AR010155A1 - Procedimiento para regenerar soluciones de estanado y dispositivo para llevar a cabo dicho procedimiento - Google Patents
Procedimiento para regenerar soluciones de estanado y dispositivo para llevar a cabo dicho procedimientoInfo
- Publication number
- AR010155A1 AR010155A1 ARP980102075A ARP980102075A AR010155A1 AR 010155 A1 AR010155 A1 AR 010155A1 AR P980102075 A ARP980102075 A AR P980102075A AR P980102075 A ARP980102075 A AR P980102075A AR 010155 A1 AR010155 A1 AR 010155A1
- Authority
- AR
- Argentina
- Prior art keywords
- floppy
- chamber
- presented
- solution
- applicant
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 7
- 239000012086 standard solution Substances 0.000 title 1
- 239000000243 solution Substances 0.000 abstract 5
- 239000012528 membrane Substances 0.000 abstract 2
- 229910001432 tin ion Inorganic materials 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical group [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract 1
- 239000003011 anion exchange membrane Substances 0.000 abstract 1
- 150000001768 cations Chemical class 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 229910001431 copper ion Inorganic materials 0.000 abstract 1
- 239000012895 dilution Substances 0.000 abstract 1
- 238000010790 dilution Methods 0.000 abstract 1
- 238000005868 electrolysis reaction Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/22—Regeneration of process solutions by ion-exchange
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/13—Purification and treatment of electroplating baths and plating wastes
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- Chemically Coating (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
La presente invencion se refiere a un procedimiento y a un dispositivo parasoluciones de estanado, consumidas, las cuales contienen iones estano y iones coformadores de complejos libres y vinculados a iones cobre, así como agentes reduconsumidos yfr escos. Mediante una técnica apropiada de enjuagado, se concentraenjuague del proceso de estanado con la solucion de proceso a una dilucion del 1La solucion a regenerar así preparada se alimenta a una celda de electrolisis lacomprende una cámarade cá todo, una cámara central y una cámara de ánodo. La cámcátodo está separada por medio de una membrana intercambiadora de aniones de lacentral y la cámara de ánodo está separada por medio de una membrana intercambiacationes de dicha cámaracentral. La solucion a regenerar es alimentada en primecámara de cátodo, en la cual se precipita por vía catodica la componente perturbDespués de un correspondiente tiempo de permanencia se bombea la solucion a regeempobrecida en cobre a la cámaracentral, en la cual tiene lugar un enriquecimiepor iones estano que difunden a través de la membrana intercambiadora de cationecámara de ánodo. La solucion regenerada es realimentada finalmente al proceso deDATOS DEL DISQUETTE PRESENTADO POR ELSOLICITANTEDATOS DE L DISQUETTE PRESENTADO POR EL SOLICITANTE DATOS DEL DISQUETTE PRESENTADO POR EL SOLICITANTEDATOS DEL DISQUETTE PRESENTADO POR EL SOLICITANTE DATOS DEL DISQUETTEPRESENTADO POR EL SOLICITANTE DATOS DEL DISQUETTE PRESENTADO POR EL SOLICITANTE DATOS DEL DISQUETTE PRESENTADO POR EL SOLICITANTEDATOS DEL DISQUETTE PRESENTADO POR EL SOLICITANTE DATOS DELDISQUETTE PRESENTADO POR EL SOL ICITANTE
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19719020A DE19719020A1 (de) | 1997-05-07 | 1997-05-07 | Verfahren und Vorrichtung zum Regenerieren von Verzinnungslösungen |
Publications (1)
Publication Number | Publication Date |
---|---|
AR010155A1 true AR010155A1 (es) | 2000-05-17 |
Family
ID=7828719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ARP980102075A AR010155A1 (es) | 1997-05-07 | 1998-05-04 | Procedimiento para regenerar soluciones de estanado y dispositivo para llevar a cabo dicho procedimiento |
Country Status (12)
Country | Link |
---|---|
US (1) | US6120673A (es) |
EP (1) | EP0878561B1 (es) |
JP (1) | JPH10317154A (es) |
AR (1) | AR010155A1 (es) |
AT (1) | ATE248935T1 (es) |
AU (1) | AU724854B2 (es) |
BR (1) | BR9801580A (es) |
CA (1) | CA2236393C (es) |
DE (2) | DE19719020A1 (es) |
DK (1) | DK0878561T3 (es) |
ES (1) | ES2202686T3 (es) |
PT (1) | PT878561E (es) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9901586D0 (en) * | 1999-01-25 | 1999-03-17 | Alpha Fry Ltd | Process for the recovery of lead and/or tin or alloys thereof from substrate surfaces |
JP3455709B2 (ja) * | 1999-04-06 | 2003-10-14 | 株式会社大和化成研究所 | めっき方法とそれに用いるめっき液前駆体 |
FR2801062B1 (fr) * | 1999-11-12 | 2001-12-28 | Lorraine Laminage | Installation et procede de dissolution electrolytique par oxydation d'un metal |
JP2002317275A (ja) * | 2001-04-17 | 2002-10-31 | Toto Ltd | 無電解スズめっき液の長寿命化方法 |
DE10132478C1 (de) * | 2001-07-03 | 2003-04-30 | Atotech Deutschland Gmbh | Verfahren zum Abscheiden einer Metallschicht sowie Verfahren zum Regenerieren einer Metallionen in einer hohen Oxidationsstufe enthaltenden Lösung |
US7195702B2 (en) * | 2003-06-06 | 2007-03-27 | Taskem, Inc. | Tin alloy electroplating system |
US6942810B2 (en) * | 2003-12-31 | 2005-09-13 | The Boc Group, Inc. | Method for treating metal-containing solutions |
US20060096867A1 (en) * | 2004-11-10 | 2006-05-11 | George Bokisa | Tin alloy electroplating system |
DE502005003655D1 (de) * | 2005-05-25 | 2008-05-21 | Enthone | Verfahren und Vorrichtung zur Einstellung der Ionenkonzentration in Elektrolyten |
JP2006341213A (ja) * | 2005-06-10 | 2006-12-21 | Es Adviser:Kk | 無電解銅めっき廃液の電解処理装置及びその電解処理方法 |
DE102006045157B4 (de) | 2006-09-25 | 2020-06-18 | Robert Bosch Gmbh | Handwerkzeugmaschine |
KR100934729B1 (ko) * | 2007-10-29 | 2009-12-30 | (주)화백엔지니어링 | 무전해 주석도금액 불순물 제거장치 및 방법 |
US20110226613A1 (en) | 2010-03-19 | 2011-09-22 | Robert Rash | Electrolyte loop with pressure regulation for separated anode chamber of electroplating system |
US9404194B2 (en) | 2010-12-01 | 2016-08-02 | Novellus Systems, Inc. | Electroplating apparatus and process for wafer level packaging |
JP5715411B2 (ja) | 2010-12-28 | 2015-05-07 | ローム・アンド・ハース電子材料株式会社 | めっき液中から不純物を除去する方法 |
JP5830242B2 (ja) | 2010-12-28 | 2015-12-09 | ローム・アンド・ハース電子材料株式会社 | めっき液中から不純物を除去する方法 |
JP5937320B2 (ja) | 2011-09-14 | 2016-06-22 | ローム・アンド・ハース電子材料株式会社 | めっき液中から不純物を除去する方法 |
WO2013080326A1 (ja) | 2011-11-30 | 2013-06-06 | 不二商事株式会社 | めっき液の再生方法 |
US9534308B2 (en) | 2012-06-05 | 2017-01-03 | Novellus Systems, Inc. | Protecting anodes from passivation in alloy plating systems |
EP2671968B1 (en) | 2012-06-05 | 2014-11-26 | ATOTECH Deutschland GmbH | Method and regeneration apparatus for regenerating a plating composition |
JP6706095B2 (ja) * | 2016-03-01 | 2020-06-03 | 株式会社荏原製作所 | 無電解めっき装置および無電解めっき方法 |
CN111630211B (zh) | 2017-11-01 | 2024-05-24 | 朗姆研究公司 | 控制在电化学镀敷设备上的镀敷电解液浓度 |
CN112135932A (zh) * | 2018-05-09 | 2020-12-25 | 应用材料公司 | 用于去除电镀系统内的污染物的系统及方法 |
CN109467167B (zh) * | 2018-10-30 | 2021-12-03 | 上海大学 | 一种去除不锈钢酸洗废水中重金属的方法 |
EP3875639A1 (de) * | 2020-03-04 | 2021-09-08 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Verfahren zum herstellen von leiterplatten- und/oder substraten innerhalb eines wertstoffkreislaufs |
CN111676470A (zh) * | 2020-05-29 | 2020-09-18 | 广东天承科技有限公司 | 一种简易可溶性的高价锡的还原方法 |
CN116288292A (zh) * | 2023-03-20 | 2023-06-23 | 聂柱根 | 一种化学锡药水锡还原再生除铜装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3764503A (en) * | 1972-01-19 | 1973-10-09 | Dart Ind Inc | Electrodialysis regeneration of metal containing acid solutions |
DE2742718C2 (de) * | 1977-09-22 | 1984-04-19 | ESTEL HOOGOVENS B.V., 1970 Ijmuiden | Verfahren und Vorrichtung zur Regenerierung eines Verzinnungselektrolyten |
US4330377A (en) * | 1980-07-10 | 1982-05-18 | Vulcan Materials Company | Electrolytic process for the production of tin and tin products |
US4600493A (en) * | 1985-01-14 | 1986-07-15 | Morton Thiokol, Inc. | Electrodialysis apparatus for the chemical maintenance of electroless copper plating baths |
CA2083196C (en) * | 1991-11-27 | 1998-02-17 | Randal D. King | Process for extending the life of a displacement plating bath |
DE4310366C1 (de) * | 1993-03-30 | 1994-10-13 | Fraunhofer Ges Forschung | Verfahren zum Regenerieren von wässrigen, außenstromlos arbeitenden Beschichtungsbädern |
-
1997
- 1997-05-07 DE DE19719020A patent/DE19719020A1/de not_active Withdrawn
-
1998
- 1998-03-10 JP JP10058275A patent/JPH10317154A/ja active Pending
- 1998-04-25 EP EP98107584A patent/EP0878561B1/de not_active Expired - Lifetime
- 1998-04-25 AT AT98107584T patent/ATE248935T1/de not_active IP Right Cessation
- 1998-04-25 DE DE59809451T patent/DE59809451D1/de not_active Expired - Fee Related
- 1998-04-25 PT PT98107584T patent/PT878561E/pt unknown
- 1998-04-25 ES ES98107584T patent/ES2202686T3/es not_active Expired - Lifetime
- 1998-04-25 DK DK98107584T patent/DK0878561T3/da active
- 1998-04-30 CA CA002236393A patent/CA2236393C/en not_active Expired - Fee Related
- 1998-05-04 AR ARP980102075A patent/AR010155A1/es unknown
- 1998-05-05 BR BR9801580A patent/BR9801580A/pt not_active IP Right Cessation
- 1998-05-06 AU AU64757/98A patent/AU724854B2/en not_active Ceased
- 1998-05-07 US US09/074,725 patent/US6120673A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CA2236393A1 (en) | 1998-11-07 |
JPH10317154A (ja) | 1998-12-02 |
DK0878561T3 (da) | 2004-01-12 |
PT878561E (pt) | 2004-02-27 |
US6120673A (en) | 2000-09-19 |
EP0878561B1 (de) | 2003-09-03 |
ATE248935T1 (de) | 2003-09-15 |
BR9801580A (pt) | 1999-07-06 |
DE59809451D1 (de) | 2003-10-09 |
AU6475798A (en) | 1998-11-12 |
EP0878561A3 (de) | 1999-04-28 |
AU724854B2 (en) | 2000-10-05 |
CA2236393C (en) | 2004-01-20 |
DE19719020A1 (de) | 1998-11-12 |
ES2202686T3 (es) | 2004-04-01 |
EP0878561A2 (de) | 1998-11-18 |
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