AT280041B - Reprographisches Kopiermaterial - Google Patents

Reprographisches Kopiermaterial

Info

Publication number
AT280041B
AT280041B AT227867A AT227867A AT280041B AT 280041 B AT280041 B AT 280041B AT 227867 A AT227867 A AT 227867A AT 227867 A AT227867 A AT 227867A AT 280041 B AT280041 B AT 280041B
Authority
AT
Austria
Prior art keywords
copy material
reprographic copy
reprographic
copy
Prior art date
Application number
AT227867A
Other languages
German (de)
English (en)
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Application granted granted Critical
Publication of AT280041B publication Critical patent/AT280041B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
AT227867A 1966-03-12 1967-03-09 Reprographisches Kopiermaterial AT280041B (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE1572070A DE1572070C3 (de) 1966-03-12 1966-03-12 Lichtempfindliches Kopiermaterial
DEK0058706 1966-03-12
DEK0058705 1966-03-12

Publications (1)

Publication Number Publication Date
AT280041B true AT280041B (de) 1970-03-25

Family

ID=27211296

Family Applications (1)

Application Number Title Priority Date Filing Date
AT227867A AT280041B (de) 1966-03-12 1967-03-09 Reprographisches Kopiermaterial

Country Status (9)

Country Link
US (1) US3539559A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AT (1) AT280041B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE695348A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH504023A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (3) DE1572068C3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR1513907A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1179361A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL153338B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SE (1) SE350342B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
JPS5140452B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1973-07-23 1976-11-04
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
US4554237A (en) * 1981-12-25 1985-11-19 Hitach, Ltd. Photosensitive resin composition and method for forming fine patterns with said composition
JPS59222833A (ja) * 1983-06-01 1984-12-14 Hitachi Chem Co Ltd 感光性組成物
US5310732A (en) * 1986-02-03 1994-05-10 The Scripps Research Institute 2-halo-2'-deoxyadenosines in the treatment of rheumatoid arthritis
EP0363817A3 (de) * 1988-10-14 1990-09-26 Hoechst Aktiengesellschaft Negativ arbeitendes strahlungsempfindliches Gemisch, enthaltend ein Polymeres mit 1,2,3-Thiadiazolgruppen, sowie dieses enthaltendes Aufzeichnungsmaterial
CN103160144A (zh) * 2012-10-26 2013-06-19 杭州百合科莱恩颜料有限公司 一种单偶氮有机颜料及其合成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
DE1447017B2 (de) * 1963-10-26 1971-08-12 Kalle AG, 6202 Wiesbaden Biebrich Verfahren zur herstellung von druckformen gedruckten schal tungen oder metallaetzungen

Also Published As

Publication number Publication date
FR1513907A (fr) 1968-02-16
DE1572070C3 (de) 1979-03-22
US3539559A (en) 1970-11-10
DE1572069C3 (de) 1976-01-08
DE1572068B2 (de) 1975-05-15
DE1572070B2 (de) 1978-07-13
GB1179361A (en) 1970-01-28
NL6703263A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1967-09-13
SE350342B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-10-23
DE1572068C3 (de) 1976-01-08
CH504023A (de) 1971-02-28
DE1572070A1 (de) 1970-04-23
DE1572069A1 (de) 1970-04-16
NL153338B (nl) 1977-05-16
DE1572069B2 (de) 1975-05-15
DE1572068A1 (de) 1970-04-16
BE695348A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1967-09-11

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee