WO2023281950A1 - 回折格子の製造方法および複製回折格子の製造方法 - Google Patents

回折格子の製造方法および複製回折格子の製造方法 Download PDF

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Publication number
WO2023281950A1
WO2023281950A1 PCT/JP2022/022546 JP2022022546W WO2023281950A1 WO 2023281950 A1 WO2023281950 A1 WO 2023281950A1 JP 2022022546 W JP2022022546 W JP 2022022546W WO 2023281950 A1 WO2023281950 A1 WO 2023281950A1
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Prior art keywords
metal film
diffraction grating
manufacturing
glass substrate
opening
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Ceased
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PCT/JP2022/022546
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English (en)
French (fr)
Japanese (ja)
Inventor
健太 八重樫
佳定 江畠
宇紀 青野
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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Priority to US18/570,178 priority Critical patent/US12591083B2/en
Priority to CN202280042297.0A priority patent/CN117501156A/zh
Priority to EP22835555.8A priority patent/EP4369063A4/en
Priority to JP2023533470A priority patent/JP7547637B2/ja
Publication of WO2023281950A1 publication Critical patent/WO2023281950A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/0048—Moulds for lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00769—Producing diffraction gratings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/061—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/38—Layered products comprising a layer of synthetic resin comprising epoxy resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2063/00—Use of EP, i.e. epoxy resins or derivatives thereof, as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/06—Coating on the layer surface on metal layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/20—Inorganic coating
    • B32B2255/205—Metallic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/416—Reflective
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/40—Properties of the layers or laminate having particular optical properties
    • B32B2307/418—Refractive
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2551/00—Optical elements

Definitions

  • the present invention relates to a method of manufacturing a diffraction grating and a method of manufacturing a duplicate diffraction grating using the diffraction grating as a mold.
  • Diffraction gratings are optical elements that are used in spectroscopes of analyzers, etc., and separate light (white light) in which various wavelengths are mixed into narrow band wavelengths. Fine grooves are formed on the surface of the diffraction grating, and a reflective film is deposited on the surface of the fine grooves.
  • a master diffraction grating is produced by marking grooves on a glass substrate on which a metal film is formed.
  • Methods have been implemented to fabricate replicated diffraction gratings by transfer onto resin or metal films.
  • a diffraction grating is manufactured by subjecting a photoresist coated on a silicon wafer to holographic exposure.
  • Patent Literature 1 discloses a technique of manufacturing a phase shift mask for fabricating a diffraction grating using an exposure apparatus used in semiconductor manufacturing and an etching process.
  • Patent Document 1 discloses a technique for forming an uneven shape on a glass substrate by etching the glass substrate by high-density plasma etching using a resist pattern as a mask and then performing wet etching on the glass substrate. .
  • Patent Document 2 an anisotropic dry etching method such as low-pressure high-density plasma etching is used to transfer an uneven shape formed on a resist to a glass substrate, thereby manufacturing a sinusoidal optical grating. A method is disclosed.
  • the main purpose of the present application is to provide a diffraction grating that enables high surface accuracy and a large area.
  • a method of manufacturing a diffraction grating comprises the following steps: (a) preparing a wafer having a pattern in which recesses and protrusions are alternately arranged on its surface; (b) after the step (a); forming a metal film on the surface of the wafer, and forming a first transfer region in which the shape of the pattern is transferred on a part of the surface of the metal film; (c) after the step (b), the wafer (d) after the step (c), bonding the back surface of the metal film to the first glass substrate via an adhesive.
  • FIG. 4A to 4C are cross-sectional views showing the outline of the method of manufacturing the diffraction grating according to the first embodiment;
  • FIG. 2 is a plan view showing a restraining jig according to Embodiment 1;
  • FIG. 2 is a perspective view showing a restraining jig and a metal film according to Embodiment 1;
  • 4 is a perspective view showing a base plate in Embodiment 1.
  • FIG. 4 is a perspective view showing a lower fixed plate in Embodiment 1.
  • FIG. 4 is a perspective view showing an upper fixing plate in Embodiment 1.
  • FIG. 4 is a perspective view showing a load applying plate in Embodiment 1.
  • FIG. 4 is a perspective view showing a process of installing a metal film on the bonding jig in Embodiment 1.
  • FIG. 4 is a perspective view showing a state in which a metal film is installed on the bonding jig according to Embodiment 1.
  • FIG. 4 is a cross-sectional view showing a state in which a metal film is installed on the bonding jig according to Embodiment 1;
  • FIG. 4 is a cross-sectional view showing a state in which a metal film is installed on the bonding jig according to Embodiment 1;
  • FIG. 4 is a cross-sectional view showing an outline of a method for manufacturing a duplicate diffraction grating according to Embodiment 1; 10A to 10C are cross-sectional views showing an outline of a method for manufacturing a diffraction grating according to Embodiment 2;
  • FIG. 11 is a perspective view showing a restraining jig and a metal film in Embodiment 2;
  • FIG. 11 is a perspective view showing a base plate in Embodiment 2;
  • FIG. 11 is a perspective view showing a lower fixed plate in Embodiment 2;
  • FIG. 11 is a perspective view showing an upper fixing plate in Embodiment 2;
  • FIG. 11 is a perspective view showing a load applying plate according to Embodiment 2;
  • FIG. 10 is a perspective view showing a process of installing a metal film on the bonding jig in Embodiment 2;
  • FIG. 11 is a perspective view showing a state in which a metal film is installed on a bonding jig according to Embodiment 2;
  • FIG. 11 is a cross-sectional view showing a state in which a metal film is installed on a bonding jig according to Embodiment 2;
  • FIG. 11 is a cross-sectional view showing a state in which a metal film is installed on a bonding jig according to Embodiment 2;
  • the X-direction, Y-direction and Z-direction described in this application intersect each other and are orthogonal to each other.
  • the Z direction will be described as the vertical direction, vertical direction, height direction, or thickness direction of a structure.
  • the expression "planar view” used in the present application means that a plane formed by the X direction and the Y direction is viewed from the Z direction, and the expression “planar shape” means the shape in the above planar view. .
  • Embodiment 1 ⁇ Method for manufacturing diffraction grating> A method of manufacturing the diffraction grating according to the first embodiment will be described below with reference to FIG.
  • the diffraction grating manufacturing method according to Embodiment 1 includes steps S11 to S18 shown in FIG.
  • a silicon diffraction grating 1 comprises a wafer 1a, for example made of silicon and having a front surface FS1 and a back surface BS1.
  • the wafer 1a also has a pattern 1b on its surface FS1, which has a shape in which concave portions and convex portions are alternately arranged.
  • the pattern 1b is, for example, a resist pattern produced by a photolithographic technique used in the field of semiconductor manufacturing or a holographic exposure technique using interference of laser light. More specifically, the shape of the pattern 1b is sinusoidal, rectangular, triangular, blazed, or the like. Further, the planar shape of the region (ruled line region) where the pattern 1b is formed is square, rectangular, or circular.
  • a metal film 3 is formed on the surface FS1 of the wafer 1a, and a transfer area 3a is formed on a part of the surface FS2 of the metal film 3 by transferring the shape of the pattern 1b.
  • a seed film 2 is deposited on the surface FS1 of the wafer 1a including the pattern 1b by, eg, sputtering.
  • the seed film 2 is made of a conductive material such as chromium, titanium, platinum or gold.
  • the material forming the seed film 2 is not limited to the above materials, and electrons can be transported from the electrode arranged at the edge of the wafer 1a to the center of the wafer 1a during electroplating without causing a voltage drop. It suffices if it has such a function.
  • a metal film 3 is formed on the surface FS1 (on the seed film 2) of the wafer 1a by plating, for example, so as to fill the concave portions of the pattern 1b and cover the convex portions of the pattern 1b.
  • Electroplating is suitable as the plating method.
  • the metal film 3 is made of a conductive material such as nickel or copper.
  • the material forming the metal film 3 is not limited to the above materials, and any material can be used as long as it can be electrolytically plated and can be formed into a film along the shape of the pattern 1b with high accuracy. Note that the illustration of the seed film 2 is omitted in the subsequent drawings.
  • step S14 the metal film 3 is removed from the wafer 1a.
  • Metal film 3 has front surface FS2 and back surface BS2.
  • a transfer area 3a having the shape of the pattern 1b transferred is formed on a part of the surface FS2. That is, the transfer area 3a has a shape in which concave portions and convex portions are alternately arranged, and has a sine wave shape, a rectangular shape, a triangular shape, or a blazed shape.
  • the back surface BS2 is a flat surface.
  • the adhesive 4 is provided on the back surface BS2 of the metal film 3.
  • the adhesive 4 is applied to the back surface BS2 by, for example, a coating method, and is made of a material capable of bonding the metal film 3 and the glass substrate 5, which will be described later, without heat treatment. Since there is a large difference in coefficient of linear expansion between metal and glass, the material forming the adhesive 4 is preferably a material that does not require heat treatment.
  • step S16 the metal film 3 is fixed by sandwiching the outer periphery of the metal film 3 with two restraining jigs 10 at a position not overlapping the transfer area 3a.
  • step S17 the glass substrate 5 is bonded to the metal film 3 in the bonding jig 100, which will be described later.
  • a glass substrate 5 is provided on the front surface FS2 side of the metal film 3
  • a glass substrate 6 is provided on the back surface BS2 side of the metal film 3 .
  • the glass substrate 5 is pressed toward the back surface BS2, and the metal film 3 is adhered to the glass substrate 5 with the adhesive 4 interposed therebetween.
  • step S18 the bonded glass substrate 5 and metal film 3 are removed from the bonding jig 100.
  • the diffraction grating (glass diffraction grating) 7 having the glass substrate 5, the adhesive 4 and the metal film 3 is manufactured.
  • the binding jig 10 is used from step S16 onward, but the bonding jig 100 having the binding jig 10 is prepared in advance, and step S16 and subsequent steps are performed using the bonding jig 100. . 2 to 11, each member of the bonding jig 100 and the method of manufacturing the diffraction grating after step S16 will be described in detail.
  • the bonding jig 100 includes two restraining jigs 10, a base plate 20, a lower fixing plate 30, an upper fixing plate 40, a load applying member 50 and a plurality of screws 60. It has These structures will be described below with reference to FIGS. 2 to 7.
  • FIG. 9 the bonding jig 100 according to Embodiment 1 includes two restraining jigs 10, a base plate 20, a lower fixing plate 30, an upper fixing plate 40, a load applying member 50 and a plurality of screws 60. It has These structures will be described below with reference to FIGS. 2 to 7.
  • FIG. 1 the bonding jig 100 according to Embodiment 1 includes two restraining jigs 10, a base plate 20, a lower fixing plate 30, an upper fixing plate 40, a load applying member 50 and a plurality of screws 60. It has These structures will be described below with reference to FIGS. 2 to 7.
  • FIG. 9 the bonding jig 100 according to Embodiment 1 includes two
  • FIG. 2 and 3 show the restraint jig 10.
  • FIG. The restraining jig 10 has a polygonal shape in plan view, and has a quadrangular shape here. Moreover, the restraining jig 10 is made of a material having high strength and high heat resistance, such as stainless steel.
  • the restraint jig 10 has an opening 13 in its central portion, and has a plurality of holes 11 and a plurality of holes 12 around the opening 13 .
  • the holes 11 are provided for fixing with screws 60 to another member, and the holes 12 are provided for alignment with the guide pins 22 of the base plate 20 .
  • the plane shape of the metal film 3 is polygonal, here it is square.
  • the planar shape of the opening 13 is a polygonal shape corresponding to the planar shape of the metal film 3, and is a quadrangular shape here. Further, a hole 14 integrated with the opening 13 is provided at each corner of the opening 13 .
  • the restraint jig 10 has a plurality of holes 14 that enclose each corner of the opening 13 .
  • step S16 is performed in a state where the metal film 3 around the transfer area 3a is sandwiched between two restraining jigs so that the transfer area 3a is located inside the opening 13 in plan view. At this time, each corner of the metal film 3 is positioned inside the hole 14 in plan view.
  • step S17 the metal film 3 is pressed by the substrate 5 made of glass, and the corners of the metal film 3 are places where stress tends to concentrate. Therefore, a unique stress often occurs at each corner. Therefore, by positioning each corner of the metal film 3 inside the hole 14 , stress concentration at each corner can be alleviated, and a structure in which the load distribution on the metal film 3 is uniform can be realized.
  • FIG. 4 shows the base plate 20.
  • the base plate 20 has a planar shape similar to that of the restraint jig 10 .
  • a plurality of holes 21 and guide pins 22 are provided in the outer peripheral portion of the base plate 20 .
  • the holes 21 are provided for fixing to other members with screws 60, and the guide pins 22 are provided for alignment with other members.
  • FIG. 5 shows the lower fixing plate 30.
  • the lower fixing plate 30 has a planar shape similar to that of the restraint jig 10 .
  • the lower fixing plate 30 has an opening 33 in its central portion, and has a plurality of holes 31 and a plurality of holes 32 around the opening 33 .
  • the holes 31 are provided for fixing with screws 60 to another member, and the holes 32 are provided for alignment with the guide pins 22 of the base plate 20 .
  • the lower fixing plate 30 is a member for fixing the position of the glass substrate 6 and has an opening 33 .
  • the planar shape of each of the opening 33 and the glass substrate 6 is a polygonal shape, here a square shape. Thereby, the glass substrate 6 is fitted inside the opening 33 .
  • FIG. 6 shows the upper fixing plate 40.
  • the upper fixed plate 40 has a planar shape similar to that of the restraint jig 10 .
  • the upper fixing plate 40 has an opening 43 in its central portion, and has a plurality of holes 41 and a plurality of holes 42 around the opening 43 .
  • the holes 41 are provided for fixing with screws 60 to another member, and the holes 42 are provided for alignment with the guide pins 22 of the base plate 20 .
  • the upper fixing plate 40 is a member for fixing the position of the glass substrate 5 and has an opening 43 .
  • the planar shape of each of the opening 43 and the glass substrate 5 is a polygonal shape, here a square shape. As a result, the glass substrate 5 is fitted inside the opening 43 .
  • FIG. 7 shows the load applying member 50.
  • the load applying member 50 is used when applying a load to the glass substrate 5 .
  • the planar shape of the load applying member 50 is polygonal, here it is square.
  • the load applying member 50 is designed to fit inside the opening 43 of the upper fixing plate 40 .
  • the base plate 20, the lower fixing plate 30, the upper fixing plate 40, and the load applying member 50 are made of a material with high strength and high heat resistance, such as stainless steel.
  • FIG. 8 shows the process of setting the metal film 3 on the bonding jig 100
  • FIG. 9 shows the state in which the metal film 3 is set on the bonding jig 100.
  • a base plate 20, a lower fixing plate 30, a glass substrate 6, a metal film 3 and two restraining jigs 10 are prepared.
  • the lower fixing plate 30 is provided on the base plate 20 while fitting the guide pins 22 of the base plate 20 into the holes 32 .
  • the glass substrate 6 is provided inside the opening 33 of the lower fixing plate 30 .
  • the first restraining jig 10 is provided on the lower fixed plate 30 .
  • the metal film 3 is placed on the substrate 6 made of glass, and the metal film 3 around the transfer area 3a is placed on the first restraint jig 10 .
  • An adhesive 4 is provided on the rear surface BS2 of the metal film 3.
  • the second restraining jig 10 is provided on the back surface BS2 of the metal film 3 around the transfer region 3a.
  • the upper fixing plate 40, glass substrate 5, load applying member 50 and screw 60 are prepared.
  • the upper fixing plate 40 is placed on the second restraint jig 10 while fitting the guide pins 22 of the base plate 20 into the holes 42 .
  • the glass substrate 5 is placed inside the opening 43 of the upper fixing plate 40 .
  • the load applying member 50 is installed on the substrate 5 made of glass.
  • FIG. 10 and 11 are cross-sectional views along line AA shown in FIG.
  • the metal film 3 is placed on the glass substrate 6 so that the surface FS2 of the metal film 3 faces the glass substrate 6 .
  • an adhesive 4 is provided on the back surface BS2 of the metal film 3 .
  • a glass substrate 5 is provided at a position physically separated from the back surface of the metal film 3 . That is, a gap 70 is formed between the glass substrate 5 and the metal film 3 (adhesive 4).
  • the shape of the pattern 1b provided on the wafer 1a is transferred to the metal film 3, and this metal film 3 is used for the diffraction grating 7.
  • FIG. Therefore, since it is possible to prevent the transfer of the warp of the silicon wafer, which has been a problem in the prior art, it is possible to provide the diffraction grating 7 capable of achieving high surface precision and a large area.
  • Embodiment 1 the glass substrate 5 is pressed while the outer periphery of the metal film 3 is fixed by the restraint jig 10 .
  • the occurrence of wrinkles due to the shrinkage of the adhesive 4 can be suppressed.
  • the adhesive 4 is made of a material that does not require heat treatment, the influence of shrinkage of the adhesive 4 can be suppressed.
  • the back surface BS2 of the metal film 3 and the bonding surface of the glass substrate 5, which are bonded via the adhesive 4, are flat surfaces.
  • a gap 70 is provided between the glass substrate 5 and the metal film 3 (adhesive 4).
  • Diffraction grating 7 manufactured in Embodiment 1 can be applied as an optical element used in a spectrometer or the like.
  • a reflective film made of a material having a higher light reflectance than the material forming the metal film 3 is formed on the surface FS2 of the metal film 3 including the transfer region 3a.
  • Add a step of forming is, for example, an aluminum film, and can be formed, for example, by a vapor deposition method. Thereby, the diffraction grating 7 can be used as a reflective optical element.
  • FIG. 12 shows another application example of the diffraction grating 7, showing a method of manufacturing a duplicate diffraction grating by using the diffraction grating 7 as a mold. That is, FIG. 12 shows a method for manufacturing a plurality of duplicate diffraction gratings using the diffraction grating 7 as a master diffraction grating.
  • a resin film 91 having a front surface FS3 and a back surface BS3, and a glass substrate 92 bonded to the back surface BS3 of the resin film 91 are prepared.
  • the resin film 91 is a thermosetting resin such as epoxy resin.
  • step S32 the diffraction grating 7 is prepared, and the peripheral portion of the metal film 3 is cut according to the size of the glass substrate 5. Next, as shown in FIG.
  • step S33 the resin film 91 is pressed onto the surface FS2 of the metal film 3 including the transfer area 3a.
  • a transfer area 91a having the shape of the transfer area 3a transferred is formed on a portion of the surface FS3 of the resin film 91.
  • the transfer area 91a has a shape in which concave portions and convex portions are alternately arranged, and has a sine wave shape, a rectangular shape, a triangular shape, or a blaze shape.
  • the resin film 91 is cured while maintaining the shape of the transfer region 91a.
  • step S34 the resin film 91 and the glass substrate 92 are removed from the metal film 3.
  • the duplicate diffraction grating 93 having the resin film 91 and the glass substrate 92 including the transfer region 91a is manufactured.
  • the diffraction grating 7 including the metal film 3 prevents the warp of the wafer 1a from being transferred, and achieves high surface accuracy. Therefore, even in the duplicate diffraction grating 93 having the glass substrate 92 and the resin film 91 including the transfer region 91a to which the shape of the transfer region 3a is transferred, the warp of the wafer 1a is prevented from being transferred, and a high surface is obtained. Accuracy is achieved.
  • a reflective film is formed on the surface FS3 of the resin film 91 including the transfer region 91a.
  • a reflective film is, for example, an aluminum film, and can be formed, for example, by a vapor deposition method.
  • the diffraction grating manufacturing method according to the second embodiment includes steps S21 to S28 shown in FIG. In the following description, differences from the first embodiment will be mainly described, and descriptions of points that overlap with the first embodiment will be omitted.
  • Steps S21 to S25 are the same as steps S11 to S15 in the first embodiment.
  • step S26 the outer periphery of the metal film 3 is fixed using the restraint jig 80 at a position not overlapping the transfer area 3a.
  • step S27 the glass substrate 5 is adhered to the metal film 3 in a bonding jig 200 which will be described later.
  • a glass substrate 5 is provided on the front surface FS2 side of the metal film 3
  • a glass substrate 6 is provided on the back surface BS2 side of the metal film 3 .
  • the glass substrate 5 is pressed toward the back surface BS2, and the metal film 3 is adhered to the glass substrate 5 with the adhesive 4 interposed therebetween.
  • step S28 the bonded glass substrate 5 and metal film 3 are removed from the bonding jig 100.
  • diffraction grating 7 having glass substrate 5, adhesive 4 and metal film 3 is manufactured as the diffraction grating in the first embodiment.
  • the glass substrate 5 and the glass substrate 6 in Embodiment 2 differ from Embodiment 1 in that their planar shapes are circular.
  • the circular glass substrates 5 and 6 it is possible to suppress the occurrence of specific stress when a load is applied. Therefore, in Embodiment 2, a structure in which the load distribution on the metal film 3 is uniform can be realized, and high surface precision can be realized.
  • bonding jig 200 in Embodiment 1 includes restraining jig 80 , base plate 20 , lower fixing plate 30 , upper fixing plate 40 , load applying member 50 and a plurality of screws 60 . ing. These structures will be described below with reference to FIGS. 14 to 20.
  • FIG. 20 bonding jig 200 in Embodiment 1 includes restraining jig 80 , base plate 20 , lower fixing plate 30 , upper fixing plate 40 , load applying member 50 and a plurality of screws 60 . ing.
  • FIG. 14 shows a restraining jig 80.
  • the restraint jig 80 has a circular shape in plan view.
  • the restraining jig 80 is made of copper, for example.
  • the restraining jig 80 has an opening 83 in its central portion. The planar shape of the opening 83 is circular.
  • step S26 described above the binding jig 80 is placed on the back surface BS2 of the metal film 3 around the transfer region 3a so that the transfer region 3a is positioned inside the opening 83 in plan view. done.
  • the base plate 20, the lower fixing plate 30, the upper fixing plate 40, and the load applying member 50 are substantially the same except that their planar shapes are circular. It has the same structure as that of the first embodiment and plays the same role as that of the first embodiment.
  • the base plate 20 is not provided with the guide pin 22, and the lower fixing plate 30 and the upper fixing plate 40 are not provided with the holes 32 and 42. good.
  • the planar shape of the opening 33 of the lower fixing plate 30 is circular. Thereby, the circular glass substrate 6 can be fitted inside the opening 33 .
  • the planar shape of the opening 43 of the upper fixing plate 40 is circular. As a result, the circular glass substrate 5 can be fitted inside the opening 43 .
  • FIG. 19 shows the process of setting the metal film 3 on the bonding jig 200
  • FIG. 20 shows the state where the metal film 3 is set on the bonding jig 200.
  • a base plate 20, a lower fixing plate 30, a glass substrate 6, a metal film 3 and two restraining jigs 80 are prepared.
  • the lower fixing plate 30 is provided on the base plate 20 .
  • the glass substrate 6 is provided inside the opening 33 of the lower fixing plate 30 .
  • the metal film 3 is provided on the glass substrate 6, and the metal film 3 around the transfer area 3a is provided on the lower fixing plate 30.
  • An adhesive 4 is provided on the rear surface BS2 of the metal film 3.
  • a restraining jig 80 is provided on the back surface BS2 of the metal film 3 around the transfer region 3a.
  • the upper fixing plate 40, glass substrate 5, load applying member 50 and screw 60 are prepared.
  • the upper fixed plate 40 is installed on the restraint jig 80 .
  • the glass substrate 5 is placed inside the opening 43 of the upper fixing plate 40 .
  • the load applying member 50 is installed on the substrate 5 made of glass.
  • FIG. 21 and 22 are cross-sectional views taken along line BB shown in FIG.
  • a step of adhering is performed. Note that this step is performed in a vacuum atmosphere as in the first embodiment.
  • the metal film 3 is placed on the glass substrate 6 so that the surface FS2 of the metal film 3 faces the glass substrate 6 .
  • an adhesive 4 is provided on the back surface BS2 of the metal film 3 .
  • a glass substrate 5 is provided at a position physically separated from the back surface of the metal film 3 . That is, a gap 70 is formed between the glass substrate 5 and the metal film 3 (adhesive 4).
  • the installation surface of the glass substrate 6 on which the metal film 3 is installed and the bonding surface of the glass substrate 5 bonded to the metal film 3 via the adhesive 4 are flat surfaces. ing.
  • the diffraction grating 7 manufactured in the second embodiment can also be applied as an optical element used in a spectroscope or the like, similarly to the first embodiment, and as shown in FIG. can be applied to the manufacture of the replica diffraction grating of

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  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
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  • Diffracting Gratings Or Hologram Optical Elements (AREA)
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PCT/JP2022/022546 2021-07-05 2022-06-02 回折格子の製造方法および複製回折格子の製造方法 Ceased WO2023281950A1 (ja)

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US18/570,178 US12591083B2 (en) 2021-07-05 2022-06-02 Method for manufacturing diffraction grating and method for manufacturing replica grating
CN202280042297.0A CN117501156A (zh) 2021-07-05 2022-06-02 衍射光栅的制造方法和复制衍射光栅的制造方法
EP22835555.8A EP4369063A4 (en) 2021-07-05 2022-06-02 METHOD FOR MANUFACTURING DIFFRACTION GRATING AND METHOD FOR MANUFACTURING REPLICA DIFFRACTION GRATING
JP2023533470A JP7547637B2 (ja) 2021-07-05 2022-06-02 回折格子の製造方法および複製回折格子の製造方法

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