DE69610271D1 - Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten - Google Patents

Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten

Info

Publication number
DE69610271D1
DE69610271D1 DE69610271T DE69610271T DE69610271D1 DE 69610271 D1 DE69610271 D1 DE 69610271D1 DE 69610271 T DE69610271 T DE 69610271T DE 69610271 T DE69610271 T DE 69610271T DE 69610271 D1 DE69610271 D1 DE 69610271D1
Authority
DE
Germany
Prior art keywords
photosensitive compositions
lithographic printing
printing plates
acetal polymers
sulfonamide substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69610271T
Other languages
English (en)
Other versions
DE69610271T2 (de
Inventor
Hans-Joachim Timpe
Udo Dwars
Harald Baumann
Celin Savriar-Hauck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Priority to DE69610271T priority Critical patent/DE69610271T2/de
Publication of DE69610271D1 publication Critical patent/DE69610271D1/de
Application granted granted Critical
Publication of DE69610271T2 publication Critical patent/DE69610271T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69610271T 1995-07-10 1996-07-09 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten Expired - Fee Related DE69610271T2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE69610271T DE69610271T2 (de) 1995-07-10 1996-07-09 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19525050A DE19525050C2 (de) 1995-07-10 1995-07-10 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE69610271T DE69610271T2 (de) 1995-07-10 1996-07-09 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten

Publications (2)

Publication Number Publication Date
DE69610271D1 true DE69610271D1 (de) 2000-10-19
DE69610271T2 DE69610271T2 (de) 2001-01-25

Family

ID=7766427

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19525050A Expired - Fee Related DE19525050C2 (de) 1995-07-10 1995-07-10 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE69610271T Expired - Fee Related DE69610271T2 (de) 1995-07-10 1996-07-09 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19525050A Expired - Fee Related DE19525050C2 (de) 1995-07-10 1995-07-10 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten

Country Status (6)

Country Link
US (2) US5698360A (de)
EP (1) EP0757061B1 (de)
AT (1) ATE196299T1 (de)
CA (1) CA2180580A1 (de)
DE (2) DE19525050C2 (de)
ZA (1) ZA965867B (de)

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DE19639897A1 (de) * 1996-09-27 1998-04-02 Sun Chemical Corp Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien
DE19644515A1 (de) * 1996-10-25 1998-06-25 Sun Chemical Corp Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE19847616C2 (de) * 1998-10-15 2001-05-10 Kodak Polychrome Graphics Gmbh Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
US7131107B2 (en) * 2000-07-03 2006-10-31 Oculus Technologies Corporation Method for mapping business processes using an emergent model on a computer network
US6777155B2 (en) * 2000-10-03 2004-08-17 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
JP4248137B2 (ja) * 2000-11-22 2009-04-02 富士フイルム株式会社 ネガ型感光性平版印刷版
US6802258B2 (en) * 2000-12-07 2004-10-12 Agfa-Gevaert Method of lithographic printing with a reusable substrate
US6458503B1 (en) * 2001-03-08 2002-10-01 Kodak Polychrome Graphics Llc Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
US6596456B2 (en) * 2001-05-29 2003-07-22 Kodak Polychrome Graphics Llc Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
US6562527B2 (en) 2001-08-17 2003-05-13 Kodak Polychrome Graphics Llc Imaged members and method of preparation thereof
US6821583B2 (en) 2002-07-03 2004-11-23 Kodak Polychrome Graphics Llc Imageable element for single fluid ink
DE10239505B4 (de) * 2002-08-28 2005-05-04 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit
US7217502B2 (en) * 2003-03-27 2007-05-15 Eastman Kodak Company Nanopastes for use as patterning compositions
US6921626B2 (en) * 2003-03-27 2005-07-26 Kodak Polychrome Graphics Llc Nanopastes as patterning compositions for electronic parts
US7094503B2 (en) * 2003-03-27 2006-08-22 Kodak Graphics Communications Canada Company Nanopastes for use as patterning compositions
US7081322B2 (en) * 2003-03-27 2006-07-25 Kodak Graphics Communications Canada Company Nanopastes as ink-jet compositions for printing plates
KR101179830B1 (ko) * 2005-06-03 2012-09-04 아메리칸 다이 소스, 인코포레이티드 열반응성 근적외선 흡수성 아세탈 공중합체, 이의 제조방법및 이의 사용방법
EP2366545B1 (de) 2010-03-19 2012-12-05 Agfa Graphics N.V. Lithographiedruckplattenvorläufer
CN104870193B (zh) 2013-01-01 2017-12-22 爱克发印艺公司 (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途
EP2933278B1 (de) 2014-04-17 2018-08-22 Agfa Nv (Ethylen-,Vinylacetal-)Copolymere und ihre Verwendung in Lithographiedruckplattenvorläufern
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (de) 2014-06-30 2017-04-05 Agfa Graphics NV Lithografiedruckplattenvorläufer mit (Ethylen-, Vinylacetal-) Copolymeren
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法

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Also Published As

Publication number Publication date
DE19525050A1 (de) 1997-01-30
ZA965867B (en) 1997-06-17
US5698360A (en) 1997-12-16
EP0757061B1 (de) 2000-09-13
DE69610271T2 (de) 2001-01-25
CA2180580A1 (en) 1997-01-11
EP0757061A3 (de) 1998-04-15
EP0757061A2 (de) 1997-02-05
DE19525050C2 (de) 1999-11-11
ATE196299T1 (de) 2000-09-15
US5849842A (en) 1998-12-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: EASTMAN KODAK COMPANY, ROCHESTER, N.Y., US

8339 Ceased/non-payment of the annual fee