ATE506635T1 - Imprint-lithografie - Google Patents
Imprint-lithografieInfo
- Publication number
- ATE506635T1 ATE506635T1 AT06255420T AT06255420T ATE506635T1 AT E506635 T1 ATE506635 T1 AT E506635T1 AT 06255420 T AT06255420 T AT 06255420T AT 06255420 T AT06255420 T AT 06255420T AT E506635 T1 ATE506635 T1 AT E506635T1
- Authority
- AT
- Austria
- Prior art keywords
- substrate
- hold
- substrate table
- imprint template
- imprint lithography
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Theoretical Computer Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Micromachines (AREA)
- Saccharide Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73317505P | 2005-11-04 | 2005-11-04 | |
US11/364,497 US8011915B2 (en) | 2005-11-04 | 2006-03-01 | Imprint lithography |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE506635T1 true ATE506635T1 (de) | 2011-05-15 |
Family
ID=37670937
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06255420T ATE506635T1 (de) | 2005-11-04 | 2006-10-21 | Imprint-lithografie |
Country Status (5)
Country | Link |
---|---|
US (4) | US8011915B2 (de) |
EP (1) | EP1783547B1 (de) |
JP (2) | JP4604012B2 (de) |
AT (1) | ATE506635T1 (de) |
DE (1) | DE602006021380D1 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7676088B2 (en) * | 2004-12-23 | 2010-03-09 | Asml Netherlands B.V. | Imprint lithography |
US7517211B2 (en) | 2005-12-21 | 2009-04-14 | Asml Netherlands B.V. | Imprint lithography |
JP5082262B2 (ja) * | 2006-03-03 | 2012-11-28 | コニカミノルタホールディングス株式会社 | 樹脂膜の製造方法 |
US8142702B2 (en) * | 2007-06-18 | 2012-03-27 | Molecular Imprints, Inc. | Solvent-assisted layer formation for imprint lithography |
JP5361309B2 (ja) * | 2008-09-25 | 2013-12-04 | キヤノン株式会社 | インプリント装置およびインプリント方法 |
WO2010082300A1 (ja) * | 2009-01-13 | 2010-07-22 | パイオニア株式会社 | 転写装置 |
EP2384875A4 (de) * | 2009-01-30 | 2014-03-12 | Konica Minolta Opto Inc | Vorrichtung zur herstellung einer wafer-linse und verfahren zur herstellung einer wafer-linse |
JP5404140B2 (ja) * | 2009-04-01 | 2014-01-29 | 株式会社東芝 | テンプレート及び半導体装置の製造方法 |
JP5443070B2 (ja) * | 2009-06-19 | 2014-03-19 | 東京エレクトロン株式会社 | インプリントシステム |
JP5495767B2 (ja) * | 2009-12-21 | 2014-05-21 | キヤノン株式会社 | インプリント装置及び方法、並びに物品の製造方法 |
NL2005975A (en) | 2010-03-03 | 2011-09-06 | Asml Netherlands Bv | Imprint lithography. |
JP5539011B2 (ja) | 2010-05-14 | 2014-07-02 | キヤノン株式会社 | インプリント装置、検出装置、位置合わせ装置、及び物品の製造方法 |
JP5411201B2 (ja) * | 2010-05-21 | 2014-02-12 | 東京エレクトロン株式会社 | インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体 |
JP5611112B2 (ja) * | 2010-05-21 | 2014-10-22 | 東京エレクトロン株式会社 | インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体 |
JP2012009831A (ja) * | 2010-05-21 | 2012-01-12 | Tokyo Electron Ltd | インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体 |
US9864279B2 (en) | 2010-08-05 | 2018-01-09 | Asml Netherlands B.V. | Imprint lithography |
FR2974194B1 (fr) * | 2011-04-12 | 2013-11-15 | Commissariat Energie Atomique | Procede de lithographie |
JP6032036B2 (ja) * | 2013-02-06 | 2016-11-24 | 大日本印刷株式会社 | インプリント方法およびインプリント装置 |
JP6123321B2 (ja) * | 2013-02-06 | 2017-05-10 | 大日本印刷株式会社 | インプリント方法およびインプリント装置 |
JP6028602B2 (ja) * | 2013-02-06 | 2016-11-16 | 大日本印刷株式会社 | インプリント方法およびインプリント装置 |
JP5611399B2 (ja) * | 2013-03-25 | 2014-10-22 | キヤノン株式会社 | 加工装置 |
CN105682808B (zh) * | 2013-08-19 | 2018-03-27 | 德克萨斯大学系统董事会 | 以纳米级精确度可程序化的沉积用户自定义外形的薄膜 |
JP6497849B2 (ja) * | 2014-04-15 | 2019-04-10 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
JP6399839B2 (ja) * | 2014-07-15 | 2018-10-03 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
JP6512840B2 (ja) * | 2015-01-22 | 2019-05-15 | キヤノン株式会社 | インプリント装置及び方法、並びに物品の製造方法 |
KR102097225B1 (ko) * | 2015-09-08 | 2020-04-03 | 캐논 가부시끼가이샤 | 나노임프린트 리소그래피에서의 기재 전처리 및 식각 균일성 |
CA3001848C (en) * | 2015-10-15 | 2023-09-19 | Board Of Regents, The University Of Texas System | Versatile process for precision nanoscale manufacturing |
KR102215539B1 (ko) * | 2015-11-20 | 2021-02-16 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 리소그래피 장치를 작동시키는 방법 |
JP6365619B2 (ja) * | 2016-10-17 | 2018-08-01 | 大日本印刷株式会社 | インプリント方法およびインプリント装置 |
JP6365620B2 (ja) * | 2016-10-17 | 2018-08-01 | 大日本印刷株式会社 | インプリント方法およびインプリント装置 |
Family Cites Families (66)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
US6482742B1 (en) * | 2000-07-18 | 2002-11-19 | Stephen Y. Chou | Fluid pressure imprint lithography |
US20040036201A1 (en) * | 2000-07-18 | 2004-02-26 | Princeton University | Methods and apparatus of field-induced pressure imprint lithography |
US6309580B1 (en) * | 1995-11-15 | 2001-10-30 | Regents Of The University Of Minnesota | Release surfaces, particularly for use in nanoimprint lithography |
US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
US6518189B1 (en) * | 1995-11-15 | 2003-02-11 | Regents Of The University Of Minnesota | Method and apparatus for high density nanostructures |
JPH09192573A (ja) * | 1996-01-22 | 1997-07-29 | Matsushita Electric Ind Co Ltd | 薄膜形成方法及び薄膜形成装置 |
JP3626504B2 (ja) * | 1997-03-10 | 2005-03-09 | アーエスエム リソグラフィ ベスローテン フェンノートシャップ | 2個の物品ホルダを有する位置決め装置 |
US6208407B1 (en) * | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
JPH11340129A (ja) | 1998-05-28 | 1999-12-10 | Seiko Epson Corp | パターン製造方法およびパターン製造装置 |
EP1003078A3 (de) * | 1998-11-17 | 2001-11-07 | Corning Incorporated | Verfahren zur Vervielfältigung eines Nanomusters |
JP2000182253A (ja) | 1998-12-15 | 2000-06-30 | Sony Corp | 情報記録再生装置 |
US6334960B1 (en) * | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
JP2000289037A (ja) | 1999-04-05 | 2000-10-17 | Toshiba Corp | 光学部品の成形方法とそれによる光学部品と光ヘッド装置およびそれらの製造方法および光ディスク装置 |
JP4440370B2 (ja) | 1999-05-21 | 2010-03-24 | 大日本印刷株式会社 | 可撓性シート基材へのパターン複製装置 |
EP1513513A4 (de) | 1999-07-30 | 2006-08-02 | Univ Kentucky Res Found | I cis /i -2,6-disubstituierte piperidine zur behandlung des missbrauchs und entzugs von psychostimulantien, essstörungen und erkrankungen und pathologien des zentralnervensystems |
US6517995B1 (en) * | 1999-09-14 | 2003-02-11 | Massachusetts Institute Of Technology | Fabrication of finely featured devices by liquid embossing |
SE515607C2 (sv) * | 1999-12-10 | 2001-09-10 | Obducat Ab | Anordning och metod vid tillverkning av strukturer |
US6165911A (en) * | 1999-12-29 | 2000-12-26 | Calveley; Peter Braden | Method of patterning a metal layer |
EP1257878B1 (de) * | 2000-01-21 | 2006-07-05 | Obducat Aktiebolag | Form zur nanobedruckung |
SE515785C2 (sv) * | 2000-02-23 | 2001-10-08 | Obducat Ab | Anordning för homogen värmning av ett objekt och användning av anordningen |
SE515962C2 (sv) * | 2000-03-15 | 2001-11-05 | Obducat Ab | Anordning för överföring av mönster till objekt |
SE0001367L (sv) | 2000-04-13 | 2001-10-14 | Obducat Ab | Apparat och förfarande för elektrokemisk bearbetning av substrat |
SE0001368L (sv) | 2000-04-13 | 2001-10-14 | Obducat Ab | Apparat och förfarande för elektrokemisk bearbetning av substrat |
SE516194C2 (sv) * | 2000-04-18 | 2001-12-03 | Obducat Ab | Substrat för samt process vid tillverkning av strukturer |
US6365059B1 (en) * | 2000-04-28 | 2002-04-02 | Alexander Pechenik | Method for making a nano-stamp and for forming, with the stamp, nano-size elements on a substrate |
SE516414C2 (sv) * | 2000-05-24 | 2002-01-15 | Obducat Ab | Metod vid tillverkning av en mall, samt mallen tillverkad därav |
US6921615B2 (en) * | 2000-07-16 | 2005-07-26 | Board Of Regents, The University Of Texas System | High-resolution overlay alignment methods for imprint lithography |
WO2002006902A2 (en) * | 2000-07-17 | 2002-01-24 | Board Of Regents, The University Of Texas System | Method and system of automatic fluid dispensing for imprint lithography processes |
US20050160011A1 (en) * | 2004-01-20 | 2005-07-21 | Molecular Imprints, Inc. | Method for concurrently employing differing materials to form a layer on a substrate |
US7211214B2 (en) * | 2000-07-18 | 2007-05-01 | Princeton University | Laser assisted direct imprint lithography |
US6954275B2 (en) * | 2000-08-01 | 2005-10-11 | Boards Of Regents, The University Of Texas System | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
SE519478C2 (sv) * | 2000-09-19 | 2003-03-04 | Obducat Ab | Etsförfarande, såväl som ramelement, mask och förtillverkat substratelement för användning i sådan etsning |
JP2002093748A (ja) | 2000-09-19 | 2002-03-29 | Nippon Telegr & Teleph Corp <Ntt> | インプリント装置及びインプリント方法 |
KR101031528B1 (ko) * | 2000-10-12 | 2011-04-27 | 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 | 실온 저압 마이크로- 및 나노- 임프린트 리소그래피용템플릿 |
US6964793B2 (en) * | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
US6847433B2 (en) * | 2001-06-01 | 2005-01-25 | Agere Systems, Inc. | Holder, system, and process for improving overlay in lithography |
SE519573C2 (sv) * | 2001-07-05 | 2003-03-11 | Obducat Ab | Stamp med antividhäftningsskikt samt sätt att framställa och sätt att reparera en sådan stamp |
JP3808741B2 (ja) | 2001-10-01 | 2006-08-16 | 東京エレクトロン株式会社 | 処理装置 |
US20030080472A1 (en) * | 2001-10-29 | 2003-05-01 | Chou Stephen Y. | Lithographic method with bonded release layer for molding small patterns |
JP2003249443A (ja) | 2001-12-21 | 2003-09-05 | Nikon Corp | ステージ装置、ステージ位置管理方法、露光方法及び露光装置、並びにデバイス製造方法 |
US7144539B2 (en) * | 2002-04-04 | 2006-12-05 | Obducat Ab | Imprint method and device |
EP1353229A1 (de) * | 2002-04-09 | 2003-10-15 | ASML Netherlands B.V. | Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und dabei hergesteller Artikel |
US7252492B2 (en) * | 2002-06-20 | 2007-08-07 | Obducat Ab | Devices and methods for aligning a stamp and a substrate |
US7077992B2 (en) * | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
US6908861B2 (en) * | 2002-07-11 | 2005-06-21 | Molecular Imprints, Inc. | Method for imprint lithography using an electric field |
US7070405B2 (en) * | 2002-08-01 | 2006-07-04 | Molecular Imprints, Inc. | Alignment systems for imprint lithography |
US7027156B2 (en) * | 2002-08-01 | 2006-04-11 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
US6916511B2 (en) * | 2002-10-24 | 2005-07-12 | Hewlett-Packard Development Company, L.P. | Method of hardening a nano-imprinting stamp |
US6755984B2 (en) * | 2002-10-24 | 2004-06-29 | Hewlett-Packard Development Company, L.P. | Micro-casted silicon carbide nano-imprinting stamp |
EP1606834B1 (de) * | 2003-03-27 | 2013-06-05 | Korea Institute Of Machinery & Materials | Uv-nanoimprint-lithografieverfahren unter verwendung eines elementweisen prägestempels |
US20040209123A1 (en) * | 2003-04-17 | 2004-10-21 | Bajorek Christopher H. | Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off |
TW568349U (en) * | 2003-05-02 | 2003-12-21 | Ind Tech Res Inst | Parallelism adjusting device for nano-transferring |
TW570290U (en) * | 2003-05-02 | 2004-01-01 | Ind Tech Res Inst | Uniform pressing device for nanometer transfer-print |
US6876439B2 (en) * | 2003-05-29 | 2005-04-05 | Asml Holding N.V. | Method to increase throughput in a dual substrate stage double exposure lithography system |
TWI409853B (zh) * | 2003-06-13 | 2013-09-21 | 尼康股份有限公司 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
JP2005045168A (ja) | 2003-07-25 | 2005-02-17 | Tokyo Electron Ltd | インプリント方法およびインプリント装置 |
TWI263859B (en) * | 2003-08-29 | 2006-10-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
JP2005101201A (ja) * | 2003-09-24 | 2005-04-14 | Canon Inc | ナノインプリント装置 |
JP2005153091A (ja) * | 2003-11-27 | 2005-06-16 | Hitachi Ltd | 転写方法及び転写装置 |
KR100585951B1 (ko) * | 2004-02-18 | 2006-06-01 | 한국기계연구원 | 조합/분리형 독립구동이 가능한 복수 개의 모듈을 갖는 임프린팅 장치 |
JP4393244B2 (ja) | 2004-03-29 | 2010-01-06 | キヤノン株式会社 | インプリント装置 |
US7878791B2 (en) | 2005-11-04 | 2011-02-01 | Asml Netherlands B.V. | Imprint lithography |
US7670530B2 (en) * | 2006-01-20 | 2010-03-02 | Molecular Imprints, Inc. | Patterning substrates employing multiple chucks |
KR101324549B1 (ko) * | 2005-12-08 | 2013-11-01 | 몰레큘러 임프린츠 인코퍼레이티드 | 기판의 양면 패턴화를 위한 방법 및 시스템 |
JP5194859B2 (ja) | 2008-02-12 | 2013-05-08 | 凸版印刷株式会社 | 光学シート及びバックライトユニット並びにディスプレイ装置 |
-
2006
- 2006-03-01 US US11/364,497 patent/US8011915B2/en active Active
- 2006-10-21 EP EP06255420A patent/EP1783547B1/de active Active
- 2006-10-21 DE DE602006021380T patent/DE602006021380D1/de active Active
- 2006-10-21 AT AT06255420T patent/ATE506635T1/de not_active IP Right Cessation
- 2006-10-31 JP JP2006296405A patent/JP4604012B2/ja active Active
-
2009
- 2009-10-15 JP JP2009237982A patent/JP4629147B2/ja active Active
-
2011
- 2011-08-04 US US13/198,425 patent/US9778563B2/en active Active
-
2017
- 2017-08-01 US US15/666,489 patent/US9864271B2/en active Active
- 2017-12-07 US US15/834,609 patent/US10025206B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US8011915B2 (en) | 2011-09-06 |
US10025206B2 (en) | 2018-07-17 |
EP1783547A3 (de) | 2007-05-30 |
US9778563B2 (en) | 2017-10-03 |
US20110283937A1 (en) | 2011-11-24 |
EP1783547A2 (de) | 2007-05-09 |
JP2007182063A (ja) | 2007-07-19 |
DE602006021380D1 (de) | 2011-06-01 |
JP2010016405A (ja) | 2010-01-21 |
JP4604012B2 (ja) | 2010-12-22 |
US20070102838A1 (en) | 2007-05-10 |
EP1783547B1 (de) | 2011-04-20 |
US20180095361A1 (en) | 2018-04-05 |
US9864271B2 (en) | 2018-01-09 |
US20170329218A1 (en) | 2017-11-16 |
JP4629147B2 (ja) | 2011-02-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |