ATE196299T1 - Sulfonamidsubstituierte acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und lithographischen druckplatten - Google Patents

Sulfonamidsubstituierte acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und lithographischen druckplatten

Info

Publication number
ATE196299T1
ATE196299T1 AT96111023T AT96111023T ATE196299T1 AT E196299 T1 ATE196299 T1 AT E196299T1 AT 96111023 T AT96111023 T AT 96111023T AT 96111023 T AT96111023 T AT 96111023T AT E196299 T1 ATE196299 T1 AT E196299T1
Authority
AT
Austria
Prior art keywords
photosensitive compositions
lithographic printing
printing plates
acetal polymers
sulfonamide substituted
Prior art date
Application number
AT96111023T
Other languages
English (en)
Inventor
Hans-Joachim Timpe
Udo Dwars
Harald Baumann
Celin Savriar-Hauck
Original Assignee
Kodak Polychrome Graphics Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics Llc filed Critical Kodak Polychrome Graphics Llc
Application granted granted Critical
Publication of ATE196299T1 publication Critical patent/ATE196299T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT96111023T 1995-07-10 1996-07-09 Sulfonamidsubstituierte acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und lithographischen druckplatten ATE196299T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19525050A DE19525050C2 (de) 1995-07-10 1995-07-10 Sulfonamidsubstituierte Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten

Publications (1)

Publication Number Publication Date
ATE196299T1 true ATE196299T1 (de) 2000-09-15

Family

ID=7766427

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96111023T ATE196299T1 (de) 1995-07-10 1996-07-09 Sulfonamidsubstituierte acetalpolymere und verwendung derselben in lichtempfindlichen zusammensetzungen und lithographischen druckplatten

Country Status (6)

Country Link
US (2) US5698360A (de)
EP (1) EP0757061B1 (de)
AT (1) ATE196299T1 (de)
CA (1) CA2180580A1 (de)
DE (2) DE19525050C2 (de)
ZA (1) ZA965867B (de)

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DE19644515A1 (de) * 1996-10-25 1998-06-25 Sun Chemical Corp Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE19847616C2 (de) * 1998-10-15 2001-05-10 Kodak Polychrome Graphics Gmbh Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
AU2001271802A1 (en) * 2000-07-03 2002-01-14 Oculus Technologies Corporation Access control for a decentralized or emergent model on a computer network
US6777155B2 (en) * 2000-10-03 2004-08-17 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
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US6802258B2 (en) * 2000-12-07 2004-10-12 Agfa-Gevaert Method of lithographic printing with a reusable substrate
US6458503B1 (en) * 2001-03-08 2002-10-01 Kodak Polychrome Graphics Llc Fluorinated aromatic acetal polymers and photosensitive compositions containing such polymers
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US6562527B2 (en) * 2001-08-17 2003-05-13 Kodak Polychrome Graphics Llc Imaged members and method of preparation thereof
US6821583B2 (en) 2002-07-03 2004-11-23 Kodak Polychrome Graphics Llc Imageable element for single fluid ink
DE10239505B4 (de) * 2002-08-28 2005-05-04 Kodak Polychrome Graphics Gmbh Wärmeempfindlicher positiv arbeitender Lithographie-Druckplattenvorläufer mit hoher Chemikalienbeständigkeit
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US6921626B2 (en) * 2003-03-27 2005-07-26 Kodak Polychrome Graphics Llc Nanopastes as patterning compositions for electronic parts
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EP2366545B1 (de) 2010-03-19 2012-12-05 Agfa Graphics N.V. Lithographiedruckplattenvorläufer
WO2014106554A1 (en) 2013-01-01 2014-07-10 Agfa Graphics Nv (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2933278B1 (de) 2014-04-17 2018-08-22 Agfa Nv (Ethylen-,Vinylacetal-)Copolymere und ihre Verwendung in Lithographiedruckplattenvorläufern
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2955198B8 (de) 2014-06-13 2018-01-03 Agfa Nv Ethylenvinylacetal-Copolymere und deren Verwendung in lithographischen Druckplattenvorläufer
EP2963496B1 (de) 2014-06-30 2017-04-05 Agfa Graphics NV Lithografiedruckplattenvorläufer mit (Ethylen-, Vinylacetal-) Copolymeren
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法

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Also Published As

Publication number Publication date
CA2180580A1 (en) 1997-01-11
US5698360A (en) 1997-12-16
DE69610271D1 (de) 2000-10-19
EP0757061B1 (de) 2000-09-13
DE19525050C2 (de) 1999-11-11
EP0757061A3 (de) 1998-04-15
DE19525050A1 (de) 1997-01-30
DE69610271T2 (de) 2001-01-25
US5849842A (en) 1998-12-15
ZA965867B (en) 1997-06-17
EP0757061A2 (de) 1997-02-05

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