ATE430993T1 - Lichtemittierende halbleiterdiode und herstellungsverfahren dafür - Google Patents

Lichtemittierende halbleiterdiode und herstellungsverfahren dafür

Info

Publication number
ATE430993T1
ATE430993T1 AT04773551T AT04773551T ATE430993T1 AT E430993 T1 ATE430993 T1 AT E430993T1 AT 04773551 T AT04773551 T AT 04773551T AT 04773551 T AT04773551 T AT 04773551T AT E430993 T1 ATE430993 T1 AT E430993T1
Authority
AT
Austria
Prior art keywords
light
electrodes
semiconductor
mount
semiconductor layers
Prior art date
Application number
AT04773551T
Other languages
English (en)
Inventor
Kenichiro Tanaka
Masao Kubo
Original Assignee
Panasonic Elec Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Elec Works Co Ltd filed Critical Panasonic Elec Works Co Ltd
Application granted granted Critical
Publication of ATE430993T1 publication Critical patent/ATE430993T1/de

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/483Containers
    • H01L33/486Containers adapted for surface mounting
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    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
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    • H01L24/82Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI]
    • HELECTRICITY
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    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
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    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
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    • H01L2224/82001Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected by forming build-up interconnects at chip-level, e.g. for high density interconnects [HDI] involving a temporary auxiliary member not forming part of the bonding apparatus
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    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92244Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a build-up interconnect
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    • H01L24/23Structure, shape, material or disposition of the high density interconnect connectors after the connecting process
    • H01L24/24Structure, shape, material or disposition of the high density interconnect connectors after the connecting process of an individual high density interconnect connector
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    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005Processes
    • H01L33/0093Wafer bonding; Removal of the growth substrate

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Led Device Packages (AREA)
  • Led Devices (AREA)
AT04773551T 2003-09-24 2004-09-24 Lichtemittierende halbleiterdiode und herstellungsverfahren dafür ATE430993T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003331060 2003-09-24
PCT/JP2004/014464 WO2005029599A2 (en) 2003-09-24 2004-09-24 Semiconductor light-emitting device and its manufacturing method

Publications (1)

Publication Number Publication Date
ATE430993T1 true ATE430993T1 (de) 2009-05-15

Family

ID=34373033

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04773551T ATE430993T1 (de) 2003-09-24 2004-09-24 Lichtemittierende halbleiterdiode und herstellungsverfahren dafür

Country Status (9)

Country Link
US (2) US7956377B2 (de)
EP (1) EP1665400B1 (de)
JP (1) JP4440928B2 (de)
KR (1) KR100728693B1 (de)
CN (1) CN100446280C (de)
AT (1) ATE430993T1 (de)
DE (1) DE602004021008D1 (de)
TW (1) TWI246783B (de)
WO (1) WO2005029599A2 (de)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442629B2 (en) 2004-09-24 2008-10-28 President & Fellows Of Harvard College Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate
US7057256B2 (en) 2001-05-25 2006-06-06 President & Fellows Of Harvard College Silicon-based visible and near-infrared optoelectric devices
TWI246783B (en) * 2003-09-24 2006-01-01 Matsushita Electric Works Ltd Light-emitting device and its manufacturing method
JP2006313829A (ja) * 2005-05-09 2006-11-16 Konica Minolta Opto Inc 白色発光ダイオード及びその製造方法
JP4766966B2 (ja) * 2005-09-07 2011-09-07 京セラ株式会社 発光素子
EP1928029B1 (de) * 2005-09-20 2018-10-31 Panasonic Intellectual Property Management Co., Ltd. Leuchtdioden-Baugruppe
TWI294674B (en) * 2005-12-06 2008-03-11 Subtron Technology Co Ltd High thermal conducting circuit substrate and manufacturing process thereof
US7521727B2 (en) 2006-04-26 2009-04-21 Rohm And Haas Company Light emitting device having improved light extraction efficiency and method of making same
US7955531B1 (en) 2006-04-26 2011-06-07 Rohm And Haas Electronic Materials Llc Patterned light extraction sheet and method of making same
KR100856326B1 (ko) * 2006-07-19 2008-09-03 삼성전기주식회사 레이저 리프트 오프를 이용한 유전체 박막을 갖는 박막 커패시터 내장된 인쇄회로기판 제조방법, 및 이로부터 제조된 박막 커패시터 내장된 인쇄회로기판
DE102007006640A1 (de) * 2007-02-06 2008-08-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Aufbringen einer Struktur auf ein Halbleiterbauelement
KR100853960B1 (ko) * 2007-04-12 2008-08-25 주식회사 이츠웰 대전류 표면실장형 발광다이오드 램프
DE102007030129A1 (de) 2007-06-29 2009-01-02 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung einer Mehrzahl optoelektronischer Bauelemente und optoelektronisches Bauelement
KR20090072980A (ko) * 2007-12-28 2009-07-02 서울옵토디바이스주식회사 발광 다이오드 및 그 제조방법
US20090322800A1 (en) * 2008-06-25 2009-12-31 Dolby Laboratories Licensing Corporation Method and apparatus in various embodiments for hdr implementation in display devices
JP4724222B2 (ja) 2008-12-12 2011-07-13 株式会社東芝 発光装置の製造方法
JP4686625B2 (ja) 2009-08-03 2011-05-25 株式会社東芝 半導体発光装置の製造方法
JP2011071272A (ja) 2009-09-25 2011-04-07 Toshiba Corp 半導体発光装置及びその製造方法
JP5349260B2 (ja) * 2009-11-19 2013-11-20 株式会社東芝 半導体発光装置及びその製造方法
CN102804430B (zh) 2010-01-19 2015-11-25 Lg伊诺特有限公司 封装结构及其制造方法
US8692198B2 (en) 2010-04-21 2014-04-08 Sionyx, Inc. Photosensitive imaging devices and associated methods
US8232117B2 (en) * 2010-04-30 2012-07-31 Koninklijke Philips Electronics N.V. LED wafer with laminated phosphor layer
CN103081128B (zh) 2010-06-18 2016-11-02 西奥尼克斯公司 高速光敏设备及相关方法
KR101725220B1 (ko) * 2010-12-22 2017-04-10 삼성전자 주식회사 형광체 도포 방법 및 형광체 도포 장치
KR101762173B1 (ko) * 2011-01-13 2017-08-04 삼성전자 주식회사 웨이퍼 레벨 발광 소자 패키지 및 그의 제조 방법
JP2012175069A (ja) * 2011-02-24 2012-09-10 Nitto Denko Corp 発光ダイオード装置の製造方法
JP5535114B2 (ja) * 2011-03-25 2014-07-02 株式会社東芝 発光装置、発光モジュール、発光装置の製造方法
KR101289186B1 (ko) * 2011-04-15 2013-07-26 삼성전기주식회사 인쇄회로기판 및 그 제조방법
KR20140034262A (ko) * 2011-06-01 2014-03-19 코닌클리케 필립스 엔.브이. 지지 기판에 접합된 발광 디바이스
US9496308B2 (en) 2011-06-09 2016-11-15 Sionyx, Llc Process module for increasing the response of backside illuminated photosensitive imagers and associated methods
WO2013010127A2 (en) 2011-07-13 2013-01-17 Sionyx, Inc. Biometric imaging devices and associated methods
WO2013021305A1 (en) * 2011-08-10 2013-02-14 Koninklijke Philips Electronics N.V. Wafer level processing of leds using carrier wafer
JP6100778B2 (ja) * 2011-08-16 2017-03-22 コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. スロット内に形成される反射壁部を備えるled混合チャンバ
WO2013050898A1 (en) * 2011-10-07 2013-04-11 Koninklijke Philips Electronics N.V. Electrically insulating bond for mounting a light emitting device
US8896010B2 (en) 2012-01-24 2014-11-25 Cooledge Lighting Inc. Wafer-level flip chip device packages and related methods
US8907362B2 (en) 2012-01-24 2014-12-09 Cooledge Lighting Inc. Light-emitting dies incorporating wavelength-conversion materials and related methods
WO2013112435A1 (en) 2012-01-24 2013-08-01 Cooledge Lighting Inc. Light - emitting devices having discrete phosphor chips and fabrication methods
US20130309792A1 (en) * 2012-05-21 2013-11-21 Michael A. Tischler Light-emitting dies incorporating wavelength-conversion materials and related methods
US10439107B2 (en) * 2013-02-05 2019-10-08 Cree, Inc. Chip with integrated phosphor
US9318674B2 (en) 2013-02-05 2016-04-19 Cree, Inc. Submount-free light emitting diode (LED) components and methods of fabricating same
US9209345B2 (en) 2013-06-29 2015-12-08 Sionyx, Inc. Shallow trench textured regions and associated methods
JP5827700B2 (ja) * 2014-01-10 2015-12-02 株式会社東芝 半導体発光装置及び発光装置
WO2015119858A1 (en) 2014-02-05 2015-08-13 Cooledge Lighting Inc. Light-emitting dies incorporating wavelength-conversion materials and related methods
KR102199991B1 (ko) 2014-05-28 2021-01-11 엘지이노텍 주식회사 발광 소자 및 이를 구비한 라이트 유닛
JP6329027B2 (ja) * 2014-08-04 2018-05-23 ミネベアミツミ株式会社 フレキシブルプリント基板
JP6413460B2 (ja) * 2014-08-08 2018-10-31 日亜化学工業株式会社 発光装置及び発光装置の製造方法
JP7071118B2 (ja) * 2014-08-19 2022-05-18 ルミレッズ ホールディング ベーフェー ダイレベルのレーザリフトオフ中の機械的損傷を減少させるサファイアコレクタ
JP2016111058A (ja) * 2014-12-02 2016-06-20 ウシオ電機株式会社 半導体発光素子の製造方法及び半導体発光素子
JP6609917B2 (ja) * 2014-12-02 2019-11-27 ウシオ電機株式会社 蛍光光源用発光素子の製造方法
JP6807334B2 (ja) * 2015-05-13 2021-01-06 ルミレッズ ホールディング ベーフェー ダイレベルのリフトオフの最中におけるメカニカルダメージを低減するためのサファイアコレクタ
JP6034456B2 (ja) * 2015-07-16 2016-11-30 株式会社東芝 半導体発光装置及び発光装置
JP6072192B2 (ja) * 2015-10-22 2017-02-01 株式会社東芝 半導体発光装置、半導体発光装置の製造方法、発光装置の製造方法
WO2018080963A1 (en) * 2016-10-24 2018-05-03 Invuity, Inc. Lighting element
JP7430990B2 (ja) 2019-06-26 2024-02-14 新光電気工業株式会社 配線基板の製造方法
JP2021158303A (ja) * 2020-03-30 2021-10-07 株式会社ディスコ レーザー加工装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5693963A (en) * 1994-09-19 1997-12-02 Kabushiki Kaisha Toshiba Compound semiconductor device with nitride
US6333522B1 (en) * 1997-01-31 2001-12-25 Matsushita Electric Industrial Co., Ltd. Light-emitting element, semiconductor light-emitting device, and manufacturing methods therefor
EP0924966A1 (de) * 1997-06-30 1999-06-23 Aventis Research & Technologies GmbH & Co. KG Dünnschnitt-Elektrode für flache organische lichtemittierende Vorrichtungen und Herstellungsverfahren
JP3592553B2 (ja) * 1998-10-15 2004-11-24 株式会社東芝 窒化ガリウム系半導体装置
US6744800B1 (en) * 1998-12-30 2004-06-01 Xerox Corporation Method and structure for nitride based laser diode arrays on an insulating substrate
JP2000196197A (ja) 1998-12-30 2000-07-14 Xerox Corp 成長基板が除去された窒化物レ―ザダイオ―ドの構造及び窒化物レ―ザダイオ―ドアレイ構造の製造方法
JP4362905B2 (ja) * 1999-09-21 2009-11-11 富士ゼロックス株式会社 自己走査型発光装置、書き込み用光源および光プリンタ
CN1203596C (zh) * 2000-02-16 2005-05-25 日亚化学工业株式会社 氮化物半导体激光元件
US6878973B2 (en) * 2001-08-23 2005-04-12 Lumileds Lighting U.S., Llc Reduction of contamination of light emitting devices
EP1460694A1 (de) * 2001-11-19 2004-09-22 Sanyo Electric Co., Ltd. Zusammengesetzte halbleiterlichtemissionseinrichtung und verfahren zu ihrer herstellung
JP4055405B2 (ja) * 2001-12-03 2008-03-05 ソニー株式会社 電子部品及びその製造方法
TW554553B (en) * 2002-08-09 2003-09-21 United Epitaxy Co Ltd Sub-mount for high power light emitting diode
TWI246783B (en) * 2003-09-24 2006-01-01 Matsushita Electric Works Ltd Light-emitting device and its manufacturing method

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US20060231853A1 (en) 2006-10-19
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US20090186431A1 (en) 2009-07-23
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CN1830097A (zh) 2006-09-06
WO2005029599A2 (en) 2005-03-31
EP1665400B1 (de) 2009-05-06
US7956377B2 (en) 2011-06-07
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US7923270B2 (en) 2011-04-12
TWI246783B (en) 2006-01-01
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