ZW17590A1 - Improvements in or relating to radiation sensitive devices - Google Patents

Improvements in or relating to radiation sensitive devices

Info

Publication number
ZW17590A1
ZW17590A1 ZW175/90A ZW17590A ZW17590A1 ZW 17590 A1 ZW17590 A1 ZW 17590A1 ZW 175/90 A ZW175/90 A ZW 175/90A ZW 17590 A ZW17590 A ZW 17590A ZW 17590 A1 ZW17590 A1 ZW 17590A1
Authority
ZW
Zimbabwe
Prior art keywords
radiation sensitive
relating
sensitive devices
covering layer
dispersion
Prior art date
Application number
ZW175/90A
Other languages
English (en)
Inventor
Edward Murray David
Ernest Matthews Andrew
Original Assignee
Du Pont Howson Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont Howson Ltd filed Critical Du Pont Howson Ltd
Publication of ZW17590A1 publication Critical patent/ZW17590A1/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B5/00—Electrostatic spraying apparatus; Spraying apparatus with means for charging the spray electrically; Apparatus for spraying liquids or other fluent materials by other electric means
    • B05B5/025—Discharge apparatus, e.g. electrostatic spray guns
    • B05B5/0255—Discharge apparatus, e.g. electrostatic spray guns spraying and depositing by electrostatic forces only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Light Receiving Elements (AREA)
  • Luminescent Compositions (AREA)
  • Laminated Bodies (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Saccharide Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Physical Vapour Deposition (AREA)
  • Measurement Of Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
ZW175/90A 1989-11-21 1990-11-16 Improvements in or relating to radiation sensitive devices ZW17590A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB898926281A GB8926281D0 (en) 1989-11-21 1989-11-21 Improvements in or relating to radiation sensitive devices

Publications (1)

Publication Number Publication Date
ZW17590A1 true ZW17590A1 (en) 1991-06-16

Family

ID=10666652

Family Applications (1)

Application Number Title Priority Date Filing Date
ZW175/90A ZW17590A1 (en) 1989-11-21 1990-11-16 Improvements in or relating to radiation sensitive devices

Country Status (20)

Country Link
US (1) US5162193A (es)
EP (1) EP0429234B1 (es)
JP (1) JP3100056B2 (es)
KR (1) KR910011490A (es)
AT (1) ATE172799T1 (es)
AU (1) AU6672490A (es)
BR (1) BR9005871A (es)
CA (1) CA2030363A1 (es)
CZ (1) CZ574190A3 (es)
DE (1) DE69032721T2 (es)
ES (1) ES2121746T3 (es)
FI (1) FI905723A (es)
GB (1) GB8926281D0 (es)
HU (1) HUT56644A (es)
IE (1) IE904188A1 (es)
NO (1) NO905026L (es)
NZ (1) NZ236132A (es)
TN (1) TNSN90137A1 (es)
ZA (1) ZA909106B (es)
ZW (1) ZW17590A1 (es)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2630487B2 (ja) * 1990-06-14 1997-07-16 富士写真フイルム株式会社 感光性印刷版の製造方法
JP2622769B2 (ja) * 1990-04-19 1997-06-18 富士写真フイルム株式会社 感光性印刷版の製造方法
JPH0446341A (ja) * 1990-06-14 1992-02-17 Fuji Photo Film Co Ltd 感光性印刷版の製造方法
JPH0446343A (ja) * 1990-06-14 1992-02-17 Fuji Photo Film Co Ltd 感光性印刷版及びその製造方法
IT1252016B (it) * 1991-11-28 1995-05-27 Lastra Spa Metodo ed apparecchiatura per la mattatura di lastre da stampa fotosensibili
JPH086256A (ja) * 1994-06-24 1996-01-12 Mitsubishi Electric Corp レジストパターンの形成方法および該方法に用いられる酸性の水溶性材料組成物
DE4439184A1 (de) * 1994-11-03 1996-05-09 Hoechst Ag Lichtempfindliches Aufzeichnungsmaterial
DE19533021A1 (de) * 1995-09-07 1997-03-13 Hoechst Ag Mattiertes strahlungsempfindliches Aufzeichnungsmaterial und Verfahren zu dessen Herstellung
JPH10171124A (ja) * 1996-12-11 1998-06-26 Konica Corp 感光性印刷版の製造方法
US6433154B1 (en) 1997-06-12 2002-08-13 Bristol-Myers Squibb Company Functional receptor/kinase chimera in yeast cells
EP1084862B1 (en) * 1999-09-15 2003-11-12 Agfa-Gevaert A method for obtaining a heat sensitive element by spray-coating
US6479216B1 (en) 1999-09-15 2002-11-12 Agfa-Gevaert Method for obtaining a heat sensitive element by spray-coating
CN1830536A (zh) * 2000-05-16 2006-09-13 明尼苏达大学评议会 采用多喷嘴喷射产生大批生产量的颗粒
US6500494B2 (en) * 2000-12-29 2002-12-31 Kodak Polychrome Graphics Llc Spray coating matting method for printing plate precursors
US7247338B2 (en) 2001-05-16 2007-07-24 Regents Of The University Of Minnesota Coating medical devices
US9108217B2 (en) 2006-01-31 2015-08-18 Nanocopoeia, Inc. Nanoparticle coating of surfaces
US9248217B2 (en) 2006-01-31 2016-02-02 Nanocopocia, LLC Nanoparticle coating of surfaces
CA2637883C (en) 2006-01-31 2015-07-07 Regents Of The University Of Minnesota Electrospray coating of objects
US9040816B2 (en) 2006-12-08 2015-05-26 Nanocopoeia, Inc. Methods and apparatus for forming photovoltaic cells using electrospray
JP5080177B2 (ja) * 2007-09-03 2012-11-21 日本電波工業株式会社 レジスト塗布装置
US20090202938A1 (en) * 2008-02-08 2009-08-13 Celin Savariar-Hauck Method of improving surface abrasion resistance of imageable elements
KR101696852B1 (ko) * 2010-01-12 2017-01-17 동부대우전자 주식회사 스팀발생장치
KR101915610B1 (ko) * 2017-02-28 2018-11-06 (주)엔피홀딩스 스팀 생성 용기

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2695002A (en) * 1950-06-24 1954-11-23 Ransburg Electro Coating Corp Electrostatic atomizer of liquids
JPS5532086A (en) * 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photosensitive printing plate
JPS5734558A (en) * 1980-08-11 1982-02-24 Fuji Photo Film Co Ltd Photosensitive printing plate
JPS58137469A (ja) * 1982-02-10 1983-08-15 Fuji Photo Film Co Ltd 記録材料のマツト化方法
JPS58182636A (ja) * 1982-04-20 1983-10-25 Fuji Photo Film Co Ltd 感光性印刷版
GB8319227D0 (en) * 1983-07-15 1983-08-17 Ici Plc Electrostatic spraying
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
DE3661121D1 (en) * 1985-09-03 1988-12-15 Sale Tilney Technology Plc Electrostatic coating blade and method of electrostatic spraying
GB8609703D0 (en) * 1986-04-21 1986-05-29 Ici Plc Electrostatic spraying
GB8813154D0 (en) * 1988-06-03 1988-07-06 Vickers Plc Improvements in/relating to radiation sensitive devices

Also Published As

Publication number Publication date
BR9005871A (pt) 1991-09-24
HU907216D0 (en) 1991-05-28
NO905026L (no) 1991-05-22
JP3100056B2 (ja) 2000-10-16
AU6672490A (en) 1991-05-30
HUT56644A (en) 1991-09-30
KR910011490A (ko) 1991-08-07
ZA909106B (en) 1991-11-27
ES2121746T3 (es) 1998-12-16
TNSN90137A1 (fr) 1991-03-05
EP0429234A3 (en) 1991-12-27
GB8926281D0 (en) 1990-01-10
FI905723A0 (fi) 1990-11-20
EP0429234A2 (en) 1991-05-29
ATE172799T1 (de) 1998-11-15
US5162193A (en) 1992-11-10
CZ574190A3 (en) 1993-02-17
JPH03194558A (ja) 1991-08-26
IE904188A1 (en) 1991-05-22
DE69032721D1 (de) 1998-12-03
DE69032721T2 (de) 1999-04-08
EP0429234B1 (en) 1998-10-28
FI905723A (fi) 1991-05-22
NO905026D0 (no) 1990-11-20
NZ236132A (en) 1992-01-29
CA2030363A1 (en) 1991-05-22

Similar Documents

Publication Publication Date Title
EP0429234A3 (en) Improvements in or relating to radiation sensitive devices
GB2171955B (en) Coated fabrics
EP0585076A3 (en) Tape.
NZ189566A (en) Body exudates absorption article with layer to prevent inverse flow
DE3462219D1 (en) Sanitary towel
DE2862399D1 (en) Device and method for growing doped semiconductor material layers on the surface of a semiconductor substrate
PT78372A (fr) Structure textile enduite decoree et procede pour sa realisati-on
GB2016727B (en) Transmissive surface layer effect electro-optic device
JPS5285274A (en) Production of laminates for interior decoration
AU7624587A (en) Moistening test strips
JPS5615054A (en) Hybrid integrated circuit device
JPS6463322A (en) Growing of fruit
JPS6476030A (en) Liquid crystal display device
ES8101688A1 (es) Procedimiento para obtener un recubrimiento con espaldar de espuma sobre un soporte
EP0180556A3 (en) Cover for an ironing board
JPS5780737A (en) Dividing method for semiconductor wafer
JPS6415971A (en) Solid-state image sensing device
GB2032301B (en) Liquid jet producing device
JPS53109643A (en) Optical fiber cable
IL86858A (en) Process for the production of polyolefin film with mat surface
JPS53120747A (en) Coating method of fiber-incorporated materials and its device
JPS5491348A (en) Display device
JPS53139493A (en) Liquid-crystal display unit
JPS5388742A (en) Method of sealingly adhering liquid crystal element
UA16857A1 (uk) Спосіб розморожуваhhя клітиhhої суспеhзії та пристрій для його здійсhеhhя