ATE303T1 - Verfahren und vorrichtung zur messung der ebenheit, der rauhigkeit oder des kruemmungsradius einer messflaeche. - Google Patents

Verfahren und vorrichtung zur messung der ebenheit, der rauhigkeit oder des kruemmungsradius einer messflaeche.

Info

Publication number
ATE303T1
ATE303T1 AT79104110T AT79104110T ATE303T1 AT E303 T1 ATE303 T1 AT E303T1 AT 79104110 T AT79104110 T AT 79104110T AT 79104110 T AT79104110 T AT 79104110T AT E303 T1 ATE303 T1 AT E303T1
Authority
AT
Austria
Prior art keywords
components
phase
points
measured
measuring
Prior art date
Application number
AT79104110T
Other languages
German (de)
English (en)
Inventor
Guenter Makosch
Bernhard Solf
Original Assignee
International Business Machines Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corporation filed Critical International Business Machines Corporation
Application granted granted Critical
Publication of ATE303T1 publication Critical patent/ATE303T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
AT79104110T 1978-11-30 1979-10-23 Verfahren und vorrichtung zur messung der ebenheit, der rauhigkeit oder des kruemmungsradius einer messflaeche. ATE303T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2851750A DE2851750B1 (de) 1978-11-30 1978-11-30 Verfahren und Vorrichtung zur Messung der Ebenheit der Rauhigkeit oder des Kruemmungsradius einer Messflaeche
EP79104110A EP0011708B1 (de) 1978-11-30 1979-10-23 Verfahren und Vorrichtung zur Messung der Ebenheit, der Rauhigkeit oder des Krümmungsradius einer Messfläche

Publications (1)

Publication Number Publication Date
ATE303T1 true ATE303T1 (de) 1981-10-15

Family

ID=6055909

Family Applications (1)

Application Number Title Priority Date Filing Date
AT79104110T ATE303T1 (de) 1978-11-30 1979-10-23 Verfahren und vorrichtung zur messung der ebenheit, der rauhigkeit oder des kruemmungsradius einer messflaeche.

Country Status (6)

Country Link
US (1) US4298283A (fi)
EP (1) EP0011708B1 (fi)
JP (1) JPS6017041B2 (fi)
AT (1) ATE303T1 (fi)
DE (2) DE2851750B1 (fi)
IT (1) IT1165365B (fi)

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JPS567006A (en) * 1979-06-22 1981-01-24 Ibm Method of extending measurement range of interference
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US4606638A (en) * 1983-11-03 1986-08-19 Zygo Corporation Distance measuring interferometer and method of use
DE3376502D1 (en) * 1983-12-27 1988-06-09 Ibm Deutschland Method and apparatus for measuring surface profiles
US4681447A (en) * 1984-03-16 1987-07-21 Hewlett Packard Company Interferometer apparatus and method for determining the spatial relationship of two or more objects
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JPS61219802A (ja) * 1985-03-27 1986-09-30 Hitachi Ltd 変位の光学的測定装置
JPS6288902A (ja) * 1985-10-16 1987-04-23 Hitachi Ltd 変位の光学的測定方法および測定装置
DE3574280D1 (en) * 1985-12-23 1989-12-21 Ibm Deutschland Method and arrangement for optically determining surface profiles
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US5253038A (en) * 1986-03-03 1993-10-12 U.S. Philips Corp. Interferometric device for detecting a centering error
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US4844616A (en) * 1988-05-31 1989-07-04 International Business Machines Corporation Interferometric dimensional measurement and defect detection method
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EP0561015A1 (de) * 1992-03-17 1993-09-22 International Business Machines Corporation Interferometrische Phasenmessung
US5706212A (en) * 1996-03-20 1998-01-06 Board Of Regents Of University Of Nebraska Infrared ellipsometer/polarimeter system, method of calibration, and use thereof
JPH06137830A (ja) * 1992-10-23 1994-05-20 Canon Inc 干渉計測方法及び干渉計測装置
US5506672A (en) * 1993-09-08 1996-04-09 Texas Instruments Incorporated System for measuring slip dislocations and film stress in semiconductor processing utilizing an adjustable height rotating beam splitter
US5469259A (en) * 1994-01-03 1995-11-21 International Business Machines Corporation Inspection interferometer with scanning autofocus, and phase angle control features
US5473434A (en) * 1994-05-16 1995-12-05 Zygo Corporation Phase shifting interferometer and method for surface topography measurement
US5764363A (en) * 1995-06-30 1998-06-09 Nikon Corporation Apparatus for observing a surface using polarized light
DE19600491C1 (de) * 1996-01-09 1997-07-17 Ibm Interferometrische Meßeinrichtung
US5953448A (en) * 1996-03-01 1999-09-14 Textile/Clothing Technology Corporation Contour measurement of an object having a discontinuous surface using block point identification techniques
US5612535A (en) * 1996-06-07 1997-03-18 Wang; Youqi Spin-split scanning electron microscope
JPH10104524A (ja) * 1996-08-08 1998-04-24 Nikon Corp 微分干渉顕微鏡
US5784163A (en) * 1996-09-23 1998-07-21 International Business Machines Corporation Optical differential profile measurement apparatus and process
US5703684A (en) * 1996-09-23 1997-12-30 International Business Machines Corporation Apparatus for optical differential measurement of glide height above a magnetic disk
US5926266A (en) * 1996-09-23 1999-07-20 International Business Machines Corporation Optical apparatus for rapid defect analysis
DE19714202A1 (de) * 1997-04-07 1998-10-15 Bosch Gmbh Robert Vorrichtung zum optischen Prüfen von Oberflächen
US5872629A (en) * 1997-06-23 1999-02-16 Charles Evans & Associates Analytical depth monitor utilizing differential interferometric analysis
US5798837A (en) 1997-07-11 1998-08-25 Therma-Wave, Inc. Thin film optical measurement system and method with calibrating ellipsometer
US6278519B1 (en) 1998-01-29 2001-08-21 Therma-Wave, Inc. Apparatus for analyzing multi-layer thin film stacks on semiconductors
US6320665B1 (en) * 1998-12-29 2001-11-20 Bryan Kok Ann Ngoi Acousto optic scanning laser vibrometer for determining the dynamic properties of an object
DE10042140A1 (de) * 2000-08-28 2002-03-14 Leica Microsystems Beleuchtungs- und Abbildungseinrichtung für mehrere Spektralbereiche und Koordinatenmessmaschine mit einer Beleuchtungs- und Abbildungseinrichtung für mehrere Spektralbereiche
US6643027B2 (en) * 2001-08-14 2003-11-04 Agilent Technologies, Inc. Optical measurement system and method for determining height differential between two surfaces
US7064828B1 (en) 2001-12-19 2006-06-20 Nanometrics Incorporated Pulsed spectroscopy with spatially variable polarization modulation element
JP3677263B2 (ja) * 2002-09-30 2005-07-27 株式会社東芝 試料面の高さ位置調整方法
US7221459B2 (en) * 2003-03-24 2007-05-22 International Business Machines Corporation Method and system for interferometric height measurement
US7061613B1 (en) 2004-01-13 2006-06-13 Nanometrics Incorporated Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation
US7453577B2 (en) * 2004-12-14 2008-11-18 Asml Netherlands B.V. Apparatus and method for inspecting a patterned part of a sample
DE102005061834B4 (de) 2005-12-23 2007-11-08 Ioss Intelligente Optische Sensoren & Systeme Gmbh Vorrichtung und Verfahren zum optischen Prüfen einer Oberfläche
JP5627260B2 (ja) 2009-05-22 2014-11-19 キヤノン株式会社 撮像装置および撮像方法
US9417281B1 (en) * 2014-09-30 2016-08-16 Checkpoint Technologies Llc Adjustable split-beam optical probing (ASOP)
KR102339215B1 (ko) * 2018-08-10 2021-12-14 전북대학교산학협력단 검사 장치 및 검사 방법
WO2020032689A1 (en) * 2018-08-10 2020-02-13 Industrial Cooperation Foundation Chonbuk National University Inspection apparatus and inspection method
JP7460080B2 (ja) * 2020-10-19 2024-04-02 浜松ホトニクス株式会社 光学特性評価装置および光学特性評価方法

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US3849003A (en) * 1970-03-25 1974-11-19 Philips Corp Interferometer apparatus for measuring the roughness of a surface
US3635552A (en) * 1970-04-14 1972-01-18 Philips Corp Optical interferometer
JPS54656B1 (fi) * 1971-06-18 1979-01-13
DE2622787C2 (de) * 1976-05-21 1978-05-18 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur interferometrischen Abstands-, Dicken- oder Ebenheitsmessung
DE2658399A1 (de) * 1976-12-23 1978-06-29 Ibm Deutschland Interferometrisches verfahren
US4188122A (en) * 1978-03-27 1980-02-12 Rockwell International Corporation Interferometer

Also Published As

Publication number Publication date
DE2851750B1 (de) 1980-03-06
DE2851750C2 (fi) 1980-11-06
JPS6017041B2 (ja) 1985-04-30
EP0011708B1 (de) 1981-10-14
IT7927150A0 (it) 1979-11-09
JPS5575603A (en) 1980-06-07
DE2961022D1 (en) 1981-12-24
IT1165365B (it) 1987-04-22
EP0011708A1 (de) 1980-06-11
US4298283A (en) 1981-11-03

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