ATE503252T1 - Hochdichte speichervorrichtung mit planarer magnetdomänenwand und herstellungsverfahren dafür - Google Patents

Hochdichte speichervorrichtung mit planarer magnetdomänenwand und herstellungsverfahren dafür

Info

Publication number
ATE503252T1
ATE503252T1 AT07867608T AT07867608T ATE503252T1 AT E503252 T1 ATE503252 T1 AT E503252T1 AT 07867608 T AT07867608 T AT 07867608T AT 07867608 T AT07867608 T AT 07867608T AT E503252 T1 ATE503252 T1 AT E503252T1
Authority
AT
Austria
Prior art keywords
shift register
domain wall
magnetic
register structures
storage device
Prior art date
Application number
AT07867608T
Other languages
English (en)
Inventor
Michael Gaidis
Lawrence Clevenger
Timothy Dalton
John Debrosse
Louis Hsu
Carl Radens
Keith Wong
Chih-Chao Yang
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of ATE503252T1 publication Critical patent/ATE503252T1/de

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C19/00—Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/02—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements
    • G11C19/08—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure
    • G11C19/0808—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation
    • G11C19/0841—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation using electric current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165—Auxiliary circuits
    • G11C11/1675—Writing or programming circuits or methods
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C5/00—Details of stores covered by group G11C11/00
    • G11C5/02—Disposition of storage elements, e.g. in the form of a matrix array
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/53—Means to assemble or disassemble
    • Y10T29/5313—Means to assemble electrical device
    • Y10T29/53165—Magnetic memory device
AT07867608T 2007-03-30 2007-12-04 Hochdichte speichervorrichtung mit planarer magnetdomänenwand und herstellungsverfahren dafür ATE503252T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/694,183 US7514271B2 (en) 2007-03-30 2007-03-30 Method of forming high density planar magnetic domain wall memory
PCT/US2007/024798 WO2008121134A1 (en) 2007-03-30 2007-12-04 High density planar magnetic domain wall memory apparatus and method of forming the same

Publications (1)

Publication Number Publication Date
ATE503252T1 true ATE503252T1 (de) 2011-04-15

Family

ID=39794015

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07867608T ATE503252T1 (de) 2007-03-30 2007-12-04 Hochdichte speichervorrichtung mit planarer magnetdomänenwand und herstellungsverfahren dafür

Country Status (7)

Country Link
US (3) US7514271B2 (de)
EP (1) EP2140458B1 (de)
JP (1) JP5063775B2 (de)
KR (1) KR101120808B1 (de)
AT (1) ATE503252T1 (de)
DE (1) DE602007013472D1 (de)
WO (1) WO2008121134A1 (de)

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US7514271B2 (en) * 2007-03-30 2009-04-07 International Business Machines Corporation Method of forming high density planar magnetic domain wall memory
KR101435516B1 (ko) * 2008-02-14 2014-08-29 삼성전자주식회사 자구벽 이동을 이용한 정보저장장치 및 그 동작방법
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US8102691B2 (en) * 2008-06-24 2012-01-24 Seagate Technology Llc Magnetic tracks with domain wall storage anchors
US7876595B2 (en) * 2008-09-19 2011-01-25 Seagate Technology Llc Magnetic shift register as counter and data storage device
US7969774B2 (en) * 2009-03-10 2011-06-28 Micron Technology, Inc. Electronic devices formed of two or more substrates bonded together, electronic systems comprising electronic devices and methods of making electronic devices
US8331125B2 (en) * 2009-08-26 2012-12-11 International Business Machines Corporation Array architecture and operation for high density magnetic racetrack memory system
US8164940B2 (en) * 2009-12-15 2012-04-24 Hitachi Global Storage Technologies Netherlands, B.V. Read/write structures for a three dimensional memory
US20110186946A1 (en) * 2010-02-04 2011-08-04 Qualcomm Incorporated Magnetic Tunnel Junction with Domain Wall Pinning
US8279662B2 (en) * 2010-11-11 2012-10-02 Seagate Technology Llc Multi-bit magnetic memory with independently programmable free layer domains
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US20140003118A1 (en) * 2012-07-02 2014-01-02 International Business Machines Corporation Magnetic tunnel junction self-alignment in magnetic domain wall shift register memory devices
US8923039B2 (en) 2012-11-06 2014-12-30 International Business Machines Corporation Multiple bit nonvolatile memory based on current induced domain wall motion in a nanowire magnetic tunnel junction
US8772889B2 (en) 2012-11-20 2014-07-08 International Business Machines Corporation Magnetic domain wall shift register memory device readout
US9048410B2 (en) 2013-05-31 2015-06-02 Micron Technology, Inc. Memory devices comprising magnetic tracks individually comprising a plurality of magnetic domains having domain walls and methods of forming a memory device comprising magnetic tracks individually comprising a plurality of magnetic domains having domain walls
JP6172850B2 (ja) 2013-07-30 2017-08-02 東芝メモリ株式会社 磁気記憶素子、磁気記憶装置、磁気メモリ、および磁気記憶素子の駆動方法
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WO2015171620A1 (en) 2014-05-05 2015-11-12 University Of South Florida Physically unclonable function based on domain wall memory and method of use
US20160064060A1 (en) * 2014-09-02 2016-03-03 Nanyang Technological University Method of forming a magnetic domain wall in a nanowire
WO2017074263A1 (en) * 2015-10-26 2017-05-04 Nanyang Technological University Magnetic memory devices and methods of operating the same
CN106533431A (zh) * 2016-11-03 2017-03-22 南京大学 一种低能耗金属基逻辑电路
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CN107611255B (zh) * 2017-09-11 2019-09-10 北京航空航天大学 一种高密度磁性存储器件
JP2019057545A (ja) 2017-09-19 2019-04-11 東芝メモリ株式会社 磁気記憶装置
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JP2021149769A (ja) 2020-03-23 2021-09-27 キオクシア株式会社 メモリシステムおよびシフトレジスタ型メモリ
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Also Published As

Publication number Publication date
EP2140458A1 (de) 2010-01-06
DE602007013472D1 (de) 2011-05-05
KR20100002255A (ko) 2010-01-06
US8009453B2 (en) 2011-08-30
US7514271B2 (en) 2009-04-07
KR101120808B1 (ko) 2012-03-26
US8023305B2 (en) 2011-09-20
US20080239785A1 (en) 2008-10-02
WO2008121134A1 (en) 2008-10-09
EP2140458B1 (de) 2011-03-23
JP5063775B2 (ja) 2012-10-31
JP2010524233A (ja) 2010-07-15
US20080239784A1 (en) 2008-10-02
US20080243972A1 (en) 2008-10-02
EP2140458A4 (de) 2010-05-05

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