AT513190B9 - Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs - Google Patents

Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs Download PDF

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Publication number
AT513190B9
AT513190B9 ATA877/2012A AT8772012A AT513190B9 AT 513190 B9 AT513190 B9 AT 513190B9 AT 8772012 A AT8772012 A AT 8772012A AT 513190 B9 AT513190 B9 AT 513190B9
Authority
AT
Austria
Prior art keywords
electrode
segments
substrate
electrode segments
energy source
Prior art date
Application number
ATA877/2012A
Other languages
German (de)
English (en)
Other versions
AT513190B1 (de
AT513190A1 (de
Inventor
Andreas Dipl Ing Gebeshuber
Daniel Dr Heim
Johann Dr Laimer
Thomas Dipl Ing Müller
Michael Dr Proschek
Otto Ing Stadler
Herbert Dr Störi
Original Assignee
Berndorf Hueck Band Und Pressblechtechnik Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ATA877/2012A priority Critical patent/AT513190B9/de
Application filed by Berndorf Hueck Band Und Pressblechtechnik Gmbh filed Critical Berndorf Hueck Band Und Pressblechtechnik Gmbh
Priority to AU2013302202A priority patent/AU2013302202B2/en
Priority to BR112015002657A priority patent/BR112015002657A8/pt
Priority to JP2015525690A priority patent/JP6140286B2/ja
Priority to CN201380042267.0A priority patent/CN104755653B/zh
Priority to ES13791714.2T priority patent/ES2587929T3/es
Priority to EP13791714.2A priority patent/EP2882885B8/de
Priority to US14/420,194 priority patent/US9530624B2/en
Priority to NZ704253A priority patent/NZ704253A/en
Priority to CA2881069A priority patent/CA2881069C/en
Priority to IN1149DEN2015 priority patent/IN2015DN01149A/en
Priority to RU2015107784A priority patent/RU2615743C2/ru
Priority to PCT/AT2013/050152 priority patent/WO2014022872A2/de
Priority to MYPI2015700347A priority patent/MY176134A/en
Priority to PL13791714.2T priority patent/PL2882885T3/pl
Priority to KR1020157006106A priority patent/KR101742744B1/ko
Priority to DK13791714.2T priority patent/DK2882885T3/en
Publication of AT513190A1 publication Critical patent/AT513190A1/de
Publication of AT513190B1 publication Critical patent/AT513190B1/de
Application granted granted Critical
Publication of AT513190B9 publication Critical patent/AT513190B9/de
Priority to CL2015000301A priority patent/CL2015000301A1/es

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B30—PRESSES
    • B30B—PRESSES IN GENERAL
    • B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
    • B30B15/06—Platens or press rams
    • B30B15/062—Press plates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
ATA877/2012A 2012-08-08 2012-08-08 Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs AT513190B9 (de)

Priority Applications (18)

Application Number Priority Date Filing Date Title
ATA877/2012A AT513190B9 (de) 2012-08-08 2012-08-08 Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs
PCT/AT2013/050152 WO2014022872A2 (de) 2012-08-08 2013-08-06 Vorrichtung und verfahren zur plasmabeschichtung eines substrats, insbesondere eines pressblechs
JP2015525690A JP6140286B2 (ja) 2012-08-08 2013-08-06 基板、特にプレス板をプラズマコーティングする装置及び方法
CN201380042267.0A CN104755653B (zh) 2012-08-08 2013-08-06 用于对压板进行等离子体涂覆的装置的应用及相应方法
ES13791714.2T ES2587929T3 (es) 2012-08-08 2013-08-06 Procedimiento para el recubrimiento por plasma de una chapa de prensado
EP13791714.2A EP2882885B8 (de) 2012-08-08 2013-08-06 Verfahren zum plasmabeschichten eines pressblechs
US14/420,194 US9530624B2 (en) 2012-08-08 2013-08-06 Method for the plasma coating of a substrate, in particular a press platen
NZ704253A NZ704253A (en) 2012-08-08 2013-08-06 Apparatus and method for the plasma coating of a substrate, in particular a press platen
AU2013302202A AU2013302202B2 (en) 2012-08-08 2013-08-06 Apparatus and method for the plasma coating of a substrate, in particular a press platen
IN1149DEN2015 IN2015DN01149A (OSRAM) 2012-08-08 2013-08-06
RU2015107784A RU2615743C2 (ru) 2012-08-08 2013-08-06 Устройство и способ для плазменного нанесения покрытия на подложку, в частности, на прессовальный лист
BR112015002657A BR112015002657A8 (pt) 2012-08-08 2013-08-06 aparelho e método para o revestimento por plasma de um substrato, em particular de uma placa de prensa
MYPI2015700347A MY176134A (en) 2012-08-08 2013-08-06 Apparatus and method for the plasma coating of a substrate, in particular a press platen
PL13791714.2T PL2882885T3 (pl) 2012-08-08 2013-08-06 Sposób powlekania plazmowego blachy naciskowej
KR1020157006106A KR101742744B1 (ko) 2012-08-08 2013-08-06 기판, 특히 프레스 플래튼의 플라즈마 코팅을 위한 장치 및 방법
DK13791714.2T DK2882885T3 (en) 2012-08-08 2013-08-06 Method for Plating a Press Plate
CA2881069A CA2881069C (en) 2012-08-08 2013-08-06 Apparatus and method for the plasma coating of a substrate, in particular a press platen
CL2015000301A CL2015000301A1 (es) 2012-08-08 2015-02-06 Uso de un dispositivo para el recubrimiento por plasma de una chapa de prensado, que comprende una cámara de vacío y un electrodo que durante el funcionamiento está orientado esencialmente en paralelo a la chapa de prensado y frente a su lado a recubrir, y que está segmentado y cada uno de sus segmentos presenta una conexión propia para una fuente de energía eléctrica; procedimientos.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ATA877/2012A AT513190B9 (de) 2012-08-08 2012-08-08 Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs

Publications (3)

Publication Number Publication Date
AT513190A1 AT513190A1 (de) 2014-02-15
AT513190B1 AT513190B1 (de) 2014-03-15
AT513190B9 true AT513190B9 (de) 2014-05-15

Family

ID=49584535

Family Applications (1)

Application Number Title Priority Date Filing Date
ATA877/2012A AT513190B9 (de) 2012-08-08 2012-08-08 Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs

Country Status (18)

Country Link
US (1) US9530624B2 (OSRAM)
EP (1) EP2882885B8 (OSRAM)
JP (1) JP6140286B2 (OSRAM)
KR (1) KR101742744B1 (OSRAM)
CN (1) CN104755653B (OSRAM)
AT (1) AT513190B9 (OSRAM)
AU (1) AU2013302202B2 (OSRAM)
BR (1) BR112015002657A8 (OSRAM)
CA (1) CA2881069C (OSRAM)
CL (1) CL2015000301A1 (OSRAM)
DK (1) DK2882885T3 (OSRAM)
ES (1) ES2587929T3 (OSRAM)
IN (1) IN2015DN01149A (OSRAM)
MY (1) MY176134A (OSRAM)
NZ (1) NZ704253A (OSRAM)
PL (1) PL2882885T3 (OSRAM)
RU (1) RU2615743C2 (OSRAM)
WO (1) WO2014022872A2 (OSRAM)

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JP2017025389A (ja) * 2015-07-24 2017-02-02 株式会社ユーテック プラズマｃｖｄ装置及び成膜方法
US11251019B2 (en) * 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
CN107283551B (zh) * 2017-08-21 2018-07-24 阜南盛原木业有限公司 一种具有良好防霉防虫性能的胶合板
JP6863199B2 (ja) 2017-09-25 2021-04-21 トヨタ自動車株式会社 プラズマ処理装置
CN109055917B (zh) * 2018-09-07 2020-09-08 信阳师范学院 一种单室双面镀膜等离子体化学气相沉积系统
DE102019127659A1 (de) * 2019-10-15 2021-04-15 Hueck Rheinische Gmbh Presswerkzeug und Verfahren zum Herstellen eines Presswerkzeugs
US11884426B2 (en) 2020-07-08 2024-01-30 Hamilton Sundstrand Corporation Compression apparatus and methods of making and using the same

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US20020159216A1 (en) * 2001-03-30 2002-10-31 Lam Research Corporation Vacuum plasma processor and method of operating same
EP1417090B1 (de) * 2001-08-14 2005-10-12 Hueck Engraving GmbH Verfahren zur bearbeitung und herstellung einer oberfläche mit einem glanzgrad

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US5156820A (en) * 1989-05-15 1992-10-20 Rapro Technology, Inc. Reaction chamber with controlled radiant energy heating and distributed reactant flow
US5273588A (en) * 1992-06-15 1993-12-28 Materials Research Corporation Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means
DE19757141A1 (de) * 1997-12-20 1999-06-24 Philips Patentverwaltung Array aus Diamant/wasserstoffhaltigen Elektroden
US20020159216A1 (en) * 2001-03-30 2002-10-31 Lam Research Corporation Vacuum plasma processor and method of operating same
EP1417090B1 (de) * 2001-08-14 2005-10-12 Hueck Engraving GmbH Verfahren zur bearbeitung und herstellung einer oberfläche mit einem glanzgrad

Also Published As

Publication number Publication date
JP2015531820A (ja) 2015-11-05
EP2882885B1 (de) 2016-05-25
IN2015DN01149A (OSRAM) 2015-06-26
CL2015000301A1 (es) 2015-09-21
NZ704253A (en) 2016-08-26
US20150255254A1 (en) 2015-09-10
AT513190B1 (de) 2014-03-15
ES2587929T3 (es) 2016-10-27
CN104755653A (zh) 2015-07-01
DK2882885T3 (en) 2016-09-05
EP2882885B8 (de) 2016-08-31
WO2014022872A2 (de) 2014-02-13
JP6140286B2 (ja) 2017-05-31
MY176134A (en) 2020-07-24
AU2013302202A1 (en) 2015-02-26
KR20150042817A (ko) 2015-04-21
BR112015002657A2 (pt) 2017-07-04
CN104755653B (zh) 2017-09-19
CA2881069A1 (en) 2014-02-13
RU2015107784A (ru) 2016-09-27
WO2014022872A3 (de) 2014-05-15
EP2882885A2 (de) 2015-06-17
CA2881069C (en) 2017-11-07
BR112015002657A8 (pt) 2019-07-30
KR101742744B1 (ko) 2017-06-01
AU2013302202B2 (en) 2015-12-03
PL2882885T3 (pl) 2016-11-30
AT513190A1 (de) 2014-02-15
RU2615743C2 (ru) 2017-04-11
US9530624B2 (en) 2016-12-27

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