ZA963969B - Oxazoline modified acid polymers useful in photosensitive compositions and lithographic plates. - Google Patents

Oxazoline modified acid polymers useful in photosensitive compositions and lithographic plates.

Info

Publication number
ZA963969B
ZA963969B ZA9603969A ZA963969A ZA963969B ZA 963969 B ZA963969 B ZA 963969B ZA 9603969 A ZA9603969 A ZA 9603969A ZA 963969 A ZA963969 A ZA 963969A ZA 963969 B ZA963969 B ZA 963969B
Authority
ZA
South Africa
Prior art keywords
free radical
radical polymerizable
system consisting
acid polymers
polymers useful
Prior art date
Application number
ZA9603969A
Other languages
English (en)
Inventor
Celin M Savariar-Hauck
Harald Baumann
Hans-Joachim Timpe
Udo Dwars
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of ZA963969B publication Critical patent/ZA963969B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L1/00—Compositions of cellulose, modified cellulose or cellulose derivatives
    • C08L1/08—Cellulose derivatives
    • C08L1/10—Esters of organic acids, i.e. acylates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D101/00—Coating compositions based on cellulose, modified cellulose, or cellulose derivatives
    • C09D101/08—Cellulose derivatives
    • C09D101/10—Esters of organic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Polymerisation Methods In General (AREA)
ZA9603969A 1995-05-17 1996-05-17 Oxazoline modified acid polymers useful in photosensitive compositions and lithographic plates. ZA963969B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19518118A DE19518118C2 (de) 1995-05-17 1995-05-17 Lichtempfindliche Zusammensetzung

Publications (1)

Publication Number Publication Date
ZA963969B true ZA963969B (en) 1997-02-26

Family

ID=7762163

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA9603969A ZA963969B (en) 1995-05-17 1996-05-17 Oxazoline modified acid polymers useful in photosensitive compositions and lithographic plates.

Country Status (6)

Country Link
US (1) US5695905A (de)
EP (1) EP0749045B1 (de)
AT (1) ATE199785T1 (de)
CA (1) CA2176873A1 (de)
DE (2) DE19518118C2 (de)
ZA (1) ZA963969B (de)

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US6555240B1 (en) * 1999-11-24 2003-04-29 Oji Paper Co., Ltd. Film laminates for printing
US6884561B2 (en) * 2000-01-12 2005-04-26 Anocoil Corporation Actinically imageable and infrared heated printing plate
US6458511B1 (en) 2000-06-07 2002-10-01 Kodak Polychrome Graphics Llc Thermally imageable positive-working lithographic printing plate precursor and method for imaging
US6555283B1 (en) 2000-06-07 2003-04-29 Kodak Polychrome Graphics Llc Imageable element and waterless printing plate
US6451505B1 (en) 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
US6777155B2 (en) * 2000-10-03 2004-08-17 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
US6548215B2 (en) 2001-02-09 2003-04-15 Kodak Polychrome Graphics Llc Method for the production of a printing plate using the dual-feed technology
US6706454B2 (en) 2001-07-05 2004-03-16 Kodak Polychrome Graphics Llc Method for the production of a printing plate using particle growing acceleration by an additive polymer
US6817855B2 (en) 2002-05-17 2004-11-16 Husky Injection Molding Systems Ltd. Apparatus for post mold cooling of plastic pieces
DE10307453B4 (de) * 2003-02-21 2005-07-21 Kodak Polychrome Graphics Gmbh Oxazol-Derivate enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
DE10356847B4 (de) * 2003-12-05 2005-10-06 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
US7294671B2 (en) * 2004-02-06 2007-11-13 Invista North America S.A.R.L. Reactive carriers for polymer melt injection
EP3548970A1 (de) 2016-12-01 2019-10-09 Agfa Nv Verfahren zur herstellung eines lithografischen druckplattenvorläufers mit einer diazoniumverbindung
ES2881270T3 (es) 2017-12-08 2021-11-29 Agfa Nv Procedimiento de fabricación de una plancha de impresión litográfica
WO2020120402A1 (en) 2018-12-10 2020-06-18 Agfa Nv On-press processing of a uv or violet-sensitized lithographic printing plate
CN112940154A (zh) * 2019-12-11 2021-06-11 固安鼎材科技有限公司 大分子光引发剂及包含其的光敏树脂组合物

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US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition
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Also Published As

Publication number Publication date
DE19518118A1 (de) 1996-11-21
CA2176873A1 (en) 1996-11-18
US5695905A (en) 1997-12-09
EP0749045A3 (de) 1997-11-12
DE69612036D1 (de) 2001-04-19
DE19518118C2 (de) 1998-06-18
EP0749045B1 (de) 2001-03-14
EP0749045A2 (de) 1996-12-18
DE69612036T2 (de) 2001-10-25
ATE199785T1 (de) 2001-03-15

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