 | 一种逆导双极型晶体管 |
| CN119050128B (zh) * | 2024-08-26 | 2025-06-06 | 西安电子科技大学 | 一种结合hk集电极栅的sj-ligbt器件结构 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0420233B1 (de) * | 1989-09-27 | 1995-11-29 | Nippon Paper Industries Co., Ltd. | Phthalsäuremetallsalzderivat und eine dieses enthaltende verdunkelnde und lichtgefühlige Platte |
| US5202750A (en) * | 1990-04-09 | 1993-04-13 | U.S. Philips Corp. | MOS-gated thyristor |
| JP3297060B2 (ja) * | 1990-09-17 | 2002-07-02 | 株式会社東芝 | 絶縁ゲート型サイリスタ |
| KR100327323B1 (ko) * | 2000-05-30 | 2002-03-06 | 김덕중 | 래치 업이 억제된 트랜치 게이트 구조의 전력용반도체소자 및 그 제조방법 |
| TW543146B (en) * | 2001-03-09 | 2003-07-21 | Fairchild Semiconductor | Ultra dense trench-gated power device with the reduced drain-source feedback capacitance and miller charge |
| JP4723816B2 (ja) * | 2003-12-24 | 2011-07-13 | 株式会社豊田中央研究所 | 半導体装置 |
| JP4731848B2 (ja) * | 2004-07-16 | 2011-07-27 | 株式会社豊田中央研究所 | 半導体装置 |
| US20080203535A1 (en) * | 2007-02-27 | 2008-08-28 | Masaaki Noda | Semiconductor device |
| JP2008288386A (ja) * | 2007-05-17 | 2008-11-27 | Hitachi Ltd | 半導体装置 |
| JP4544360B2 (ja) * | 2008-10-24 | 2010-09-15 | トヨタ自動車株式会社 | Ｉｇｂｔの製造方法 |
-
2010
- 2010-06-30 EP EP10167819A patent/EP2402997B1/de active Active
- 2010-06-30 AT AT10167819T patent/ATE545155T1/de active
- 2010-06-30 ES ES10167819T patent/ES2382185T3/es active Active
-
2011
- 2011-06-28 KR KR1020110062877A patent/KR101683751B1/ko active Active
- 2011-06-29 US US13/172,054 patent/US8304814B2/en active Active
- 2011-06-30 CN CN201110192302.XA patent/CN102315257B/zh active Active
- 2011-06-30 JP JP2011145616A patent/JP5781383B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| ES2382185T3 (es) | 2012-06-06 |
| KR101683751B1 (ko) | 2016-12-20 |
| JP2012015518A (ja) | 2012-01-19 |
| EP2402997B1 (de) | 2012-02-08 |
| CN102315257B (zh) | 2015-09-09 |
| CN102315257A (zh) | 2012-01-11 |
| JP5781383B2 (ja) | 2015-09-24 |
| US20120001199A1 (en) | 2012-01-05 |
| KR20120002455A (ko) | 2012-01-05 |
| EP2402997A1 (de) | 2012-01-04 |
| US8304814B2 (en) | 2012-11-06 |
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