ATE164704T1 - Verfahren zur herstellung eines vertikalen pnp- vielfachkollektortransistors - Google Patents
Verfahren zur herstellung eines vertikalen pnp- vielfachkollektortransistorsInfo
- Publication number
- ATE164704T1 ATE164704T1 AT89300902T AT89300902T ATE164704T1 AT E164704 T1 ATE164704 T1 AT E164704T1 AT 89300902 T AT89300902 T AT 89300902T AT 89300902 T AT89300902 T AT 89300902T AT E164704 T1 ATE164704 T1 AT E164704T1
- Authority
- AT
- Austria
- Prior art keywords
- vertical
- pnp transistor
- regions
- collectors
- producing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000009792 diffusion process Methods 0.000 abstract 3
- 238000002955 isolation Methods 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000007943 implant Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/40—Vertical BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/137—Collector regions of BJTs
Landscapes
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/154,832 US5023194A (en) | 1988-02-11 | 1988-02-11 | Method of making a multicollector vertical pnp transistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE164704T1 true ATE164704T1 (de) | 1998-04-15 |
Family
ID=22552990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT89300902T ATE164704T1 (de) | 1988-02-11 | 1989-01-31 | Verfahren zur herstellung eines vertikalen pnp- vielfachkollektortransistors |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5023194A (de) |
| EP (1) | EP0328286B1 (de) |
| JP (1) | JPH025564A (de) |
| KR (1) | KR890013783A (de) |
| AT (1) | ATE164704T1 (de) |
| DE (1) | DE68928627D1 (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3145694B2 (ja) * | 1990-08-28 | 2001-03-12 | 日本電気株式会社 | 半導体装置 |
| US5447766A (en) * | 1990-09-28 | 1995-09-05 | Nissei Asb Machine Co., Ltd. | Plastic vessel preform and mold for forming the same |
| US5311054A (en) * | 1991-03-25 | 1994-05-10 | Harris Corporation | Graded collector for inductive loads |
| US5248624A (en) * | 1991-08-23 | 1993-09-28 | Exar Corporation | Method of making isolated vertical pnp transistor in a complementary bicmos process with eeprom memory |
| CA2165871C (en) * | 1994-12-30 | 2002-03-26 | Tadayoshi Takashima | Parison forming apparatus and parison forming method |
| US5633180A (en) * | 1995-06-01 | 1997-05-27 | Harris Corporation | Method of forming P-type islands over P-type buried layer |
| US5763835A (en) * | 1995-11-01 | 1998-06-09 | Raychem Corporation | Gel-filled closure |
| US6365447B1 (en) * | 1998-01-12 | 2002-04-02 | National Semiconductor Corporation | High-voltage complementary bipolar and BiCMOS technology using double expitaxial growth |
| CN102496626B (zh) * | 2011-12-30 | 2014-03-26 | 清华大学 | 锗硅异质结双极晶体管结构 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3312882A (en) * | 1964-06-25 | 1967-04-04 | Westinghouse Electric Corp | Transistor structure and method of making, suitable for integration and exhibiting good power handling capability and frequency response |
| US3488564A (en) * | 1968-04-01 | 1970-01-06 | Fairchild Camera Instr Co | Planar epitaxial resistors |
| US3665266A (en) * | 1970-12-10 | 1972-05-23 | Motorola Inc | Low saturation resistance,low offset voltage,monolithic analog switch |
| GB1298053A (en) * | 1971-03-26 | 1972-11-29 | Jury Nikolaevich Dyakov | Semiconductor device for a trigger storage cell |
| JPS5942463B2 (ja) * | 1972-09-22 | 1984-10-15 | ソニー株式会社 | 半導体集積回路装置 |
| US4038680A (en) * | 1972-12-29 | 1977-07-26 | Sony Corporation | Semiconductor integrated circuit device |
| JPS524787A (en) * | 1975-07-01 | 1977-01-14 | Nec Corp | Transistor containing embedded base |
| US4140558A (en) * | 1978-03-02 | 1979-02-20 | Bell Telephone Laboratories, Incorporated | Isolation of integrated circuits utilizing selective etching and diffusion |
| US4458158A (en) * | 1979-03-12 | 1984-07-03 | Sprague Electric Company | IC Including small signal and power devices |
| US4412376A (en) * | 1979-03-30 | 1983-11-01 | Ibm Corporation | Fabrication method for vertical PNP structure with Schottky barrier diode emitter utilizing ion implantation |
| JPS5823471A (ja) * | 1981-08-05 | 1983-02-12 | Toshiba Corp | 半導体装置 |
| JPS5967670A (ja) * | 1982-10-12 | 1984-04-17 | Toshiba Corp | 半導体装置 |
| FR2543739B1 (fr) * | 1983-03-30 | 1986-04-18 | Radiotechnique Compelec | Procede de realisation d'un transistor bipolaire haute tension |
| JPS60149163A (ja) * | 1984-01-17 | 1985-08-06 | Nec Corp | 半導体装置 |
| DE3586341T2 (de) * | 1984-02-03 | 1993-02-04 | Advanced Micro Devices Inc | Bipolartransistor mit in schlitzen gebildeten aktiven elementen. |
-
1988
- 1988-02-11 US US07/154,832 patent/US5023194A/en not_active Expired - Lifetime
-
1989
- 1989-01-31 DE DE68928627T patent/DE68928627D1/de not_active Expired - Lifetime
- 1989-01-31 EP EP89300902A patent/EP0328286B1/de not_active Expired - Lifetime
- 1989-01-31 AT AT89300902T patent/ATE164704T1/de not_active IP Right Cessation
- 1989-02-11 KR KR1019890001585A patent/KR890013783A/ko not_active Ceased
- 1989-02-13 JP JP1031241A patent/JPH025564A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP0328286A3 (de) | 1990-06-20 |
| EP0328286A2 (de) | 1989-08-16 |
| US5023194A (en) | 1991-06-11 |
| JPH025564A (ja) | 1990-01-10 |
| DE68928627D1 (de) | 1998-05-07 |
| KR890013783A (ko) | 1989-09-26 |
| EP0328286B1 (de) | 1998-04-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |