NL6703263A - - Google Patents

Info

Publication number
NL6703263A
NL6703263A NL6703263A NL6703263A NL6703263A NL 6703263 A NL6703263 A NL 6703263A NL 6703263 A NL6703263 A NL 6703263A NL 6703263 A NL6703263 A NL 6703263A NL 6703263 A NL6703263 A NL 6703263A
Authority
NL
Netherlands
Application number
NL6703263A
Other versions
NL153338B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6703263A publication Critical patent/NL6703263A/xx
Publication of NL153338B publication Critical patent/NL153338B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00Compounds containing azido groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/008Azides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL676703263A 1966-03-12 1967-02-28 Werkwijze voor het bereiden van een reprografische kopieermassa alsmede kopieermateriaal waarvan de kopieerlaag uit een aldus bereide kopieermassa is gevormd. NL153338B (nl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DEK0058706 1966-03-12
DE1572070A DE1572070C3 (de) 1966-03-12 1966-03-12 Lichtempfindliches Kopiermaterial
DEK0058705 1966-03-12

Publications (2)

Publication Number Publication Date
NL6703263A true NL6703263A (de) 1967-09-13
NL153338B NL153338B (nl) 1977-05-16

Family

ID=27211296

Family Applications (1)

Application Number Title Priority Date Filing Date
NL676703263A NL153338B (nl) 1966-03-12 1967-02-28 Werkwijze voor het bereiden van een reprografische kopieermassa alsmede kopieermateriaal waarvan de kopieerlaag uit een aldus bereide kopieermassa is gevormd.

Country Status (9)

Country Link
US (1) US3539559A (de)
AT (1) AT280041B (de)
BE (1) BE695348A (de)
CH (1) CH504023A (de)
DE (3) DE1572068C3 (de)
FR (1) FR1513907A (de)
GB (1) GB1179361A (de)
NL (1) NL153338B (de)
SE (1) SE350342B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
JPS5140452B2 (de) * 1973-07-23 1976-11-04
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
JPS57168942A (en) * 1981-04-13 1982-10-18 Hitachi Ltd Photosensitive polymer composition
US4554237A (en) * 1981-12-25 1985-11-19 Hitach, Ltd. Photosensitive resin composition and method for forming fine patterns with said composition
JPS59222833A (ja) * 1983-06-01 1984-12-14 Hitachi Chem Co Ltd 感光性組成物
US5310732A (en) * 1986-02-03 1994-05-10 The Scripps Research Institute 2-halo-2'-deoxyadenosines in the treatment of rheumatoid arthritis
EP0363817A3 (de) * 1988-10-14 1990-09-26 Hoechst Aktiengesellschaft Negativ arbeitendes strahlungsempfindliches Gemisch, enthaltend ein Polymeres mit 1,2,3-Thiadiazolgruppen, sowie dieses enthaltendes Aufzeichnungsmaterial
CN103160144A (zh) * 2012-10-26 2013-06-19 杭州百合科莱恩颜料有限公司 一种单偶氮有机颜料及其合成方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
DE1447017B2 (de) * 1963-10-26 1971-08-12 Kalle AG, 6202 Wiesbaden Biebrich Verfahren zur herstellung von druckformen gedruckten schal tungen oder metallaetzungen

Also Published As

Publication number Publication date
DE1572070A1 (de) 1970-04-23
AT280041B (de) 1970-03-25
DE1572069B2 (de) 1975-05-15
DE1572069A1 (de) 1970-04-16
CH504023A (de) 1971-02-28
DE1572068A1 (de) 1970-04-16
DE1572070B2 (de) 1978-07-13
NL153338B (nl) 1977-05-16
US3539559A (en) 1970-11-10
DE1572070C3 (de) 1979-03-22
DE1572068B2 (de) 1975-05-15
SE350342B (de) 1972-10-23
DE1572069C3 (de) 1976-01-08
DE1572068C3 (de) 1976-01-08
GB1179361A (en) 1970-01-28
BE695348A (de) 1967-09-11
FR1513907A (fr) 1968-02-16

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