WO2023276773A1 - 樹脂組成物及び接着剤 - Google Patents
樹脂組成物及び接着剤 Download PDFInfo
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- WO2023276773A1 WO2023276773A1 PCT/JP2022/024658 JP2022024658W WO2023276773A1 WO 2023276773 A1 WO2023276773 A1 WO 2023276773A1 JP 2022024658 W JP2022024658 W JP 2022024658W WO 2023276773 A1 WO2023276773 A1 WO 2023276773A1
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- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- KYCGURZGBKFEQB-UHFFFAOYSA-N n',n'-dibutylpropane-1,3-diamine Chemical compound CCCCN(CCCC)CCCN KYCGURZGBKFEQB-UHFFFAOYSA-N 0.000 description 1
- UDGSVBYJWHOHNN-UHFFFAOYSA-N n',n'-diethylethane-1,2-diamine Chemical compound CCN(CC)CCN UDGSVBYJWHOHNN-UHFFFAOYSA-N 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 1
- GZUCMODGDIGMBI-UHFFFAOYSA-N n',n'-dipropylpropane-1,3-diamine Chemical compound CCCN(CCC)CCCN GZUCMODGDIGMBI-UHFFFAOYSA-N 0.000 description 1
- 229940078490 n,n-dimethylglycine Drugs 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- HNHVTXYLRVGMHD-UHFFFAOYSA-N n-butyl isocyanate Chemical compound CCCCN=C=O HNHVTXYLRVGMHD-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229940105570 ornex Drugs 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical class NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- 229940081066 picolinic acid Drugs 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- UFUASNAHBMBJIX-UHFFFAOYSA-N propan-1-one Chemical compound CC[C]=O UFUASNAHBMBJIX-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- WHMDPDGBKYUEMW-UHFFFAOYSA-N pyridine-2-thiol Chemical compound SC1=CC=CC=N1 WHMDPDGBKYUEMW-UHFFFAOYSA-N 0.000 description 1
- KFUSANSHCADHNJ-UHFFFAOYSA-N pyridine-3-carbohydrazide Chemical compound NNC(=O)C1=CC=CN=C1 KFUSANSHCADHNJ-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000007962 solid dispersion Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
- 229940096522 trimethylolpropane triacrylate Drugs 0.000 description 1
- LTEHWCSSIHAVOQ-UHFFFAOYSA-N tripropyl borate Chemical compound CCCOB(OCCC)OCCC LTEHWCSSIHAVOQ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
- C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
- C08L81/02—Polythioethers; Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J181/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Adhesives based on polysulfones; Adhesives based on derivatives of such polymers
- C09J181/02—Polythioethers; Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
Definitions
- the present invention relates to a resinous composition, an adhesive containing the same, a cured product thereof, a semiconductor device and an electronic component containing the cured product.
- Adhesives that are temporarily fixed by ultraviolet (UV) irradiation and fully cured by heat are used in many fields (for example, Patent Documents 1 and 2), and are particularly often used for image sensor modules.
- Image sensor modules are used as camera modules for mobile phones and smart phones.
- Adhesives used in the manufacture of image sensor modules are also used to prevent moisture from penetrating into electronic components, so they are also required to exhibit sufficient moisture resistance.
- Patent Document 3 as a photo- and thermosetting resin composition that suppresses a decrease in adhesive strength in a moisture resistance test of the resin composition after curing and has a sufficiently long pot life, (A) an acrylic resin , (B) a polyfunctional nitrogen-containing heterocyclic compound having a specific formula, (C) a latent curing agent, (D) a radical polymerization inhibitor, and (E) an anionic polymerization inhibitor.
- a resin composition is disclosed.
- Patent Literature 3 describes suppression of decrease in adhesive strength in a moisture resistance test of a resin composition after UV curing and heat curing, but does not describe moisture resistance after only heat curing.
- an object of the present invention is to provide a resin composition and an adhesive that have high moisture resistance after thermosetting.
- a first embodiment of the present invention is the following resin composition.
- (1) (A) (meth)acrylate compound, (B) a polythiol compound, (C) a cyclic carbodiimide compound, (D) a curing catalyst; and (E) a resin composition containing a coupling agent.
- (2) The resin composition according to (1) above, wherein the content of (C) the cyclic carbodiimide compound is 5% by mass or more relative to the total mass of the resin composition.
- a second embodiment of the present invention is (6) an adhesive comprising the resin composition according to any one of (1) to (5) above.
- a third embodiment of the present invention is (7) a cured product obtained by curing the resin composition according to any one of (1) to (5) above or the adhesive according to (6) above.
- a fourth embodiment of the present invention is (8) a semiconductor device comprising the cured product according to (7) above.
- a fifth embodiment of the present invention is an electronic component including the semiconductor device according to (8) above.
- the first embodiment of the present invention it is possible to obtain a resin composition having high moisture resistance after heat curing.
- the second embodiment of the present invention it is possible to obtain an adhesive having high moisture resistance after heat curing.
- a cured product having high moisture resistance can be obtained.
- the fourth aspect of the present invention it is possible to obtain a semiconductor device containing a cured product having high moisture resistance.
- an electronic component including a semiconductor device having high moisture resistance can be obtained.
- the resin composition which is the first embodiment of the present invention, (A) (meth)acrylate compound, (B) a polythiol compound, (C) a cyclic carbodiimide compound, (D) a curing catalyst; and (E) a coupling agent. According to this embodiment, it is possible to obtain a resin composition having high moisture resistance after thermosetting.
- the resin composition of the present embodiment contains (A) (meth)acrylate compound (hereinafter also referred to as “(A) component”).
- (A) The (meth)acrylate compound can impart transparency and appropriate hardness to the cured resin composition.
- the (meth)acrylate compound as component (A) is not particularly limited as long as it has one or more (meth)acryloyl groups. In consideration of ensuring heat resistance, compounds having two or more (meth)acryloyl groups are preferred, compounds having 2 to 6 (meth)acryloyl groups are more preferred, and two (meth)acryloyl groups.
- component (A) preferably has a structure that does not have a hydrolyzable partial structure such as an ester bond in the molecule, but in the present embodiment, (C) By including a cyclic carbodiimide compound, hydrolysis of ester bonds and the like can be suppressed, and even if the molecular chains are cut by hydrolysis, they can be rebonded, so the molecules may have ester bonds and the like.
- (meth)acrylate compounds include tris(2-hydroxyethyl)isocyanurate diacrylate and/or dimethacrylate; tris(2-hydroxyethyl)isocyanurate triacrylate and/or trimethacrylate; trimethylol Propane triacrylate and/or trimethacrylate, or oligomers thereof; pentaerythritol triacrylate and/or trimethacrylate, or oligomers thereof; polyacrylates and/or polymethacrylates of dipentaerythritol; tris(acryloxyethyl)isocyanurate; caprolactone modification tris(acryloxyethyl) isocyanurate; caprolactone-modified tris(methacryloxyethyl) isocyanurate; alkyl-modified dipentaerythritol polyacrylate and/or polymethacrylate; caprolactone-modified dipentaerythritol polyacrylate and/or polymethacrylate
- the component (A) is preferably an acrylate compound and does not substantially contain a methacrylate compound.
- the (A) (meth)acrylate compound any one of the (meth)acrylate compounds described above may be used, or two or more thereof may be used in combination.
- the component (A) preferably has a viscosity of 0.01 to 80 Pa ⁇ s from the viewpoint of the preparation and dispensing properties of the resin composition.
- viscosity refers to a value measured at a measurement temperature of 25°C using an appropriate viscometer depending on the viscosity range.
- component (A) Commercially available products of component (A) include, for example, polyester acrylate (product name: EBECRYL810) manufactured by Daicel-Ornex Co., Ltd., polyester acrylate (product name: M7100) manufactured by Toagosei Co., Ltd., and dimethylol-tricyclodecanedi manufactured by Kyoeisha Chemical Co., Ltd. Acrylate (Product name: Light Acrylate DCP-A) can be mentioned.
- component may use any one type, and may use 2 or more types together.
- the content of component (A) is preferably 10 to 70% by mass, more preferably 20 to 60% by mass, based on the total mass of the resin composition.
- the resin composition of the present embodiment contains (B) a polythiol compound (hereinafter also referred to as “component (B)").
- component (B) The polythiol compound imparts elasticity and moisture resistance to the resin composition.
- Component (B) is not particularly limited as long as it has two or more thiol groups.
- component (B) preferably has a structure that does not have a hydrolyzable partial structure such as an ester bond in the molecule, but in the present embodiment, (C) By including a cyclic carbodiimide compound, hydrolysis of ester bonds and the like can be suppressed, and even if the molecular chains are cut by hydrolysis, they can be rebonded, so the molecules may have ester bonds and the like.
- Polythiol compounds having an ester bond in the molecule include, for example, pentaerythritol tetrakis (3-mercaptopropionate), trimethylolpropane tris (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate butyrate), pentaerythritol tetrakis(3-mercaptobutyrate), tris-[(3-mercaptopropionyloxy)-ethyl]-isocyanurate, pentaerythritol tetrakis(3-mercaptobutyrate), 1,4-bis(3- mercaptobutyryloxy)butane, 1,3,5-tris(3-mercaptobutyryloxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, trimethylolpropane tris(3-mercaptobutyrate), tri
- component (B) having an ester bond in the molecule examples include trimethylolpropane tris(3-mercaptopropionate) (manufactured by SC Organic Chemical Co., Ltd.: TMMP) and tris-[(3-mercaptopropionyloxy).
- a (B) polythiol compound that does not have an ester bond in its molecule can also be used.
- examples of such component (B) include glycoluril compounds represented by the following general formula (1).
- R 1 and R 2 are each independently hydrogen, an alkyl group having 1 to 10 carbon atoms, or a phenyl group.
- n is an integer from 0 to 10;
- the (B) component may be a compound represented by the following chemical formula (2) or chemical formula (3).
- the compound represented by chemical formula (2) or chemical formula (3) is a more preferable compound as component (B).
- examples of (B) polythiol compounds that do not have an ester bond or the like in the molecule include polythiol compounds represented by general formula (4).
- R 3 , R 4 , R 5 and R 6 are each independently hydrogen or C n H 2n SH (n is 2 to 6). Further, at least one of R 3 , R 4 , R 5 and R 6 is C n H 2n SH (n is 2-6). From the viewpoint of curability, n of the polythiol compound (B) represented by the general formula (4) is preferably 2 to 4. Moreover, it is more preferable that this polythiol compound is a mercaptopropyl group in which n is 3 from the viewpoint of the balance between the physical properties of the cured product and the curing speed.
- the (B) component represented by the general formula (4) itself has a sufficiently flexible skeleton, and is effective when it is desired to lower the elastic modulus of the cured product.
- the elastic modulus of the cured product can be controlled, so that the adhesive strength (especially peel strength) after curing can be increased.
- component (B) that do not have an ester bond in the molecule
- Shikoku Kasei Co., Ltd.'s thiol glycol uril derivative product name: TS-G (equivalent to chemical formula (2), thiol equivalent: 100 g/eq)
- C3 TS -G equivalent to chemical formula (3), thiol equivalent: 114 g / eq
- SC organic chemical thiol compound product name: PEPT (equivalent to general formula (4), thiol equivalent: 124 g / eq)) be done.
- any one type may be used, or two or more types may be used in combination.
- a component (B) having an intramolecular ester bond and a component (B) having no intramolecular ester bond may be used in combination.
- the ester bond When using a polythiol compound having an ester bond in the molecule as the component (B), the ester bond hydrolyzes to form a carboxyl group and a hydroxyl group. These functional groups react with the cyclic carbodiimide compound (C) to form polar groups in the resin composition, thereby improving the adhesive strength under high humidity.
- the content of the polythiol compound having an ester bond in the molecule is preferably less than 60 parts by mass, more preferably less than 70 parts by mass, per 100 parts by mass of component (B). , is more preferably less than 80 parts by mass.
- the component (B) does not have an ester bond.
- (B) Per 100 parts by mass of component 70 to 100 parts by mass of a compound having no ester bond is included, from the viewpoint of maintaining the shear strength under high humidity for a long time after curing of the resin composition. preferable.
- the content of the polythiol compound having no ester bond in component (B) is more preferably 80 to 100 parts by mass, more preferably 90 to 100 parts by mass, relative to 100 parts by mass of component (B). preferable.
- [number of thiol group equivalents of component (B)]/[(meth)acryloyl group equivalent number of component (A)] is preferably from 0.5 to 2.0, and from 0.5 to 1.5 is more preferred.
- functional group equivalents such as (meth) acryloyl equivalents and thiol equivalents represent the molecular weight of a compound per functional group
- functional groups such as (meth) acryloyl group equivalents and thiol group equivalents
- the number of equivalents represents the number of functional groups (number of equivalents) per compound mass (amount charged).
- the thiol equivalent of component (B) is theoretically the number obtained by dividing the molecular weight of component (B) by the number of thiol groups in one molecule.
- the actual thiol equivalent weight can be determined, for example, by potentiometrically determining the thiol number.
- (A) The (meth)acryloyl equivalent of a (meth)acrylate compound is theoretically equal to the molecular weight of the (meth)acrylate compound divided by the number of acryloyl groups (or methacryloyl groups) in one molecule.
- the actual (meth)acryloyl equivalent can be measured, for example, by NMR.
- the (meth)acryloyl group equivalent number of component (A) is the number (number of equivalents) of (meth)acryloyl groups per mass (amount charged) of component (A), and the mass of (A) (meth)acrylate compound (g) divided by the (meth)acryloyl equivalent of the (meth)acrylate compound (if more than one (meth)acrylate compound is involved, the sum of such quotients for each (meth)acrylate compound) be.
- the thiol group equivalent number of component (B) is the number of thiol groups (equivalent number) per mass (amount charged) of component (B), and the mass (g) of the thiol compound (B) is It is the quotient divided by the thiol equivalent (if more than one thiol compound is involved, the sum of such quotients for each thiol compound).
- [Number of thiol group equivalents of component (B)]/[Number of (meth)acryloyl group equivalents of component (A)] is in the range of 0.5 to 2.0. reacts in a certain amount or more, sufficient molecular cross-linking is formed, and high adhesive strength can be easily developed.
- the resin composition of the present embodiment is a resin composition containing (A) a (meth)acrylate compound as a main component prepolymer compound.
- the resin composition of the present embodiment may contain other prepolymer compounds such as epoxy compounds.
- [(B) thiol group equivalent number of component] / [epoxy group equivalent number of epoxy compound] is not included in the embodiment in which it is 10.0 or less.
- a cured product of a (meth)acrylate compound-rich resin composition as a main component prepolymer compound has better moisture resistance than an epoxy compound-rich resin composition, especially when hydrolyzable ester bonds are formed in the polymer molecule. was more serious.
- the epoxy equivalent of an epoxy compound is theoretically a number obtained by dividing the molecular weight of the epoxy compound by the number of epoxy groups in one molecule.
- the actual epoxy equivalent can be determined by the method described in JIS K7236.
- the number of epoxy group equivalents of an epoxy compound is the number of epoxy groups (number of equivalents) per mass (amount charged) of the epoxy compound, and is the quotient obtained by dividing the mass (g) of the epoxy compound by the epoxy equivalent of the epoxy compound ( If more than one epoxy compound is included, the sum of such quotients for each epoxy compound).
- the resin composition of the present embodiment contains (C) a cyclic carbodiimide compound (hereinafter also referred to as “component (C)”).
- a cyclic carbodiimide compound has a cyclic structure.
- One cyclic structure has only one carbodiimide group.
- the number of atoms in the ring structure is preferably 8-50, more preferably 10-30, still more preferably 10-20.
- the cyclic carbodiimide compound may have multiple cyclic structures.
- the cyclic carbodiimide compound used in this embodiment is preferably a cyclic carbodiimide compound represented by the following general formula (5).
- Ar 1 to Ar 4 each independently represent an aromatic group.
- the aromatic group may be substituted with an alkyl group having 1 to 6 carbon atoms or an aryl group.
- Examples of the aromatic group include aromatic groups such as phenylene group and naphthalenediyl group.
- Ar 1 to Ar 4 are phenyl groups because the film formability is improved.
- X is a divalent or tetravalent group. q is 0 when X is divalent and q is 1 when X is tetravalent. X is one of the following formulas (5-i), (5-ii), (5-iii), (5-iv), (5-v), (5-vi), and (5-vii) is preferred.
- n is an integer of 1-6.
- (5-i) is exemplified by a methylene group, ethylene group, 1,3-propylene group, 1,4-butylene group, 1,5-pentane group and 1,6-hexane group.
- m and n are each independently an integer of 0 to 4.
- R 1 and R 2 are each independently an alkyl group or an aryl group having 1 to 6 carbon atoms.
- Alkyl groups having 1 to 6 carbon atoms include methyl group, ethyl group, n-propyl group, sec-propyl group, iso-propyl group, n-butyl group, tert-butyl group, sec-butyl group and iso-butyl group.
- X is the above-described (5-i), (5-ii), (5-iii), (5-iv), (5-v), (5-vi), ( 5-vii) is preferable.
- Y and Z are each independently a substituent other than an alkyl group having 1 to 6 carbon atoms or a phenyl group.
- substituents other than alkyl groups having 1 to 6 carbon atoms or phenyl groups conventionally known substituents can be applied, for example, alkyl groups having 7 or more carbon atoms, aryl groups other than phenyl groups, alkoxy groups, hydroxy groups, and aldehydes.
- the compound represented by the following chemical formula (5-1) or the following chemical formula (5-2) is preferable.
- the mechanism of moisture resistance improvement by the cyclic carbodiimide compound is not limited, but is presumed as follows. Hydrolyzable partial structures such as ester bonds are contained in some (A) (meth)acrylate compounds and some (B) polythiol compounds. For example, an ester bond hydrolyzes to produce a carboxylic acid and an alcohol. As shown below, the carbodiimide group has the effect of suppressing hydrolysis by reacting with the carboxylic acid produced by hydrolysis and capturing the acid that serves as a catalyst for the decomposition reaction.
- (C) a polycarbodiimide compound that is not a cyclic carbodiimide compound, although the carbodiimide group reacts with the carboxylic acid to suppress hydrolysis, decomposition occurs when heat is applied thereafter, resulting in high irritation and sensitization. A substance known as isocyanate gas is generated.
- the cyclic carbodiimide compound (C) when the carbodiimide group present in the cyclic skeleton reacts with the carboxylic acid, the bond is not broken even when heat is applied thereafter, and the resulting isocyanate forms a cyclic skeleton. remain in the polymer via Isocyanate groups form bonds between isocyanate groups or with thiol groups. As a result, the polymer chains cut off by hydrolysis can be recombined with other polymer chains, thereby maintaining or strengthening the adhesive strength. It is thought to be larger than the carbodiimide compound.
- the (C) cyclic carbodiimide compound does not generate isocyanate gas when heated, a voidless cured film can be produced. If there are voids in the cured film, cracks are likely to progress, and it is also a cause of deterioration in reliability, such as easier passage of moisture, so it is preferable that there are no voids in the cured film.
- the content of the cyclic carbodiimide compound is preferably 5% by mass or more, more preferably 8% by mass or more, and more preferably 10% by mass or more, relative to the total mass of the resin composition.
- the upper limit of the content of the cyclic carbodiimide compound (C) is not particularly limited, but from the viewpoint of viscosity, it is, for example, 60% by mass or less, 50% by mass or less, or 40% by mass or less.
- the method for producing the cyclic carbodiimide compound is not particularly limited, and it can be produced by a conventionally known method (for example, the method described in International Publication No. 2010/071211, Japanese Patent Application Laid-Open No. 2011-256139, etc.). can.
- a method for producing an amine form via an isocyanate form for example, a method for producing an amine form for an isothiocyanate form, a method for producing an amine form for a triphenylphosphine form, and a method for producing a urea form from an amine form.
- a commercially available product may be used as the cyclic carbodiimide compound.
- the resin composition of the present embodiment contains (D) a curing catalyst (hereinafter also referred to as “component (D)”).
- component (D) a curing catalyst
- the (D) curing catalyst used in the present embodiment is not particularly limited as long as it is a curing catalyst for a (meth)acrylate compound, and a known one can be used, but a latent curing catalyst is preferred.
- the latent curing catalyst of component (D) is a compound that is inactive at room temperature and is activated by heating to function as a curing catalyst.
- imidazole compounds that are solid at room temperature
- solid-dispersed amine adduct-based latent curing catalysts such as reaction products with epoxy compounds (amine-epoxy adduct systems); reaction products of amine compounds with isocyanate compounds or urea compounds (urea-type adduct systems); .
- Examples of the epoxy compound used as one of raw materials for producing the solid-dispersed amine adduct-based latent curing catalyst include bisphenol A, bisphenol F, catechol, polyhydric phenols such as resorcinol, or glycerin.
- Polyglycidyl ethers obtained by reacting polyhydric alcohols such as polyhydric alcohols and polyethylene glycol with epichlorohydrin; reaction of epichlorohydrin with hydroxycarboxylic acids such as p-hydroxybenzoic acid and ⁇ -hydroxynaphthoic acid polyglycidyl esters obtained by reacting polycarboxylic acids such as phthalic acid and terephthalic acid with epichlorohydrin; 4,4'-diaminodiphenylmethane, m-aminophenol, etc.
- An amine compound used as another raw material for producing a solid-dispersed amine adduct-based latent curing catalyst has in its molecule one or more active hydrogens capable of undergoing an addition reaction with an epoxy group, and has a primary amino group, a secondary Any compound having at least one functional group selected from an amino group and a tertiary amino group in the molecule may be used. Examples of such amine compounds are shown below, but are not limited thereto.
- Aliphatic amines such as, for example, diethylenetriamine, triethylenetetramine, n-propylamine, 2-hydroxyethylaminopropylamine, cyclohexylamine, 4,4'-diamino-dicyclohexylmethane; 4,4'-diaminodiphenylmethane, 2 -aromatic amine compounds such as methylaniline; nitrogen atom-containing heterocyclic compounds such as 2-ethyl-4-methylimidazole, 2-ethyl-4-methylimidazoline, 2,4-dimethylimidazoline, piperidine and piperazine; etc., but not limited to these.
- compounds having a tertiary amino group in the molecule are particularly raw materials that provide latent curing catalysts having excellent curing accelerating ability.
- examples of such compounds include, for example, dimethylaminopropylamine , diethylaminopropylamine, di-n-propylaminopropylamine, dibutylaminopropylamine, dimethylaminoethylamine, diethylaminoethylamine, N-methylpiperazine and other amine compounds, 2-methylimidazole, 2-ethylimidazole, 2-ethyl- Primary or secondary amines having a tertiary amino group in the molecule, such as imidazole compounds such as 4-methylimidazole and 2-phenylimidazole; 2-dimethylaminoethanol, 1-methyl-2-dimethylaminoethanol, 1-phenoxymethyl-2-dimethylaminoethanol, 2-diethylaminoethanol, 1-butoxymethyl-2-dimethylamin
- isocyanate compounds used as solid-dispersed amine adduct-based latent curing catalysts and as another manufacturing raw material include monofunctional isocyanate compounds such as n-butyl isocyanate, isopropyl isocyanate, phenyl isocyanate, and benzyl isocyanate; methylene diisocyanate, toluylene diisocyanate, 1,5-naphthalene diisocyanate, diphenylmethane-4,4'-diisocyanate, isophorone diisocyanate, xylylene diisocyanate, paraphenylene diisocyanate, 1,3,6-hexamethylene triisocyanate, bicycloheptane triisocyanate, etc.
- monofunctional isocyanate compounds such as n-butyl isocyanate, isopropyl isocyanate, phenyl isocyanate, and benzyl isocyanate
- terminal isocyanate group-containing compounds obtained by reacting these polyfunctional isocyanate compounds with active hydrogen compounds can also be used.
- Examples of such terminal isocyanate group-containing compounds include an addition compound having a terminal isocyanate group obtained by the reaction of toluylene diisocyanate and trimethylolpropane, and a terminal isocyanate group obtained by the reaction of toluylene diisocyanate and pentaerythritol. but not limited thereto.
- urea compounds include urea and thiourea, but are not limited to these.
- the solid-dispersed latent curing catalyst that can be used in the present embodiment includes, for example, the above (a) two components of an amine compound and an epoxy compound, (b) three components of these two components and an active hydrogen compound, or (c ) Binary or ternary combinations of amine compounds and isocyanate compounds and/or urea compounds. These components are mixed and reacted at a temperature from room temperature to 200° C., then solidified by cooling and pulverized, or reacted in a solvent such as methyl ethyl ketone, dioxane, tetrahydrofuran, etc., and after removing the solvent, , can be easily produced by pulverizing the solid content.
- a solvent such as methyl ethyl ketone, dioxane, tetrahydrofuran, etc.
- Typical examples of commercially available solid dispersion type latent curing catalysts include amine-epoxy adduct system (amine adduct system) such as "Amicure PN-23” (product name of Ajinomoto Fine-Techno Co., Ltd.), “Amicure PN-40” (Ajinomoto Fine-Techno Co., Ltd. product name), “Amicure PN-50” (Ajinomoto Fine-Techno Co., Ltd. product name), “Hardner X-3661S” (ACR Co., Ltd. product name), “Hardener X-3670S” ” (ACR Co., Ltd.
- urea-type adducts include "Fujicure FXE-1000" (T&K TOKA Co., Ltd. product name), "Fujicure FXR- 1030" (product name of T&K TOKA Co., Ltd.), but not limited to these.
- Component (D) may be used either singly or in combination of two or more.
- the content of the curing catalyst is preferably 0.1 to 40% by mass, preferably 1 to 20% by mass, based on the total mass of the resin composition, from the viewpoint of the curing speed and pot life of the resin composition. % is more preferred.
- the resin composition of the present embodiment contains (E) a coupling agent (hereinafter also referred to as “component (E)”).
- the coupling agent has two or more different functional groups in the molecule, one of which is a functional group that chemically bonds with the inorganic material, and the other of which chemically bonds with the organic material. It is a functional group.
- (E) a coupling agent is also necessary for improving moisture resistance.
- the reason is not limited, it is considered as follows.
- water, heat, ions, vibration, load, etc. are applied to the metal material bonding portion, the bonding strength is lowered.
- water is positioned as an extremely important deterioration factor, and when water molecules enter and accumulate at the metal/adhesive interface, the effects of other deterioration factors such as heat, ions, vibrations and loads are further accelerated, resulting in the final adhesion. Partial destruction.
- (E) the coupling agent suppresses the penetration of water into the adhesion interface, which is thought to improve the moisture resistance.
- Examples of (E) coupling agents include, but are not limited to, silane coupling agents, aluminum coupling agents, titanium coupling agents, etc., depending on the type of functional group that chemically bonds with the inorganic material.
- Examples of coupling agents include various types of coupling agents such as epoxy, amino, vinyl, methacrylic, acrylic, and mercapto, depending on the type of functional group that chemically bonds with the organic material. It is not limited to these.
- an epoxy coupling agent containing an epoxy group, a methacrylic coupling agent containing a methacryloyl group, an acrylic coupling agent containing an acryloyl group, and a mercapto coupling agent containing a thiol group have improved moisture resistance. It is preferable because In particular, an epoxy-based coupling agent containing an epoxy group is more preferable from the viewpoint of both heat curing and moisture resistance after UV+heat curing.
- epoxy-based silane coupling agents include 3-glycidoxypropyltrimethoxysilane (product name: KBM403, manufactured by Shin-Etsu Chemical Co., Ltd.), 3-glycidoxypropyltriethoxysilane (product name: KBE-403, Shin-Etsu Chemical Co., Ltd.), 3-glycidoxypropylmethyldiethoxysilane (product name: KBE-402, manufactured by Shin-Etsu Chemical Co., Ltd.), 3-glycidoxypropylmethyldimethoxysilane (product name: KBM402, manufactured by Shin-Etsu Chemical Co., Ltd.) , 8-glycidoxyoctyltrimethoxysilane (product name: KBM-4803, Shin-Etsu Chemical Co., Ltd.), 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane (product name: Sila Ace S530, JNC Corporation), etc. mentioned.
- methacrylic silane coupling agents include 3-methacryloxypropyltrimethoxysilane (product name: KBM503, manufactured by Shin-Etsu Chemical Co., Ltd.), 3-methacryloxypropylmethyldimethoxysilane (product name: KBM502, manufactured by Shin-Etsu Chemical Co., Ltd.). ), 3-methacryloxypropylmethyldiethoxysilane (product name: KBE502, manufactured by Shin-Etsu Chemical Co., Ltd.), 3-methacryloxypropyltriethoxysilane (product name: KBE503, manufactured by Shin-Etsu Chemical Co., Ltd.), and the like.
- acrylic silane coupling agents include 3-acryloxypropyltrimethoxysilane (product name: KBM-5103, manufactured by Shin-Etsu Chemical Co., Ltd.).
- mercapto-based silane coupling agents include 3-mercaptopropyltrimethoxysilane (product name KBM803, manufactured by Shin-Etsu Chemical Co., Ltd.) and 3-mercaptopropylmethyldimethoxysilane (product name KBM802, manufactured by Shin-Etsu Chemical Co., Ltd.). mentioned.
- any one of the coupling agents may be used, or two or more may be used in combination.
- the content of component (E) is preferably 0.1 to 10% by mass, more preferably 0.2 to 7% by mass, and still more preferably 0.3 to 5% by mass, relative to the total mass of the resin composition. is.
- the resin composition of the present embodiment may contain (F) a photoinitiator (hereinafter also referred to as "(F) component") within a range that does not impair the effects of the present invention.
- a photoinitiator hereinafter also referred to as "(F) component
- photoinitiators that generate radicals by UV absorption are preferred.
- photoinitiators examples include alkylphenone photoinitiators and acylphosphine oxide photoinitiators. Specifically, 2,2-dimethoxy-1,2-diphenylethan-1-one, 1-hydroxy-cyclohexyl-phenyl-ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholino and propan-1-one.
- the resin composition of the present embodiment is photo- and heat-curable, but UV curing can be accelerated by using a photoinitiator.
- component (F) is preferably 0.1 to 10 parts by mass, more preferably 0.2 to 8 parts by mass, relative to 100 parts by mass of the (meth)acrylate compound, from the viewpoint of UV curability. is.
- the resin composition of the present embodiment may contain (G) an inorganic filler (hereinafter also referred to as "(G) component") within a range that does not impair the effects of the present invention.
- An inorganic filler consists of a granular body formed of an inorganic material.
- Inorganic materials include silica, alumina, aluminum nitride, calcium carbonate, aluminum silicate, magnesium silicate, magnesium carbonate, barium sulfate, barium carbonate, lime sulfate, aluminum hydroxide, calcium silicate, potassium titanate, titanium oxide, Zinc oxide, silicon carbide, silicon nitride, boron nitride and the like can be used. Any one of the inorganic fillers may be used, or two or more thereof may be used in combination.
- a silica filler is preferably used as the inorganic filler.
- Silica is preferably amorphous silica.
- the shape of the inorganic filler is not particularly limited, and may be spherical, scaly, acicular, irregular, and the like. A spherical shape is preferable from the viewpoint of fluidity.
- the average particle size of the inorganic filler is preferably 0.01-15 ⁇ m, more preferably 0.01-10 ⁇ m.
- the maximum particle size of the inorganic filler is preferably 50 ⁇ m or less, more preferably 30 ⁇ m or less.
- the average particle size is the particle size at 50% of the integrated value in the volume-based particle size distribution measured by the laser diffraction/scattering method.
- the maximum particle size is the maximum particle size in a volume-based particle size distribution measured by a laser diffraction/scattering method.
- the content of the inorganic filler is preferably 0.5 to 80% by mass, more preferably 1 to 70% by mass, relative to the total mass of the resin composition.
- the resin composition of the present embodiment may contain (H) a stabilizer (hereinafter also referred to as “(H) component”) within a range that does not impair the effects of the present invention.
- (H) Stabilizers are used to increase the storage stability of the resin composition, and are added to suppress the occurrence of polymerization reactions caused by unintended radicals and basic components.
- a known stabilizer can be used, for example, a boric acid ester compound, a strong acid, or a radical scavenger can be used.
- specific (H) stabilizers include trimethylborate, triethylborate, tri-n-propylborate, triisopropylborate, trifluoromethanesulfonic acid, maleic acid, methanesulfonic acid, difluoroacetic acid, trichloroacetic acid, phosphorus acids, dichloroacetic acid, N-nitroso-N-phenylhydroxylamine aluminum, triphenylphosphine, 4-methoxyphenol, and hydroquinone.
- the preferred (H) stabilizer is at least one selected from maleic acid, methanesulfonic acid, N-nitroso-N-phenylhydroxylamine aluminum and 4-methoxyphenol.
- (H) stabilizer known ones disclosed in JP-A-2010-117545, JP-A-2008-184514, JP-A-2017-171804, etc. can also be used.
- (H) Stabilizers may be used alone or in combination of two or more.
- the content of component (H) is preferably 0.1 to 5% by mass, more preferably 0.3 to 3% by mass, relative to the total mass of the resin composition.
- the resin composition contains at least one of (G) an inorganic filler and (H) a stabilizer.
- the resin composition may optionally contain a solvent, carbon black, titanium black, an ion trapping agent, a leveling agent, an antioxidant, an antifoaming agent, a thixotropic agent, and a viscosity modifier as long as the object of the present embodiment is not impaired. , flame retardants, and/or other additives.
- the resin composition includes, for example, components (A) to (E), optionally components (F), (G) and/or (H), and optionally other additives, etc. at the same time. Alternatively, they can be obtained separately by stirring, melting, mixing and/or dispersing while optionally applying heat treatment.
- Devices for mixing, stirring, dispersing, etc. are not particularly limited. As this device, a Laikai machine, a Henschel mixer, a three-roll mill, a ball mill, a planetary mixer, a bead mill, etc., equipped with a stirring and heating device can be used. Also, these devices may be used in combination as appropriate.
- the resin composition obtained in this way has both photocurability and thermosetting properties, and is sufficiently cured only by thermosetting.
- the thermosetting temperature of the resin composition is preferably 70 to 90° C. when the resin composition is used for an image sensor module.
- the resin composition of the present embodiment can be used, for example, as an adhesive for joining parts together or as a raw material thereof.
- the adhesive which is the second embodiment of the present invention, contains the resin composition of the first embodiment described above. This adhesive allows good bonding to engineering plastics, ceramics and metals.
- the cured product of the third embodiment of the present invention is a cured product obtained by curing the resin composition of the first embodiment or the adhesive of the second embodiment.
- semiconductor device of the fourth embodiment of the present invention contains the cured product of the third embodiment, it has high moisture resistance. Since the electronic component of the fifth embodiment of the present invention includes the semiconductor device of the fourth embodiment, it has high moisture resistance.
- (A) (meth)acrylate compound (component (A)) (A1): Dimethylol-tricyclodecane diacrylate (product name: Light Acrylate DCP-A, manufactured by Kyoeisha Chemical Co., Ltd., acryloyl equivalent: 188 g/eq) (A2): Polyester acrylate (product name: M7100, manufactured by Toagosei Co., Ltd., acryloyl equivalent: 152 g/eq) - (B) polythiol compound (component (B)) (B1): Pentaerythritol tetrakis(3-mercaptopropionate) represented by the following formula (product name: PEMP, manufactured by SC Organic Chemical, thiol equivalent: 122 g/eq) (B2): a glycoluril derivative represented by formula (3) (product name: C3 TS-G, manufactured by Shikoku Kasei Kogyo Co., Ltd., thiol equivalent: 114
- the properties of the cured product obtained by curing the resin composition were measured as follows.
- the curing conditions at this time are: 80°C/60 minutes in a blower dryer for "heat only”; After an amount of 2000 mJ/cm 2 (UV wavelength: 365 nm, LED lamp), 80° C./60 min in a blower dryer.
- the alumina chip on this glass plate was poked from the side with a MODEL-1605HTP type strength tester manufactured by Aikoh Engineering Co., Ltd., and the shear strength was calculated from the numerical value when the alumina chip was peeled off.
- the cured test pieces were subjected to a pressure cooker test (PCT) (2 atm, 121° C., 100% RH, 20 hours). After that, the shear strength was calculated in the same manner. Table 1 shows the results (unit: N).
- a PCT test is a reliability test in which a cured resin composition is held at 121° C., 2 atmospheres, and 100% relative humidity.
- the retention rate (%) of the adhesive strength after a pressure cooker test (PCT) was calculated for the initial adhesive strength.
- the adhesive strength retention rate is preferably 50% or more, more preferably 60% or more. Table 1 shows the results.
- Both (A1) and (A2) of component (A) are (meth)acrylate compounds containing an ester bond.
- Component (B) (B1) is a polythiol compound containing an ester bond, and (B2) and (B3) are polythiol compounds that do not contain an ester bond. All of Examples 1 to 9 and Comparative Examples 1 to 4 contain (A1), (A2) and (B1), and are examined under conditions that facilitate hydrolysis. It should be noted that the scope of the present invention is not necessarily limited to embodiments in which component (A) and component (B) contain ester bonds.
- the present invention is a light and thermosetting resin composition that exhibits high moisture resistance after UV+thermal curing as well as high moisture resistance even after thermal curing alone, and is particularly applicable to locations where UV curing is difficult. Very useful as an adhesive.
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Abstract
Description
本発明の第一の実施形態は、以下の樹脂組成物である。
(1)(A)(メタ)アクリレート化合物、
(B)ポリチオール化合物、
(C)環状カルボジイミド化合物、
(D)硬化触媒、
及び
(E)カップリング剤
を含む樹脂組成物。
(2)(C)環状カルボジイミド化合物の含有量が、樹脂組成物の総質量に対し5質量%以上である、上記(1)に記載の樹脂組成物。
(3)(E)カップリング剤が、エポキシ基を含むエポキシ系カップリング剤を含む、上記(1)又は(2)に記載の樹脂組成物。
(4)さらに、(F)光開始剤を含む、(1)~(3)のいずれかに記載の樹脂組成物。
(5)さらに、(G)無機フィラー及び(H)安定化剤の少なくとも1つを含む、上記(1)~(4)のいずれか項に記載の樹脂組成物。
本発明の第三の実施形態は、(7)上記(1)~(5)のいずれかに記載の樹脂組成物、又は上記(6)に記載の接着剤が硬化された硬化物である。
本発明の第四の実施形態は、(8)上記(7)に記載の硬化物を含む半導体装置である。
本発明の第五の実施形態は、上記(8)に記載の半導体装置を含む電子部品である。
本発明の第一の実施形態である樹脂組成物は、
(A)(メタ)アクリレート化合物、
(B)ポリチオール化合物、
(C)環状カルボジイミド化合物、
(D)硬化触媒、
及び
(E)カップリング剤
を含む。本実施形態によれば、熱硬化後に高い耐湿性を有する樹脂組成物を得ることができる。
本実施形態の樹脂組成物は、(A)(メタ)アクリレート化合物(以下、「(A)成分」とも言う)を含む。(A)(メタ)アクリレート化合物は、硬化後の樹脂組成物に透明性や適度な硬度を付与することができる。(A)成分である(メタ)アクリレート化合物は、1以上の(メタ)アクリロイル基を有していれば、特に限定されない。耐熱性を確保する点を考慮すると、2個以上の(メタ)アクリロイル基を持つ化合物が好ましく、2~6個の(メタ)アクリロイル基を持つ化合物がより好ましく、2個の(メタ)アクリロイル基を持つ化合物がさらに好ましい。また、粘度や硬化物物性(接着強度や柔軟性など)の調整のため、2個の(メタ)アクリロイル基を持つ化合物に加えて、1個の(メタ)アクリロイル基を持つ化合物を用いることもできる。本来であれば、耐湿性の観点から、(A)成分は、分子内にエステル結合等の加水分解性の部分構造を有しない構造を有することが好ましいが、本実施形態においては、(C)環状カルボジイミド化合物を含むことにより、エステル結合等の加水分解を抑制するとともに、加水分解により分子鎖が切れても再結合することができるため、分子内にエステル結合等を有していてもよい。
(A)(メタ)アクリレート化合物は、上述した(メタ)アクリレート化合物のうち、いずれか1種を用いてもよいし、2種以上を併用してもよい。
本実施形態の樹脂組成物は、(B)ポリチオール化合物(以下、「(B)成分」とも言う)を含む。(B)ポリチオール化合物は、樹脂組成物に、弾性及び耐湿性を付与する。(B)成分は、2以上のチオール基を有していれば、特に限定されない。本来であれば、耐湿性の観点から、(B)成分は、分子内にエステル結合等の加水分解性の部分構造を有しない構造を有することが好ましいが、本実施形態においては、(C)環状カルボジイミド化合物を含むことにより、エステル結合等の加水分解を抑制するとともに、加水分解により分子鎖が切れても再結合することができるため、分子内にエステル結合等を有していてもよい。
プロピオネート)、ペンタエリスリトールテトラキス(3-メルカプトブチレート)、トリス-[(3-メルカプトプロピオニルオキシ)-エチル]-イソシアヌレート、ペンタエリスリトールテトラキス(3-メルカプトブチレート)、1,4-ビス(3-メルカプトブチリルオキシ)ブタン、1,3,5-トリス(3-メルカプトブチリルオキシエチル)-1,3,5-トリアジン-2,4,6(1H,3H,5H)-トリオン、トリメチロールプロパントリス(3-メルカプトブチレート)、及びトリメチロールエタントリス(3-メルカプトブチレート)等が挙げられる。
本実施形態の樹脂組成物は、(C)環状カルボジイミド化合物(以下、「(C)成分」とも言う)を含む。環状カルボジイミド化合物は、環状構造を有する。環状構造は、カルボジイミド基(-N=C=N-)を1個有しその第一窒素と第二窒素とが結合基により結合されている。一つの環状構造中には、1個のカルボジイミド基のみを有する。環状構造中の原子数は、好ましくは8~50、より好ましくは10~30、さらに好ましくは10~20である。環状カルボジイミド化合物は、環状構造を複数有していてもよい。
(C)環状カルボジイミド化合物による耐湿性改善のメカニズムは、限定されるものではないが、以下のように推定される。
エステル結合等の加水分解性の部分構造は、一部の(A)(メタ)アクリレート化合物お及び一部の(B)ポリチオール化合物に含まれている。例えば、エステル結合は加水分解し、カルボン酸とアルコールを生成する。カルボジイミド基は、以下に示す通り、加水分解で生成したカルボン酸と反応し、分解反応の触媒となる酸を補足することによって、加水分解を抑制する効果がある。
本実施形態において、環状カルボジイミド化合物の製造方法は特に限定されず、従来公知の方法(例えば、国際公開第2010/071211号、特開2011-256139号公報に記載の方法など)により製造することができる。例えば、アミン体からイソシアネート体を経由して製造する方法、アミン体からイソチオシアネート体を経由して製造する方法、アミン体からトリフェニルホスフィン体を経由して製造する方法、アミン体から尿素体を経由して製造する方法、アミン体からチオ尿素体を経由して製造する方法、カルボン酸体からイソシアネート体を経由して製造する方法、ラクタム体を誘導して製造する方法が挙げられる。
本実施形態の樹脂組成物は、(D)硬化触媒(以下、「(D)成分」とも言う)を含む。本実施形態において用いる(D)硬化触媒は、(メタ)アクリレート化合物の硬化触媒であれば特に限定されず、公知のものを使用することができるが、潜在性硬化触媒であることが好ましい。上記(D)成分の潜在性硬化触媒とは、室温では不活性の状態で、加熱することにより活性化して、硬化触媒として機能する化合物であり、例えば、常温で固体のイミダゾール化合物;アミン化合物とエポキシ化合物との反応生成物(アミン-エポキシアダクト系)等の固体分散型アミンアダクト系潜在性硬化触媒;アミン化合物とイソシアネート化合物又は尿素化合物との反応生成物(尿素型アダクト系)等が挙げられる。
本実施形態の樹脂組成物は、(E)カップリング剤(以下、「(E)成分」とも言う)を含む。カップリング剤は、分子中に2つ以上の異なった官能基を有しており、その一つは、無機質材料と化学結合する官能基であり、他の一つは、有機質材料と化学結合する官能基である。樹脂組成物がカップリング剤を含有することによって、樹脂組成物の基板等への密着性が向上する。
本実施形態の樹脂組成物は、本発明の効果を損なわない範囲で、(F)光開始剤(以下、「(F)成分」とも言う)を含有してもよい。本実施形態においては、UV吸収によりラジカルを発生する光開始剤が好ましい。
本実施形態の樹脂組成物は、本発明の効果を損なわない範囲で、(G)無機フィラー(以下、「(G)成分」とも言う)を含有していてもよい。
無機フィラーは、無機材料によって形成された粒状体からなる。無機材料としては、シリカ、アルミナ、窒化アルミニウム、炭酸カルシウム、ケイ酸アルミニウム、ケイ酸マグネシウム、炭酸マグネシウム、硫酸バリウム、炭酸バリウム、硫酸石灰、水酸化アルミニウム、ケイ酸カルシウム、チタン酸カリウム、酸化チタン、酸化亜鉛、炭化ケイ素、窒化ケイ素、窒化ホウ素等を用いることができる。無機フィラーは、いずれか1種を用いてもよいし、2種以上を併用してもよい。無機フィラーとしては、シリカフィラーを用いることが好ましい。シリカは、非晶質シリカが好ましい。
本実施形態の樹脂組成物は、本発明の効果を損なわない範囲で、(H)安定化剤(以下、「(H)成分」とも言う)を含んでもよい。(H)安定化剤は、樹脂組成物の保存時の安定性を高めるためのものであり、意図しないラジカルや塩基性成分による重合反応の発生を抑制するために添加される。
(H)安定化剤は、いずれか1種を用いてもよいし、2種以上を併用してもよい。
本発明の第二の実施形態である接着剤は、上述の第一の実施形態の樹脂組成物を含む。この接着剤は、エンジニアリングプラスチック、セラミックス、及び金属に対して、良好な接合を可能にする。
本発明の第三の実施形態の硬化物は、上述の第一実施形態の樹脂組成物又は第二実施形態の接着剤が硬化された硬化物である。
本発明の第四の実施形態の半導体装置は、上述の第三実施形態の硬化物を含むため、高い耐湿性を有する。本発明の第五の実施形態の電子部品は、この第四実施形態の半導体装置を含むため、高い耐湿性を有する。
表1に示す配合に従って、3本ロールミルを用いて所定の量の各成分を混合することにより、樹脂組成物を調製した。表1において、各成分の量は質量部(単位:g)で表されている。実施例及び比較例において用いた成分は、以下の通りである。
(A1):ジメチロール-トリシクロデカンジアクリレート(品名:ライトアクリレートDCP-A、共栄社化学社製、アクリロイル当量:188g/eq)
(A2):ポリエステルアクリレート(品名:M7100、東亜合成株式会社製、アクリロイル当量:152g/eq)
・(B)ポリチオール化合物(成分(B))
(B1):下記式で表されるペンタエリスリトールテトラキス(3-メルカプトプロピオネート)(品名:PEMP、SC有機化学製、チオール当量:122g/eq)
(B2):式(3)で表されるグリコールウリル誘導体(品名:C3 TS-G、四国化成工業製、チオール当量:114g/eq)
(B3):式(2)で表される1,3,4,6-テトラキス(2-メルカプトエチル)グリコールウリル(品名:TS-G、四国化成工業株式会社製、チオール当量:100g/eq)
・(C)環状カルボジイミド化合物(成分(C))
式(5-1)の環状カルボジイミド化合物(カルボジイミド当量:256g/eq)
・(C’)ポリカルポジイミド化合物
(品名:カルボジライトV-02B、日清紡ケミカル株式会社製、カルボジイミド当量:600g/eq)
・(D)硬化触媒(成分(D))
(D1):アミン-エポキシアダクト系潜在性硬化触媒(品名:ノバキュアHXA9322HP、旭化成イーマテリアルズ株式会社製)
(D2):アミン-エポキシアダクト系潜在性硬化触媒(品名:フジキュアFXR1121、株式会社T&K TOKA製)
・(E)カップリング剤(成分(E))
(E1):3-グリシドキシプロピルトリメトキシシラン(品名:KBM-403、信越化学工業株式会社)
(E2):8-グリシドキシオクチルトリメトキシシラン(品名:KBM-4803、信越化学工業株式会社)
(E3):2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン(品名:サイラエース S530、JNC株式会社)
・(F)光開始剤(成分(F))
2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン(品名:Omnirad 907、IGM Resins B.V.社)
・(G)無機フィラー(成分(G))
シリカ(品名:SO-E2、株式会社アドマテックス)
・(H)安定化剤(成分(H))
ホウ酸トリイソプロピル(品名:TIPB、東京化成工業株式会社)
ガラス板上に、樹脂組成物をφ2mmの大きさ、125μmの厚さで孔版印刷し、印刷した樹脂組成物の上に、3.2mm×1.6mm×0.45mm厚のアルミナチップを搭載し、荷重をかけたものを硬化させて、試験片を作製した(n=10)。このときの硬化条件は、「熱のみ」の場合は、送風乾燥機中で80℃/60分、「UV+熱」の場合は、アルミナチップ搭載面(表面)の反対面(裏面)よりUV照射量2000mJ/cm2(UV波長:365nm、LEDランプ)の後、送風乾燥機中で80℃/60分とした。このガラス板上のアルミナチップを、アイコーエンジニアリング社製MODEL-1605HTP型強度試験機で側面から突き、アルミナチップが剥がれた時の数値からせん断強度を算出した。
次に、実施例1~9、比較例1~4について、硬化処理後の試験片をプレッシャークッカー試験(Pressure Cooker Test;以下、PCT)(2atm、121℃、100%RH、20時間)を行った後、同様にしてせん断強度を算出した。表1に、結果(単位は、N)を示す。PCT試験とは、硬化後の樹脂組成物を、121℃、2気圧、100%相対湿度に保持する信頼性試験である。
熱硬化条件、UV+熱硬化条件のそれぞれについて、初期の接着強度に対するプレッシャークッカー試験(Pressure Cooker Test;以下、PCT)後の接着強度の保持率(%)を算出した。本発明において、接着強度保持率は好ましくは50%以上、さらに好ましくは60%以上である。表1に結果を示す。
実施例1~4及び比較例1の比較から、(C)環状カルボジイミド化合物を樹脂組成物中に5質量%以上添加することにより、熱硬化条件及びUV+熱硬化条件の両方において、PCT後の接着強度保持率が上昇し、耐湿性が改善したことがわかる。
実施例5、6及び比較例2の比較から、成分(B)を2種以上併用した場合でも、同様に、(C)環状カルボジイミド化合物を樹脂組成物中に添加することにより、熱硬化条件及びUV+熱硬化条件の両方において、PCT後の接着強度保持率が上昇し、耐湿性が改善したことがわかる。
実施例2及び7の比較から、(D)硬化触媒の種類によらず、同様に、(C)環状カルボジイミド化合物を樹脂組成物中に添加することにより、熱硬化条件及びUV+熱硬化条件の両方において、PCT後の接着強度保持率が上昇し、耐湿性が改善したことがわかる。
実施例2及び比較例1、3の比較から、(C)環状カルボジイミド化合物は、ポリカルボジイミド化合物よりも、熱硬化条件において、耐湿性をより改善させることがわかる。また、UV+熱硬化条件において、(C)環状カルボジイミド化合物は、耐湿性を改善することができたのに対し、ポリカルボジイミド化合物は、耐湿性を改善させることができなかった。
実施例2、8、9及び比較例4の比較より、耐湿性の改善には(E)カップリング剤の存在も必要であることがわかる。
本明細書に記載された全ての文献、特許出願、および技術規格は、個々の文献、特許出願、および技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書に参照により取り込まれる。
Claims (9)
- (A)(メタ)アクリレート化合物、
(B)ポリチオール化合物、
(C)環状カルボジイミド化合物、
(D)硬化触媒、
及び
(E)カップリング剤
を含む樹脂組成物。 - (C)環状カルボジイミド化合物の含有量が、樹脂組成物の総質量に対し5質量%以上である、請求項1に記載の樹脂組成物。
- (E)カップリング剤が、エポキシ基を含むエポキシ系カップリング剤を含む、請求項1又は2に記載の樹脂組成物。
- さらに、(F)光開始剤を含む、請求項1~3のいずれか1項に記載の樹脂組成物。
- さらに、(G)無機フィラー及び(H)安定化剤の少なくとも1つを含む、請求項1~4のいずれか1項に記載の樹脂組成物。
- 請求項1~5のいずれか1項に記載の樹脂組成物を含む接着剤。
- 請求項1~5のいずれか1項に記載の樹脂組成物、又は請求項6に記載の接着剤が硬化された硬化物。
- 請求項7に記載の硬化物を含む半導体装置。
- 請求項8に記載の半導体装置を含む電子部品。
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