ZA804267B - Radiation-sensitive mixture and process for the production of relief images - Google Patents

Radiation-sensitive mixture and process for the production of relief images

Info

Publication number
ZA804267B
ZA804267B ZA00804267A ZA804267A ZA804267B ZA 804267 B ZA804267 B ZA 804267B ZA 00804267 A ZA00804267 A ZA 00804267A ZA 804267 A ZA804267 A ZA 804267A ZA 804267 B ZA804267 B ZA 804267B
Authority
ZA
South Africa
Prior art keywords
denotes
radiation
production
group
sensitive mixture
Prior art date
Application number
ZA00804267A
Other languages
English (en)
Inventor
G Buhr
H Ruckert
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of ZA804267B publication Critical patent/ZA804267B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/16—Cyclic ethers having four or more ring atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L69/00—Compositions of polycarbonates; Compositions of derivatives of polycarbonates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
ZA00804267A 1979-07-16 1980-07-15 Radiation-sensitive mixture and process for the production of relief images ZA804267B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792928636 DE2928636A1 (de) 1979-07-16 1979-07-16 Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern

Publications (1)

Publication Number Publication Date
ZA804267B true ZA804267B (en) 1981-07-29

Family

ID=6075816

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA00804267A ZA804267B (en) 1979-07-16 1980-07-15 Radiation-sensitive mixture and process for the production of relief images

Country Status (9)

Country Link
US (1) US4311782A (xx)
EP (1) EP0022571B1 (xx)
JP (1) JPS5617345A (xx)
AT (1) ATE2099T1 (xx)
AU (1) AU533172B2 (xx)
BR (1) BR8004395A (xx)
CA (1) CA1133743A (xx)
DE (2) DE2928636A1 (xx)
ZA (1) ZA804267B (xx)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
DE3582697D1 (de) * 1984-06-07 1991-06-06 Hoechst Ag Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
JPS6246520A (ja) * 1985-08-23 1987-02-28 Mitsubishi Electric Corp 露光装置
US4897336A (en) * 1986-04-11 1990-01-30 Chien James C W Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether
DE3621376A1 (de) * 1986-06-26 1988-01-07 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial
JP2719909B2 (ja) * 1986-07-02 1998-02-25 コニカ株式会社 感光性組成物および感光性平版印刷版
DE3628720A1 (de) * 1986-08-23 1988-02-25 Hoechst Ag Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck
DE3635303A1 (de) 1986-10-17 1988-04-28 Hoechst Ag Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten
JPS63265242A (ja) * 1987-04-23 1988-11-01 Fuji Photo Film Co Ltd 多色画像形成方法
DE3715790A1 (de) * 1987-05-12 1988-11-24 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial
DE3716848A1 (de) * 1987-05-20 1988-12-01 Hoechst Ag Verfahren zur bebilderung lichtempfindlichen materials
DE3725741A1 (de) * 1987-08-04 1989-02-16 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
DE3725949A1 (de) * 1987-08-05 1989-02-16 Hoechst Ag Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien
DE3730785A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730787A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3730783A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3821585A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE3737734A1 (de) * 1987-11-06 1989-05-18 Hoechst Ag Strahlungsempfindliches gemisch
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand
EP0347381B1 (de) * 1988-06-13 1992-02-12 Ciba-Geigy Ag Ungesättigte beta-Ketoesteracetale und ihre Anwendungen
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3821584A1 (de) * 1988-06-25 1989-12-28 Hoechst Ag Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichungsmaterial fuer hochenergetische strahlung
DE3827901A1 (de) * 1988-08-17 1990-02-22 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3837438A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3837513A1 (de) * 1988-11-04 1990-05-10 Basf Ag Strahlungsempfindliches gemisch
DE3907953A1 (de) * 1989-03-11 1990-09-13 Hoechst Ag Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE3907954A1 (de) * 1989-03-11 1990-09-13 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5220037A (en) * 1989-07-22 1993-06-15 Basf Aktiengesellschaft Sulfonium salts and use thereof
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4003025A1 (de) * 1990-02-02 1991-08-08 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
US5164278A (en) * 1990-03-01 1992-11-17 International Business Machines Corporation Speed enhancers for acid sensitized resists
DE4110057A1 (de) * 1991-03-27 1992-10-01 Hoechst Ag Verfahren zur herstellung eines mehrfarben-pruefbildes und hierfuer geeignetes strahlungsempfindliches aufzeichnungsmaterial
US5403695A (en) * 1991-04-30 1995-04-04 Kabushiki Kaisha Toshiba Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups
US5342734A (en) * 1992-02-25 1994-08-30 Morton International, Inc. Deep UV sensitive photoresist resistant to latent image decay
US6667387B1 (en) 1996-09-30 2003-12-23 N.V. Innogenetics S.A. HCV core peptides
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
DE4242050A1 (de) * 1992-12-14 1994-06-16 Hoechst Ag Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung
DE4242051A1 (de) * 1992-12-14 1994-06-16 Hoechst Ag N,N-Disubstituierte Sulfonamide und damit hergestelltes strahlungsempfindliches Gemisch
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
EP0620500A3 (en) * 1993-04-16 1996-01-03 Hitachi Ltd Reserve and method for obtaining structures with this reserve.
GB9326150D0 (en) * 1993-12-22 1994-02-23 Alcan Int Ltd Electrochemical roughening method
DE4414896A1 (de) * 1994-04-28 1995-11-02 Hoechst Ag Positiv arbeitendes strahlungempfindliches Gemisch
EP0786701A4 (en) * 1994-10-13 1998-08-12 Nippon Zeon Co PHOTO PAINT COMPOSITION
DE4444669A1 (de) 1994-12-15 1996-06-20 Hoechst Ag Strahlungsempfindliches Gemisch
JPH0954437A (ja) 1995-06-05 1997-02-25 Fuji Photo Film Co Ltd 化学増幅型ポジレジスト組成物
EP0877294A4 (en) 1996-01-26 1999-09-29 Nippon Zeon Co COMPOSITION OF RESIST
JP3591672B2 (ja) 1996-02-05 2004-11-24 富士写真フイルム株式会社 ポジ型感光性組成物
US6060222A (en) 1996-11-19 2000-05-09 Kodak Polcyhrome Graphics Llc 1Postitve-working imaging composition and element and method of forming positive image with a laser
DE19803564A1 (de) 1998-01-30 1999-08-05 Agfa Gevaert Ag Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen
KR100314761B1 (ko) 1999-03-03 2001-11-17 윤덕용 노르보르넨에 콜릭산, 디옥시콜릭산 또는 리소콜릭산 유도체를 결합시킨 단량체를 이용한 중합체 및 이를 함유하는 포토레지스트 조성물
JP2000347411A (ja) * 1999-06-08 2000-12-15 Matsushita Electric Ind Co Ltd パターン形成材料およびパターン形成方法
JP3969909B2 (ja) 1999-09-27 2007-09-05 富士フイルム株式会社 ポジ型フォトレジスト組成物
EP1235104A4 (en) 2000-08-29 2008-10-01 Jsr Corp COMPOSITION HAVING SUBSTANTIALLY MODIFIABLE REFRACTION INDEX AND METHOD FOR FORMING REFRACTION INDEX PATTERN
EP1350814A4 (en) 2000-12-11 2007-09-19 Jsr Corp RADIATION SENSITIVE COMPOSITION, VARIABLE REFRACTION INDEX AND METHOD OF ALTERING REFRACTIVE INDEX
KR100789582B1 (ko) 2001-02-19 2007-12-28 제이에스알 가부시끼가이샤 감방사선성 굴절율 변화성 조성물
US7125647B2 (en) 2001-03-13 2006-10-24 Jsr Corporation Radiation-sensitive composition changing in refractive index and utilization thereof
KR100749494B1 (ko) 2001-04-03 2007-08-14 삼성에스디아이 주식회사 화학증폭형 네가티브 포토레지스트용 중합체 및 포토레지스트 조성물
KR100975793B1 (ko) * 2002-10-23 2010-08-16 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 화학 증폭 포지티브형 감광성 수지 조성물
JP4396443B2 (ja) 2004-08-18 2010-01-13 コニカミノルタエムジー株式会社 感光性平版印刷版の製造方法及び使用方法
US7740699B2 (en) * 2006-10-05 2010-06-22 E.I. Du Pont De Nemours And Company Orthoformate-protected polyols

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH621416A5 (xx) * 1975-03-27 1981-01-30 Hoechst Ag
US4066747A (en) * 1976-04-08 1978-01-03 Alza Corporation Polymeric orthoesters housing beneficial drug for controlled release therefrom
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse

Also Published As

Publication number Publication date
AU6015280A (en) 1981-01-22
US4311782A (en) 1982-01-19
BR8004395A (pt) 1981-01-27
JPS6320325B2 (xx) 1988-04-27
EP0022571B1 (de) 1982-12-22
DE3061426D1 (en) 1983-01-27
DE2928636A1 (de) 1981-02-12
CA1133743A (en) 1982-10-19
EP0022571A1 (de) 1981-01-21
ATE2099T1 (de) 1983-01-15
JPS5617345A (en) 1981-02-19
AU533172B2 (en) 1983-11-03

Similar Documents

Publication Publication Date Title
ZA804267B (en) Radiation-sensitive mixture and process for the production of relief images
ES8602059A1 (es) Procedimiento de obtencion de peliculas plasticas de polivinilbutiral
ATE74590T1 (de) Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare verbindungen und verfahren zu deren herstellung.
BR8204072A (pt) Mistura sensivel a luz e material de copia sensivel a luz
EP0212440A3 (en) Radiation-sensitive composition, registration material containing such a composition and process for the production of relief images
EG14884A (en) Process for preparing of 2,4,6-triiodoisophthalic acid derivatives and their use as x-ray contrast agents
ZA8238B (en) Light-sensitive mixture and copying material comprising an o-naphthoquinondediazide
SE7614315L (sv) Fotopolymeriserbart material
SE7908428L (sv) Nya minoglykosider
BR8106859A (pt) Mistura foto-sensivel e material de copia foto-sensivel
BR8105460A (pt) Agente sequestrante suportado, seu processo de preparacao e sua aplicacao
DE3264928D1 (en) Process for producing brominated 1,3-dioxolen-2-ones
ZA824004B (en) Light-sensitive mixture based on o-naphthoquinonediazides,and light-sensitive copying material prepared therefrom
ES471267A1 (es) Procedimiento para la preparacion de alquilo inferior 2-tri-(inferior) alquilsililacetileno-n-carbetoxiglicinatos y ami-no acidos derivados de ellos
JPS52100470A (en) Synthesis of hydantoin derivatives
ES441129A1 (es) Procedimiento para el procesado de una capa fotopolimerica expuesta a modo de imagen.
ES8205816A1 (es) Procedimiento para la preparacion de cardenolido-bis-digoto-xosidos
JPS52100469A (en) Hydantoin derivatives
ES479537A1 (es) Procedimiento de preparacion de esteres bencilidenicos.
GB805500A (en) Herbicidal compositions and substances for use therein
JPS5265255A (en) Synthesis of tetrahydronaphthylamine derivatives
JPS6444950A (en) Electrophotographic sensitive body
JPS57182749A (en) Electrophotographic receptor
ES297979A2 (es) Procedimiento para la fabricacion de derivados basicos de dibenzo-(b,e) -oxepina o de dibenzo-(b,e)-tiepina, de sus sales y combinaciones amonicas cuaternarias