ATE369901T1 - Verfahren zur herstellung einer halbleitervorrichtung mit betriebsflüssigkeitsaufbereitung - Google Patents

Verfahren zur herstellung einer halbleitervorrichtung mit betriebsflüssigkeitsaufbereitung

Info

Publication number
ATE369901T1
ATE369901T1 AT00302597T AT00302597T ATE369901T1 AT E369901 T1 ATE369901 T1 AT E369901T1 AT 00302597 T AT00302597 T AT 00302597T AT 00302597 T AT00302597 T AT 00302597T AT E369901 T1 ATE369901 T1 AT E369901T1
Authority
AT
Austria
Prior art keywords
filter film
semiconductor device
producing
liquid processing
operating liquid
Prior art date
Application number
AT00302597T
Other languages
English (en)
Inventor
Motoyuki Tsuihiji
Hirofumi Iinuma
Original Assignee
Sanyo Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP32446599A external-priority patent/JP3316484B2/ja
Priority claimed from JP32436799A external-priority patent/JP3291487B2/ja
Priority claimed from JP32436699A external-priority patent/JP3316483B2/ja
Priority claimed from JP35382299A external-priority patent/JP3291488B2/ja
Application filed by Sanyo Electric Co filed Critical Sanyo Electric Co
Application granted granted Critical
Publication of ATE369901T1 publication Critical patent/ATE369901T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/08—Flat membrane modules
    • B01D63/082—Flat membrane modules comprising a stack of flat membranes
    • B01D63/0822—Plate-and-frame devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D25/00—Filters formed by clamping together several filtering elements or parts of such elements
    • B01D25/12—Filter presses, i.e. of the plate or plate and frame type
    • B01D25/164—Chamber-plate presses, i.e. the sides of the filtering elements being clamped between two successive filtering plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
    • B01D29/13—Supported filter elements
    • B01D29/15—Supported filter elements arranged for inward flow filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/39—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with hollow discs side by side on, or around, one or more tubes, e.g. of the leaf type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
    • B01D29/52—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in parallel connection
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
    • B01D29/56—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
    • B01D29/56—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection
    • B01D29/58—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection arranged concentrically or coaxially
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/70—Regenerating the filter material in the filter by forces created by movement of the filter element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/76—Handling the filter cake in the filter for purposes other than for regenerating
    • B01D29/86—Retarding cake deposition on the filter during the filtration period, e.g. using stirrers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D36/00—Filter circuits or combinations of filters with other separating devices
    • B01D36/02—Combinations of filters of different kinds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D36/00—Filter circuits or combinations of filters with other separating devices
    • B01D36/04—Combinations of filters with settling tanks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B01D37/02—Precoating the filter medium; Addition of filter aids to the liquid being filtered
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D37/00—Processes of filtration
    • B01D37/04—Controlling the filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/08—Flat membrane modules
    • B01D63/082—Flat membrane modules comprising a stack of flat membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/14—Dynamic membranes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Hydrology & Water Resources (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Filtration Of Liquid (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Formation Of Insulating Films (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Separation Of Suspended Particles By Flocculating Agents (AREA)
  • Filtering Materials (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
AT00302597T 1999-05-27 2000-03-29 Verfahren zur herstellung einer halbleitervorrichtung mit betriebsflüssigkeitsaufbereitung ATE369901T1 (de)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP14835199 1999-05-27
JP14835299 1999-05-27
JP14835399 1999-05-27
JP32446599A JP3316484B2 (ja) 1999-05-27 1999-11-15 半導体装置の製造方法
JP32436799A JP3291487B2 (ja) 1999-05-27 1999-11-15 流体の被除去物除去方法
JP32436699A JP3316483B2 (ja) 1999-05-27 1999-11-15 流体の被除去物除去装置
JP35382299A JP3291488B2 (ja) 1999-05-27 1999-12-14 流体の被除去物除去方法

Publications (1)

Publication Number Publication Date
ATE369901T1 true ATE369901T1 (de) 2007-09-15

Family

ID=27566130

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00302597T ATE369901T1 (de) 1999-05-27 2000-03-29 Verfahren zur herstellung einer halbleitervorrichtung mit betriebsflüssigkeitsaufbereitung

Country Status (4)

Country Link
EP (4) EP1055445A3 (de)
AT (1) ATE369901T1 (de)
DE (1) DE60035919T2 (de)
ES (1) ES2291172T3 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4210462B2 (ja) * 2002-03-29 2009-01-21 株式会社ディスコ 切削装置
US20040262209A1 (en) * 2003-04-25 2004-12-30 Hiroyuki Umezawa Filtration apparatus
JP4368249B2 (ja) 2004-06-01 2009-11-18 三洋電機株式会社 処理装置およびそれを用いた被処理水の処理方法
JP4326489B2 (ja) 2005-03-22 2009-09-09 三洋電機株式会社 排水処理装置および排水処理方法
DE102005014818A1 (de) * 2005-03-30 2006-10-05 Spörl KG Filtermodul
DE102006022502A1 (de) * 2006-05-08 2007-11-29 Ltn Nanovation Ag Filtereinheit für die Abwasseraufbereitung und die Trinkwassergewinnung
KR20090121297A (ko) 2007-03-02 2009-11-25 스미쓰 앤드 네퓨 피엘씨 생물학적 시료의 여과시 초음파, 역세정 및 필터 이동에 의한 필터 세정용 기기 및 방법
JP2009095941A (ja) 2007-10-17 2009-05-07 Disco Abrasive Syst Ltd 加工廃液処理装置
GB2457501B (en) * 2008-02-18 2011-01-05 Dirt Bags Ltd Dirtbag
US8997998B2 (en) 2008-07-25 2015-04-07 Smith & Nephew Plc Controller for an acoustic standing wave generation device in order to prevent clogging of a filter
DE102009044204A1 (de) 2009-10-08 2011-04-28 Fab Service Gmbh Wiederaufbereitungsverfahren und Wiederaufbereitungsvorrichtung zur Wiederaufbereitung von Slurry-Abwasser aus einem Halbleiterbearbeitungs-prozess, insbesondere aus einem chemisch-mechanischen Polierprozess
CN102070276B (zh) * 2009-11-03 2013-10-23 环保科技环境咨询有限公司 利用自动控制超声波进行污泥减量化和改善分离液性状的污、废水处理装置及其方法
DE102011056633B4 (de) 2011-12-19 2014-02-13 Highq-Factory Gmbh Verfahren zum Reinigen eines Filters
FI125050B (fi) * 2012-10-10 2015-05-15 Aslak Siimes Järjestelmä ja menetelmä virtaavan nesteen puhdistamiseksi
RU175942U1 (ru) * 2017-04-03 2017-12-25 Ольга Юрьевна Чернова Топливный фильтр-диспергатор
CN111054727B (zh) * 2019-12-06 2021-02-12 占慧楠 一种基于资源再利用的餐厨废弃物处理装置
DE102020101027A1 (de) 2020-01-17 2021-07-22 Beresa GmbH & Co. KG Trennvorrichtung und Verfahren zum Trennen von Feststoffen aus einem Feststoff-Flüssigkeits-Gemisch
CN112587990B (zh) * 2020-12-04 2022-03-11 黄冈市吉宏包装有限公司 一种胶印机润版液的循环过滤装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH511629A (fr) * 1969-03-27 1971-08-31 Brasco Sa Appareil de filtration d'un fluide sous pression
US3735872A (en) * 1971-07-12 1973-05-29 M H Denver Anderson Filter system
JP2621870B2 (ja) * 1987-07-16 1997-06-18 九州日本電気株式会社 シリコンウエハー研磨排水処理方法
US5062968A (en) * 1987-09-14 1991-11-05 Warning Theodore A Apparatus and process for filtering fluids
DE69421577T2 (de) * 1993-08-16 2000-07-13 Ebara Corp Vorrichtung zur Behandlung von Abfall in einer Poliervorrichtung
DE19534102C2 (de) * 1995-09-14 2001-11-08 Peter Anthony Miller Verfahren und Vorrichtung zur Tiefenfiltration von Flüssigkeiten
US6033566A (en) * 1996-07-12 2000-03-07 Jtj Systems, Inc. Continuous flow filter system
AU6508996A (en) * 1996-08-05 1998-02-25 Peter Anthony Miller Apparatus for liquid purification

Also Published As

Publication number Publication date
EP1055446A2 (de) 2000-11-29
EP1055445A2 (de) 2000-11-29
EP1055446B1 (de) 2007-08-15
DE60035919T2 (de) 2008-05-08
EP1055447A2 (de) 2000-11-29
EP1055448A3 (de) 2001-05-16
EP1055445A3 (de) 2001-08-29
ES2291172T3 (es) 2008-03-01
EP1055447A3 (de) 2001-05-16
EP1055448A2 (de) 2000-11-29
EP1055446A3 (de) 2001-05-16
DE60035919D1 (de) 2007-09-27

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