CH474780A - Lichtempfindliches Material - Google Patents

Lichtempfindliches Material

Info

Publication number
CH474780A
CH474780A CH1181066A CH1181066A CH474780A CH 474780 A CH474780 A CH 474780A CH 1181066 A CH1181066 A CH 1181066A CH 1181066 A CH1181066 A CH 1181066A CH 474780 A CH474780 A CH 474780A
Authority
CH
Switzerland
Prior art keywords
photosensitive material
photosensitive
Prior art date
Application number
CH1181066A
Other languages
English (en)
Inventor
Justus Dr Danhaeuser
Heinrich Dr Gold
Hans Dr Holtschmidt
Willibald Dr Pelz
Original Assignee
Agfa Gevaert Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert Ag filed Critical Agfa Gevaert Ag
Publication of CH474780A publication Critical patent/CH474780A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • C08C19/20—Incorporating sulfur atoms into the molecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CH1181066A 1965-08-28 1966-08-16 Lichtempfindliches Material CH474780A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEA0050136 1965-08-28

Publications (1)

Publication Number Publication Date
CH474780A true CH474780A (de) 1969-06-30

Family

ID=6937249

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1181066A CH474780A (de) 1965-08-28 1966-08-16 Lichtempfindliches Material

Country Status (6)

Country Link
US (1) US3467630A (de)
BE (1) BE685054A (de)
CH (1) CH474780A (de)
DE (1) DE1472775A1 (de)
GB (1) GB1083070A (de)
NL (1) NL6611198A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE756478A (fr) * 1969-09-22 1971-03-22 Eastman Kodak Co Nouveaux polysulfonates photosensibles
US4106943A (en) * 1973-09-27 1978-08-15 Japan Synthetic Rubber Co., Ltd. Photosensitive cross-linkable azide containing polymeric composition
JPS59101644A (ja) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd 感光性組成物
ES2601846T3 (es) 2013-11-07 2017-02-16 Agfa Graphics Nv Precursor termosensible negativo de plancha de impresión litográfica

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1140704B (de) * 1957-01-21 1962-12-06 Bayer Ag Verfahren zur Herstellung unloeslicher, vernetzter hochmolekularer Verbindungen
BE595534A (de) * 1959-10-02

Also Published As

Publication number Publication date
GB1083070A (en) 1967-09-13
NL6611198A (de) 1967-01-25
BE685054A (de) 1967-02-06
DE1472775A1 (de) 1969-08-07
US3467630A (en) 1969-09-16

Similar Documents

Publication Publication Date Title
AT270378B (de) Lichtempfindliches Material
CH504699A (de) Lichtempfindliches Material
AT267317B (de) Lichtempfindliches Reproduktionsmaterial
AT271194B (de) Lichtempfindliches Diazotypiematerial
CH474779A (fr) Matériel photographique
AT278520B (de) Lichtempfindliches Kopiermaterial
CH487426A (de) Lichtempfindliches Material
CH450911A (fr) Matériel photosensible
AT267553B (de) Lichtempfindliches Kopiermaterial
CH466040A (de) Lichtempfindliches elektrophotographisches Material
CH477708A (fr) Matériel photosensible
CH483656A (de) Lichtempfindliches Diazotypiematerial
AT264289B (de) Lichtempfindliches Material
CH474780A (de) Lichtempfindliches Material
AT277752B (de) Diazotypiematerial
CH465397A (de) Diazotypiematerial
CH466707A (de) Diazotypiematerial
AT275317B (de) Lichtempfindliches Material
DK118496B (da) Diazotypimateriale.
CH468026A (de) Lichtempfindliches Material
AT276085B (de) Lichtempfindliches Kopiermaterial
CH472708A (de) Lichtempfindliches elektrophotographisches Material
FR1463728A (fr) Matières photoconductrices
CH454614A (de) Lichtempfindliches Material
AT271195B (de) Zweikomponenten-Diazotypiematerial