ATE303T1 - Verfahren und vorrichtung zur messung der ebenheit, der rauhigkeit oder des kruemmungsradius einer messflaeche. - Google Patents
Verfahren und vorrichtung zur messung der ebenheit, der rauhigkeit oder des kruemmungsradius einer messflaeche.Info
- Publication number
- ATE303T1 ATE303T1 AT79104110T AT79104110T ATE303T1 AT E303 T1 ATE303 T1 AT E303T1 AT 79104110 T AT79104110 T AT 79104110T AT 79104110 T AT79104110 T AT 79104110T AT E303 T1 ATE303 T1 AT E303T1
- Authority
- AT
- Austria
- Prior art keywords
- components
- phase
- points
- measured
- measuring
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- A Measuring Device Byusing Mechanical Method (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
- Measuring And Recording Apparatus For Diagnosis (AREA)
- Measurement And Recording Of Electrical Phenomena And Electrical Characteristics Of The Living Body (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2851750A DE2851750B1 (de) | 1978-11-30 | 1978-11-30 | Verfahren und Vorrichtung zur Messung der Ebenheit der Rauhigkeit oder des Kruemmungsradius einer Messflaeche |
EP79104110A EP0011708B1 (de) | 1978-11-30 | 1979-10-23 | Verfahren und Vorrichtung zur Messung der Ebenheit, der Rauhigkeit oder des Krümmungsradius einer Messfläche |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE303T1 true ATE303T1 (de) | 1981-10-15 |
Family
ID=6055909
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT79104110T ATE303T1 (de) | 1978-11-30 | 1979-10-23 | Verfahren und vorrichtung zur messung der ebenheit, der rauhigkeit oder des kruemmungsradius einer messflaeche. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4298283A (de) |
EP (1) | EP0011708B1 (de) |
JP (1) | JPS6017041B2 (de) |
AT (1) | ATE303T1 (de) |
DE (2) | DE2851750B1 (de) |
IT (1) | IT1165365B (de) |
Families Citing this family (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS567006A (en) * | 1979-06-22 | 1981-01-24 | Ibm | Method of extending measurement range of interference |
US4320567A (en) * | 1980-06-30 | 1982-03-23 | Rca Corporation | Optical inspection method for determining machinability |
EP0045321B1 (de) * | 1980-07-31 | 1986-12-10 | International Business Machines Corporation | Verfahren und Einrichtung zur optischen Distanzmessung |
EP0075032B1 (de) * | 1981-09-17 | 1986-01-08 | Ibm Deutschland Gmbh | Verfahren zur interferometrischen Oberflächentopographie |
US4534649A (en) * | 1981-10-30 | 1985-08-13 | Downs Michael J | Surface profile interferometer |
FI823028A0 (fi) * | 1982-09-01 | 1982-09-01 | Kalevi Juhani Kalliomaeki | Foerfarande foer maetning av korta straeckor med en interferometer som utnyttjar icke-koherent ljus, samt foer utfoerande av foerfarandet avsedd interferometer |
JPS5975108A (ja) * | 1982-10-22 | 1984-04-27 | Hitachi Ltd | 微小隙間の光学的測定方法及び測定装置 |
GB2135448B (en) * | 1982-12-15 | 1986-02-19 | Sira Ltd | Inspection apparatus and method |
US4552457A (en) * | 1983-02-01 | 1985-11-12 | Giallorenzi Thomas G | Fiber optic interferometer using two wavelengths or variable wavelength |
JPS59154309A (ja) * | 1983-02-24 | 1984-09-03 | Olympus Optical Co Ltd | 面形状測定用干渉計 |
US4498773A (en) * | 1983-05-04 | 1985-02-12 | Rockwell International Corporation | Pencil beam interferometer |
US4577967A (en) * | 1983-05-20 | 1986-03-25 | Citizen Watch Co., Ltd. | Surface shape measurement apparatus |
US4606638A (en) * | 1983-11-03 | 1986-08-19 | Zygo Corporation | Distance measuring interferometer and method of use |
DE3376502D1 (en) * | 1983-12-27 | 1988-06-09 | Ibm Deutschland | Method and apparatus for measuring surface profiles |
US4681447A (en) * | 1984-03-16 | 1987-07-21 | Hewlett Packard Company | Interferometer apparatus and method for determining the spatial relationship of two or more objects |
NL8401649A (nl) * | 1984-05-23 | 1985-12-16 | Optische Ind De Oude Delft Nv | Meetstelsel voor het, onder gebruikmaking van een op driehoeksmeting berustend principe, contactloos meten van de afstand tussen een bepaald punt van een objectvlak en een referentieniveau. |
JPS61219802A (ja) * | 1985-03-27 | 1986-09-30 | Hitachi Ltd | 変位の光学的測定装置 |
JPS6288902A (ja) * | 1985-10-16 | 1987-04-23 | Hitachi Ltd | 変位の光学的測定方法および測定装置 |
EP0226658B1 (de) * | 1985-12-23 | 1989-11-15 | Ibm Deutschland Gmbh | Verfahren und Anordnung für das optische Bestimmen von Oberflächenprofilen |
NL8600526A (nl) * | 1986-03-03 | 1987-10-01 | Philips Nv | Inrichting voor het detekteren van een centreerfout. |
US5253038A (en) * | 1986-03-03 | 1993-10-12 | U.S. Philips Corp. | Interferometric device for detecting a centering error |
JPS63153450A (ja) * | 1986-12-18 | 1988-06-25 | Japan Spectroscopic Co | エリプソメ−タ |
JP2529562B2 (ja) * | 1986-12-29 | 1996-08-28 | 日本分光工業株式会社 | エリプソメ−タ |
GB8807817D0 (en) * | 1988-03-31 | 1988-05-05 | See C W | Optical measuring apparatus & method |
US4844616A (en) * | 1988-05-31 | 1989-07-04 | International Business Machines Corporation | Interferometric dimensional measurement and defect detection method |
US5018861A (en) * | 1989-06-22 | 1991-05-28 | Quantametrics Inc. | Methods and means for full-surface interferometric testing of grazing incidence mirrors |
IL100655A (en) * | 1991-02-08 | 1994-11-28 | Hughes Aircraft Co | Profile gauge for interferometric laser |
FR2680414B1 (fr) * | 1991-08-14 | 1995-05-24 | Sofie | Ensemble d'observation et de mesures interferometriques simultanees par laser, en particulier sur des structures a couches minces. |
EP0561015A1 (de) * | 1992-03-17 | 1993-09-22 | International Business Machines Corporation | Interferometrische Phasenmessung |
US5706212A (en) * | 1996-03-20 | 1998-01-06 | Board Of Regents Of University Of Nebraska | Infrared ellipsometer/polarimeter system, method of calibration, and use thereof |
JPH06137830A (ja) * | 1992-10-23 | 1994-05-20 | Canon Inc | 干渉計測方法及び干渉計測装置 |
US5506672A (en) * | 1993-09-08 | 1996-04-09 | Texas Instruments Incorporated | System for measuring slip dislocations and film stress in semiconductor processing utilizing an adjustable height rotating beam splitter |
US5469259A (en) * | 1994-01-03 | 1995-11-21 | International Business Machines Corporation | Inspection interferometer with scanning autofocus, and phase angle control features |
US5473434A (en) * | 1994-05-16 | 1995-12-05 | Zygo Corporation | Phase shifting interferometer and method for surface topography measurement |
DE19626261A1 (de) * | 1995-06-30 | 1997-01-02 | Nikon Corp | Beobachtungsvorrichtung |
DE19600491C1 (de) * | 1996-01-09 | 1997-07-17 | Ibm | Interferometrische Meßeinrichtung |
US5953448A (en) * | 1996-03-01 | 1999-09-14 | Textile/Clothing Technology Corporation | Contour measurement of an object having a discontinuous surface using block point identification techniques |
US5612535A (en) * | 1996-06-07 | 1997-03-18 | Wang; Youqi | Spin-split scanning electron microscope |
JPH10104524A (ja) * | 1996-08-08 | 1998-04-24 | Nikon Corp | 微分干渉顕微鏡 |
US5784163A (en) * | 1996-09-23 | 1998-07-21 | International Business Machines Corporation | Optical differential profile measurement apparatus and process |
US5703684A (en) * | 1996-09-23 | 1997-12-30 | International Business Machines Corporation | Apparatus for optical differential measurement of glide height above a magnetic disk |
US5926266A (en) * | 1996-09-23 | 1999-07-20 | International Business Machines Corporation | Optical apparatus for rapid defect analysis |
DE19714202A1 (de) * | 1997-04-07 | 1998-10-15 | Bosch Gmbh Robert | Vorrichtung zum optischen Prüfen von Oberflächen |
US5872629A (en) * | 1997-06-23 | 1999-02-16 | Charles Evans & Associates | Analytical depth monitor utilizing differential interferometric analysis |
US6278519B1 (en) | 1998-01-29 | 2001-08-21 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
US5798837A (en) | 1997-07-11 | 1998-08-25 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
US6320665B1 (en) * | 1998-12-29 | 2001-11-20 | Bryan Kok Ann Ngoi | Acousto optic scanning laser vibrometer for determining the dynamic properties of an object |
DE10042140A1 (de) * | 2000-08-28 | 2002-03-14 | Leica Microsystems | Beleuchtungs- und Abbildungseinrichtung für mehrere Spektralbereiche und Koordinatenmessmaschine mit einer Beleuchtungs- und Abbildungseinrichtung für mehrere Spektralbereiche |
US6643027B2 (en) * | 2001-08-14 | 2003-11-04 | Agilent Technologies, Inc. | Optical measurement system and method for determining height differential between two surfaces |
US7064828B1 (en) | 2001-12-19 | 2006-06-20 | Nanometrics Incorporated | Pulsed spectroscopy with spatially variable polarization modulation element |
JP3677263B2 (ja) * | 2002-09-30 | 2005-07-27 | 株式会社東芝 | 試料面の高さ位置調整方法 |
US7221459B2 (en) * | 2003-03-24 | 2007-05-22 | International Business Machines Corporation | Method and system for interferometric height measurement |
US7061613B1 (en) | 2004-01-13 | 2006-06-13 | Nanometrics Incorporated | Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation |
US7453577B2 (en) * | 2004-12-14 | 2008-11-18 | Asml Netherlands B.V. | Apparatus and method for inspecting a patterned part of a sample |
DE102005061834B4 (de) | 2005-12-23 | 2007-11-08 | Ioss Intelligente Optische Sensoren & Systeme Gmbh | Vorrichtung und Verfahren zum optischen Prüfen einer Oberfläche |
JP5627260B2 (ja) | 2009-05-22 | 2014-11-19 | キヤノン株式会社 | 撮像装置および撮像方法 |
US9417281B1 (en) * | 2014-09-30 | 2016-08-16 | Checkpoint Technologies Llc | Adjustable split-beam optical probing (ASOP) |
US11248955B2 (en) * | 2018-08-10 | 2022-02-15 | Industrial Cooperation Foundation Chonbuk National University | Polarization measurement with interference patterns of high spatial carrier frequency |
KR102339215B1 (ko) * | 2018-08-10 | 2021-12-14 | 전북대학교산학협력단 | 검사 장치 및 검사 방법 |
JP7460080B2 (ja) * | 2020-10-19 | 2024-04-02 | 浜松ホトニクス株式会社 | 光学特性評価装置および光学特性評価方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3849003A (en) * | 1970-03-25 | 1974-11-19 | Philips Corp | Interferometer apparatus for measuring the roughness of a surface |
US3635552A (en) * | 1970-04-14 | 1972-01-18 | Philips Corp | Optical interferometer |
JPS54656B1 (de) * | 1971-06-18 | 1979-01-13 | ||
DE2622787C2 (de) * | 1976-05-21 | 1978-05-18 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zur interferometrischen Abstands-, Dicken- oder Ebenheitsmessung |
DE2658399A1 (de) * | 1976-12-23 | 1978-06-29 | Ibm Deutschland | Interferometrisches verfahren |
US4188122A (en) * | 1978-03-27 | 1980-02-12 | Rockwell International Corporation | Interferometer |
-
1978
- 1978-11-30 DE DE2851750A patent/DE2851750B1/de active Granted
-
1979
- 1979-10-23 DE DE7979104110T patent/DE2961022D1/de not_active Expired
- 1979-10-23 AT AT79104110T patent/ATE303T1/de not_active IP Right Cessation
- 1979-10-23 EP EP79104110A patent/EP0011708B1/de not_active Expired
- 1979-11-02 JP JP54141407A patent/JPS6017041B2/ja not_active Expired
- 1979-11-09 IT IT27150/79A patent/IT1165365B/it active
- 1979-11-13 US US06/093,642 patent/US4298283A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6017041B2 (ja) | 1985-04-30 |
DE2961022D1 (en) | 1981-12-24 |
IT7927150A0 (it) | 1979-11-09 |
JPS5575603A (en) | 1980-06-07 |
EP0011708A1 (de) | 1980-06-11 |
US4298283A (en) | 1981-11-03 |
IT1165365B (it) | 1987-04-22 |
EP0011708B1 (de) | 1981-10-14 |
DE2851750C2 (de) | 1980-11-06 |
DE2851750B1 (de) | 1980-03-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
REN | Ceased due to non-payment of the annual fee |