ZA804267B - Radiation-sensitive mixture and process for the production of relief images - Google Patents
Radiation-sensitive mixture and process for the production of relief imagesInfo
- Publication number
- ZA804267B ZA804267B ZA00804267A ZA804267A ZA804267B ZA 804267 B ZA804267 B ZA 804267B ZA 00804267 A ZA00804267 A ZA 00804267A ZA 804267 A ZA804267 A ZA 804267A ZA 804267 B ZA804267 B ZA 804267B
- Authority
- ZA
- South Africa
- Prior art keywords
- denotes
- radiation
- production
- group
- sensitive mixture
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- 230000005855 radiation Effects 0.000 title abstract 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 3
- 239000002253 acid Substances 0.000 abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 125000002947 alkylene group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 230000000306 recurrent effect Effects 0.000 abstract 2
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract 1
- 125000005529 alkyleneoxy group Chemical group 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000004122 cyclic group Chemical group 0.000 abstract 1
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- 125000005842 heteroatom Chemical group 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 230000036211 photosensitivity Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/16—Cyclic ethers having four or more ring atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L69/00—Compositions of polycarbonates; Compositions of derivatives of polycarbonates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19792928636 DE2928636A1 (de) | 1979-07-16 | 1979-07-16 | Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern |
Publications (1)
Publication Number | Publication Date |
---|---|
ZA804267B true ZA804267B (en) | 1981-07-29 |
Family
ID=6075816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ZA00804267A ZA804267B (en) | 1979-07-16 | 1980-07-15 | Radiation-sensitive mixture and process for the production of relief images |
Country Status (9)
Country | Link |
---|---|
US (1) | US4311782A (xx) |
EP (1) | EP0022571B1 (xx) |
JP (1) | JPS5617345A (xx) |
AT (1) | ATE2099T1 (xx) |
AU (1) | AU533172B2 (xx) |
BR (1) | BR8004395A (xx) |
CA (1) | CA1133743A (xx) |
DE (2) | DE2928636A1 (xx) |
ZA (1) | ZA804267B (xx) |
Families Citing this family (69)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3144499A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
DE3144480A1 (de) * | 1981-11-09 | 1983-05-19 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial |
DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
US4564575A (en) * | 1984-01-30 | 1986-01-14 | International Business Machines Corporation | Tailoring of novolak and diazoquinone positive resists by acylation of novolak |
EP0164083B1 (de) * | 1984-06-07 | 1991-05-02 | Hoechst Aktiengesellschaft | Positiv arbeitende strahlungsempfindliche Beschichtungslösung |
DE3445276A1 (de) * | 1984-12-12 | 1986-06-19 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform |
JPS6246520A (ja) * | 1985-08-23 | 1987-02-28 | Mitsubishi Electric Corp | 露光装置 |
US4897336A (en) * | 1986-04-11 | 1990-01-30 | Chien James C W | Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether |
DE3621376A1 (de) * | 1986-06-26 | 1988-01-07 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial |
JP2719909B2 (ja) * | 1986-07-02 | 1998-02-25 | コニカ株式会社 | 感光性組成物および感光性平版印刷版 |
DE3628720A1 (de) * | 1986-08-23 | 1988-02-25 | Hoechst Ag | Vorsensibilisierte druckplatte und verfahren zur herstellung einer druckform fuer den wasserlosen flachdruck |
DE3635303A1 (de) | 1986-10-17 | 1988-04-28 | Hoechst Ag | Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten |
JPS63265242A (ja) * | 1987-04-23 | 1988-11-01 | Fuji Photo Film Co Ltd | 多色画像形成方法 |
DE3715790A1 (de) * | 1987-05-12 | 1988-11-24 | Hoechst Ag | Strahlungsempfindliches aufzeichnungsmaterial |
DE3716848A1 (de) * | 1987-05-20 | 1988-12-01 | Hoechst Ag | Verfahren zur bebilderung lichtempfindlichen materials |
DE3725741A1 (de) * | 1987-08-04 | 1989-02-16 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch |
DE3725949A1 (de) * | 1987-08-05 | 1989-02-16 | Hoechst Ag | Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung von negativen reliefkopien |
DE3730785A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3730783A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3730787A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3821585A1 (de) * | 1987-09-13 | 1989-03-23 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
DE3737734A1 (de) * | 1987-11-06 | 1989-05-18 | Hoechst Ag | Strahlungsempfindliches gemisch |
DE3810631A1 (de) * | 1988-03-29 | 1989-10-12 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand |
EP0347381B1 (de) * | 1988-06-13 | 1992-02-12 | Ciba-Geigy Ag | Ungesättigte beta-Ketoesteracetale und ihre Anwendungen |
DE3820699A1 (de) * | 1988-06-18 | 1989-12-21 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3821584A1 (de) * | 1988-06-25 | 1989-12-28 | Hoechst Ag | Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichungsmaterial fuer hochenergetische strahlung |
DE3827901A1 (de) * | 1988-08-17 | 1990-02-22 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3837438A1 (de) * | 1988-11-04 | 1990-05-10 | Basf Ag | Strahlungsempfindliches gemisch |
DE3837513A1 (de) * | 1988-11-04 | 1990-05-10 | Basf Ag | Strahlungsempfindliches gemisch |
DE3907954A1 (de) * | 1989-03-11 | 1990-09-13 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
DE3907953A1 (de) * | 1989-03-11 | 1990-09-13 | Hoechst Ag | Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung |
EP0410606B1 (en) | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
US5220037A (en) * | 1989-07-22 | 1993-06-15 | Basf Aktiengesellschaft | Sulfonium salts and use thereof |
DE3930087A1 (de) * | 1989-09-09 | 1991-03-14 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3930086A1 (de) * | 1989-09-09 | 1991-03-21 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3940911A1 (de) * | 1989-12-12 | 1991-06-13 | Hoechst Ag | Verfahren zur herstellung negativer kopien |
DE4002397A1 (de) * | 1990-01-27 | 1991-08-01 | Hoechst Ag | Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE4003025A1 (de) * | 1990-02-02 | 1991-08-08 | Hoechst Ag | Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen |
US5164278A (en) * | 1990-03-01 | 1992-11-17 | International Business Machines Corporation | Speed enhancers for acid sensitized resists |
DE4110057A1 (de) * | 1991-03-27 | 1992-10-01 | Hoechst Ag | Verfahren zur herstellung eines mehrfarben-pruefbildes und hierfuer geeignetes strahlungsempfindliches aufzeichnungsmaterial |
KR950000482B1 (ko) * | 1991-04-30 | 1995-01-20 | 가부시키가이샤 도시바 | 패턴형성용 레지스트 |
US5342734A (en) * | 1992-02-25 | 1994-08-30 | Morton International, Inc. | Deep UV sensitive photoresist resistant to latent image decay |
US6667387B1 (en) | 1996-09-30 | 2003-12-23 | N.V. Innogenetics S.A. | HCV core peptides |
JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
DE4242050A1 (de) * | 1992-12-14 | 1994-06-16 | Hoechst Ag | Polymere mit N,N-disubstituierten Sulfonamid-Seitengruppen und deren Verwendung |
DE4242051A1 (de) * | 1992-12-14 | 1994-06-16 | Hoechst Ag | N,N-Disubstituierte Sulfonamide und damit hergestelltes strahlungsempfindliches Gemisch |
US5314782A (en) * | 1993-03-05 | 1994-05-24 | Morton International, Inc. | Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative |
EP0620500A3 (en) * | 1993-04-16 | 1996-01-03 | Hitachi Ltd | Reserve and method for obtaining structures with this reserve. |
GB9326150D0 (en) * | 1993-12-22 | 1994-02-23 | Alcan Int Ltd | Electrochemical roughening method |
DE4414896A1 (de) * | 1994-04-28 | 1995-11-02 | Hoechst Ag | Positiv arbeitendes strahlungempfindliches Gemisch |
EP0786701A4 (en) * | 1994-10-13 | 1998-08-12 | Nippon Zeon Co | PHOTO PAINT COMPOSITION |
DE4444669A1 (de) | 1994-12-15 | 1996-06-20 | Hoechst Ag | Strahlungsempfindliches Gemisch |
JPH0954437A (ja) | 1995-06-05 | 1997-02-25 | Fuji Photo Film Co Ltd | 化学増幅型ポジレジスト組成物 |
KR19990076735A (ko) | 1996-01-26 | 1999-10-15 | 나카노 카쯔히코 | 레지스트 조성물 |
JP3591672B2 (ja) | 1996-02-05 | 2004-11-24 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
US6060222A (en) * | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
DE19803564A1 (de) | 1998-01-30 | 1999-08-05 | Agfa Gevaert Ag | Polymere mit Einheiten aus N-substituiertem Maleimid und deren Verwendung in strahlungsempfindlichen Gemischen |
KR100314761B1 (ko) | 1999-03-03 | 2001-11-17 | 윤덕용 | 노르보르넨에 콜릭산, 디옥시콜릭산 또는 리소콜릭산 유도체를 결합시킨 단량체를 이용한 중합체 및 이를 함유하는 포토레지스트 조성물 |
JP2000347411A (ja) * | 1999-06-08 | 2000-12-15 | Matsushita Electric Ind Co Ltd | パターン形成材料およびパターン形成方法 |
JP3969909B2 (ja) | 1999-09-27 | 2007-09-05 | 富士フイルム株式会社 | ポジ型フォトレジスト組成物 |
CA2387716A1 (en) | 2000-08-29 | 2002-03-07 | Jsr Corporation | Radiation sensitive refractive index changing composition and refractive index changing method |
WO2002048264A1 (fr) | 2000-12-11 | 2002-06-20 | Jsr Corporation | Composition sensible aux rayonnements, a indice de refraction variable et procede pour modifier son indice de refraction |
CA2406219A1 (en) | 2001-02-19 | 2002-10-15 | Jsr Corporation | Radiation sensitive refractive index changing composition |
US7125647B2 (en) | 2001-03-13 | 2006-10-24 | Jsr Corporation | Radiation-sensitive composition changing in refractive index and utilization thereof |
KR100749494B1 (ko) | 2001-04-03 | 2007-08-14 | 삼성에스디아이 주식회사 | 화학증폭형 네가티브 포토레지스트용 중합체 및 포토레지스트 조성물 |
JP4153912B2 (ja) * | 2002-10-23 | 2008-09-24 | Azエレクトロニックマテリアルズ株式会社 | 化学増幅ポジ型感光性樹脂組成物 |
JP4396443B2 (ja) | 2004-08-18 | 2010-01-13 | コニカミノルタエムジー株式会社 | 感光性平版印刷版の製造方法及び使用方法 |
US7740699B2 (en) * | 2006-10-05 | 2010-06-22 | E.I. Du Pont De Nemours And Company | Orthoformate-protected polyols |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH621416A5 (xx) * | 1975-03-27 | 1981-01-30 | Hoechst Ag | |
US4066747A (en) * | 1976-04-08 | 1978-01-03 | Alza Corporation | Polymeric orthoesters housing beneficial drug for controlled release therefrom |
DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
-
1979
- 1979-07-16 DE DE19792928636 patent/DE2928636A1/de not_active Withdrawn
-
1980
- 1980-07-04 CA CA355,539A patent/CA1133743A/en not_active Expired
- 1980-07-07 AU AU60152/80A patent/AU533172B2/en not_active Ceased
- 1980-07-11 EP EP80104006A patent/EP0022571B1/de not_active Expired
- 1980-07-11 DE DE8080104006T patent/DE3061426D1/de not_active Expired
- 1980-07-11 AT AT80104006T patent/ATE2099T1/de not_active IP Right Cessation
- 1980-07-15 BR BR8004395A patent/BR8004395A/pt not_active IP Right Cessation
- 1980-07-15 ZA ZA00804267A patent/ZA804267B/xx unknown
- 1980-07-15 US US06/169,133 patent/US4311782A/en not_active Expired - Lifetime
- 1980-07-16 JP JP9629080A patent/JPS5617345A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6320325B2 (xx) | 1988-04-27 |
EP0022571A1 (de) | 1981-01-21 |
CA1133743A (en) | 1982-10-19 |
EP0022571B1 (de) | 1982-12-22 |
DE2928636A1 (de) | 1981-02-12 |
AU533172B2 (en) | 1983-11-03 |
DE3061426D1 (en) | 1983-01-27 |
ATE2099T1 (de) | 1983-01-15 |
US4311782A (en) | 1982-01-19 |
AU6015280A (en) | 1981-01-22 |
BR8004395A (pt) | 1981-01-27 |
JPS5617345A (en) | 1981-02-19 |
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