CH504023A - Kopiermasse und ihre Verwendung - Google Patents

Kopiermasse und ihre Verwendung

Info

Publication number
CH504023A
CH504023A CH344767A CH344767A CH504023A CH 504023 A CH504023 A CH 504023A CH 344767 A CH344767 A CH 344767A CH 344767 A CH344767 A CH 344767A CH 504023 A CH504023 A CH 504023A
Authority
CH
Switzerland
Prior art keywords
copy paste
copy
paste
Prior art date
Application number
CH344767A
Other languages
English (en)
Inventor
Hans Dr Ruckert
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH504023A publication Critical patent/CH504023A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CH344767A 1966-03-12 1967-03-09 Kopiermasse und ihre Verwendung CH504023A (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DEK0058706 1966-03-12
DE1572070A DE1572070C3 (de) 1966-03-12 1966-03-12 Lichtempfindliches Kopiermaterial
DEK0058705 1966-03-12

Publications (1)

Publication Number Publication Date
CH504023A true CH504023A (de) 1971-02-28

Family

ID=27211296

Family Applications (1)

Application Number Title Priority Date Filing Date
CH344767A CH504023A (de) 1966-03-12 1967-03-09 Kopiermasse und ihre Verwendung

Country Status (9)

Country Link
US (1) US3539559A (de)
AT (1) AT280041B (de)
BE (1) BE695348A (de)
CH (1) CH504023A (de)
DE (3) DE1572068C3 (de)
FR (1) FR1513907A (de)
GB (1) GB1179361A (de)
NL (1) NL153338B (de)
SE (1) SE350342B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496111A1 (fr) * 1980-12-17 1982-06-18 Hitachi Ltd Composition polymere sensible a la lumiere ou aux radiations, son utilisation pour former des dessins en relief, et composes entrant dans cette composition

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
JPS5140452B2 (de) * 1973-07-23 1976-11-04
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
US4554237A (en) * 1981-12-25 1985-11-19 Hitach, Ltd. Photosensitive resin composition and method for forming fine patterns with said composition
JPS59222833A (ja) * 1983-06-01 1984-12-14 Hitachi Chem Co Ltd 感光性組成物
US5310732A (en) * 1986-02-03 1994-05-10 The Scripps Research Institute 2-halo-2'-deoxyadenosines in the treatment of rheumatoid arthritis
EP0363817A3 (de) * 1988-10-14 1990-09-26 Hoechst Aktiengesellschaft Negativ arbeitendes strahlungsempfindliches Gemisch, enthaltend ein Polymeres mit 1,2,3-Thiadiazolgruppen, sowie dieses enthaltendes Aufzeichnungsmaterial
CN103160144A (zh) * 2012-10-26 2013-06-19 杭州百合科莱恩颜料有限公司 一种单偶氮有机颜料及其合成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
DE1447017B2 (de) * 1963-10-26 1971-08-12 Kalle AG, 6202 Wiesbaden Biebrich Verfahren zur herstellung von druckformen gedruckten schal tungen oder metallaetzungen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496111A1 (fr) * 1980-12-17 1982-06-18 Hitachi Ltd Composition polymere sensible a la lumiere ou aux radiations, son utilisation pour former des dessins en relief, et composes entrant dans cette composition

Also Published As

Publication number Publication date
DE1572070A1 (de) 1970-04-23
DE1572069B2 (de) 1975-05-15
FR1513907A (fr) 1968-02-16
BE695348A (de) 1967-09-11
DE1572068C3 (de) 1976-01-08
GB1179361A (en) 1970-01-28
SE350342B (de) 1972-10-23
DE1572069C3 (de) 1976-01-08
DE1572069A1 (de) 1970-04-16
AT280041B (de) 1970-03-25
DE1572068B2 (de) 1975-05-15
DE1572070C3 (de) 1979-03-22
DE1572068A1 (de) 1970-04-16
NL153338B (nl) 1977-05-16
DE1572070B2 (de) 1978-07-13
NL6703263A (de) 1967-09-13
US3539559A (en) 1970-11-10

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Legal Events

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PL Patent ceased