ATE391732T1 - Verwendung einer zusamensetzung zur herstellung einer trennwand einer dünnen anzeigetafel - Google Patents

Verwendung einer zusamensetzung zur herstellung einer trennwand einer dünnen anzeigetafel

Info

Publication number
ATE391732T1
ATE391732T1 AT01102880T AT01102880T ATE391732T1 AT E391732 T1 ATE391732 T1 AT E391732T1 AT 01102880 T AT01102880 T AT 01102880T AT 01102880 T AT01102880 T AT 01102880T AT E391732 T1 ATE391732 T1 AT E391732T1
Authority
AT
Austria
Prior art keywords
composition
thin display
bulkhead
display panel
partition
Prior art date
Application number
AT01102880T
Other languages
English (en)
Inventor
Noriya Hayashi
Original Assignee
Mitsubishi Heavy Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Ind Ltd filed Critical Mitsubishi Heavy Ind Ltd
Application granted granted Critical
Publication of ATE391732T1 publication Critical patent/ATE391732T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J11/36—Spacers, barriers, ribs, partitions or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Polymerisation Methods In General (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Glass Compositions (AREA)
  • Paints Or Removers (AREA)
AT01102880T 2000-02-22 2001-02-14 Verwendung einer zusamensetzung zur herstellung einer trennwand einer dünnen anzeigetafel ATE391732T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000044205A JP4240733B2 (ja) 2000-02-22 2000-02-22 薄型ディスプレイパネルの隔壁用組成物

Publications (1)

Publication Number Publication Date
ATE391732T1 true ATE391732T1 (de) 2008-04-15

Family

ID=18567006

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01102880T ATE391732T1 (de) 2000-02-22 2001-02-14 Verwendung einer zusamensetzung zur herstellung einer trennwand einer dünnen anzeigetafel

Country Status (9)

Country Link
US (1) US6861455B2 (de)
EP (1) EP1130036B1 (de)
JP (1) JP4240733B2 (de)
KR (1) KR100531986B1 (de)
CN (1) CN1229839C (de)
AT (1) ATE391732T1 (de)
CA (1) CA2333896C (de)
DE (1) DE60133507T2 (de)
RU (1) RU2213748C2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001089639A (ja) * 1999-09-24 2001-04-03 Mitsubishi Heavy Ind Ltd エネルギー線硬化樹脂組成物
JP4240733B2 (ja) * 2000-02-22 2009-03-18 三菱重工業株式会社 薄型ディスプレイパネルの隔壁用組成物
JP4282518B2 (ja) * 2004-03-22 2009-06-24 東京応化工業株式会社 感光性絶縁ペースト組成物、およびそれを用いた感光性フィルム
JP2006036756A (ja) * 2004-06-22 2006-02-09 Mitsui Chemicals Inc イオン性化合物およびそれを含む樹脂
KR100927610B1 (ko) * 2005-01-05 2009-11-23 삼성에스디아이 주식회사 감광성 페이스트 조성물, 및 이를 이용하여 제조된플라즈마 디스플레이 패널
TW200716361A (en) * 2005-07-27 2007-05-01 Mitsubishi Heavy Ind Ltd Rtm process
KR101299111B1 (ko) 2006-04-06 2013-08-28 주식회사 동진쎄미켐 플라즈마 디스플레이 패널 격벽용 페이스트 조성물
US8323796B2 (en) * 2007-07-17 2012-12-04 United Technologies Corporation High temperature refractory coatings for ceramic substrates
JP5444702B2 (ja) * 2008-12-05 2014-03-19 デクセリアルズ株式会社 新規なスルホニウムボレート錯体
JP5667970B2 (ja) 2011-12-26 2015-02-12 株式会社日立製作所 複合材料
WO2014061590A1 (ja) * 2012-10-19 2014-04-24 東レ株式会社 絶縁膜の形成方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1587536A (en) * 1977-07-05 1981-04-08 Ciba Geigy Ag Expoxide resin-impregnated composites
US4222835A (en) * 1978-05-25 1980-09-16 Westinghouse Electric Corp. In depth curing of resins induced by UV radiation
US4351708A (en) * 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
JPH0644452B2 (ja) 1984-07-13 1994-06-08 奥野製薬工業株式会社 表示装置
JP3034731B2 (ja) 1992-07-23 2000-04-17 東洋ゴム工業株式会社 エアバッグ装置の組立て方法
US5274148A (en) * 1992-08-10 1993-12-28 Isp Investments, Inc. Dialky alkoxy phenyl sulfonium salt cationic initiators
US5840465A (en) * 1995-07-17 1998-11-24 Taiyo Ink Manufacturing Co., Ltd. Compositions and method for formation of barrier ribs of plasma display panel
FR2727416A1 (fr) * 1994-11-24 1996-05-31 Rhone Poulenc Chimie Nouveaux amorceurs cationiques thermoactivables, de polymerisation et/ou de reticulation et compositions monomeres et/ou polymeres fonctionnels les mettant en oeuvre
TW375759B (en) * 1996-07-10 1999-12-01 Toray Industries Plasma display and preparation thereof
JPH10158031A (ja) 1996-11-27 1998-06-16 Kyocera Corp プラズマディスプレイパネルの隔壁用組成物及びそれを用いた隔壁の製造方法
US5730764A (en) * 1997-01-24 1998-03-24 Williamson; Sue Ellen Coated abrasive systems employing ionizing irradiation cured epoxy resins as binder
JP3950241B2 (ja) 1997-10-17 2007-07-25 三菱重工業株式会社 樹脂組成物、樹脂硬化物、及び構造物の補修方法、補強方法、補修用材料、補強用材料
JP3442274B2 (ja) * 1997-12-25 2003-09-02 富士通株式会社 表示パネルの隔壁形成方法
US6352763B1 (en) * 1998-12-23 2002-03-05 3M Innovative Properties Company Curable slurry for forming ceramic microstructures on a substrate using a mold
US6306948B1 (en) * 1999-10-26 2001-10-23 3M Innovative Properties Company Molding composition containing a debinding catalyst for making ceramic microstructures
JP4240733B2 (ja) * 2000-02-22 2009-03-18 三菱重工業株式会社 薄型ディスプレイパネルの隔壁用組成物

Also Published As

Publication number Publication date
EP1130036A3 (de) 2003-12-17
CA2333896A1 (en) 2001-08-22
CA2333896C (en) 2007-05-01
DE60133507T2 (de) 2009-04-30
CN1324091A (zh) 2001-11-28
US6861455B2 (en) 2005-03-01
RU2213748C2 (ru) 2003-10-10
JP2001236886A (ja) 2001-08-31
KR100531986B1 (ko) 2005-11-30
EP1130036A2 (de) 2001-09-05
DE60133507D1 (de) 2008-05-21
JP4240733B2 (ja) 2009-03-18
EP1130036B1 (de) 2008-04-09
CN1229839C (zh) 2005-11-30
KR20010096570A (ko) 2001-11-07
US20020004353A1 (en) 2002-01-10

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